电离辐射环境下金属-铁电-绝缘体-基底结构铁电场效应晶体管电学性能的模拟

本文利用改进的米勒模型模拟了金属-铁电-绝缘体-基底结构铁电场效应晶体管在电离辐射环境下的铁电薄膜极化、界面电荷密度和电荷迁移率,最终得出在不同辐射总剂量和辐射剂量率下,铁电场效应晶体管的电容和漏源电流曲线. 计算结果表明,总剂量为10 Mrad时,对铁电场效应晶体管的漏源电流和电容影响甚微;总剂量为100 Mrad (1 rad = 10² Gy)时,对其有很明显的影响. 当辐射的剂量率发生变化时,铁电场效应晶体管的电流和电容也会发生改变. 模拟结果表明,铁电场效应晶体管有较强的抗辐射能力. 关键词： 总剂量 剂量率 电容 漏源电流     

Au/PZT/BIT/p-Si异质结的制备与性能研究

采用脉冲激光沉积(PLD)工艺,制备了以Bi₄Ti₃O₁₂(BIT)为过渡阻挡层的Au/PZT/BIT/p-Si异质结.研究了BIT铁电层对Pb(Zr_0.52Ti_0.48)O₃(PZT)薄膜晶相结构、铁电及介电性能的影响,对Au/PZT/BIT/p-Si异质结的导电机制进行了讨论.氧气氛530℃淀积的PZT为多晶铁电薄膜,与直接淀积在Si基片上相比,加入BIT铁电层后PZT铁 关键词： 铁电薄膜 异质结构 脉冲激光沉积(PLD)     

Bismuth ferrite composite thin films

0.60Bi_0.90La_0.10FeO₃–0.40Pb(Zr_0.52Ti_0.48)O₃ composite thin films were deposited on Pt/TiO₂/SiO₂/Si(100) substrates by radio-frequency sputtering and their ferroelectric and fatigue properties were mainly investigated. The composite thin films have a low dielectric loss, a high dielectric constant, and enhanced ferroelectric properties of 2P _r～122.6 μC/cm² and 2E _c～479.3 kV/cm, together with a fatigue-free behavior at 200 kHz. Their fatigue behavior is strongly dependent on measurement frequencies, and the concentration of oxygen vacancies plays an important role in their fatigue behavior.     

Effects of oxygen partial pressure on the ferroelectric properties of pulsed laser deposited Ba0.8Sr0.2TiO3 thin films

The Ba_0.8Sr_0.2TiO₃ thin films were grown on the Pt–Si substrate at 700 °C by using a pulsed laser deposition technique at different oxygen partial pressure (PO₂) in the range of 1–20 Pa and their properties were investigated. It is observed that the PO₂ during the deposition plays an important role on the tetragonal distortion ratio, surface morphology, dielectric permittivity, ferroelectric polarization, switching response, and leakage currents of the films. With an increase in PO₂, the in-plane strain for the BST films changes from tensile to compressive. The films grown at 7.5 Pa show the optimum dielectric and ferroelectric properties and also exhibit the good polarization stability. It is assumed that a reasonable compressive strain, increasing the ionic displacement, and thus promotes the in-plane polarization in the field direction, could improve the dielectric permittivity. The butterfly features of the capacitance–voltage (C–V) characteristics and the bell shape curve in polarization current were attributed to the domain reversal process. The effect of pulse amplitude on the polarization reversal behavior of the BST films grown at PO₂ of 7.5 Pa was studied. The peak value of the polarization current shows exponential dependence on the electric field.     

Leakage currents in ferroelectric thin films

The main mechanisms of leakage currents in thin lead zirconate titanate (PZT) ferroelectric films prepared by the sol–gel method are discussed. Four specific regions are determined in I–V dependencies. At very weak fields (10–20 kV/cm), the current falls with the voltage increase as a result of depolarization. In the low fields region (about 70–100 kV/cm), the leakage current decreases with the decrease of voltage ramp speed and its components are the ohmic and displacement currents. In the high fields region (≥130 kV/cm), the leakage current increases with the decrease of step voltage ramp in contrast to the previous case. Possible conductivity mechanisms are the Poole– Frenkel emission and hopping conduction. In the transition region between above-mentioned ones (from 80–90 to ～130 kV/cm), an abrupt unstable increase of current is observed caused by breakdown of reverse bias Schottky barrier. Depolarization currents are studied for sol–gel PZT films prepared at different preparation conditions.     

Multiferroic and resistive switching behaviors in BiFe0.95Cr0.05O3 thin films deposited on Pt/Ti/SiO2/Si substrates

Multiferroic and resistive switching properties of single-phase polycrystalline perovskite BiFe_0.95Cr_0.05O₃ (BFCO) thin films grown on Pt/Ti/SiO₂/Si substrates by radio-frequency magnetron sputtering were investigated. The BFCO film shows ferroelectric and magnetic properties simultaneously at room temperature, and also exhibits a good piezoelectric property with remanent effective piezoelectric coefficient d _33,f ～55±4 pm/V. An obviously resistive switching behavior was observed in the BFCO thin film at room temperature, which was discussed by the filamentary conduction mechanism associated with the redistribution of oxygen vacancies.     

Phase evolution and effect of pre-heating temperature on the characteristics of PZT thin films grown by using a triol sol--gel route

Lead zirconate titanate (PZT) films were fabricated on Pt(111)/Ti/SiO₂/Si(100) using the triol sol--gel method. The effect of the pre-heating temperature on the phase transformations, microstructures, electrical properties and ferroelectric properties of the PZT thin films was investigated. Randomly-oriented PZT thin films pre-heated at 400°C for 10?min and annealed at 600°C for 30?min showed well-defined ferroelectric hysteresis loops with a remanent polarization of 26.57?µC?cm^?2 and a coercive field of 115.42?kV?cm^?1. The dielectric constant and dielectric loss of the PZT films were 621 and 0.0395, respectively. The microstructures of the thin films are dense, crack-free and homogeneous with fine grains about 15–20?nm in size.     

(111)取向(Pb,La)TiO3铁电薄膜中90°纳米带状畴与热释电性能的研究

采用射频磁控溅射技术在Pt/Ti/SiO₂/Si(100)衬底上生长了掺镧钛酸铅(PLT)铁电薄膜.用X射线衍射技术(XRD)研究了PLT薄膜结晶性能，结果表明PLT薄膜为 (111)择优取向钙钛矿相织构.使用原子力显微镜(AFM)和压电响应力显微镜(PFM) 分别观察了PLT薄膜的表面形貌和对应区域的电畴结构.PFM观察显示PLT薄膜中存在90°纳米带状畴，电畴的极化为首尾相接的低能量的排列方式，带状畴的宽度为20—60nm.研究了PLT10铁电薄膜的制备条件与性能之间的关系.发现在优化条件下制备的PLT10铁电薄膜的介电常数ε_r为365、介电损耗tgδ为0.02，热释电系数γ为2.18×10^-8C·(cm²·K)^-1，可以满足制备非制冷红外探测器的需要. 关键词： PLT薄膜 电畴 PFM 极化     

A novel Sr_{3}Pb_{6}Ce_{2}Ti_{12}O_{36} ferroelectric thin film grown by pulsed laser ablation

Complex perovskite oxide ferroelectric thin films are of great technological interest because of their high dielectric constant and large tunability. In this paper, we report the structural and electrical properties of Sr \(_{3}\) Pb \(_{6}\) Ce \(_{2}\) Ti \(_{12}\) O \(_{36}\) (SPCTO) thin films grown by pulsed laser deposition. The role of oxygen pressure and substrate temperature on the microstructure, dielectric properties and leakage current mechanism of SPCTO thin films was investigated. Strong oxygen partial pressure dependence on the microcrystalline properties and leakage current conduction mechanism was observed. Both Raman spectra and C-V characteristics show a ferroelectric phase rather than paraelectric phase for the deposited thin films. Investigations on the leakage current showed that SPCTO thin films deposited at different oxygen pressure have different dominant conduction mechanism at various electric fields. The low field conduction mechanism is governed by Ohmic and space charge limited conduction mechanisms, whereas at high fields, the conduction process is dominated by Schottky emission mechanism. The dielectric constant as well as the tunability is found to increase with increase in the crystallite size.     

Temperature and frequency dependence of the ferroelectric characteristics of BaTiO<Subscript>3</Subscript> thin films for nonvolatile memory applications

Ferroelectric thin films of BaTiO₃ were successfully deposited on SiO₂/Si substrate under the optimal rf magnetron sputtering conditions, and their electrical and ferroelectric characteristics were discussed. The memory window, capacitance, threshold voltage and leakage current density of MFIS structure under different frequencies and temperatures were also reported. The variations of ferroelectric capacitance and threshold voltage would be attributed to the as-deposited BaTiO₃ films of MFIS structure as the temperature and frequency increased. Besides, the memory window, threshold voltage and leakage current density would be degraded from 4 V, 5 V and 8×10^-10 A/cm² to 2.5 V, 10 V and 5×10^-4 A/cm², respectively, as the temperature increased from 25 to 90 °C. PACS 77.84.-s; 81.15.Cd; 73.40.Qv; 51.50.+v; 67.80.Gb     

Bias dependence of a deep submicron NMOSFET response to total dose irradiation

Deep submicron n-channel metal-oxide-semiconductor field-effect transistors (NMOSFETs) with shallow trench isolation (STI) are exposed to ionizing dose radiation under different bias conditions.The total ionizing dose radiation induced subthreshold leakage current increase and the hump effect under four different irradiation bias conditions including the worst case (ON bias) for the transistors are discussed.The high electric fields at the corners are partly responsible for the subthreshold hump effect.Charge trapped in the isolation oxide,particularly at the Si/SiO 2 interface along the sidewalls of the trench oxide creates a leakage path,which becomes a dominant contributor to the offstate drain-to-source leakage current in the NMOSFET.Non-uniform charge distribution is introduced into a threedimensional (3D) simulation.Good agreement between experimental and simulation results is demonstrated.We find that the electric field distribution along with the STI sidewall is important for the radiation effect under different bias conditions.     

Thickness dependent magnetic and ferroelectric properties of LaNiO3 buffered BiFeO3 thin films

BiFeO₃ (BFO) thin films with thickness increasing from 40 to 480 nm were successfully grown on LaNiO₃ (LNO) buffered Pt/Ti/SiO₂/Si(100) substrate and the effects of thickness evolution on magnetic and ferroelectric properties are investigated. The LNO buffer layer promotes the growth and crystallization of BFO thin films. Highly (100) orientation is induced for all BFO films regardless of the film thickness together with the dense microstructure. All BFO films exhibited weak ferromagnetic response at room temperature and saturation magnetization is found to decrease with increase in film thickness. Well saturated ferroelectric hysteresis loops were obtained for thicker films; however, the leakage current dominated the ferroelectric properties in thinner films. The leakage current density decreased by three orders of magnitude for 335 nm film compared to 40 nm film, giving rise to enhanced ferroelectric properties for thicker films. The mechanisms for the evolution of ferromagnetic and ferroelectric characteristics are discussed.     

Improved diode properties in zinc telluride thin film-silicon nanowire heterojunctions

In this study, structural and optoelectronic properties and photodedection characteristics of diodes constructed from p-zinc telluride (ZnTe) thin film/n-silicon (Si) nanowire heterojunctions are reported. Dense arrays of vertically aligned Si nanowires were successfully synthesized on (1 1 0)-oriented n-type single crystalline Si wafer using simple and inexpensive metal-assisted etching (MAE) process. Following the nanowire synthesis, p-type ZnTe thin films were deposited onto vertically oriented Si nanowires via radio frequency magnetron sputtering to form three-dimensional heterojunctions. A comparative study of the structural results obtained from X-ray diffraction and Raman spectroscopy measurements showed the improved crystallinity of the ZnTe thin films deposited onto the Si nanowire arrays. The fabricated nanowire-based heterojunction devices exhibited remarkable diode characteristics and enhanced optoelectronic properties and photosensitivity in comparison to the planar reference. The electrical measurements revealed that the diodes with nanowires had a well-defined rectifying behaviour with a rectification ratio of 10⁴ at ±2 V and a relatively small ideality factor of n = 1.8 with lower reverse leakage current and series resistance at room temperature in dark condition. Moreover, an open-circuit voltage of 100 mV was also observed under illumination. Based on spectral photoresponsivity measurements, the nanowire-based device exhibited a distinct responsivity and high detectivity in visible and near-infrared (NIR) wavelength regions. The device characteristics observed here offer that the fabricated ZnTe thin film/Si nanowire-based p–n heterojunction structures will find important applications in future and will be a promising candidate for high-performance and low-cost optoelectronic device applications, NIR photodedectors in particular.     

Improvement of metal–ferroelectric–silicon structures without buffer layers between Si and ferroelectric films

Si-based metal–ferroelectric–semiconductor (MFS) structures without buffer layers between Si and ferroelectric films have been developed by depositing SrBi₂Ta₂O₉ (SBT) directly on n-type (100)-oriented Si. Some effective processes are adopted to improve the electrical properties of these MFS structures. Contrary to the conventional MFS structures with top electrodes directly on ferroelectrics, our MFS structures have been developed with thin dense SiO₂ films deposited between ferroelectric films and top electrodes. Due to the SiO₂ films, the leakage current densities of MFS structures are reduced to 2×10^-8 A/cm² under the bias of 5 V. The C-V electrical properties of the MFS structures are greatly improved after annealing at 400 °C in N₂ ambient for 1 h. The C-V memory windows are increased to 3 V, which probably results from the decrease of the interface trap density at the Si/SBT interface. Received: 7 September 1999 / Accepted: 24 November 1999 / Published online: 2 August 2000     

In-plane dielectric characterization of sol–gel derived PLZT (9/65/35) thin films using an interdigital electrode configuration

Lead lanthanum zirconate titanate (PLZT 9/65/35) thin films were deposited on MgO (00l) substrates using a sol–gel method. X-ray diffraction measurements reveal that the PLZT film has epitaxially grown on the substrate and has a pure perovskite structure. Using gold interdigital electrodes the in-plane dielectric properties of the films were measured as a function of frequency (1 kHz to 10 GHz), temperature (293–435 K) and dc electric field (0–20 MV/m). The PLZT (9/65/35) thin film exhibits a diffuse phase transition, which indicates a relaxor-like ferroelectric behavior. The temperature dependence of the characteristic relaxation time was analyzed in terms of the Vögel–Fulcher relation. The relative permittivity has a high tunability of 34–42% in the frequency range of 10 MHz to 1 GHz.     

Total ionizing dose effects of domestic Si Ge HBTs under different dose rates

The total ionizing radiation(TID) response of commercial NPN silicon germanium hetero-junction bipolar transistors(Si Ge HBTs) produced domestically are investigated under dose rates of 800 m Gy(Si)/s and 1.3 m Gy(Si)/s with a Co-60 gamma irradiation source. The changes of transistor parameters such as Gummel characteristics, and excess base current before and after irradiation, are examined. The results of the experiments show that for the KT1151, the radiation damage is slightly different under the different dose rates after prolonged annealing, and shows a time dependent effect(TDE). For the KT9041, however, the degradations of low dose rate irradiation is higher than for the high dose rate, demonstrating that there is a potential enhanced low dose rate sensitivity(ELDRS) effect for the KT9041. The possible underlying physical mechanisms of the different dose rates responses induced by the gamma rays are discussed.     

The effects of substrate temperatures on the electrical properties of CaZrO3 thin films prepared by RF magnetron sputtering

The radio frequency magnetron sputtering technology (RFMS) was employed to deposit perovskite structure orthogonal phase CaZrO₃ thin films on Pt/Ti/SiO₂/Si substrates. The effects of substrate temperatures on structure and electrical properties of these films were investigated in detail. The CaZrO₃ thin films were systematically characterized by means of X-ray diffraction (XRD), Scanning electron microscope (SEM), Multi-frequency LCR meter (HP4294A) and Radiant Precision Workstation to study the phase structure, cross-section morphology, dielectric and ferroelectric properties at different substrate temperatures. The result indicates that these films can withstand 80 V DC Bias voltage and have excellent stability of frequency, voltage and temperature. The CaZrO₃ thin film prepared at 550 °C turned out to be mainly orthorhombic CaZrO₃ phase with high permittivity, low dielectric loss, extremely low leakage current (at 1 MHz, the dielectric constant is 39.42, the dielectric loss is 0.00455, the quality factor is 220 and the leakage current density is 9.11 × 10⁻⁷A/cm² at 80 V applied voltage.). This work demonstrates that higher substrate temperature can boost the formation of orthorhombic CaZrO₃ phase and the CaZrO₃ thin film prepared by RF magnetron sputtering is a very promising paraelectric material in the application of thin film capacitor.     

Electrical conduction and bipolar switching properties in transparent vanadium oxide resistive random access memory (RRAM) devices

In this study, the electrical conduction and bipolar switching properties in transparent vanadium oxide thin films are investigated and discussed. (110)-oriented vanadium oxide thin films were well deposited onto transparent ITO substrates for the possible development of applications in the structure of system-on-panel devices. For the as-deposited vanadium oxide thin films, they were prepared for 1 h by a rf magnetron sputtering method of rf power 130 W, chamber pressure 10 mTorr, substrate temperature 550 °C, and different oxygen concentrations. In addition, the Al/V₂O₅/ITO device presents reliable and bipolar switching behavior. The on/off ratio and switching cycling of two stable states are found and discussed. We suggest that the current–voltage characteristics are governed by ohmic contact and Poole?Frankel emission transport model mechanisms in low- and high-voltage regions, respectively.     

Effect of strontium addition on ferroelectric phase transition of PZT thin films prepared by chemical route

The dependence of ferroelectric phase transition temperature as a function of strontium substitution in lead titanate zirconate thin films (referred here as PSZT) on platinum-coated silicon substrates was investigated. The dielectric study reveals that the material undergoes a diffuse type ferroelectric phase transition that depends on the substitution of Sr for Pb in PZT. At 100 kHz, the phase transition temperatures were 633, 613 and 516 K for PSZT10, PSZT20 and PSZT30 thin films, respectively. On the other hand, the results showed that the dependence of the dielectric constant upon the frequency does not reveal any relaxor behavior. The diffusivity increases with increasing Sr contents in the studied composition range. The experimental data obtained from measurements of the dielectric constant as a function of temperature and frequencies showed a classical behavior of ferroelectric phase transition in PSZT thin films, rather than a relaxor ferroelectric phase transition. The transition temperature decreases with increasing Sr contents due to the decrease in grain size, lattice decrease and local structural disorder.     

Influence of gamma radiation on morphology structure,electrochemical corrosion behavior and hardness of Ni–Cr based alloys

This study evaluates the effects of gamma radiation on structure, electrochemical corrosion behavior and Vickers hardness of commercial dental Nikkeli–Kromi–Polttosekoitus [Ni_65.2Cr_22.5Mo_9.5X_2.8 (X=Nb, Si, Fe and Mn)] alloy. The corrosion rate of Ni_65.2Cr_22.5Mo_9.5X_2.8 (X=Nb, Si, Fe and Mn) alloy with 0.5 M HCl is increased with increasing the exposure rate of gamma radiation. The corrosion resistance of Ni_65.2Cr_22.5Mo_9.5X_2.8 (X=Nb, Si, Fe and Mn) is varied and reaches a minimum value at 30 KGy. The corrosion potential value also is varied and reaches its highest value at 30 KGy. The Vickers hardness value of Ni_65.2Cr_22.5Mo_9.5X_2.8 (X=Nb, Si, Fe and Mn) alloy is decreased by increasing the gamma radiation dose. Also it is obvious from our results that the effects of gamma radiation at the surface are much higher as compared with deeper parts and the structure of the alloy is changed due to its exposure to gamma radiation.