Mg2Si化合物在静水压下的电子输运性能研究

本文基于第一性原理采用全电势线性缀加平面波方法和波尔兹曼理论运算了在静水压下Mg₂Si的电子和热电性能. 研究发现, 对于n型载流子控制Mg₂Si输运性质, 应变达到0.02时, 室温情况下, 热电性能参数得到了明显提高, 其塞贝克系数增幅为26%, 功率因数增幅47%; 高温时, 功率因数增幅45%. 而对于主要载流子为空穴时, 其热电系数最值出现在应变为0.01时. 但其数值与未施加静水压的结构相比提高不多, 表明对于p型Mg₂Si半导体应变对其输运性能的影响不大. 并且结合电子能带结构图解释这些现象.     

V+注入锐钛矿TiO2第一性原理研究

用金属离子注入方法在锐钛矿TiO₂薄膜中掺杂了V⁺，采用全势线性缀加平面波方法计算了锐钛矿TiO₂及V⁺掺杂TiO₂超原胞的电子结构，通过紫外-可见吸收光谱测试方法检测了注入不同剂量的V⁺对TiO₂薄膜吸收光谱的影响.理论计算和实验结果表明，锐钛矿TiO₂薄注入V⁺后，带隙宽度变小，吸收光谱发生红移，并且TiO 关键词： +注入')" href="#">V⁺注入 2')" href="#">TiO₂ 全势线性缀加平面波方法 能带结构     

GaN(0001)表面的电子结构研究

报道了纤锌矿WZ(wurtzite)GaN(0001)表面的电子结构研究.采用全势线性缀加平面波方法计算得到了GaN分波态密度,与以前实验结果一致.讨论了Ga3d对GaN电子结构的影响.利用同步辐射角分辨光电子能谱技术研究了价带电子结构.通过改变光子能量的垂直出射谱勾画沿ΓA方向的体能带结构,与计算得到的能带结构符合得较好.根据沿ΓK和ΓM方向的非垂直出射谱,确定了两个表面态的能带色散 关键词： GaN 角分辨光电发射 全势线性缀加平面波 电子结构     

铁基化合物 SrFeAsF以及 Co掺杂超导体SrFe0.875Co0.125AsF的电子结构和磁性

采用基于密度泛函理论的全势线性缀加平面波方法,计算了 SrFeAsF 和 Co 掺杂超导体 SrFe_0875 Co_0.125AsF 的电子能带结构和磁性.结果表明,SrFeAsF 的基态构型为条状反铁磁结构,而 SrFe_0.875Co_0.125AsF 的条状反铁磁构型与棋盘形能量相差非常小,体系处于两种构型转变的临界值附近.由电子能带结构计算表明,Co掺杂引起FeAs杂化能带增宽,增强了d电子的平面巡游性,同时掺杂后 关键词： 铁基超导体 反铁磁序 掺杂 交换相互作用     

第一性原理研究Mg2 Si同质异相体的结构、电子结构和弹性性质

在第一性原理框架下,采用赝势平面波方法研究了三种Mg₂Si同质异相体的晶胞结构、电子结构和弹性性质随压强的变化关系.研究发现,反萤石结构Mg₂Si、反氯铅矿结构Mg₂Si和Ni₂In型Mg₂Si分别在压强为0-7 GPa,7.5-20.2 GPa和21.9-40 GPa范围内能够保持结构稳定.计算获得了不同压强下Mg₂Si的弹性常数、体模量、剪切模量、杨氏模量、泊松比和各向异 关键词： 态密度 电子结构 弹性常数 第一性原理     

新超导体MgCNi3的虚晶掺杂研究

用全势线性缀加平面波方法,考虑局域自旋密度近似研究虚晶掺杂MgCNi₃的超导电性和磁性.计算了自旋极化能带结构、体弹性模量和它对压力的导数、原子磁矩m及其变化率.计算结果表明，对于电子掺杂的Mg_1-xAl_xCNi₃(0≤x≤0.5)，超导电性和磁涨落随掺杂量的增加逐渐减小.空穴掺杂的Mg_1-xNa_xCNi₃,在x＝0.12处出现铁磁相变，超导电性消失.在MgCNi₃少量空穴掺杂区域(0≤x<0.12)，表现为超导与磁涨落共存的不稳定状态. 关键词： 超导电性 能带结构 态密度 磁性     

不同浓度下V掺杂Mg2Si的第一性原理研究

本文用基于密度泛函理论的超软赝势平面波方法,分别计算了四种V掺杂模型Mg_2-xV_xSi(x=0,0.25,0.5,0.75)的电子结构和光学性质,并对其能带图、态密度图和光学性质进行了分析.结果表明,V掺杂之后会使Mg₂Si由其原本的半导体性变为半金属性,在费米能级处出现了杂质能级,态密度图也显示V元素的3d轨道的贡献在费米能级附近占据主导地位,Mg₂Si的光学性质随着V元素的掺入也发生了改变.该文为Mg₂Si材料在电子器件和光学器件方面的应用提供了理论依据.     

β型烧绿石结构氧化物超导体$lt;i$gt;A$lt;/i$gt;Os$lt;sub$gt;2$lt;/sub$gt;O$lt;sub$gt;6$lt;/sub$gt;($lt;i$gt;A$lt;/i$gt;=K,Rb,Cs)电子能带结构的第一性原理计算

用全势线性缀加平面波方法计算β型烧绿石结构氧化物超导体AOs₂O₆ （A=K,Rb,Cs）的电子能带结构及态密度.计算发现电子自旋轨道耦合和在位库仑势U的作用增大了费米面处态密度值.通过计算还得到这三种化合物电子关联常数λ_c分别为1.55,1.12和0.73.由实验测量与能带计算得到的电子比热容系数的比值得到电子质量提高参数.通过分析这三种化合物电子质量提高参数,推算出它们的电声子耦合常数λ_ep分别为1.56,0.78和1.08.由此提出KOs₂O₆为强电子关联和强电声子耦合系统,而RbOs₂O₆和CsOs₂O₆的电子关联性与电声子耦合为中等. 关键词： β型烧绿石超导体 能带结构 电子关联 电声子耦合     

超晶格SnO2掺Cr的电子结构和光学性质的研究

基于密度泛函理论的第一性原理,采用全势线性缀加平面波方法(FPLAPW)和广义梯度近似(GGA)来处理相关能,计算了Cr掺杂SnO₂超晶格的电子态密度、能带结构、介电函数、吸收系数、反射率和折射率.研究表明由于Cr的掺入,超晶格SnO₂在费米能级附近形成了新的电子占据态,出现了不连续的杂质能带,这是由Cr-3d态和O-2p,Sn-5s态电子所形成.介电谱在0—5.5 eV之间时出现了三个新的介电峰,在高能区介电谱主峰位置发生蓝移,峰值强度减小.吸收谱、反射谱和折 关键词： 超晶格 第一性原理 态密度 电子结构     

高压下LiF和NaF的结构稳定性及其电子和光学性质的第一性原理研究

基于密度泛函理论，采用全势线性缀加平面波加局域轨道方法，计算模拟了LiF高压下的相变行为，预测其在450GPa附近发生由NaCl结构(B1)到CsCl结构(B2)的结构相变.同时还计算了高压下LiF不同相的电学特性，LiF的复介电函数以及介电常数随压强变化关系.通过比较能带结构的变化行为，得出LiF在53GPa附近还存在等结构相变，即由直接带隙结构变为间接带隙结构.将LiF的计算结果与另外一个同构化合物NaF进行了比较讨论. 关键词： LiF 压致相变 从头计算     

Transport properties of Mg2 X 0.4Sn0.6 solid solutions (X = Si, Ge) with p-type conductivity

The transport properties of Mg₂ X _0.4Sn_0.6 (X = Si, Ge) solid solutions are investigated. It is shown that these materials can be rendered p-type with a hole concentration of up to 4 × 10¹⁹ cm^?3. The Hall coefficient, thermopower, and electrical conductivity are measured over a wide temperature range. The mobility of holes in these solid solutions is less than that of electrons by a factor of 2 for Mg₂Si_0.4Sn_0.6 and by a factor of 1.5 for Mg₂Ge_0.4Sn_0.6. Solid solutions in the Mg₂Ge-Mg₂Sn system appear more promising for thermoelectric applications.     

DFT investigation on the electronic and thermoelectric properties of ternary semiconductor AgBiS2 for energy conversion application

Via the FP-APW+lo method, we have performed a systematic theoretical study of the structural, electronic and thermoelectric properties of β-AgBiS₂ compound. The estimated structural properties such as cell parameters a and c, c/a ratio and internal parameters are in reasonable agreement with the earlier measured one. From band structure calculations we have found that β-AgBiS₂ is semiconductor with a band gap of 1.23 eV using the TB-mBJ approximation. In addition, the analysis of the total and partial DOS shows a considerable hybridization between Ag ‘d’ states and S ‘p’, Bi ‘s’ states indicating that both Ag-S and Bi-S have covalent character. The main thermoelectric properties such as electrical conductivity, thermo-power, electronic thermal conductivity, power factor and figure of merit are calculated and discussed. We observed that ZT increases when temperature is augmented and reached its maximum of 0.95 and 0.85 at 2 × 10¹⁹ cm⁻³ for p and n-type doping, respectively. Thus, β-AgBiS₂ compound has interesting thermoelectric properties in both p and n-type doping.     

GeI2 monolayer: a model thermoelectric material from 300 to 600 K

ABSTRACT

In this work, the electronic structure, optical properties and thermoelectric properties of the GeI₂ monolayer are calculated by the first principles with the Boltzmann transport equation. The monolayer is calculated as an indirect band gap semiconductor with an indirect band gap of a value 2.19?eV. This GeI₂ monolayer is good for absorbing low-energy photons, and it is insensitive to high-energy photons. The material is stable at temperatures up to 600?K, so we calculated the thermal conductivity (K_L), Seebeck coefficient (S), power factor (PF) and thermoelectric figure of merit (ZT) of the GeI₂ monolayer at various carrier concentrations from 300 to 600?K. Due to the lower group velocity, the GeI₂ monolayer has a lower thermal conductivity of 0.48?W/m?K at 300K. In P-type doping, the power factor can up to 0.11?mW/m?K², and its ZT value is 4.04 at 600?K of the GeI₂ monolayer, indicating that the GeI₂ monolayer is a potential thermoelectric material.     

钙钛矿型氧离子导体KNb1-xMgxO3-δ的制备和表征

在高温高压（4.0GPa，870℃）下合成了具有正交钙钛矿结构的KNb_1-xMg_x O_3-δ（x=0.0—0.3）系列固体电解质，并系统地研究了Mg掺杂对其结构相变和导电性的影响.变温拉曼谱和DTA测量结果表明，随着温度的升高，KNb_{1-xMgxO3-δ发生了结构相变，由铁电正交、四方相转变为顺 电立方相.由于Mg掺杂削弱了B位离子对自发极化的贡献以及A位离子与BO关键词： 钙钛矿 离子电导 1-xMgxO3-δ')" href="#">KNb1-xMgxO3-δ 高温高压 铁电相变}     

Synergistically Enhancing Thermoelectric Performance of n-Type PbTe with Indium Doping and Sulfur Alloying

To achieve high-performance n-type PbTe-based thermoelectric materials, this work provides a synergetic strategy to improve electrical transport property with indium (In) element doping and reduces thermal conductivity with sulfur (S) element alloying. In n-type PbTe, In doping can tune the carrier density in the whole working temperature range, causing the carrier density to increase from 2.18 × 10¹⁹ cm⁻³ at 300 K to 4.84 × 10¹⁹ cm⁻³ at 823 K in Pb_0.98In_0.005Sb_0.015Te. The optimized carrier density can further modulate electrical conductivity and Seebeck coefficient, finally contributing to a substantial increase of power factor, and a maximum power factor increase from 19.7 µW cm⁻¹ K⁻² in Pb_0.985Sb_0.015Te to 28.2 µW cm⁻¹ K⁻² in Pb_0.9775In_0.0075Sb_0.015Te. Based on the optimally In-doped PbTe, S alloying is introduced to suppress phonon propagation by forming a complete solid solution, which could effectively reduce lattice thermal conductivity and simultaneously benefit carrier mobility to maintain high power factor. With S alloying, the minimum lattice thermal conductivity decreases from 0.76 Wm⁻¹ K⁻¹ in Pb_0.985Sb_0.015Te to 0.42 Wm⁻¹ K⁻¹ in Pb_0.98In_0.005Sb_0.015Te_0.88S_0.12. Combining the advantages of both In doping and S alloying, the peak ZT value and averaged ZT (ZT_ave) (300–873 K) are boosted from 1.0 and 0.60 in Pb_0.985Sb_0.015Te to 1.4 and 0.87 in Pb_0.98In_0.005Sb_0.015Te_0.94S_0.06.     

高电导a-Si:H:Y合金的电输运特性

本文报道由rf溅射技术将稀土元素Y掺入非晶硅,当掺Y浓度为20％左右时,获得了室温直流电导率为2×10¹Ω^-1·cm^-1的a-Si:H:Y合金膜。测量表明该合金膜是n型。变温电导测量指出,在测量温度范围内lnσ与l/T的关系可拟合于两条直线。对于衬底温度为260℃,290℃和330℃溅射的合金膜,其转折点分别出现在～70℃,～75℃和～90℃。这表明a-Si:H:Y合金膜存在两种电传导机制:在室温附近电子在Y施主杂质带内跳跃传导,在高温情况下电子在导带延展态内传导。并且得到Y施主杂质带中心处于导带E_c以下0.06—0.07eV。 关键词：     

Carrier transport and luminescence properties of n-type GaN

The surface morphology, electrical properties and optical properties of Si doped n-type GaN were investigated. The intentional SiH₄ doped GaN films were grown by metal organic chemical vapor deposition with the electron concentration varying from 3×10¹⁶ cm⁻³ to 5.4×10¹⁸ cm⁻³. The surface morphology shows that the roughness and dislocation pits increase as the mass flow rate of SiH₄ increases, which indicates that the quality of GaN degrades gradually. The activation energy of Si in GaN with different n concentrations varies from 12 to 22 meV, which may originate from the interactions of donor wave functions. The carrier transport mechanism with increasing temperature from 100 to 420 K was concluded as the complex effect of both impurity scattering and phonon scattering. The position of the near band edge emission peak was determined by both renormalization of the band gap and B-M effect. The intensity variations of the yellow luminescence could be explained by the change of Ga vacancy concentration caused by Si doping. Supported by the National Basic Research Program of China (Grant No. 2006CB6049), the National Hi-Tech Research and Development Program of China (Grant No. 2006AA03A142), the National Natural Science Foundation of China (Grant Nos. 60721063, 60731160628 and 60676057), the Research Fund for the Doctoral Program of Higher Education of China (Grant No. 20050284004) and the Natural Science Foundation of Jiangsu Province of China (Grant No. BK2005210)     

Optical and electrical properties of GaN: Si-based microstructures with a wide range of doping levels

The optical and electrical properties of silicon-doped epitaxial gallium nitride layers grown on sapphire have been studied. The studies have been performed over a wide range of silicon concentrations on each side of the Mott transition. The critical concentrations of Si atoms corresponding to the formation of an impurity band in gallium nitride (～2.5 × 10¹⁸ cm^?3) and to the overlap of the impurity band with the conduction band (～2 × 10¹⁹ cm^?3) have been refined. The maximum of the photoluminescence spectrum shifts nonmonotonically with increasing doping level. This shift is determined by two factors: (1) an increase in the exchange interaction leading to a decrease in the energy gap width and (2) a change in the radiation mechanism as the donor concentration increases. The temperature dependence of the exciton luminescence with participating optical phonons has been studied. The energies of phonon-plasmon modes in GaN: Si layers with different silicon concentrations have been measured using Raman spectroscopy.     

Optical and structural properties of Zn1−x Mg x O ceramic materials

This paper reports structural, optical and cathodoluminescence characterizations of sintered Zn_1?x Mg _x O composite materials. The effects of MgO composition on these film properties have been analyzed. X-ray diffraction (XRD) confirms that all composites are polycrystalline with prominent hexagonal wurtzite structure along two preferred orientations (002) and (101) for the crystallite growth. Above doping content x = 10 %, the formation of the hexagonal ZnMgO alloy phase and the segregation of the cubic MgO phase start. From reflectance and absorption measurements, we determined the band gap energy which tends to increase from 3.287 to 3.827 eV as the doping content increases. This widening of the optical band gap is explained by the Burstein–Moss effect which causes a significant increase of electron concentration (2.89 × 10¹⁸?5.19 × 10²⁰ cm^?3). The luminescent properties of the Zn_1?x Mg _x O pellets are studied by cathodoluminescence (CL) at room and liquid nitrogen temperatures under different electron beam excitations. At room temperature, the CL spectra of the Zn_1?x Mg _x O composites exhibit a dominant broad yellow-green light band at 2.38 eV and two ultraviolet emission peaks at 3.24 and 3.45 eV corresponding to the luminescence of the hexagonal ZnO and ZnMgO structures, respectively. For the doped ZnO samples, it reveals also new red peaks at 1.72 and 1.77 eV assigned to impurities’ emissions. However, the CL spectra recorded at 77 K show the presence of excitonic emission peaks related to recombination of free exciton (X _A), neutral donor-bound excitons (D⁰X) and their phonon replicas. The CL intensity and energy position of the green, red and ultraviolet emission peaks are found to depend strongly on the MgO doping content. The CL intensity of the UV and red emissions is more enhanced than the green light when the MgO content increases. CL imaging analysis shows that the repartition of the emitting centers in Zn_1?x Mg _x O composites is intimately connected to the film composition and surface morphology.     

Relation between interface states and temperature behavior of the barrier height of silver contacts on clean cleaved n-type silicon

The properties of silver-silicon interfaces formed by cleaving n-type silicon in ultra high vacuum (UHV) in a stream of evaporating silver atoms were studied. The barrier heights of these contacts were measured at different temperatures by using C-V techniques. All measurements were performed in UHV. The dependence of the barrier height upon temperature did not follow the temperature dependence of the Si band gap as it is usually found. The measured temperature behavior depended on the roughness of the Si surface. The temperature behavior can be explained by assuming a specific band structure of the interface states. For Ag contacts on atomically smooth n-type Si, the interface states were found to be arranged in two bands, one band 4 × 10^?3 eV wide with acceptor type states 0.18 eV below the intrinsic level E_i and a density of 10¹⁷ states/cm² eV, and the other 1 eV wide with donor type states with its upper edge 0.28 eV below E_i, and a density of 4 × 10¹⁴ states/cm²eV.