脉冲放电射流辅助射频辉光放电研究

通过实验研究了脉冲放电射流辅助下大气压氦气射频辉光放电的电学和光学特性。采用组合电极结构,在射频放电前段增加脉冲电极,脉冲放电产生的射流以等离子体子弹形式注入射频放电区域,主要研究脉冲射流辅助射频放电的电流电压曲线、最低放电维持电压、放电强度和空间结构时空分布。研究结果表明:等离子体子弹经过射频放电区域后,由于等离子体子弹引入的活性粒子,会使射频放电区域等离子体强度增强;而射频放电最低维持电压也从0.93 kV降低至0.43 kV。     

同轴枪放电等离子体电流片的运动特性研究

同轴枪放电可以产生高速度、高密度的等离子体射流,在天体物理、核物理等研究领域具有广泛的应用.基于同轴枪放电等离子体运动的"雪犁模型"分析,本实验通过对等离子体光电信号和磁信号的测量及放电照片的拍摄,研究了不同放电电流和气压对同轴枪放电等离子体电流片的运动特性、电流通道分布的影响.实验结果发现:一次放电过程中,气压为10 Pa、放电电流为35.7—69.8 kA时,随着放电电流的增加,等离子体喷射速度增加,输运距离与离子携带的轴向动能成正比,大电流条件下,等离子体喷出枪口时易于在枪底端形成新的电流通道;气压为5—40 Pa、放电电流为49.8 kA时,随着气压的增加,等离子体喷射速度减小,输运距离缩短,高气压下,等离子体喷出枪口时在枪底端未产生新的放电通道,这与放电过程中遗留在枪底端的带电粒子和电流片渗漏残留在枪内的中性粒子共同形成的阻抗通道有关;电流反向时,二次放电击穿位置发生在电极头部,放电过程中存在多次放电现象.     

面向等离子体合成射流应用的微秒脉冲源研制

为了产生高能等离子体合成射流,设计了一台面向等离子体合成射流应用的微秒脉冲源,输出电压为10 kV,重复频率为100 Hz,可承受高达250 A的放电电流。详细介绍了微秒脉冲源的工作原理,比较了不同放电电容对脉冲变压器原边电流及输出电压的影响。进一步将所设计的微秒脉冲源成功应用于等离子体合成射流实验中,研究了不同间距对等离子体合成射流的影响,比较了有无放电电容条件下的能量消耗率。实验结果表明:不同放电电容在相同激励器间距的条件下,击穿电压基本相同;击穿电压随激励器间距增大而增大。有放电电容能产生较大的放电电流,且电流值随电容值的增大而增大。有放电电容条件下的能量消耗率比无放电电容要高,易于产生高能的等离子体合成射流。     

大气压介质阻挡放电的光谱研究

使用水电极介质阻挡放电装置,分别在大气压空气和氦气中实现了稳定的高气压放电。通过水电极观察两种气体的放电,发现大气压空气中放电为空间随机分布的微放电丝,等离子体是不均匀的,而在氦气中放电没有微放电丝,空间分布比较均匀。比较而言,这种均匀放电产生的等离子体具有更广泛的工业应用前景。对两种气体中放电的电流波形进行了比较,发现空气中放电的电流脉冲在时间上是随机出现的而氦气中放电的电流脉冲在时间上具有周期性,并且空气中放电脉冲宽度约为几十ns而氦气中放电的电流持续时间较长,脉冲宽度大约为1μs。文章还对两种气体中介质阻挡放电发射光谱进行了研究,结果表明大气压氦气中均匀放电的N+₂(B2Σ+_u→X2Σ+_g)谱线391.4nm很强而在大气压空气放电中此光谱线很弱。这些研究结果对高气压条件下均匀放电的实现和大气压辉光放电的工业应用具有重要意义。     

气体脉冲放电等离子体阻抗的参量研究

在纯净氦气条件下，对高频纵向脉冲放电的等离子体动态阻抗进行了实验研究.测量了放电等离子体阻抗随放电电压、频率以及气体压强之间的变化关系，表明等离子体阻抗随频率和电压的增加而下降，随气压的升高而增大.定性分析了这些宏观参量与等离子体阻抗变化之间的关系，拟合出等离子体阻抗随电压、频率、气压变化的经验公式，并对数值模拟与实验结果进行了比较研究. 关键词： 等离子体阻抗 气体脉冲放电     

大气压介质阻挡辉光放电中放电电流的测量与分析

介质阻挡放电产生的低温等离子体具有广泛的应用前景而成为研究热点。文章利用平行平板介质阻挡放电装置,在流动的氦气中实现了大气压均匀辉光放电,得到了大气压下的均匀等离子体。利用电学方法将放电电流从总电流中分离出来,从而得到了辉光放电的放电电流。通过分析放电电流、外加电压、气隙上电压以及壁电荷电量之间的相互关系,可以研究气体放电过程中壁电荷积累的微观动力学行为。实验结果表明壁电荷主要是在放电电流脉冲持续期间积累的,但电流脉冲结束后,由于气隙电压没有改变极性,壁电荷还会逐渐积累,气隙电压改变极性后,壁电荷量随时间减小。这些结果对壁电荷在介质阻挡辉光放电中作用的深入研究和大气压介质阻挡辉光放电的工业应用具有重要意义。     

大气压双频氦气放电等离子体特性的数值研究

用一维流体模型研究了大气压双频氦气放电等离子体的特性。数值模拟的结果表明,在单、双频放电中,随着应用电压的增加,电子密度和放电电流都增加。相对于单频放电,双频放电中低频源的耦合效应使得放电中的电流以及电子密度降低。随着低频源电压峰值的增加,电子密度降低,离子通量,电子损失能量以及电子吸收能量均降低;但电子温度和电势随着低频源电压峰值的增加而增加。在相同低频源电压下,随着高频源电压的增加离子流非线性增加。     

LaB6在低压强氮气和氦气中的放电特性

研究了LaB6在1~10 Pa氮气和氦气中的直流和脉冲放电特性以及放电过程对电极的影响。结果表明，电极直径为5 mm的LaB6氦气放电管在脉冲工作状态下可以长期稳定放电。在脉冲电压为2.2 kV、脉冲宽度10 ms、频率13.3 Hz下，脉冲峰值放电电流超过120 A。氦气放电管在放电过程中，阴极表面有离子的清洗和活化作用，可以使电极的表面逸出功降低，提高放电管的发射能力和稳定性。LaB6作为气体放电电极具有寿命长、延迟时间短、放电电流大等优点，可用于重复强流脉冲气体放电的高压高速开关器件。     

脉冲氙灯放电过程分析与实验测定

脉冲氙灯是一种新型光源,利用量子理论以及气体放电理论分析了脉冲氙灯放电过程,设计了放电测试系统,实验测定了放电过程中的电压、电流和光脉冲信号。结果表明：在预电离阶段自由电子浓度较低,能量较低;气体放电阶段灯内形成电子崩,使得自由电子浓度的增大,放电电流迅速上升,电压下降;离子复合时释放出光子形成光脉冲,氙灯脉冲的光能量输出和光谱特性与复合电子能量、氙气复合能级相关,而当输入能量与氙灯的能耗不一致的时候,将导致充电电容反复充放电,而使电路产生振荡。对于分析脉冲氙灯放电过程,优化放电回路参数设计和脉冲氙灯的生产具有重要意义。     

不同氩气气压下铝丝电爆炸的二次放电特性

搭建了RLC放电回路,研究了不同氩气气压下铝丝电爆炸二次放电特性。结果表明,随着气压的变化,电爆炸二次放电电压曲线呈U形。为了阐明氩气和铝蒸气在二次放电过程中的作用,利用光谱仪和高速分幅相机分别研究了二次放电等离子体的自辐射光谱特性和空间分布特性,发现:在低气压下氩气会参与放电,放电通道在铝蒸气表面;高气压下主要是铝蒸气放电,氩气基本不参与放电过程,放电通道在铝蒸气内部。     

60MHz电容耦合等离子体中电子能量分布函数特性研究

甚高频(频率大于30 MHz)耦合放电源由于能产生大面积高密度的等离子体而受到了人们的广泛关注. 采用电流、电压探针以及朗缪尔探针诊断技术对60MHz射频激发产生的容性耦合等离子体的放电特性及电子行为进行了研究. 实验结果表明,等离子体的等效电阻/电容随着射频输入功率的增加而减小/增加;等离子体中电子行为不仅依赖于射频输入功率,还与放电气压密切相关;放电气压的增加导致电子能量概率分布函数(EEPF)从双温Maxwellian分布向Druyvesteyn分布转变,而且转变气压远低于文献所报道的数值,这主要是由于在60MHz容性耦合等离子体中电子反弹共振加热效率大为降低. 关键词： 甚高频容性耦合等离子体 朗缪尔探针诊断 电子加热模式     

Electrical characteristics of parallel-plate RF discharges in argon

Electrical characteristics were measured in a parallel-plate, capacitively coupled (E-type), low-pressure, symmetrical RF discharge driven at 13.56 MHz. The discharge voltage, current, and phase shift between them were measured over a very wide range of discharge parameters (gas pressures between 3 mtorr and 3 torr with discharge power between 20 mW and 100 W). From these measurements the discharge impedance components, the power dissipated in the plasma and in the sheaths, the sheath width, and the ion current to the RF electrodes were found over a wide range of discharge conditions. Some of the general relationships between the various measured and determined parameters are discussed. The experimental results can be used as a database for straightforward comparison with existing RF discharge models and numerical simulations     

Electrical characteristics of argon radio frequency glow dischargesin an asymmetric cell

Measurements of the current and voltage at both electrodes of a parallel-plate, capacitively coupled RF discharge cell (the Gaseous Electronics Conference Reference Cell) were combined with measurements of the voltage on a wire inserted into the glow region between the electrodes, for argon discharges at pressures of 1.3-133 Pa and peak-to-peak applied voltages ⩽400 V. Together, these measurements determined the RF voltage, current, impedance, and power of each sheath of the plasma. Simple power laws were found to describe changes in sheath impedances observed as voltage and pressure were varied. An equivalent circuit model for the electrical behavior of the discharge was obtained. The equivalent circuit model can be used to relate the electrical data to plasma properties such as electron densities, ion currents, and sheath widths. The results differ from models previously proposed for asymmetric RF discharges, and the implications of this disagreement are discussed     

悬浮型微波共振探针在电负性容性耦合等离子体中电子密度的测量

本文首先利用悬浮型微波共振探针测量了Ar等离子体的电子密度,并与朗缪尔双探针的测量结果进行了比较,表明了微波共振探针在低密度等离子体测量的可行性.对40.68 MHz单射频容性耦合Ar/SF₆和SF₆/O₂等离子体的测量结果表明:电负性气体SF₆掺入Ar等离子体显著降低了等离子体电子密度,但随着增加SF₆的流量,电子密度表现为缓慢下降;而O₂掺入SF₆等离子体中,电子密度则随着O₂流量的增加表现为持续的下降.另外,40.68 MHz/13.56 MHz双频激发的SF₆/O₂容性耦合离子体的电子密度并不随低频功率的变化而变化.本文对上述的实验现象进行了初步的解释.     

容性耦合射频氩等离子体放电诊断研究及仿真模拟

针对中等气压、中等功率下射频容性耦合(CCRF)等离子体的放电特性,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar为工作气体,研究同一气压时不同射频输入功率下等离子体电子温度和电子密度的分布规律。同时依据仿真模型设计制作相同尺寸的密闭玻璃腔体和平板电极,实验测量了不同射频输入功率时放电等离子体的有效电流电压及发射光谱,进而计算等离子体的电子温度及电子密度;利用玻耳兹曼双线测温法,得到光谱法下等离子体的电子温度及电子密度。结果表明:当气体压强为250 Pa、输入功率为100~450 W时,等离子体电压电流呈线性关系,电子密度随功率的增大而增大,而电子温度并未随功率的变化而有明显变化,其与功率无关。运用仿真模拟验证了实验的准确性,通过比较,三种方法所得的结果相近。通过结合等效回路法、光谱法和数值模拟仿真法初步诊断出中等气压下等离子体的放电参数,提出了结合三种方法作为实验研究的方法,使实验结果更具说服力,证明其方法的可靠性,也为进一步的等离子体特性研究提供依据。     

Nonlinear dynamics of radio frequency plasma processing reactorspowered by multifrequency sources

The source frequency has a strong influence on plasma characteristics in RF discharges. Multiple sources at widely different frequencies are often simultaneously used to separately optimize the magnitude and energy of ion fluxes to the substrate. In doing so, the sources are relatively independent of each other. These sources can, however, nonlinearly interact if the frequencies are sufficiently close. The resulting plasma and electrical characteristics can then be significantly different from those due to the sum of the individual sources. In this paper, a plasma equipment model is used to investigate the interaction of multiple frequency sources in capacitively and inductively coupled RF excited plasmas. In capacitively coupled systems, we confirmed that the plasma density increases with increasing frequency but also found that the magnitude of the DC bias and DC sheath voltage decreases. To produce a capacitively coupled discharge having a high plasma density with a large DC bias, we combined low and high frequency sources. The plasma density did increase using the dual frequency system as compared to the single low frequency source. The sources, however, nonlinearly interacted at the grounded wall sheath, thereby shifting both the plasma potential and DC bias. In inductively coupled plasmas (ICP), the frequency of the capacitive substrate bias does not have a significant effect on electron temperature and density. The DC bias and DC sheath voltage at the substrate were, however, found to strongly depend on source frequency. By using additional RF sources at alternate locations in ICP reactors, it was found that the DC bias at the substrate was varied without significantly changing other plasma parameters, such as the substrate sheath potential     

Gamma-electron dynamics and radio frequency capacitive sheathdiagnostics

Time-resolved measurements of gamma-electrons energy spectra in low-pressure capacitively coupled RF discharge are presented. Time dependence of the sheath voltage is calculated from experimental results and compared with theoretical predictions. Good quantitative agreement is observed for collisional sheath. In low pressure discharge sheath voltage time dependence is close to [1+cos(ωτ)], which qualitatively corresponds to the theoretical results. Asymmetry of electron energy spectra for increasing and decreasing sheath voltage is observed and explained by divergence and convergence of electron trajectories in plasma (klystron-effect)     

N_2-H_2容性耦合等离子体电非对称效应的particle-in-cell/Monte Carlo模拟

H_2-N_2混合气体电容性耦合射频放电在有机低介电系数材料刻蚀中具潜在研究意义.采用paxticle-incell/Monte Carlo模型模拟了双频(13.56 MHz/27.12 MHz)电压源分别接在结构对称的两个电极上的H_2-N_2容性耦合等离子体特征,研究了其电非对称效应.模拟结果表明,通过调节两谐波间的相位角θ,可以改变其电场、等离子体密度、离子流密度的轴向分布及离子轰击电极的能量分布.当相位角θ为0°时,低频电极(晶片)附近主要离子(H_3~+)的密度最小,离子(H_3~+,H_2~+,H~+)轰击低频电极的流密度及平均能量最高;当θ从0°变化90°时,低频电极的自偏压从-103V到106V近似线性增加,轰击电极的离子流密度变化约±18%,H~+离子轰击低频电极的最大能量约减小2.5倍,轰击电极的平均能量约变化2倍,表明氢离子能量和离子流几乎能独立控制.     

Characteristic features of the emission properties of pulsed broad-beam ion and plasma sources utilizing the evaporation of metal by a vacuum arc

An experimental confirmation was obtained of the anode potential fall effect in pulsed broad-beam ion and plasma sources utilizing the evaporation of metal by a vacuum arc. An increase in the overall voltage across the arc discharge was discovered. The investigations demonstrated that the magnitude of the positive anode fall depends on the structural features of the ion source and are determined by the ratio of the plasma flux directed onto the lateral surface of the anode to the total plasma flux from the cathode spot. It was established that the anode fall effect is controlled and makes it possible to influence the homogeneity of the ion current distribution over the beam cross section, the efficiency of extracting ions from the plasma, and the charge composition of the ion flux.Scientific-Research Institute of Nuclear Physics, Polytechnic University, Tomsk. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 2, pp. 82–92, February, 1994.     

Numerical simulation and experimental validation of direct current air corona discharge under atmospheric pressure

Air corona discharge is one of the critical problems associated with high-voltage equipment. Investigating the corona mechanism plays a key role in enhancing the electrical insulation performance. An improved self-consistent multi-component two-dimensional plasma hybrid model is presented for the simulation of a direct current atmospheric pressure corona discharge in air. The model is based on plasma hydrodynamic and chemical models, and includes 12 species and 26 reactions. In addition, the photoionization effect is introduced into the model. The simulation on a bar-plate electrode configuration with an inter-electrode gap of 5.0 mm is carried out. The discharge voltage– current characteristics and the current density distribution predicted by the hybrid model agree with the experimental measurements. In addition, the dynamics of volume charged species generation, discharge current waveform, current density distribution at an electrode, charge density, electron temperature, and electric field variations are investigated in detail based on the model. The results indicate that the model can contribute valuable insights into the physics of an air plasma discharge.