Ta_2O_5/MgF_2异质结构三维光子晶体的偏振性

为了在可见及近红外波段得到具有良好带隙结构的三维光子晶体,利用传输矩阵法分析了MgF2、Ta2O5以及Ta2O5/MgF2异质结构三维光子晶体的带隙性质.结果表明:Ta2O5/MgF2异质结构三维光子晶体在820～1020nm的近红外波段TM模式下具有不受入射光方向影响的全方位光子带隙.该结构有望用于制作近红外光波段的偏振器件.     

加载光子带隙膜系BaF2晶体闪烁光慢成分抑制和抗γ辐照损伤的研究

 根据BaF₂晶体闪烁光快、慢成分波段的不同，设计并制备了用于抑制该晶体闪烁光慢成分的Al₂O₃/MgF₂/Al/MgF₂…光子带隙膜系。实验结果显示：加载光子带隙膜系的BaF₂晶体，其闪烁光快/慢成分比提高80倍以上；经剂量为1×10⁵ Gy的60Co γ射线辐照后，其透射光谱、发射光谱和发光衰减时间谱没有明显的变化,这表明由光子带隙膜系与BaF₂晶体所构成的快闪烁器件不仅可有效避免慢成分的干扰，而且还具有很强的抗γ辐射性能。     

基于TaCl5的Ta2O2气凝胶制备工艺

 主要介绍了以TaCl₅为前驱体,低分子醇类为溶剂,分别采用环氧丙烷和环氧氯丙烷作为凝胶促进剂制备Ta₂O₂湿凝胶,湿凝胶经过CO₂超临界干燥而获得白色Ta₂O₂气凝胶。透射电镜图谱表明气凝胶是由粒度为10～20 nm的颗粒堆积而成。N₂等温吸附-脱附分析表明,气凝胶的比表面积为800～900 m²/g。     

大规模合成具有氧空位的多孔Bi2O3用于有效降解亚甲基蓝

光催化降解有机污染物由于其具有低能耗和绿色环保的特点，已经成为研究的热点. 氧化铋纳米晶体的带隙在2.0∽2.8 eV之间，利用它催化可见光降解有机污染物具有较高的活性，从而引起了越来越多的关注. 尽管近年来已经开发了几种制备Bi₂O₃基半导体材料的方法，但是仍然难以用简单的方法大规模地制备高活性的Bi₂O₃催化剂. 因此，开发简单可行的大规模制备Bi₂O₃纳米晶体的方法对于工业废水处理的潜在应用具有重要意义. 本文通过蚀刻商用BiSn粉末，然后进行热处理，成功地大规模制备了多孔Bi₂O₃. 获得的多孔Bi₂O₃在亚甲基蓝(MB)的光催化降解中表现出优异的活性和稳定性. 对该机理的进一步研究表明，多孔Bi₂O₃合适的能带结构允许生成活性氧物种，例如O₂^-·和·OH，可有效降解MB.     

过渡金属Fe或Ag掺杂K2Ti6O13的电子结构和光学性质

本文利用基于密度泛函理论（DFT）的第一性原理计算研究了它们的电子结构和光学性质.光学性质的计算结果和实验相一致.结果表明,Fe或Ag掺杂后,K₂Ti₆O₁₃的带隙中出现了杂质带且其带隙值变小,因而使掺杂后的K₂Ti₆O₁₃的吸收边发生红移并实现了其对可见光吸收.其中杂质带主要由Fe 3d态或Ag 4d态与Ti 3d态和O 2p态杂化而成.对于Fe掺杂的K₂Ti₆O₁₃,杂质带位于带隙中间,因此可以作为电子从价带跃迁到导带的桥梁.对于Ag掺杂的K₂Ti₆O₁₃,杂质带位于价带顶附近为受主能级,可以降低光生载流子的复合概率.实验和计算研究表明,通过Fe或Ag的掺杂可以实现了K₂Ti₆O₁₃对可见光的吸收,这对进一步研究K₂Ti₆O₁₃的光学性质具有重要意义.     

二维MoS2/MoSe2异质材料的电子结构和热电性质研究

利用密度泛函理论结合玻尔兹曼输运理论计算体相和双层二维MoS₂/MoSe₂异质材料的热电性质. 计算表明,体相MoS₂/MoSe₂异质材料的热电性质比之于MoSe₂会有较大程度的提高. 该异质材料热电性质的提高主要源于异质材料本身带隙的减小以及层间的范德瓦尔斯相互作用. 二维MoS₂/MoSe₂异质材料存在热电应用的可能性.     

金属醇盐法制备Ta2O5气凝胶

 以乙醇钽为前驱物,采用金属醇盐溶胶-凝胶技术,获得了Ta₂O₅湿凝胶,分析了不同条件下的溶胶-凝胶过程,并初步探讨了凝胶过程机理。Ta₂O₅的溶胶-凝胶过程主要受到水量、催化剂用量及钽源浓度等因素的影响：体系在强酸性条件下凝胶,且随着酸性的增强,体系凝胶时间明显缩短;当水量较少时,凝胶时间随水量的增加而增加,但当水量增加到一定程度时,体系凝胶时间基本不变;实验证明,通过增大溶剂用量,体系凝胶时间延长,气凝胶理论密度降低。通过对溶胶-凝胶过程的控制,结合超临界干燥技术,获得了密度低至44 mg/cm³的Ta₂O₅气凝胶样品。     

Cu掺杂Ga2O3薄膜的光学性能

采用射频磁控溅射和N₂气氛退火处理制备了多晶Ga₂O₃薄膜和Cu掺杂Ga₂O₃薄膜.用X射线衍射仪、紫外-可见分光光度计、荧光光谱仪对Ga₂O₃薄膜和Cu掺杂Ga₂O₃薄膜的结构和光学性能进行了表征.结果表明,Cu掺杂后Ga₂O₃薄膜的结晶质量变差,透过率明显降低,吸收率增加,光学带隙减小.本征Ga₂O₃薄膜在紫外、蓝光和绿光出现了发光带,Cu掺杂后紫外和蓝光发射增强,且在475 nm 处出现了一个新的发光峰.     

掺铋BaF2晶体的制备及其近红外发光研究

通过温度梯度法制备了Bi₂O₃:BaF₂以及BiF₃:BaF₂晶体.在Bi₂O₃:BaF₂晶体中观察到了发光峰位于961 nm,半高宽202 nm的超宽带红外发光.在BiF₃:BaF₂晶体中检测到Bi²⁺和Bi³⁺可见区的发光,但是没有观察到红外发光.通过γ射线辐照实现了BiF₃:BaF₂晶体的近红外发光, 发光峰位于1135 nm,半高宽192 nm.讨论了Bi₂O₃和BiF₃掺杂BaF₂晶体的红外发光的机理.     

In2O3 透明薄膜晶体管的制备及其电学性能的研究

采用磁控溅射方法在玻璃衬底上生长了In₂O₃晶体薄膜.该薄膜具有(111)晶面择优取向,晶粒尺寸达到33 nm.利用光刻工艺制作了以In₂O₃晶体薄膜为沟道层的底栅式薄膜晶体管.In₂O₃薄膜晶体管具有良好的栅压调制特性,场效应迁移率达到6.3 cm²/(V·s),开关电流比为3×10³,阈值电压为-0.9 V.结果表明,In相似文献   

Emission features of Ho ion in Nb2O5, Ta2O5 and La2O3 mixed Li2O-ZrO2-SiO2 glasses

Li₂O-ZrO₂-SiO₂: Ho³⁺ glasses mixed with three interesting d-block elemental oxides, viz., Nb₂O₅, Ta₂O₅ and La₂O₃, were prepared. Optical absorption and photoluminescence spectra of these glasses have been recorded at room temperature. The luminescence spectra of Nb₂O₅ and Ta₂O₅ mixed Li₂O-ZrO₂-SiO₂ glasses (free of Ho³⁺ ions) have also exhibited broad emission band in the blue region. This band is attributed to radiative recombination of self-trapped excitons (STEs) localized on substitutionally positioned octahedral Ta⁵⁺ and Nb⁵⁺ ions in the glass network. The Judd-Ofelt theory was successfully applied to characterize Ho³⁺ spectra of all the three glasses. From this theory various radiative properties, like transition probability A, branching ratio β_r and the radiative lifetime τ_r, for ⁵S₂ emission levels in the spectra of these glasses have been evaluated. The radiative lifetime for ⁵S₂ level of Ho³⁺ ions has also been measured and quantum efficiencies were estimated. Among the three glasses studied the La₂O₃ mixed glass exhibited the highest quantum efficiency. The reasons for such higher value have been discussed based on the relationship between the structural modifications taking place around the Ho³⁺ ions.     

Structural and dielectric properties of Ru-based gate/Hf-doped Ta2O5 stacks

Hf-doped Ta₂O₅ thin films are studied with respect to their composition, dielectric and electrical properties. The incorporation of Hf is performed by sputtering of a 0.7 nm thick Hf layer on top of Ta₂O₅ and subsequent annealing to stimulate diffusion of Hf into Ta₂O₅ and their intermixing. The elemental in-depth distribution of the films is investigated by the time of flight secondary ion mass spectroscopy (ToF-SIMS), which has revealed that Hf and Ta₂O₅ are intermixed throughout the whole thickness. Two sub-layers exist in all the samples - an upper homogeneous Hf-doped Ta₂O₅ sub-layer and a near interfacial region which is a mixture of Ta- and Si-oxides. The X-ray reflectivity (XRR) analysis shows existence of interfacial layer with a thickness of about 1.9-2 nm, irrespectively of the total thickness of the stacks. Metal-oxide-Si structures with Ru and RuO₂ metal electrodes have been prepared and investigated in terms of dielectric constant, effective work function (EWF) and interfacial layer parameters. The influence of post-metallization annealing steps on these parameters was also studied.     

Effects of O2/Ar ratio and annealing temperature on electrical properties of Ta2O5 film prepared by magnetron sputtering

The effects of the oxygen-argon ratio on electric properties of Ta2O5 film prepared by radio-frequency magnetron sputtering were investigated.The Ta2O5 partially transforms from the amorphous phase into the crystal phase when annealing temperatures are 800℃ or higher.The lattice constant of Ta2O5 decreases with the increase of the O2/Ar ratio,which indicates that oxygen gas in the working gas mixture contributes to reducing the density of oxygen vacancies during the deposition process.For the films deposited in working gas mixtures with different O2/Ar ratios and subsequently annealed at 700℃,the effective dielectric constant is increased from 14.7 to 18.4 with the increase of the O2/Ar ratio from 0 to 1.Considering the presence of an SiO2 layer between the film and the silicon substrate,the optimal dielectric constant of Ta2O5 film was estimated to be 31.Oxygen gas in the working gas mixture contributes to reducing the density of oxygen vacancies,and the oxygen vacancy density and leakage current of Ta2O5 film both decrease with the increase of the O2/Ar ratio.The leakage current decreases after annealing treatment and it is minimized at 700℃.However,when the annealing temperature is 800℃ or higher,it increases slightly,which results from the partially crystallized Ta2O5 layer containing defects such as grain boundaries and vacancies.     

Effect of Ti doping on Ta2O5 stacks with Ru and Al gates

The Ti-doped Ta₂O₅ thin films (<10 nm) obtained by rf sputtering are studied with respect to their composition, dielectric and electrical properties. The incorporation of Ti is performed by two methods - a surface doping, where a thin Ti layer is deposited on the top of Ta₂O₅ and a bulk doping where the Ti layer is sandwiched between two layers of Ta₂O₅. The effect of the process parameters (the method and level of doping) on the elemental distribution in-depth of the films is investigated by the time of flight secondary ion mass spectroscopy (ToF-SIMS). The Ti and Ta₂O₅ are intermixed throughout the whole thickness but the layers are very inhomogeneous. Two sub-layers exist in all the samples — a near interfacial region which is a mixture of Ta-, Ti-, Si-oxides as well as TaSiO, and an upper Ti-doped Ta₂O₅ sub-layer. For both methods of doping, Ti tends to pile-up at the Si interface. The electrical characterisation is performed on capacitors with Al- and Ru-gate electrodes. The two types of MIS structures exhibit distinctly different electrical behavior: the Ru gate provides higher dielectric permittivity while the stacks with Al electrode are better in terms of leakage currents. The specific metal-dielectric reactions and metal-induced electrically active defects for each metal electrode/high-k dielectric stack define its particular electrical behavior. It is demonstrated that the Ti doping of Ta₂O₅ is a way of remarkable improvement of leakage characteristics (the current reduction with more than four orders of magnitude as compared with undoped Ta₂O₅) of Ru-gated capacitors which originates from Ti induced suppression of the oxygen vacancy related defects.     

Phase transition in Cd2Ta2O7 and the Cd2Nb2−xTaxO7 series

A phase transition has been discovered in Cd₂Ta₂O₇ near 200 K which is about the same temperature at which Cd₂Nb₂O₇ is known to become ferroelectric. However, Cd₂Ta₂O₇ does not become ferroelectric below this transition. The nature of this transition was also studied in the Cd₂Nb_2?xTa_xO₇ series using low temperature X-ray, SHG, and DSC techniques.     

Theoretical analysis on the optical characteristics of pure and N-doped Ta2O5 2D photonic crystals with honeycomb lattice

Density functional theory (DFT) is performed on the structural and optical properties of undoped and N-doped Ta₂O₅. The optimized lattice constants of β-Ta₂O₅ are in good agreement with the experimental values. When O is replaced by N in Ta₂O₅, the substitutional doping of N in Ta₂O₅ clearly increases the refractive indices. The propagation of acoustic wave in two-dimensional (2D) photonic crystal of a honeycomb structure of air cylinder is investigated by the plane wave expansion method (PWEM). Our numerical results show that Ta₂O₅ has incomplete band gaps, indicating that only the TE mode appears. Ta₂O_4.5N_0.5 is more suitable for background material. When a = 338 nm, r/a = 0.46, and Δ = 0.022 (ωa/2πc), a complete band gap appears in the red light range.     

Structural and compositional changes in ion-bombarded Ta2O5

A detailed study of the effect of heavy-ion bombardment on Ta₂O₅ has been undertaken using a combination of radioactive tracer techniques, electron microscopy, and Rutherford backscattering. Crystalline Ta₂O₅ is amorphized at ~6 × 10¹³ ions cm^?2, while at a dose of ~5 × 10¹⁶ ions cm^?2 the electron microscopy reveals the development of random grains of a new crystalline phase. By ~1 × 10¹⁷ ions cm^?2 the grains are not yet overlapping but still yield a diffraction pattern consistent with either δ-Ta-O (not to be confused with TaO) or Ta_1?xO₂, thus indicating that Ta₂O₅, like most other transition-metal oxides, is subject to preferential sputtering. Preferential sputtering was confirmed by backscattering analysis of specimens bombarded to high doses, where the average surface composition was found to be Ta_1.8±0.2O₂ or, equivalently, Ta₂O_2.2±0.2. The surface alteration had an average composition independent of the mass and energy of the incident ions.     

Optimization of dichromatic filters based on photonic heterostructures of Si/MgF2

The current research work presents the theoretical results of demonstrating novel dichromatic filters, which consist of blue and yellow light. A one-dimensional photonic crystal or photonic heterostructure of Si/MgF₂ is analyzed in detail by fully considering the effects of structural parameters using the transfer matrix method. The position and the number of defect modes are shown to have relationships with the repeat cycle counts of various photonic crystals. When the photonic heterostructures have the optimized structural parameters, defect modes can be obtained with high transmittances located in blue and yellow light. This photonic heterostructure is expected to be used in dichromatic filters with wide non-transmission range in a visible range.     

AgI(Cr2O3)复合离子导体的光谱研究

本文研究了AgI(Cr₂O₃)复合离子导体的红外吸收光谱,近紫外、可见反射光谱。发现复合离子导体的两种谱图均与纯AgI,Cr₂O₃的不同。红外吸收光谱在882—889cm^-1处有一新吸收峰。电子谱中,AgI从430nm开始向长波方向表现的光离解特性消失。本来Cr₂O₃由配位场效应而引起的d—d吸收跃迁以410nm,530nm为中心的反射谱带,现在410nm处的谱带消失。530nm处的谱带稍有红移,且随加入Cr₂O₃量的增多而强度减弱。代之以整个紫外、可见区的较强吸收。对此,结合透射电子显微镜的分析,用双声子耦合和介质的变形极化以及配位场理论对AgI(Cr₂O₃)复合离子导体的声子谱和电子谱进行了解析。 关键词：     

层状钙钛矿结构铁电薄膜SrBi2Ta2O9的掺杂改性研究

研究了Nb掺杂对层状钙钛矿结构铁电薄膜SrBi₂Ta₂O₉(SBT)的改性，分析了其改性机理.利用光声光谱技术对不同含量Nb掺杂SBT薄膜的可见光吸收进行了分析.结果表明掺杂SBT薄膜在580nm处的吸收带随Nb含量的增加发生红移，这暗示掺杂SBT薄膜的能隙与Nb含量有关.对掺杂SBT薄膜的铁电性质研究表明，薄膜的剩余极化值依赖于薄膜中的Nb含量，这与薄膜存在相界有关. 关键词：