Optical and electrical properties of p-type transparent conducting CuAlO2 thin film synthesized by reactive radio frequency magnetron sputtering technique

Thin films of p-type transparent conducting CuAlO₂ have been synthesized through reactive radio frequency magnetron sputtering on silicon and glass substrates at substrate temperature 300°C. Reactive sputtering of a target fabricated from Cu and Al powder (1:1.5) was performed in Ar+O₂ atmosphere. The deposition parameters were optimized to obtain phase pure, good quality CuAlO₂ thin films. The films were characterized by studying their structural, morphological, optical and electrical properties.     

Engineering of nested Fermi surface and transparent conducting p-type Delafossite CuAlO2: possible lattice instability or transparent superconductivity?

Based on ab initio electronic structure calculation using a super-cell FLAPW method, we propose a new valence control method for the fabrication of low-resistive p-type and transparent conducting oxides of Delafossite CuAlO₂. We propose a Cu-vacancy doping method with decreasing the Cu-vapor pressure and with increasing the oxygen vapor pressure, or, Be- or Mg-acceptor doping method at the Al-site with decreasing the Al-vapor pressure and with increasing the Cu-vapor pressure. The heavily doped p-type CuAlO₂ indicates the two-dimensional nested Fermi surfaces, which originate from the layered O-Cu-O dumbbell. Nested Fermi surfaces may cause possibly a lattice instability or a transparent superconductivity rather than magnetism.     

Wet-chemical dip-coating preparation of highly oriented copper-aluminum oxide thin film and its opto-electrical characterization

Transparent p-type semiconducting copper aluminum oxide thin film has been synthesized by a wet-chemical route. CuCl and AlCl₃, dissolved in HCl, are taken as starting materials. pH value of the solution is controlled by adding a measured amount of NaOH into it. Films are deposited by dip-coating technique on glass and Si substrates followed by annealing in air at 500 °C for 3 h. XRD pattern confirms the crystalline CuAlO₂ phase formation in the film and also indicates a strong (0 0 6) orientation. UV-vis spectrophotometric measurements show high transparency of the film in the visible region with a direct allowed bandgap of 3.94 eV. Electrical measurements depict the thermally activated conduction within the films. Thermoelectric measurements confirm the p-type nature of the films. Compositional analysis shows the presence of excess (nonstoichiometric) oxygen within the material, which is incorporated during the air-annealing of the film. According to defect equilibrium, this excess oxygen is predicted to cause the p-type conductivity of the film. This type of cost-effective solution-based technique is very useful for volume production of this kind of technologically important material for transparent electronic and other diverse applications.     

Effects of annealing ambience on ZnO:N films grown by MOCVD and the p-type doping mechanism of ZnO:N films investigated by XANES

ZnO:N thin films were deposited on sapphire substrate by metal organic chemical vapor deposition with NH₃ as N-doping sources. The reproducible p-type ZnO:N film with hole concentration of ∼10¹⁷ cm⁻³ was successfully achieved by subsequent in situ thermal annealing in N₂O plasma protective ambient, while only weak p-type ZnO:N film with remarkably lower hole concentration of ∼10¹⁵ cm⁻³ was obtained by annealing in O₂ ambient. To understand the mechanism of the p-type doping behavior of ZnO:N film, X-ray photoelectron spectroscopy (XPS) and soft X-ray absorption near-edge spectroscopy (XANES) measurements have been applied to investigate the local electronic structure and chemical states of nitrogen atoms in ZnO:N films.     

Room-temperature power factor of CuAlO2 composite tablets enhanced by MWCNTs

CuAlO₂ with high theoretical thermoelectric performance has potential applications in thermal energy conversion. Herein, multi-wall carbon nanotubes (MWCNTs)/CuAlO₂ composite tablets are prepared by using different amounts of MWCNTs and solid paraffin binder, where MWCNTs served as a conductive agent and rendered three orders of magnitude increase in electrical conductivity. Seebeck coefficient of the composites was reduced with increasing MWCNTs content. Consequently, an optimal room-temperature thermoelectric power factor (PF) of 1.31 μW m⁻¹K⁻² has been rendered by MWCNTs/CuAlO₂ composite tablet with 1 wt % MWCNTs. Moreover, PF value increased with increasing temperature after a slight decrease at 333 K, which can be ascribed to the modulation of electrical conductivity. Current work provides an effective strategy to improve thermoelectric performance of CuAlO₂ materials.     

离子束增强沉积制备p型氧化锌薄膜及其机理研究

采用离子束增强沉积方法在Si和SiO₂/Si衬底上制备In-N共掺杂ZnO薄膜(INZO)，溅射靶是用ZnO和2 atm% In₂O₃粉体均匀混合并压制而成，在氩离子溅射ZnO靶的同时，氮、氩混合离子束垂直注入沉积的薄膜.实验结果显示INZO薄膜具有(002)的择优取向，并且为p型导电，电阻率最低为0.9Ωcm.薄膜在氮气、氧气气氛下退火，对薄膜的结构和电学特性与成膜和退火条件的关系进行了分析. 关键词： 氧化锌薄膜 p型掺杂 离子束增强沉积     

First-principles study of the formation mechanisms of nitrogen molecule in annealed ZnO

Recently, N₂ molecule was reported to induce localized states in the band gap and trap two holes in ZnO. In this Letter, the detailed mechanism for the formation of N₂ molecule in high temperature annealing process in ZnO was investigated based on density-functional theory. By analyzing the interactions between N-related defects, we found that the nitrogen molecule would form by the binding of two interstitial nitrogen atoms. Interstitial oxygen facilitated the formation of N₂ by kicking out N_O to interstitial site. The formation of nitrogen molecule in ZnO would cause low doping efficiency and degeneration of the p-type in annealing process. Our results could explain the recently reported formation of N₂ molecule in high temperature annealing process in N-doped ZnO. Appropriate annealing conditions were suggested in order to get p-type ZnO.     

非晶硅太阳电池BZO/p-a-SiC:H接触特性改善的研究

采用重掺杂的p型微晶硅来改善前电极掺硼氧化锌 (ZnO:B) 和窗口层p型非晶硅碳 (p-a-SiC) 之间的非欧姆接触特性. 通过优化插入层p型微晶硅的沉积参数 (氢稀释比H₂/SiH₄、硼掺杂比B₂H₆/SiH₄) 获得了较薄厚度下 (20 nm) 暗电导率高达4.2 S/cm的p型微晶硅材料. 在本征层厚度约为150 nm, 仅采用Al背反射电极的情况下,获得了效率6.37%的非晶硅顶电池(V_oc=911 mV, FF=71.7%, J_sc=9.73 mA/cm²), 开路电压V_oc和填充因子FF均较无插入层的电池有大幅提升. 关键词： 氧化锌 p型微晶硅 非晶硅顶电池 非欧姆接触     

原位氧化Zn3N2制备p型ZnO薄膜的性能研究

采用射频反应溅射法在玻璃衬底上制备Zn₃N₂薄膜，然后向真空室中通入纯氧气进行热氧化制备ZnO薄膜.利用X射线衍射、扫描电子显微镜、霍尔效应测量、透射光谱和光致发光光谱等表征技术，研究了氧化温度和氧化时间对ZnO薄膜的结晶质量、电学性质和光学性能的影响.研究结果显示，450 ℃ 下氧化2 h后的样品中除含有ZnO外，还有Zn₃N₂成分，500 ℃下氧化2 h可以制备出电阻率为0.7 Ωcm，空穴载流子浓度为10^{关键词： p型ZnO薄膜 3N₂薄膜')" href="#">Zn₃N₂薄膜 射频溅射 原位氧化}     

Cation defects and conductivity in transparent oxides

High quality doped zinc oxide and mixed transition metal spinel oxide films have been deposited by means of sputter deposition from metal and metal oxide targets, and by spin casting from aqueous or alcoholic precursor solutions. Deposition conditions and post-deposition processing are found to alter cation oxidation states and their distributions in both oxide materials resulting in marked changes to both optical transmission and electrical response. For ZnO, partial reduction of the neat or doped material by hydrogen treatment of the heated film or by electrochemical processing renders the oxide n-type conducting. Continued reduction was found to diminish conductivity. In contrast, oxidation of the infrared transparent p-type spinel conductors typified by NiCo₂O₄ was found to increase conductivity. The disparate behavior of these two materials is caused, in part, by the sign of the charge carrier and by the existence of two different charge transport mechanisms that are identified as free carrier conduction and polaron hopping. While much work has been reported concerning structure/property relationships in the free carrier conducting oxides, there is a significantly smaller body of information on transparent polaron conductors. In this paper, we identify key parameters that promote conductivity in mixed metal spinel oxides and compare their behavior with that of the free carrier TCO’s. PACS 61.72.C.; 71.38.-k; 81.15.-z; 77.84.Bw; 73.61.-r     

Characterization of ZnO thin films grown on various substrates by RF magnetron sputtering

In this study we investigated properties of ZnO thin films deposited on both oxygen-containing substrates and a substrate without oxygen content at various O₂/Ar reactant gas ratios. Deposition of ZnO on indium-tin oxide (ITO) resulted in the best crystallinity, whereas the least degree of crystallization was observed from ZnO deposited on glass. All the films were found to have compressive stress, which was relieved by annealing in O₂ environment. ZnO films deposited on glass revealed p-type conductivity when prepared at O₂/Ar ratio of 0.25 whereas those on SiN_x yielded p-type conductivity when prepared at O₂/Ar ratio of 4. In addition, shallower oxygen interstitial seemed to be found from films with better crystallinity. The largest shift in binding energy of Zn_2p3/2 was observed from ZnO prepared on glass at O₂/Ar ratio of 0.25, whereas that of O_1s was obtained from ZnO deposited on SiN_x at O₂/Ar ratio of 4. A model was proposed in terms of O₂ diffusion and hydrogen desorption in order to account for the observed property variations depending on substrates and O₂/Ar ratios.     

The microstructures and the electrical and optical properties of ZnO:N films prepared by thermal oxidation of Zn3N2 precursor

Samples of p-type ZnO:N films were prepared on glass substrates by thermal oxidation of Zn₃N₂ precursor, which was produced by reactive magnetron sputtering with a metallic zinc target in Ar/N₂ working gas. The microstructures and the electrical and optical properties of the samples were systematically investigated as a function of the annealing temperature. The results indicate that the annealing temperature has strong effects on the conductivity and photoluminescence (PL) properties of the obtained ZnO:N films. With an annealing temperature of 500 ^°C in oxygen flux, ZnO:N samples show the best p-type characteristics. The doping mechanism and the doping efficiency are briefly discussed based on the experimental results.     

The effects of thermal annealing in NH3 -ambient on the p-type ZnO films

Thermal annealing in NH₃-ambient was carried out to form p-type ZnO films. The properties were examined by X-ray diffraction (XRD), Hall-effect measurement, photoluminescence (PL), and secondary ion mass spectrometry (SIMS). Electron concentrations in ZnO films were in the range of 10¹⁵–10¹⁷/cm³ with thermal annealing in NH₃-ambient. The activation thermal annealing process was needed at 800 C under N₂-ambient to obtain p-type ZnO. The electrical properties of the p-type ZnO showed a hole concentration of 1.06×10¹⁶/cm³, a mobility of 15.8 cm²/V s, and a resistivity of 40.18 Ω cm. The N-doped ZnO films showed a strong photoluminescence peak at 3.306 eV at 13 K, which is closely related to neutral acceptor bound excitons of the p-type ZnO. The incorporation of nitrogen was confirmed in the SIMS spectra.     

Theoretical study of band gap in CuAlO2: Pressure dependence and self-interaction correction

By using first-principles calculations, we studied the energy gaps of delafossite CuAlO₂: (1) pressure dependence and (2) self-interaction correction (SIC). Our simulation shows that CuAlO₂ transforms from a delafossite structure to a leaning delafossite structure at 60 GPa. The energy gap of CuAlO₂ increases through the structural transition due to the enhanced covalency of Cu 3d and O 2p states. We implemented a self-interaction correction (SIC) into first-principles calculation code to go beyond local density approximation and applied it to CuAlO₂. The energy gap calculated within the SIC is close to experimental data while one calculated without the SIC is about 1 eV smaller than the experimental data.     

Spectroscopic ellipsometry modeling of ZnO thin films with various O2 partial pressures

ZnO films were deposited on thermally oxidized SiO₂/p-type Si (100) substrates and glass substrates by DC magnetron sputtering using a metal Zn target. Three types of samples were prepared with various O₂/(Ar + O₂) ratios (O₂ partial pressure) of 20%, 50%, and 80%. The properties of these ZnO thin films were investigated using X-ray diffraction (XRD), optical transmittance, atomic force microscopy (AFM), and spectroscopic ellipsometry in the spectral region of 1.7–3.1 eV. The structural and optical properties of ZnO thin films were affected by O₂ partial pressure. Relationships between crystallinity, the ZnO surface roughness layer, and the refractive index (n) were investigated with varying O₂ partial pressure. It was shown that the spectroscopic ellipsometry extracted parameters well represented the ZnO thin film characteristics for different O₂ partial pressures.     

First-principles calculation on p-type conduction of (Sb,N) codoping in ZnO

Based on first-principles calculations, (Sb, N) codoped ZnO are investigated. We find that Sb_Zn–4N_O have lower formation energy and can form p-type conduction with smaller hole effective mass. In comparation to monodoping of Sb, Sb_Zn–4N_O complex can form better p-type conductivity than Sb_Zn–2V_Zn, which may be strongly compensated by Sb_Zn defect and result in a decrease of p-type conduction. So we inferred that (Sb, N) codoping in ZnO under O-poor condition should be a realizable candidate of p-type conduction.     

p型K:ZnO导电机理的第一性原理研究

基于密度泛函理论,利用局域密度近似的第一性原理平面波赝势方法,对掺K以及含有氢填隙(H_i)、氧空位(V_O)、锌填隙(Zn_i)和锌空位(V_Zn)的K:ZnO电子结构分别进行了研究.结果表明,1) 单独掺K可引入浅受主,但系统总能增高;2) K与H共掺可降低系统总能,提升稳定性;3) V_O在K+H:ZnO中的形成比Zn_i困难得多,二者都是 关键词： 氧化锌 p型 第一性原理 电子结构     

Ultrafast laser assisted fabrication of ZnO nanorod arrays for photon detection applications

Orderly aligned ZnO nanorod arrays were grown by the ultrafast laser assisted ablation deposition method. These nanorod arrays were further used to make efficient p-n heterojunction photodetector arrays, which have the potential to have nanoscale spatial resolution for imaging, unique incident polarization discrimination capability, and much improved quantum efficiency as well as detection sensitivity. Both front- and back-illumination photodetection schemes were demonstrated by growing those ZnO nanorod arrays on p-type silicon and p-type Zn_0.9Mg_0.1O-coated Al₂O₃ (0 0 0 1) substrates, respectively. Typical diode rectification behavior and photosensitivity were observed in both designs through I-V and photocurrent measurements.     

Structural, optical and electronic properties of P doped p-type ZnO thin film

P doped ZnO films were grown on quartz by radio frequency-magnetron sputtering method using a ZnO target mixed with 1.5 at% P₂O₅ in the atmosphere of Ar and O₂ mixing gas. The as-grown P doped ZnO film showed n-type conductivity, which was converted to p-type after 800 °C annealing in Ar gas. The P doped ZnO has a resistivity of 20.5 Ω cm (p∼2.0×10¹⁷ cm⁻³) and a Hall mobility of 2.1 cm² V⁻¹ s⁻¹. XRD measurement indicated that both the as-grown and the annealed P doped ZnO films had a preferred (0 0 2) orientation. XPS study agreed with the model that the P_Zn-2V_Zn acceptor complex was responsible for the p-type conductivity as found in the annealed P-doped ZnO. Temperature-dependent photoluminescence (PL) spectrum showed that the dominant band is located at 3.312 eV, which was attributed to the free electronic radiative transition to neutral acceptor level (FA) in ZnO. The P_Zn-2V_Zn acceptor complex level was estimated to be at E_V=122 meV.     

Preparation and electrochemical performance of bramble-like ZnO array as anode materials for lithium-ion batteries

A bramble-like ZnO array with a special three-dimensional (3D) nanostructure was successfully fabricated on Zn foil through a facile two-step hydrothermal process. A possible growth mechanism of the bramble-like ZnO array was proposed. In the first step of hydrothermal process, the crystal nucleus of Zn(OH) ₄ ^2? generated by the zinc atoms and OH^? ions fold together preferentially along the positive polar (0001) to form the needle-like ZnO array. In the second step of hydrothermal process, the crystal nuclei of Zn(OH) ₄ ^2? adjust their posture to keep their c-axes vertical to the perching sites due to the sufficient environmental force and further grow preferentially along the (0001) direction so as to form bramble-like ZnO array. The electrochemical properties of the needle- and bramble-like ZnO arrays as anode materials for lithium-ion batteries were investigated and compared. The results show that the bramble-like ZnO material exhibits much better lithium storage properties than the needle-like ZnO sample. Reasons for the enhanced electrochemical performance of the bramble-like ZnO material were investigated.