光控-晶控相结合的膜厚监控法对滤光片膜厚的研究

针对光电极值法和石英晶振法各自的弊端,结合两种方法提出了光控-晶控膜厚监控法.在相同工艺条件下,分别使用这三种方法监控905nm窄带滤光片(规整膜系)和830nm截止滤光片(非规整膜系)的膜厚,对制备的滤光片的透射率光谱曲线进行比较.结果表明,光控-晶控膜厚监控法除了各项指标都符合要求外,在曲线通带处获得的平均透过率值比光电极值法和石英晶振法获得的平均透过率值提高了3%~6%,且与理论光谱基本吻合,光谱特性最好.该方法不仅对规整和非规整膜系都能进行监控,且能有效降低膜厚误差,提高光谱特性.     

石英晶体振荡法监控膜厚研究

给出了石英晶体振荡法监控膜厚的基本原理,在相同的工艺条件下分别用光电极值法和石英晶体振荡法监控膜厚,对制备的增透膜的反射光谱曲线进行了比较,并对石英晶体振荡法的监控结果做了误差分析.结果表明:石英晶体振荡法不仅膜厚监控精度高,而且能监控沉积速率,获得稳定的膜层折射率,从而有效地控制薄膜的光学性能.     

DWDM极窄带干涉滤光片的误差与自动补偿效应

针对现代光通信中的核心元件之一--密集型波分复用(DWDM)系统中极窄带光学薄膜干涉滤光片的指标要求,提出采用基于四分之一波长的规整膜系是实现密集型波分复用功能的最佳选择.对给定的设计方案的各个膜层的误差灵敏度分布、特定膜层的误差成因进行了分析,并对多个膜层进行了随机分布的误差模拟.通过对直接极值法监控中不同误差的补偿机理的研究,指出采用直接极值法监控是目前为止镀制这种滤光片的有效方法.最后讨论了可能存在的两种系统误差.     

一种监控膜厚的新算法

光学薄膜的光学特性与其每一膜层的厚度密切相关,为了制备出符合要求的光学薄膜产品,在制备过程中必须监控膜厚。光学薄膜实时监控精度决定了所镀制的光学薄膜的厚度精度。针对光电极值法极值点附近监控精度低、无法精确监控非规整膜系的缺陷,提出了新的光学薄膜膜厚监控算法。该算法通过数学运算,使得光学薄膜的光学厚度与透射率呈线性关系,并且有效地消除光源波动、传输噪声等共模干扰的影响,算法精度可控制在2%以内。     

一种基于光电极值法的光学膜厚监控系统的改进设计

介绍目前通用的基于光电极值法的光学膜厚监控系统的特点，针对其缺点进行改进设计，新系统的稳定性有较大提高，可满足镀制多层介质薄膜器件的要求。     

镀窄带干涉滤光片用的直控极值法

直控极值法具有自动补偿各层膜的光学厚度的优点,至今仍被人们广泛采用.但在镀制窄带滤光片的最末几层时,有时会因出现反常现象而带来巨大误差,甚至失灵.本文用电脑模拟了滤光片的镀制过程,分析了出现反常现象的原因,从而提出了改进及消除这种现象的措施.结果表明:可以用带宽小于所镀滤光片的通带半宽度的光束来进行膜厚监控.     

诱导透射干涉滤光片的设计及其镀制工艺

介绍可见光区诱导透射滤光片(简称ITF)的设计和镀制方法,给出透射率随膜层变化的部分理论曲线和实验曲线,讨论金属Ag层厚度和间隔层的变化对ITF透射率和截止宽度的影响。应用直透法监控层厚的工艺,第一间隔层最终控制在透射率高于起始点0.5—0.7％左右时较佳。镀Ag时厚度最终控制在其透射率起始下降到最低点附近较为适宜。     

结合傅里叶变换合成法设计均匀薄膜

基于傅里叶变换合成法的基本原理,合成了一个K9基底上的负滤光片,合成的渐变折射率薄膜具有期望光学特性,但实际制备难度很大,因此将其细分为足够多层离散折射率的均匀薄膜,由于实际薄膜材料种类有限,不能获得任意折射率膜层,鉴于两层高低折射率薄层可近似为一层中间折射率膜层的思想,将膜系转化成一个可实际制备的膜系结构:膜系采用ZrO2和SiO2两种膜料,膜层总数为183层,经单纯形调法优化后,膜层总厚度为7.09 μm,通带和截止带内平均透射比分别为97.56%和3.13%,其结果优于直接采用傅里叶方法合成的非均匀膜系,与期望透射比曲线吻合更好.说明通过这种思想设计任意光谱特性的膜系是可行的,也使傅里叶变换合成法设计的薄膜实际制备成为可能.     

光学薄膜膜厚自动控制系统的研究

介绍了一种利用光电极值法同时控制规整膜系和非规整膜系的方法,利用VC++编写程序实现对光学监控信号的采集、处理及停镀点的自动判断,实现了规整膜系和非规整膜系膜层厚度的自动控制.并利用该膜厚自动控制系统实验制备了规整膜系和非规整膜系多层膜,实验结果表明：利用该系统镀制的薄膜重复性良好,且光谱曲线和理论光谱曲线吻合较好.该系统解决了非规整膜系的监控问题,由计算机控制膜层的停镀点,排除了人的主观因素对薄膜的性能及其制备的重复性产生的影响,提高了薄膜镀制的重复性和成品率.     

极值法膜厚控制的误差分析及其改进设计

分析了光学薄膜厚度的极值控制法,并利用矩阵的方法给出了极值法膜厚控制误差。基于极值法膜厚控制的原理,利用由IC/5薄膜沉积控制器和晶震探头组成的反馈系统,控制蒸发速率的大小,光控的信号由可编程的计算机探测接收。分别对ZrO2/SiO2,膜料进行了两组交替镀制实验测试。结果表明,整个系统稳定性好,自动化程度高,膜厚控制精度在1 02%左右。     

自适应模拟退火遗传算法在薄膜厚度及光学常数反演中的应用

准确的测量薄膜的厚度和光学常数,在薄膜的制备、研究和应用中都是十分重要的。借助Cauchy色散模型,通过薄膜透过率测量曲线,用改进的自适应模拟退火遗传算法对透过率曲线进行全光谱拟合,从而反演得到薄膜的厚度和光学常数。对由电子束蒸发制备的TiO2单层膜和SiO2/TiO2双层膜的厚度和光学常数进行了测量计算。实验结果表明,计算得到的光学参数与实测结果相一致,厚度误差小于2nm,在560nm波长处折射率误差小于0.03。     

Development of The Liquid Refractometer Using Optical Fiber Detection

This article presents a new technique of optical heterodyne interferometry to measure the refractive index of some unknown liquid. It's based on total-internal-reflection heterodyne interferometry and the uses of fiber sensor technology.     

基底温度对电子束蒸发制备氧化铝薄膜的影响

为了考察基底温度对氧化铝薄膜折射率以及沉积厚度的影响情况,在不同基底温度环境下,通过离子辅助电子束蒸发方式,在玻璃基底上制备了同一Tooling因子条件下所监测到相同厚度的Al2O3薄膜,利用分光光度计测量光谱透过率,依据光学薄膜相关理论,计算了基底温度在25℃～300℃范围内获得的膜层实际物理厚度为275.611 nm～348.447 nm,以及膜层折射率的变化。通过对实验结果的数值计算和曲线模拟,给出了基底温度对于薄膜的折射率和实际厚度的影响情况。     

U-shaped optical fiber sensor based on multiple total internal reflections in heterodyne interferometry

In this paper, an optical fiber sensor based on multiple total internal reflections (MTIRs) in heterodyne interferometry is proposed. With the optical fiber sensor the phase shift difference due to the multiple total internal reflections effect between the p- and s-polarizations is measured by using heterodyne interferometry. Substituting the phase shift difference into Fresnel's equations, the refractive index for the tested medium can be calculated. The resolution of the sensor can reach 1.6×10^?6 refractive index unit (RIU). The optical fiber sensor could be valuable for chemical, biological and biochemical sensing. It has some merits, such as, high resolution and stability, high sensitivity, high resolution and real-time measurement.     

Applying the optical activity of cholesteric liquid crystal for measuring small wavelength differences

This work proposes a simple measurement technique based on the optical activity of cholesteric liquid crystal (CLC) and circular common-path heterodyne interferometry for measuring small wavelength differences. A circularly polarized heterodyne light passes through a CLC cell and an analyzer, generating an interference signal. When the CLC cell is properly chosen with a circular regime, it has strong optical activity. Accordingly, the phase difference between the left and right circular light of the interference signal depends strongly on the wavelength. As the wavelength changes, variations of the phase difference can be accurately detected by heterodyne interferometry. Substituting the variation of phase difference into specially derived equations, the wavelength variations can be estimated accurately. The feasibility of this method, which is applicable when the wavelength is larger than the product of the pitch and the refractive index of the CLC cell, was demonstrated; it provides the advantages of simple installation, ease of operation, and high accuracy.     

宽带膜厚实时监控过程中膜层折射率的确定方法

为了准确计算出镀膜过程中每层膜的折射率，介绍了实时监控过程中确定膜层折射率的2种方法：一种是由实测的透射比光谱直接反算出膜层的折射率；另一种是用最小二乘法的优化算法实时拟合折射率。试验结果表明：在线反算适合单点监控，所得折射率误差小于2%。然而在实际镀膜过程中,由于宽带内膜层参数误差较大,一般大于25%。为此，采用最小二乘法拟合，即在整个宽光谱范围内采集每个波长点的信息，所得结果误差很小，一般都在2％～5%之间,有时可达到10%,在很大程度上提高了实际镀膜时膜厚监控的精度。     

A method for measuring the complex refractive index and thickness of a thin metal film

A circularly polarized heterodyne light beam is incident on a thin metal film, causing successive reflections and refractions to occur at the two sides of the thin film. The phase difference between p- and s-polarizations of the multiple-beam interference signal can be measured accurately with an analyzer and heterodyne interferometry. The phase difference depends on the azimuth angle of the analyzer, the complex refractive index and the thickness of the thin metal film. The measured values of the phase differences under three different azimuth angles of the analyzer can be substituted into the special equations derived from Fresnels equations and multiple-beam interference. Hence, the complex refractive index and the thickness of the thin metal film can be estimated by using a personal computer with a numerical analysis technique. Because of its common-path optical configuration and its heterodyne interferometric phase measurement, this method has many merits, such as high stability against surrounding vibrations, high resolution and easy operation. PACS 78.66.Bz; 78.20.Ci; 07.60.Cy     

A refractive index interferometry method based on the X-ray crystallography

The absorption contrast image is very low for those weakly absorbing materials or weak phase object, such as the soft biological tissues, however, the phase item value of refractive index is a thousand larger than the absorption item, therefore the refractive index interferometry method is expected to be a new imaging tool for them. An interferometry method based on the X-ray crystallography is explored to the measurement of refractive index in this paper. The theoretical foundation, the optical design, the crystal transistor performance are the key parts to this interferometry method based on the X-ray crystallography. We give out a special refractive index detection scheme, using a laboratory hard X-ray source, and four single Si crystals. With this instrument, refractive index profile of those weak phase object can be unfolded accurately using this method. This refractive index interferometry method based on the X-ray crystallography will provide a new research tool for those special material properties or biological tissues study.     

Measurement of small differences in refractive indices of solutions with interferometric optical method

Based on the principles of both surface plasmon resonance (SPR) and heterodyne interferometry, an optical method for measuring small differences in refractive indices of solutions was proposed. On a specially designed probe, two light beams are incident on both reference and test solutions. The phase differences between the p- and s-polarizations of each reflected light under SPR condition are measured simultaneously with heterodyne interferometric technique. The phase values are substituted into special equations derived from Fresnel's equations. Finally, the difference between the refractive indices of these two solutions can be estimated. The feasibility of this method was demonstrated and the measurement sensitivity of refractive index can reach a value of at least 8.57×10⁻⁷. This method should bear the merits of a simple structure, easy operation, high sensitivity and rapid measurement.     

采用椭偏法结合分光光度法研究极薄银的光学常数

极薄银在滤光片、高反射镜等中有广泛的应用,其光学常数严重影响着膜系的特性。在室温条件下,采用电阻热蒸发技术分别在硅和玻璃基底上沉积5.3 nm~26 nm不同厚度的极薄银薄膜,用TalySurfCCI非接触式轮廓仪测量了薄膜的厚度,研究了不同厚度银薄膜的光学常数n和k。镀制厚度5.3 nm、7.9 nm、14.1 nm、26.0 nm的银薄膜,结果显示极薄银的光学常数与块状银光学常数不同,当膜厚小于14.1 nm时,折射率n在380 nm~600 nm随波长增加而增加,在600 nm~1 600 nm随波长增加缓慢减小至趋于稳定值2.6;消光系数k在380 nm~500 nm随着波长增加而增加,在500 nm~1 600 nm随波长增加而缓慢减小至趋于0不变;当膜厚大于14.1 nm时,折射率随波长增加而增加,消光系数随波长近似呈线性增加。整体上,膜厚增加时折射率减小且趋于块状银的折射率,k随厚度增加而增加并最终趋于块状膜。用此拟合的光学常数代入TFc膜系设计软件计算其透射率,发现与分光光度计测得的透射率吻合较好。