自支撑透射光栅的设计、制作和测试

采用标量衍射理论和严格耦合波理论分别计算和讨论了金自支撑透射光栅的衍射效率随波长和光栅周期变化的情况并设计了光栅的结构参数.制作了周期为300 nm、线宽/周期比为055、厚度为200 nm、总面积为1 mm×1 mm、有效面积比为65%的金自支撑透射光栅.在国家同步辐射实验室检测了该光栅在55—38 nm波长范围内的绝对衍射效率.检测结果表明所制作的光栅在8 nm附近具有接近10%的最大衍射效率,并且该光栅对于波长15—35 nm范围内的极紫外波段具有基本稳定的衍射效率.     

1000线/毫米软X射线自支撑闪耀透射光栅的设计与制作

基于标量衍射理论讨论了软X射线自支撑闪耀透射光栅的特性并设计了光栅的结构参数. 采用全息光刻和湿法腐蚀技术, 成功制作了周期1 μm、占空比0.1---0.2、高宽比约100、栅线厚度10 μm、 有效面积比为65%的自支撑闪耀透射光栅. 单元尺寸为15mm× 15mm的硅绝缘体上含有四个5 mm× 5 mm的自支撑闪耀透射光栅窗口. 在国家同步辐射实验室检测了该光栅在5---50 nm波长范围内的衍射效率. 波长扫描测量结果表明, 闪耀效应明显地发生在类似镜面的光栅侧壁镜面反射方向上, 闪耀级次位置及其特征与标量理论预测的一致. 衍射效率的实测结果基本与理论模拟符合, 只是因光栅结构上的缺陷致使衍射效率偏低, 峰值只有理论值的38---49%. 实验结果证明了闪耀透射光栅的概念和湿法制作工艺的可行性.     

软X射线位相型金透射光栅的设计与制作

根据衍射光栅的标量理论,计算并讨论了金透射光栅在软X波段衍射效率对光栅厚度和占宽比的依赖关系.结果表明,选择合适的光栅槽深和占宽比,高达 21.9%的衍射效率可能被获得,远高于振幅型光栅的+1级衍射效率10.14%.通过全息光刻与电镀转移技术制作的位相型金透射光栅由300nm的聚酰亚胺薄膜支撑,光栅槽深200nm,占宽比为0.55,周期为1μm,面积为20mm×5mm.在国家同步辐射装置上,测得其+1级透射衍射效率在波长λ=7.425nm时获得最大值,约为16%. 关键词： 透射位相光栅 全息光刻 电镀     

大面积10000线/毫米软X射线金属型透射光栅的设计、制作与检测

基于严格的矢量耦合波理论,优化设计了用于13.4nm软X射线干涉光刻的透射型双光栅掩模版. 采用电子束光刻技术,在国内首次成功制作了周期为100nm的大面积金属型透射光栅.光栅面积为1.5mm ×1.5mm,Cr浮雕厚度为50nm,Gap/period为0.6,衬底Si₃N₄厚度为100nm. 此光栅将用于上海光源软X射线干涉光刻实验站.利用其1级衍射光和2级衍射光将可以经济高效地制作周期为50和25nm的大面积周期结构.最后,测量了该光栅对波长为13.4nm 同步辐射光的衍射光强度,并且推算得出该光栅的1级和2级衍射效率分别为4.41%和0.49%,与理论设计值比较符合.实验结果与理论模拟结果的对比表明该光栅侧壁陡直,Gap/period的控制也与设计值符合. 关键词： 软X射线金属型透射光栅 严格耦合波方法 衍射效率 软X射线干涉光刻     

用于光谱合束技术的透射光栅设计与优化

设计并制作了一种亚波长透射光栅,利用该光栅实现了半导体激光阵列光谱合束。基于严格耦合波理论,对光栅占空比、脊高和周期等进行了设计,模拟了不同结构参数对光栅衍射效率的影响,从而实现了光栅衍射效率的优化。理论计算表明,优化后的光栅对940nm激光的-1级衍射效率可达92%。实验结果表明,激光阵列光谱合束后,输出功率为46.2 W,光束质量为3.9mm·mrad。     

亚波长浮雕光栅的衍射和抗反射及增透研究

研究了亚波长光栅的衍射对抗反射和增强透射性能的影响。理论分析表明,如果要达到抗反射和增强透射的双重效果,需要避免衍射引起的横向波导损耗,光栅周期要足够小;而如果只需要达到抗反射效果,可利用光栅衍射形成横向波导共振降低反射效率,此时光栅周期不需要很小。利用严格耦合波理论对周期、占空比及凹槽深度等结构参数进行优化。采用激光干涉光刻法制作了周期为290 nm的一维浮雕光栅,并测试其透射及反射光谱,结果表明这种结构在大角度范围内对可见光波段有明显的抗反射效果,但是只有波长在非衍射区才具有透射增强效果,而在衍射区透射降低。该研究实验和理论分析相一致,研究结果为根据应用要求合理选择光栅周期、降低制备工艺提供了清晰的物理图像和参考。     

准随机矩形孔阵列透射光栅

自支撑透射光栅的周期加强筋结构在降低光栅的通光面积、减少光栅衍射效率的同时, 也影响了光栅原有的衍射模式, 致使其应用更加复杂. 为了应对这一问题, 作者提出了利用在高Z材料薄膜上准随机排布矩形孔实现自支撑透射光栅的技术方法. 理论分析与实验结果表明, 利用新方法制作的透射光栅较好地摆脱了周期性加强筋对透射光栅衍射模式的强加干扰.     

基于光谱合束技术的透射光栅模拟设计

半导体激光器光谱合束技术能够实现近衍射极限的高功率激光输出,已成为当前研究热点。衍射光栅的性能直接决定光谱合束的激光输出效果。模拟设计了一种针对940 nm波长、熔融石英材料的亚波长透射光栅。基于严格耦合波理论对光栅结构进行初步设计,运用Rsoft软件依次对光栅占空比、脊高和周期等参数进行优化确定,同时分析了各个参数对光栅衍射效率的影响。所设计的透射式光栅实现第-1级衍射级次的波分复用功能,衍射效率达到91.2%(TE模式),同时压缩其他衍射级次,使其衍射效率降到1.2%以下。同时在光栅入射角度59°±3°范围内保持90%以上的衍射效率,实现高功率激光输出的同时具有较高的误差容错率,易于调节,满足光谱合束技术的要求。     

3333lp/mm X射线透射光栅的研制

针对X射线透射光栅摄谱仪中的高线密度光栅,研究了采用电子束曝光和X射线曝光技术结合制作高线密度X射线透射光栅的工艺技术.首先利用电子束曝光和微电镀技术在镂空的薄膜上制备母光栅X射线掩模版,然后利用X射线曝光和微电镀技术小批量复制光栅.在国内首次完成了3333lp/mm X射线透射光栅的研制,栅线宽度为150nm,周期为300nm,金吸收体厚度为500nm.衍射效率标定的结果表明,该光栅的占空比合理、侧壁陡直,具有良好的色散特性,能够满足空间探测、同步辐射和变等离子诊断等多个领域的应用.     

正弦光栅标量衍射及等效介质理论有效性分析

利用严格傅里叶模式理论研究了不同基底折射率、入射角度、归一化周期、归一化沟槽深度对正弦型光栅微结构衍射效率的影响,并分析了该光栅的衍射特性.基于标量衍射理论和等效介质理论,分别计算了光栅周期远远大于和远远小于入射波长时,正弦型光栅的衍射效率,并与傅里叶模式理论的计算结果进行比较,分析标量衍射理论和等效介质理论的有效性.结果表明:在垂直入射条件下,当光栅基质材料折射率为1.5时,标量衍射理论在光栅归一化周期大于5时,能够准确计算光栅衍射效率,误差小于3%;当基底折射率增大到3.42时,只有在光栅归一化周期大于10时,标量衍射理论才有效,误差小于5%;当正弦型光栅透射光中只有0级衍射光传播时,等效介质理论能够准确计算其透射率;随着入射角度的增大,标量衍射理论和等效介质理论的有效性都不同程度地降低.     

非相干光纤激光组束中光栅衍射效率的研究

提高非相干光纤激光组束的组束功率,需要增大光栅对组束激光的衍射效率。通过理论分析和数值仿真,结果表明对中心激光入射角偏移及组束光角偏移的精确控制是提高光栅衍射效率的光健,高的衍射效率对应较大的光栅周期和较小的光栅厚度。对于中心激光入射波长1060nm,应选择光栅频率200~400mm-1,对应的光栅厚度2~4mm。     

Fabrication of Near-Infrared Volume Phase Holographic Grism with High Efficiency and High Dispersion,and Its Application to a Wavelength De-multiplexing Device

We designed and developed a volume phase holographic (VPH) grism with high resolution and high efficiency in the near-infrared light domain (1550 nm) to be applied as a wavelength de-multiplexing device of a photonic network. In order to achieve both diffraction efficiency of over 80% and wavelength resolution of 0.08 nm, we newly designed and fabricated a VPH grism with high efficiency and high wavelength resolution in near-infrared wavelength region by sandwiching a VPH grating between prisms. An active feedback control technique was introduced to a two-beam interference exposure system, and we also applied it to a wavelength de-multiplexing device for a photonic network. Consequently, a VPH grism was successfully fabricated with diffraction efficiency of over 80% by employing the Bragg condition of 1550 nm at the incident wavelength from 1530 to 1570 nm, and high refractive index modulation of 0.047 was confirmed.     

Fabrication and characterization of sliced multilayer transmission grating for X-ray region

To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi 2 /Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23-25 μm. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.     

Compact vector twist sensor using a small period long period fiber grating inscribed with femtosecond laser

We propose and demonstrate a sensitive vector twist sensor based on a small period long period fiber grating(SP-LPFG)fabricated with a femtosecond(fs) laser. The fabricated SP-LPFG is compact in size(2.8 mm) and shows strong polarization dependent peaks in its transmission spectrum due to the vectorial behavior of high-order cladding modes. Twist sensing is realized by monitoring the polarization dependent peaks, since the polarization of input light changes with fiber twist. The proposed sensor can be interrogated by the peak intensity and wavelength, with high twist sensitivity that reaches0.257 d B/deg and 0.115 nm/deg, respectively.     

MoRu-Be multilayer-coated grating with 10.4% normal-incidence efficiency near the 11.4-nm wavelength

A MoRu-Be multilayer coating was applied to a diffraction grating to enhance the grating's normal-incidence efficiency near 11.4 nm wavelength. The holographic grating substrate had a blazed groove profile with 2400 grooves/mm and a microroughness of 0.8 nm. The efficiency in the second diffraction order, measured with synchrotron radiation, was 10.4% at a wavelength of 11.37 nm.     

High-efficiency multilayer-coated ion-beam-etched blazed grating in the extreme-ultraviolet wavelength region

We describe a simple method to fabricate blazed gratings used in the extreme ultraviolet wavelength region. The method uses an argon and oxygen mixed-gas ion beam to directly etch the grating substrate through a rectangular profile photoresist grating mask. With this method the etched grating groove profile can be well controlled. An Mo/Si multilayer-coated specimen with a blaze angle of 1.9 degrees was fabricated and measured. At an incident angle of 10 degrees and a wavelength of 13.62 nm, the diffraction efficiency of the negative second order reaches 36.2%.