Zemax软件在取样光栅对设计中的应用

 光束取样光栅(BSG)是一种重要的用于光束取样诊断的衍射光学元件。以2块取样光栅代替单块光栅作为初始光学结构,运用Zemax光学设计软件采用分步优化的方法设计了具有消像差功能的光栅对结构,此方法比采用Matlab语言编程计算的方法消像差更快捷、更灵活,同时可以验证程序计算结果的正确性。设计结果显示：再现的会聚光经2块光栅衍射后在像平面上点列图中的均方根半径仅为0.506μm,单块取样光栅的均方根半径则为7.284μm,说明2块光栅能够做到像差互相矫正,其像质明显好于单块取样光栅。另外,设计出的双光栅光学系统,可进行远场光斑质量检测,为激光束性能的在线诊断提供了行之有效的技术支持。     

光谱仪用平场凹面光栅的凸面母光栅的消像差设计思路

平场全息凹面光栅是光谱仪中的核心元件之一,其成像质量和衍射效率直接影响了光谱仪的分辨率和光能利用率。利用凸面母光栅复制制作凹面光栅,便于在凸面基底上进行离子束刻蚀以获得高的衍射效率。为了保证复制的凹面光栅具有高的成像质量,文章提出一种全息凸面光刻胶光栅的消像差设计方法,优化中考虑了凸面基底对记录光束的折射效应以及由基底折射率所引入的附加光程。通过将“光程函数级数展开法”和ZEMAX光学设计软件相结合,采用粗精两步优化的方法,显著提高了优化的效率和成功率。ZEMAX对比仿真结果显示,复制得到的凹面光栅与传统直接采用全息法制作的凹面光栅的成像质量是相当的。     

双光栅平场全息凹面光栅光谱仪的优化设计

提出了双光栅平场全息凹面光栅光谱仪的优化设计方法.将使用波段一分为二,由两个使用结构相同的平场全息凹面光栅分别进行光谱成像以达到提高光谱分辨率的目的.根据全息凹面光栅像差理论,对光栅的使用结构和两光栅各自的制作结构进行优化求解以校正离焦、像散、彗差和球差等各种像差.据此原理设计了工作波段为200~800 nm、探测器长...     

复杂分光仪器中的像差研究

为提高分光仪器的性能,采用两个椭球面镜和一个椭球面消像差光栅分光。光源发出的光线被第一个椭球面镜反射,产生特定的波前,经过光栅衍射以后,不同波长的光波被第二个椭球面镜汇聚到探测器的不同位置上。系统具有复杂的像差特性和成像特性,根据费马原理,参考第二代全息变线距光栅的制作光路和理论,建立坐标系,定义两个椭球面上的入射角和反射角,确定各元件的位置变量,确立基本几何关系,将光程函数分为两部分:由衍射引起的光程变化和几何位置引起的光程变化,将两部分都按级数展开,给出了高阶像差的解析形式。对于平面、柱面、球面光栅和反射镜也可以使用这些公式。像差的解析式和光路也可以用于各种分光仪器中。     

光束斜入射的折反射组合光学系统的像差计算

基于平面对称光栅反射镜系统的像差理论,根据光学元件材料折射率对成像光束波像差进行修正,将像差理论扩展到平面对称折射光学系统,使得该理论可应用于光束斜入射的折反射组合光学系统的像差计算;指出在折反射组合光学系统中考虑物像方空间折射率的关系,以及入射角方向的定义,使得波像差的计算表达式保持统一;应用扩展后的像差理论对折反射...     

宽场平谱面全息凹面光栅光谱仪的设计

全息凹面光栅光谱仪具有平谱面、小型化、大孔径、高分辨率等优点。首先从信息光学的角度推导了全息凹面光栅的成像公式,在垂直于狭缝和平行于狭缝的平面上系统分析了全息凹面光栅光谱仪的成像性能;在垂直于狭缝的平面上,全息凹面光栅光谱仪具有良好的平谱面性;在平行于狭缝的平面上,全息凹面光栅光谱仪克服了传统平面光栅的谱线弯曲和色畸变,实现了谱线平直成像;此外指出全息凹面光栅光谱仪固有的弧矢场曲对视场扩展的限制。然后根据理论分析结果提出了结构对称消场曲的全息凹面光栅光谱仪的设计思想,利用ZEMAX软件优化设计了像差补偿型全息凹面光栅光谱仪。在保证相对孔径F#=3、光谱分辨率为20nm/mm、空间分辨率小于25μm等技术指标不变的前提下,设计了狭缝长度为0.4mm的传统单球面镜全息凹面光栅光谱仪和狭缝长度为8mm的像差补偿型全息凹面光栅光谱仪。结果表明,改进后的像差补偿型全息凹面光栅光谱仪成功地将视场扩大为单球面镜全息凹面光栅光谱仪的20倍。     

基于双波前传感器自适应光学技术的太阳光栅光谱仪

为了研究不同太阳大气高度的热力学特性,具有良好成像质量的成像型光栅光谱仪是实现这个目标的重要仪器。然而作为地基式太阳望远镜重要的终端仪器之一,光栅光谱仪的光谱成像性能不可避免的会受到动态波前像差和系统静态像差的影响。动态波前像差常通过在太阳望远镜系统中集成自适应光学系统进行补偿。针对光学系统中的由装调和光学元件加工等引起的静态波前像差,提出了一种基于自适应光学技术校正光栅光谱仪中静态波前像差的方法,并进行了数值模拟仿真和实验验证。实验结果表明,校正后系统的残余波前像差RMS≈0.025λ,此时波前像差对光谱分辨率和能量利用率的影响可忽略,提高了光栅光谱仪的光谱成像质量,证明了所提出的方法的有效性。此外它具有降低光学系统装调精度和光学元件加工精度要求的优点。     

Offner型成像光谱仪波长使用范围和光谱分辨率研究

研究了Offner型成像光谱仪消像差结构的参量和性能.用几何法推导出Offner型成像光谱仪的波长使用范围、系统线色散以及光谱分辨率的计算公式;在理想像差条件下,分析了Offner型成像光谱仪光谱分辨率与入射狭缝的宽度、凸面光栅分辨率和探测器像元尺寸各个因素之间的关系;探讨了提高光谱分辨率采用的方法和技术,解决了光谱仪的各个参量和光谱分辨率之间的矛盾.研究表明:当系统像差很小可忽略时,通过减小狭缝宽度,有利于提高光谱分辨率;Offner型成像光谱仪的分辨率由入射狭缝宽度、光栅和CCD像元尺寸三者中分辨本领最低的参量确定.     

左手性介质透镜系统的赛德尔像差特性研究

根据初级像差理论，系统研究了由左手性介质构造的透镜系统的赛德尔像差特性.分析了左手性介质单折射曲面的赛德尔像差特性，发现其消初级球差的曲面类型比普通介质更为灵活且可用于实成像系统.依据薄透镜赛德尔和数公式，分析和设计了三种只有左手性介质才具备的可消部分赛德尔像差的薄透镜结构参数，提出了几种能同时消除全部五种赛德尔像差的由左手性介质构造的透镜组合系统.研究表明左手性介质相对于普通介质在消像差方面存在较大优势，在光学设计时可以采用更少的折射表面个数或更简单的表面形状即可到达同等的成像性能.     

零像散宽波段平场全息凹面光栅的优化设计

平场全息凹面光栅的理想像面应为一平面,此时子午焦线与弧矢焦线均位于像面内且彼此重合,形成接近理想像点的光谱像。但子午焦线总是存在弯曲,只有弧矢焦线在满足一定条件的情况下可以成为直线。鉴于此,提出一种满足平场弧矢焦线条件的平场全息凹面光栅设计方法。利用光学设计软件ZEMAX研究了运用此方法设计的零像散光栅的成像特性,并与原有设计方法得到的结果进行比较。模拟结果显示,满足平场弧矢焦线条件的光栅能够达到与原有方法所设计光栅相当的光谱分辨率,而其全波段零像散特性使其拥有更加出色的弧矢方向聚焦性能,显著提高平场光谱仪的信噪比。     

用Stigmatic Points法设计高性能80通道阵列波导光栅器件

采用Stigmatic Points方法改进传统的罗兰圆结构设计方法,给出一个实用化、高性能80通道阵列波导光栅器件设计方案.对采用这两种设计方法得到的器件性能结果进行了比较分析,指出了传统设计方法在设计大通道数阵列波导光栅器件中存在的问题以及Stigmatic Points方法对器件性能的改进.     

Design of flat-field arrayed waveguide grating with three stigmatic points

A new-type flat-field arrayed waveguide grating (AWG), with the focal signals of all wavelengths of operation focusing along a straight line, has been designed. The work bases on the aberration theory of AWG, in which the restraints imposed on the conventional Rowland-type AWG have been released. In the design of flat-field AWG, three stigmatic points restrain three dominant geometry parameters: geometry of star couplers, ports distribution of phased-array, and length increment between adjacent paths. An eight-channel 200-GHz spacing flat-field AWG has been designed and simulated. As stigmatic points introduced, the aberration of this device is much lower than that of the Rowland-type AWG.     

两点法设计平场型EDG波分复用器件

利用两点法(two stigmatic points method)对平场型蚀刻衍射光栅(EDG)波分复用器件进行了优化设计.与传统EDG相比,该方法以较小的性能损失为代价,极大简化了制作工艺.通过标量波动衍射理论对16通道的该型器件进行了数值模拟,结果表明:在用光探测器陈列接收的情况下,额外的功率损耗约为1dB,信道间的不均匀性小于0.3dB,串绕小于-30dB.     

A Spectrometer Based on Diffractive Lens

A novel spectrometer is designed based on diffractive lens. It is essentially a flat field spectrometer. All the focal points are along the optical axis. Besides, all the asymmetrical aberrations vanish in our mounting. Thus low aberration can be obtained. In this article a diffractive lens is modeled as a special grating and analyzed by using a grating-based method. And a stigmatic point is introduced to reduce the aberrations.     

A Spectrometer Based on Diffractive Lens

A novel spectrometer is designed based on diffractive lens. It is essentially a flat field spectrometer. All the focal points are along the optical axis. Besides, all the asymmetrical aberrations vanish in our mounting. Thus low aberration can be obtained. In this article a diffractive lens is modeled as a special grating and analyzed by using a grating-based method. And a stigmatic point is introduced to reduce the aberrations.     

Focussing properties of a holographic plane diffraction grating

A plane holographic diffraction grating is the simplest grating, yet very important component for many optical devices. Very little has been done with regards to its focusing properties and stigmatic conditions. In this paper, we discuss a holographic plane diffraction grating and show that the grating can exhibit focusing properties under some conditions. We also discuss the conditions for zero astigmatism.     

Off-plane grazing-incidence blazed grating with radial grooves as an efficient spectral purity filter for EUV lithography

It was found that the high-blaze-angle reflective diffraction grating operating in the off-plane grazing-incidence configuration allows the separation and focusing of a 2% wavelength band in the vicinity of 13.5 nm. A model of a cooled multiple grating with a fan-groove geometry was used to separate the desired spectral range and to achieve a record efficiency and stigmatic focusing of images at high dispersion of adjacent orders. The highest relative efficiency in the range of 0.96–0.99 and reflectances from 0.71 to 0.96 can be achieved for an off-plane fine-pitch grating irradiated at angles of 70°–85° with a converging unpolarized light beam from a EUV collector. Such efficiency is higher than that of the corresponding in-plane configuration. The absolute efficiency of 0.72 was achieved in the minus-first order of a Mo-coated test Si grating with 5000 grooves/mm in unpolarized light using the PCGrate^®-SX? code and the AFM-measured groove profile.     

New stigmatic mounting of holographiccylindrical diffraction grating

A new stigmatic mounting of a holographic cylindrical diffraction grating has been considered to be used in the field of X-ray and XUV regions. The conditions for zero astigmatism and sagittal coma have been obtained. Astigmatism per unit length has been plotted against wavelength using the design parameters which give zero astigmatism at least at one wavelength.     

软X射线多层膜反射镜反射率测量

 采用线状激光等离子体作为软X光源,用具有空间分辨的掠入射光栅谱仪对正入射多层膜反射镜进行了反射率测量。谱仪测谱范围20~40nm,谱分辨0.05nm,测得50层C/Al反射镜在中心波长28.6nm处反射率为22%,带宽约为2.5nm。     

The elliptical gaussian wave transformation due to diffraction by an elliptical hologram

Realized as an interferogram of a spherical and a cylindrical wave, the elliptical hologram is treated as a plane diffracting grating which produces Fresnel diffraction of a simple astigmatic gaussian incident wave. It is shown that if the principal axes of the incident beam coincide with the principal axes of the hologram, the diffracted wave field is composed of three different astigmatic gaussian waves, with their waists situated in parallel but distinct planes. The diffraction pattern, observed on a transverse screen, is the result of the interference of the three diffracted wave components. It consists of three systems of overlapped second-order curves, whose shape depends on the distance of the observation screen from the hologram, as well as on the parameters of the incident wave beam and the hologram. The results are specialized for gratings in the form of circular and linear holograms and for the case of a stigmatic gaussian incident wave, as well as for the normal plane-wave incidence on the three mentioned types of hologram.