第一性原理研究[112]硅锗异质结纳米线的电子结构与光学性质

基于密度泛函理论体系下的广义梯度近似,本文利用第一性原理方法着重研究了[112]晶向硅锗异质结纳米线的电子结构与光学性质.能带结构计算表明:随着锗原子数的增加,[112]晶向硅锗纳米线的带隙逐渐减小;对Si_(36)Ge_(24)H_(32)纳米线施加单轴应变,其能量带隙随拉应变的增加而单调减小.光学性质计算则表明:随着锗原子数的增加,[112]硅锗纳米线介电函数的峰位和吸收谱的吸收边均向低能量区移动;而随着拉应变的增大,吸收系数峰值呈现出逐渐减小的趋势,且峰位不断向低能量区移动,上述结果说明锗原子数的增加与施加拉应变均导致[112]硅锗纳米线的吸收谱产生红移.本文的研究为硅锗异质结纳米线光电器件研究与设计提供一定的理论参考.     

Pu(100)表面吸附CO2的密度泛函研究

采用广义梯度密度泛函理论的改进Perdew-Burke-Ernzerh方法结合周期性层晶模型,研究了CO₂分子在Pu（100）面上的吸附和解离.吸附能和几何构型的计算表明,CO₂以穴位C4O4构型吸附最为有利,吸附能为1.48 eV.布居分析和态密度分析表明,CO₂与Pu表面相互作用的本质主要是CO₂分子的杂化轨道2π_μ与Pu5f,Pu6d,Pu7s轨道通过强电子转移和弱重叠杂化的方式相互作用而生成了新的化学键.计算的CO₂→CO+O解离能垒为0.66 eV,解离吸附能为2.65 eV, 表明在一定热激活条件下CO₂分子倾向于发生解离性吸附.O₂,H₂,CO和CO₂在Pu （100）面吸附的比较分析表明,较低温度下的吸附强度顺序依次为O₂,CO,CO₂,H₂;较高温度下的吸附强度顺序依次为O₂,CO₂,CO,H₂. 关键词： 密度泛函理论 Pu （100） 2')" href="#">CO₂ 吸附和解离     

基于低温硅技术的赝晶SiGe应变弛豫机理

基于能量平衡条件,结合低温硅(LT-Si)剪切模量小于SiGe的实验结果,从螺位错形成模型出发,给出了基于LT-Si技术的赝晶SiGe应变弛豫机理.该机理指出,赝晶SiGe薄膜厚度小于位错形成临界厚度,可通过LT-Si缓冲层中形成位错释放应变;等于与大于临界厚度,位错在LT-Si层中优先形成,和文献报道中已观察到的实验结果相符合.同时,实验制备了基于LT-Si技术的弛豫Si_0.8Ge_0.2虚拟衬底材料.结果显示,位错被限制在LT-Si缓冲层中,弛豫度达到了85.09%,且在Si_0.8Ge_0.2中未观察到穿透位错,实验结果证实了赝晶Si_0.8Ge_0.2是通过在LT-Si缓冲层形成位错来释放应变的弛豫机理. 关键词： 低温硅 赝晶锗硅 弛豫机理 位错理论     

气体吸附对V掺杂石墨烯电子结构与光学性质的影响

基于密度泛函理论(DFT)的广义梯度近似(GGA),采用第一性原理方法研究了气体分子吸附对V掺杂石墨烯的吸附能、电子结构与光学性质的影响．能带结构计算表明:吸附NO₂分子的V掺杂石墨烯的带隙显著增加,从0 e V变为0.368 e V,由金属性转变为半导体特性,而吸附CO与NH₃分子的V掺杂石墨烯的带隙则变化很小．三种吸附构型(NO₂,CO,NH₃)的吸附能分别为-8.499 e V、-2.05 e V和-2.01e V,说明V掺杂石墨烯对NO₂气体分子吸附最强．进而计算了本征、V掺杂石墨烯及其吸附NO₂分子的光学性质,结果表明:随着V掺杂与吸附NO₂气体,石墨烯介电吸收峰值有所增大,介电峰位向低能量区域移动;本征石墨烯仅吸收紫外光,V掺杂石墨烯吸附NO₂分子可以明显拓宽光吸收的光谱范围;掺杂与吸附使得石墨烯光电导率显著增强,能在红外与可见光区产生光电流．上述结果表明V掺杂石墨烯吸附NO₂后...     

Ti掺杂W$lt;sub$gt;18$lt;/sub$gt;O$lt;sub$gt;49$lt;/sub$gt;纳米线的电子结构与NO$lt;sub$gt;2$lt;/sub$gt;敏感性能的第一性原理研究

采用基于密度泛函理论框架下的第一性原理平面波超软赝势方法,通过理论建模,研究了Ti掺杂的非化学计量比W₁₈O₄₉纳米线的几何与能带结构以及电子态密度,并通过进一步计算NO₂/Ti-W₁₈O₄₉纳米线吸附体系的吸附能、电荷差分密度与电荷布居,分析了Ti掺杂W₁₈O₄₉纳米线的气体吸附与敏感性能. 计算发现,Ti掺杂改变了W₁₈O₄₉纳米线的表面电子结构,引入的额外的杂质态密度和费米能级附近能带结构的显著变化,使掺杂纳米线带隙与费米能级位置改变,纳米线导电性能增强. 吸附在W₁₈O₄₉纳米线表面的NO₂作为电子受体从纳米线导带夺取电子,导致纳米线电导降低,产生气体敏感响应. 与纯相W₁₈O₄₉纳米线相比,NO₂/Ti-W₁₈O₄₉纳米线吸附体系内部存在更多的电子转移,从理论上定量地反映了Ti掺杂对改善W₁₈O₄₉纳米线气敏灵敏度的有效性. 对Ti掺杂纳米线不同气体吸附体系电子布居的进一步计算表明,Ti掺杂纳米线对NO₂气体具有良好的灵敏度和选择性. 关键词： 密度泛函计算 Ti掺杂 18O₄₉纳米线')" href="#">W₁₈O₄₉纳米线 气敏     

V2CO2MXene从CO2/N2混合气体中选择性吸附CO2的第一性原理计算

二氧化碳作为温室气体中最重要的组成部分,其含量的变化将直接影响全球气候变化,在燃烧后气体中选择性捕获CO₂,对减缓因CO₂浓度过高引发的环境问题具有十分重要的意义.本文采用第一性原理计算的方法,研究了V₂CO₂ MXene材料对CO₂的选择性吸附性能.首先研究了不同官能团V₂CT_X MXene材料的结构和性质,发现V₂CO₂具有良好的稳定性.后研究了V₂CO₂对CO₂的吸附行为,结果表明,当CO₂被水平吸附时,V₂CO₂对CO₂气体分子的吸附能力较强且均满足在高性能吸附剂表面吸附CO₂的理想值(-0.42 eV-0.82 eV),可以适用于探测/捕获CO₂气体分子.此外,进一步研究了相同条件下V<...     

沸石类咪唑骨架材料吸附分离天然气的分子模拟

采用巨正则蒙特卡洛方法研究C₂H₆, CO₂和CH₄三种气体在两种沸石类咪唑骨架材料 (ZIF)-ZIF-2和ZIF-71中的吸附与分离性能. 考察了C₂H₆, CO₂和CH₄三种气体在ZIF-2和ZIF-71中的单组分吸附等温线、吸附热; C₂H₆-CH₄, CO₂-CH₄ 与C₂H₆-CO₂等摩尔二元混合物的分离; 以及C₂H₆-CO₂-CH₄三元体系的分离性能. 研究结果表明: 低压下不同气体的吸附量大小与其吸附热关系紧密; 而高压下因有限的孔空间, 尺寸较小的气体分子吸附量增长趋向更快; 多组分吸附分离中, 低压下能量效应通常占据主导, ZIF优先吸附作用力较强的组分; 高压下堆积效应影响显著, ZIF会优先吸附尺寸较小的组分. ZIF-2和ZIF-71对这3种二元体系的分离性能良好. 对于三元混合物吸附分离, 在常温下3000-4000kPa范围内, ZIF-2具有良好的天然气净化性能, 可有效地分离出天然气中的C₂H₆和CO₂. 关键词： 巨正则蒙特卡洛模拟 天然气分离 沸石类咪唑骨架     

氧化硅层厚度对Si/SiO2界面电子态结构与光学性质的影响

在氧化硅上生长纳米硅晶,保持氧化硅的直接带隙结构,降低其能带带隙,以用于发光和光伏。采用基于密度泛函理论的第一性原理研究了块体α-方石英、薄膜α-方石英、Si/SiO₂界面的电子态结构和Si/SiO₂界面的光学性质。结果显示,其均为直接带隙半导体,当薄膜α-方石英厚度和Si/SiO₂界面氧化硅层厚度逐渐减小时,能带带隙均逐渐变大,表现出明显的量子限制效应。光学性质计算结果表明：Si/SiO₂界面虚部介电峰和吸收峰的峰值随氧化硅层厚度降低而显著升高,且峰位向高能量方向蓝移。使用脉冲激光沉积制备了氧化硅上硅晶薄膜,测量了Si/SiO₂界面样品的PL光谱,在670 nm处存在一个强的发光峰,在波长超过830 nm后,Si/SiO₂界面样品的发光强度不断升高。因此,可以通过控制Si/SiO₂界面氧化硅层厚度有效地调控Si/SiO₂界面的电子态结构和光学性质,引进边缘电子态,调控其带隙进入1～2 eV区间,获取硅基发光材料...     

基于密度泛函理论研究掺杂Pd石墨烯吸附O2及CO

基于第一性原理的密度泛函理论研究了单个O₂和CO气体分子吸附于本征石墨烯和掺杂钯(Pd)的石墨烯的体系, 通过石墨烯掺Pd前后气体分子的吸附能、电荷转移及能带和态密度的计算, 发现掺Pd后气体分子吸附能和电荷转移显著增大, 这是由于Pd的掺杂, 在本征石墨烯能带中引入了杂质能级, 增强了石墨烯和吸附气体分子间的相互作用; 氧化性气体O₂和还原性气体CO吸附对石墨烯体系能带结构和态密度的影响明显不同, 本征石墨烯吸附O₂后, 费米能级附近态密度变大, 掺Pd后在一定程度变小; 吸附还原性的CO后, 石墨烯费米能级附近态密度几乎没有改变, 表明掺杂Pd不会影响石墨烯对CO的气体灵敏度, 但由于CO对石墨烯的吸附能增大, 可以提高石墨烯对还原性气体的气敏响应速度.     

外延Si1-xGex薄层中浅杂质的光热电离光谱

在Si_1-xGe_x合金外延层中利用光热电离光谱方法观察到了Si_0.92Ge_0.08合金中浅施主磷的2p_±及3p_±态的分立谱线，并根据有效质量近似理论估算了Si_0.92Ge_0.08合金中磷施主的电离能为45.51meV．与硅相比，由于合金的无序效应，Si_1-xGe_x合金的分立谱线发生明显展宽 关键词：     

Photocurrent spectroscopy of indirect transitions in Ge/Si multilayer quantum dots at room temperature

Lateral photoconductivity spectra of multilayer Ge/Si heterostructures with Ge quantum dots were studied in the work proposed at room temperature. The photocurrent with minimal energy 0.48-0.56 eV that is smaller than Ge band gap was observed from such structures at the geometry of waveguide excitation. Generation of the photocurrent with the limit energy 0.48-0.56 eV was explained by spatially indirect electron transitions from heavy hole states of SiGe valence band into Δ₂-valley of the conduction band of Si surrounding. It was found out that the limit energy of such transitions decreased, as the number of SiGe quantum dot layers increased.     

Indirect to direct gap transition in low-dimensional nanostructures of Silicon and Germanium

The electronic band structures of Si and Ge low-dimensional nanostructure such as nanofilms and nanowires have been calculated using first principles based on density functional theory (DFT) with the generalized gradient approximation (GGA). The calculation results show that a direct band gap can be obtained from Si orientation [100] or in Ge orientation [111] confined low dimensional nanostructure. However, an indirect band gap is still kept in the Si orientation [111] or in the Ge orientation [110] confined low dimensional nanostructure. The calculation results are interesting and the transition mechanism from indirect to direct band gap in low dimensional nanostructures is given in the physical structures model.     

SiH4 adsorption on SiGe(0 0 1)

The adsorption process of silane (SiH₄) on a SiGe(0 0 1) surface has been investigated by using infrared absorption spectroscopy in a multiple internal reflection geometry. We have observed that SiH₄ dissociatively adsorbs on a SiGe(0 0 1) surface at room temperature to generate Si and Ge hydrides. The dissociation of Si- and Ge-hydride species is found to strongly depend on the Ge concentration of the SiGe crystal. At a low Ge concentration of 9%, Si monohydride (SiH) and dihydride (SiH₂) are preferentially produced as compared to the higher Si hydride, SiH₃. At higher Ge concentrations of 19%, 36%, on the other hand, monohydrides of SiH and GeH and trihyderide SiH₃ are favorably generated at the initial stage of the adsorption. We interpret that when SiH₄ adsorbs on the SiGe surface, hydrogen atoms released from the SiH₄ molecule stick onto Ge or Si sites to produce Si or Ge monohydrides and the remaining fragments of -SiH₃ adsorb both on Si and Ge sites. The SiH₃ species is readily decomposed to lower hydrides of SiH and SiH₂ by releasing H atoms at low Ge concentrations of 0% and 9%, while the decomposition is suppressed by Ge in cases of 19% and 36%.     

Comparison of Si and Ge low-loss spectra to interpret the Ge contrast in EFTEM images of Si(1-x) Ge(x) nanostructures

Recently, an EFTEM imaging method, exploiting the inelastically scattered electrons in the 60-90eV energy range, was proposed to visualise Ge in SiGe alloys [Pantel, R., Jullian, S., Delille, D., Dutartre, D., Chantre, A., Kermarrec, O., Campidelli, Y., Kwakman, L.F.T.Z., 2003. Inelastic electron scattering observation using Energy Filtered Transmission Electron Microscopy for silicon-germanium nanostructures imaging. Micron 34, 239-247]. This method was proven to be highly more efficient in terms of noise, drift and exposure time than the imaging of the weak and delayed ionization GeL2,3 edge at 1236eV. However, the physical phenomenon behind this Ge contrast was not clearly identified. In this work, we explain the origin of this Ge contrast, by comparing in details EELS low-loss spectra (<100eV) recorded from pure Si and Ge crystals. High resolved low-loss experiments are performed using analytical Field Emission Gun Transmission Electron Microscopes fitted or not with a monochromator. Low-loss spectra (LLS) are then deconvoluted from elastic/quasi-elastic and plural scattering effects. The deconvolution procedure is established from Si spectra recorded with the monochromated machine. The absence of second plasmon and the measurement of a band gap (1.12eV) on the Si single scattering distribution (SSD) spectrum allowed us to control the accuracy of the deconvolution procedure at high and low energy and to state that it could be reliably applied to Ge spectra. We show that the Ge-M4,5 ionisation edge located at 29eV, which is shadowed by the high second plasmon in the unprocessed Ge spectrum, can be clearly separated in the single scattering spectrum. We also show that the front edge of Ge-M4,5 is rather sharp which generates a high intensity post edge tail on several tens of eV. Due to this tail, the Si and Ge EELS signals in the 60 to 100eV energy window are very different and the monitoring of this signal gives information about the Ge concentration inside SiGe alloys. It is now evident that the EFTEM imaging technique proposed to quantify Ge (90eV/60eV image ratio) in Si-Ge nanostructures is valid and is a relevant way of exploiting the Ge-M4-5 ionisation edge.     

H2在Li掺杂Al6Si+上吸附的理论研究

本文利用密度泛函理论的B3LYP/6-31G(d, p)和组态相互作用的QCISD/6-31G(d, p)研究了Al6Si+和Al6SiLi+团簇的几何和电子结构及其对H2分子的吸附,两种不同方法计算的H2分子在团簇上的吸附能非常一致。H2分子在Al6Si+团簇上的吸附能仅为-0.018 eV,Al6Si+团簇中掺杂Li原子可以明显增强其对H2分子的吸附。Al6SiLi+团簇吸附一个H2分子的吸附能可以达到-0.157 eV,吸附五个H2分子的平均吸附能为-0.088 eV。态密度和自然键轨道分析表明,电荷从Li原子向Si原子转移,H2分子在带正电的Li离子产生的电场中发生极化,从而在静电相互作用下吸附在Li原子周围。     

Ge，Al掺杂锰硅化合物Mn4Si7的第一性原理计算

基于密度泛函理论（DFT）的第一性原理计算方法,对本征Mn4Si7以及Ge,Al单掺杂和共掺杂Mn4Si7的晶体结构,能带结构,态密度以及光学性质进行了计算和分析.计算结果表明：本征态Mn4Si7的禁带宽度为0.810 eV,为直接带隙半导体材料,掺杂后晶体结构稍微变化,禁带宽度减小,且共掺杂时禁带宽度最小,电导率最好.Al以及Ge,Al共同掺杂时会产生杂质能级.掺杂后光子能量向低能级方向移动,光电导率,光吸收,反射系数都有所增大,说明掺杂改善了Mn4Si7的光学性质,从而可以提高光伏发电效率.     

Inelastic electron scattering observation using energy filtered transmission electron microscopy for silicon -- germanium nanostructures imaging

This paper presents a new technique using energy filtered TEM (EFTEM) for inelastic electron scattering contrast imaging of Germanium distribution in Si-SiGe nanostructures. Comparing electron energy loss spectra (EELS) obtained in both SiGe and Si single crystals, we found a spectrum area strongly sensitive to the presence of Ge in the range [50-100 eV]. In this energy loss window, EELS spectrum shows a smooth steeply shaped background strongly depending on Ge concentration. Germanium mapping inside SiGe can thus be performed through imaging of the EELS background slope variation, obtained by processing the ratio of two energy filtered TEM images, respectively, acquired at 90 and 60 eV. This technique gives contrasted images strongly similar to those obtained using STEM Z-contrast, but presenting some advantages: elastic interaction (diffraction) is eliminated, and contrast is insensitive to polycrystalline grains orientation or specimen thickness. Moreover, since the extracted signal is a spectral signature (inelastic energy loss) we demonstrate that it can be used for observation and quantification of Ge concentration depth profile of SiGe buried layers.     

单原子Al修饰空位缺陷V2C（MXene）对H2气体表面吸附的第一性原理研究

基于第一性原理计算方法,对含空位缺陷的V₂C(MXene)在不同位点修饰单原子Al的相关性能进行系统研究.研究表明,几何优化后得到含空位缺陷的V₂C稳定结构表面能为-3075.53 J/m²,单原子Al修饰本征V₂C单原子的吸附能为1.5511eV、单原子Al修饰空位缺陷V₂C的吸附能为-2.0763 eV,这表明含空位缺陷的V₂C,由于单原子Al的修饰可以明显改善晶体结构稳定性.进一步从态密度、分波态密度、吸氢能力研究发现,各体系态密度和分波态密度均出现分波越过费米能级的现象,表现出较强的金属性;V₂C吸附H₂气体分子吸附能为-7.5867 eV,而空位缺陷V₂C和单原子Al修饰空位缺陷V₂C两个体系对H₂气体分子的吸附能仅为-0.9851 eV、-2.7130 eV,均未能进一步改善V₂C对H₂气体分...     

Hetero-Epitaxy and Self-Adaptive Stressor Based on Freestanding Fin for the 10 nm Node and Beyond

A promising technology named epitaxy on nano-scale freestanding fin(ENFF) is firstly proposed for heteroepitaxy This technology can effectively release total strain energy and then can reduce the probability of generating mismatch dislocations. Based on the calculation, dislocation defects can be eliminated completely when the thickness of the Si freestanding fin is less than 10 nm for the epitaxial Ge layer. In addition, this proposed ENFF process can provide sufficient uniaxial stress for the epitaxy layer, which can be the major stressor for the SiGe or Ge channel fin field-effect transistor or nanowire at the 10 nm node and beyond. According to the results of technology computer-aided design simulation, nanowires integrated with ENFF show excellent electrical performance for uniaxial stress and band offset. The ENFF process is compatible with the state of the art mainstream technology, which has a good potential for future applications.