高线密度X光透射光栅衍射效率

高线密度X光透射光栅是各种高分辨光栅摄谱仪的核心色散元件,为了获得较高的光谱分辨率,工作在2~5 keV能区的光谱仪需要使用5000 l/mm的X射线透射光栅。为了获得光栅的绝对衍射效率,采用同步辐射光在多个能点对5000 l/mm的X光透射光栅进行衍射效率实验标定,通过光栅相对衍射效率拟合获得了光栅结构参数,与光栅结构测量结果非常接近。然后,采用衍射效率的矩形栅线模型,计算得到了光栅的绝对衍射效率。     

中阶梯光栅衍射效率及杂散光检测系统设计

中阶梯光栅具有刻线密度低、闪耀角度大、衍射级次高、光谱范围宽、色散率大、光谱分辨率高等一系列突出优点,近年来由于其优良的性能而倍受青睐。作为评价中阶梯光栅质量的衍射效率和杂散光系数直接体现了中阶梯光栅的光学性能,能够准确地进行中阶梯光栅衍射效率和杂散光系数的测量是光栅应用的前提。鉴于此,基于中阶梯光栅的衍射理论创造性地提出用一套系统对中阶梯光栅的衍射效率和杂散光系数进行检测,该系统引入双轨结构,具有结构简单新颖、一机多能等优点。通过理论分析和计算,确定了检测系统的结构参数,设计结果表明： 该检测系统可用于测量190～1 100 nm光谱范围内的中阶梯光栅绝对衍射效率,同时也可用于测量200～800 nm光谱范围内的中阶梯光栅杂散光系数,实现了将衍射效率测量和杂散光测量集于一体的设计思想。     

Sinc切趾布拉格光栅谱合成特性

 谱合成是获得高功率激光输出的有效方法。反射布拉格光栅衍射旁瓣是影响谱合成效率的主要因素。建立了sinc切趾布拉格光栅谱合成理论模型,采用传输矩阵法,分析了光栅参数对切趾光栅衍射特性的影响,以及入射光束光谱宽度和发散角对谱合成效率的影响。计算结果表明：sinc切趾布拉格光栅可有效抑制衍射旁瓣的影响,其一级衍射旁瓣和二级衍射旁瓣的峰值分别由62%和36%下降为0.57%和0.12%。通过优化光栅参数,利用sinc切趾布拉格光栅可实现窄光谱间距、高谱合成效率的多光束谱合成。切趾后,在10 nm的带宽内,参与谱合成光束的数目由7束增加为25束。对于波长为1 064 nm和1 064.4 nm的两束光谱合成,当入射光束光谱宽度小于0.15 nm,且发散角小于0.8 mrad时,谱合成效率达90%以上。     

Hamming切趾技术提高体光栅光谱合成功率的研究

体光栅光谱合成技术是获得高功率激光输出的一种有效途径,体光栅衍射旁瓣是影响合成光束数目的主要因素。采用了Hamming切趾技术对体光栅旁瓣进行抑制,建立了Hamming切趾体光栅的折射率分布模型,分析了Hamming切趾体光栅的衍射特性,给出了Hamming切趾体光栅光谱合成效率公式,分析了切趾光栅对光谱合成效率的影响。计算结果表明:体光栅切趾后有效减小了体光栅对相邻合成光束的衍射损耗,切趾后,在20 nm的带宽内,谱合成光束的数目由13束增加为20束,谱合成效率达75.3%,光谱合成功率提高为切趾前的1.5倍。     

横向衍射技术测量光纤光栅的特性

提出了一种用Ｈｅ－Ｎｅ激光侧面照射光纤光栅，从另一侧探测光栅的布拉格衍射效率来测量光纤光栅光谱特性的技术，并用该技术测量了光栅的折射率变化的分布。     

基于傅里叶光学原理的新型凹面光栅衍射效率测量方法

凹面衍射光栅兼具色散分光与光束聚焦功能,同时具有像差校正、低杂散光、无鬼线和高信噪比等优势而受到光谱仪器领域的广泛关注。衍射效率作为凹面光栅最重要的技术指标之一,其测量技术水平逐渐成为光谱仪器行业最为关注的课题之一。传统方法一般采用双单色仪结构实现凹面光栅衍射效率的测量,该方法主要存在两方面问题,一是测量标准反射镜和待测光栅的出射光谱带宽不同,二是光栅叠级、杂散光的影响;上述问题的存在降低了高性能凹面光栅衍射效率测量的准确性。本文提出了一种基于傅里叶光学原理测量凹面光栅衍射效率的新方法;针对该方法建立了凹面光栅衍射效率测量的数学模型,并采用光学追迹和傅里叶光学方法相结合对其进行了仿真分析,从而验证了该方法的正确性;针对动镜横移误差、倾斜误差、光源稳定性、动镜运动距离误差等因素影响凹面光栅衍射效率测量精度的问题,提出引入辅助探测器的方法来进一步提高衍射效率测量精度,并对有无辅助探测器情况下的上述误差对衍射效率的影响进行了数学推导和仿真分析,分析结果表明引入辅助探测器可以有效抑制了上述误差对凹面光栅衍射效率测量的影响。对比传统双单色仪测量方法而言,该方法不仅能够解决传统测量方法存在的问题,同时还具有多波长同时测量、高光通量、高分辨率、高波数精度等优势,可以有效提高凹面光栅衍射效率的测量精度和测量效率。     

弱谐波情况下透射光栅衍射效率标定方法

同步辐射光源中的高次谐波会使透射光栅衍射效率标定精度变差。为了校正光源中的高次谐波对透射光栅衍射效率标定的影响,提出了一种光源存在弱谐波情况下的透射光栅衍射效率标定方法,通过使用谐波X射线的衍射效率修正基波衍射效率标定中谐波的影响,从而得到更为准确的透射光栅衍射效率。使用该标定方法在北京同步辐射光源上开展了透射光栅相对衍射效率标定工作。实验结果表明:在100~800eV存在高次谐波能段,修正后透射光栅一级与零级的相对衍射效率与理论模拟结果吻合较好,修正后光栅二级与一级的相对衍射效率更接近理论模拟结果,但与理论模拟结果仍有较大偏差,该偏差主要来源光栅较弱的二级衍射。     

光栅光谱衍射效率测量新技术的误差分析与校正方法研究

衍射光栅是非常重要的色散元件,在光谱分析领域中有着广泛的应用,光栅光谱衍射效率的测量对于评估光栅性能和改进光栅制备工艺有着重要的作用。在目前常见光栅光谱衍射效率的测量技术中,由于存在两种需要重复数百次的机械运动,因而光栅光谱衍射效率的测量速度比较缓慢,如获取700～900 nm波段范围内的光谱衍射效率,大约需要5～8 min的时间。在之前的研究中,报道了一种快速测量光栅光谱衍射效率的新方法,新方法采用声光可调谐滤波器、积分球探测器和高速数据采集系统,可以完全消除现有测量方法中存在的两种耗时的机械运动,由于测量过程中没有任何机械运动的参与,新方法能在10 ms量级获得700～900 nm波段范围内的光谱衍射效率。首先对光栅光谱衍射效率测量新方法的主要误差来源进行了系统分析,发现新方法一个比较明显的误差来源是凸透镜的透过率与入射角相关;然后结合光学模拟,得到了激光光束以不同入射角度传播通过凸透镜时的透过率,并提出了相应的误差校正方法;最后结合实验测量数据,我们对光栅光谱衍射效率新测量技术的误差校正方法进行了实验验证。数据分析结果表明,在550～750 nm波段范围内测得的光栅光谱衍射效率,经过误差校正后,新方法与传统测量方法之间绝对误差的平均值从校正前的0.207%降低到校正后的0.099%,由于传统光栅光谱衍射效率测量方法的测量精度约为0.1%,结果表明,提出的误差校准方法能成功消除光栅光谱衍射效率新测量方法的主要误差来源。     

摆动刻蚀法制作高衍射效率凸面闪耀光栅

通过摆动离子束刻蚀方法,制作了用于短波红外高光谱成像光谱仪的凸面闪耀光栅。该方法通过在光栅子午方向上进行摆动刻蚀,解决了凸面光栅子午方向的闪耀角一致性问题。建立了摆动刻蚀模型来分析摆动速度、束缝宽度等工艺参数对槽型演化的影响,并计算了优化的刻蚀工艺参数。制备了基底尺寸为67 mm,曲率半径为156.88 mm,刻线密度为45.5 gr/mm,闪耀角为2.2°的凸面闪耀光栅,并对其表面形貌及衍射效率进行了测量。实验结果表明,摆动刻蚀法能够制作出闪耀角一致性好、衍射效率高的小闪耀角凸面光栅,满足成像光谱仪对光谱分辨率和便携性的使用要求。     

梯形介质膜光栅衍射特性分析

基于严格耦合波理论建立了梯形介质膜光栅的衍射机理模型,利用该模型讨论了底角为70°的梯形介质膜光栅-1级的衍射行为.通过对梯形介质膜光栅的占空比、槽深和剩余厚度的优化,设计了应用于1053 nm和51.2°角度入射的梯形介质膜光栅.对于顶层为HfO2的介质膜光栅,当槽深为200 nm,剩余厚度为100 nm,占空比为0.35时.其衍射效率优于99.5%,而对于顶层为SiO2的梯形光栅,为获得99.5%的衍射效率.其槽深为800 nm,剩余厚度为320 nm.而且,获得同样的衍射效率,顶层为HfO2的梯形光栅具有更宽的光谱特性.数值计算表明,严格耦合波理论模型对梯形介质膜光栅衍射效率的计算具有很好的收敛性和稳定性.     

Design of high-efficiency diffraction gratings based on total internal reflection for pulse compressor

We present designs of high-efficiency compression grating based on total internal reflection (TIR) for picosecond pulse laser at 1053 nm. The setup is devised by directly etching gratings into the bottom side of a prism so that light can successfully enter (or exit) the compression grating. Dependence of the −1 order diffraction efficiencies on the constructive parameters is analyzed for TE- and TM-polarized incident light at Littrow angle by using Fourier modal method in order to obtain optimal grating structure. The electric field enhancement within the high-efficiency TIR gratings is regarded as another criterion to optimize the structure of the TIR gratings. With the criterion of high diffraction efficiency, low electric field enhancement and sufficient manufacturing latitude, TIR compression gratings with optimized constructive parameters are obtained for TE- and TM-polarized incident light, respectively. The grating for TE-polarized light exhibits diffraction efficiencies higher than 0.95 within 23 nm bandwidth and relatively low square of electric field enhancement ratio of 5.7. Regardless of the internal electric field enhancement, the grating for TM-polarized light provides diffraction efficiencies higher than 0.95 within 42 nm bandwidth. With compact structure, such TIR compression gratings made solely of fused silica should be of great interest for application to chirped pulse amplification (CPA) systems.     

Design of High-Efficiency Diffraction Gratings Based on Rigorous Coupled-Wave Analysis for 800nm Wavelength

We report on the design of a high diffraction efficiency multi-layer dielectric grating with wide incident angle and broad bandwidth for 80Ohm. The optimized grating can achieve 〉 95% diffraction efficiency in the first order at an incident angle of 5° from Littrow and a wavelength from 77Ohm to 83Ohm, with peak diffraction efieieney of 〉 99.5% at 80Ohm. The electric field distribution of the optimized multi-layer dielectric grating within the gratings ridge is 1.3 times enhancement of the incidence light, which presents potential high laser resistance ability. Because of its high-effieieney, wide incident, broad bandwidth and potential high resistance ability, the multi-layer dielectric grating should have practical application in Ti：sapphire laser systems.     

软X射线位相型金透射光栅的设计与制作

根据衍射光栅的标量理论,计算并讨论了金透射光栅在软X波段衍射效率对光栅厚度和占宽比的依赖关系.结果表明,选择合适的光栅槽深和占宽比,高达 21.9%的衍射效率可能被获得,远高于振幅型光栅的+1级衍射效率10.14%.通过全息光刻与电镀转移技术制作的位相型金透射光栅由300nm的聚酰亚胺薄膜支撑,光栅槽深200nm,占宽比为0.55,周期为1μm,面积为20mm×5mm.在国家同步辐射装置上,测得其+1级透射衍射效率在波长λ=7.425nm时获得最大值,约为16%. 关键词： 透射位相光栅 全息光刻 电镀     

基于液晶/聚合物光栅的高转化效率有机半导体激光器

采用有机半导体发光材料聚[2-甲氧基-5-(2-乙基己氧基)-1,4-苯乙炔]作为增益介质,低官能度光敏单体制备的液晶/聚合物光栅作为外部反馈谐振腔,制备出参数可独立控制的分离式结构的有机半导体激光器.液晶/聚合物光栅中液晶分子的取向影响光栅折射率调制量,从而影响光栅的反馈能力,最终影响激光器出射激光的性能.通过研究发现决定液晶分子取向的主要有两种与光栅周期有关的作用力,利用这一原理制备不同周期的光栅,光栅周期小于450 nm时,相分离出的液晶分子取向由光栅矢量方向变为光栅沟槽方向,此时光栅的折射率调制量增加,光反馈能力增强.采用周期为395 nm的液晶/聚合物光栅制备二级布拉格散射的有机半导体激光器,相较于大周期光栅(593 nm)制备的激光器,激光阈值由0.70μJ/pulse降低至0.18μJ/pulse,转化效率由2.5%提高到6.4%,且出射激光垂直于基板表面发射,有利于后续的处理及应用.     

Diffraction efficiency and electron microscopy of large amplitude holographic gratings

The diffraction efficiency of Ag coated holographic gratings was measured as a function of the grating amplitude, H, for a He-Ne laser incident at 30° and 70° in the plane perpendicular to the grating grooves. The grating amplitude was determined using a scanning electron microscope. It was found that the diffraction efficiency of s polarized light increased monotonically with increasing H for H < 250 nm. In contrast, for the same amplitude range, the diffraction efficiency of p polarized light oscillated through two maxima at H = 90 nmand 220 nm. These results were compared to the theoretical calculations of Heitmann and found to agree within 10% for H < 60 nm in the s polarization case and for H < 15 nm in the p polarization case. For larger H, the data deviated significantly, presumably due to a breakdown of the small amplitude assumption on which the calculations were based.     

High-efficiency electrically tunable phase diffraction grating based on a transparent lead magnesium niobate-lead titanite electro-optic ceramic

An electrically tunable high-efficiency phase diffraction grating using the transparent lead magnesium niobate-lead titanite (PMNT) electro-optic ceramic is proposed. A photomask technique is used for fabricating the grating with the Ti/Pt/Au interdigital electrodes. With the variation of the equivalent phase face induced by the quadratic electro-optic effect of the PMNT ceramic, the diffraction patterns of the light beam will be changed in which the diffraction efficiency may be controlled by an applied DC voltage. When the applied voltages are 41, 80, and 139 V, the zero-order, first-order, or second-order diffraction lights will disappear in turn with about 100% diffraction efficiency. The proposed grating can be used as an electrically controlled switch in the laser beam modulation and scanning, especially for the application of the high-power laser systems.     

利用铌酸锂晶体制作体全息光栅的设计性实验

利用双光束干涉,通过控制双光束的记录角度,在铌酸锂晶体中写入光折变体全息布拉格光栅.将该光栅应用于光通信系统中作为滤波器使用,利用ASE光源和光谱仪对其进行测试,在1 548nm波长处获得了峰值半高全宽为4nm,衍射效率为10%的滤波效果.     

A Novel Design of Grating Couplers for Efficient Broadband Coupling between Silicon-on-Insulator Nanophotonic Waveguides and Fibres

A novel design of out-of-plane grating couplers is proposed for coupling between silicon-on-insulator nanophotonic waveguides and single-mode fibres. The coupler with the first-order diffraction coupling to the optical fibre is actually a second-order reflected grating with two times of period of the first-order grating. To enhance outcoupled power, a back hole is designed to form in the silicon substrate and a kind of metals is placed on the top acting as a reflection layer. The coupler is optimized using coupled-mode-based simulations, showing that the coupling efficiency to and from tapered optical fibre can be as high as 85% with 1dB bandwidth about 23 nm.