远场来流条件下过冷熔体球晶生长的稳定性

建立了远场来流条件下过冷熔体球晶生长的温度场和浓度场稳态模型,分析了对流对球晶周围温度场和浓度场的影响,并以Trivedi的纯扩散球晶稳定性判据为基础,推导出远场来流条件下过冷熔体球晶生长的临界稳定性判据. 研究表明:远场来流条件下,迎流面的扰动振幅增加速率明显大于背流面的扰动振幅增加速率. 振幅增加速率最大值对应的扰动阶次从迎流面到背流面逐渐减小,随着球晶半径增加而增大. 对流使迎流面的稳定性降低,背流面的稳定性增大. 随着流速的增加,球晶的临界稳定半径减小. 关键词： 球晶 远场来流 界面形态稳定性 Trivedi判据     

采用纳米晶柱阵列衬底抑制失配位错形成的分子动力学模拟研究

运用分子动力学方法对纳米晶柱阵列衬底上铝簿膜的外延生长进行了模拟研究.所采用的原子间相互作用势为嵌入原子法(EAM)多体势.模拟结果表明：采用纳米晶柱阵列衬底可以在不形成失配位错的条件下释放其上生长的外延薄膜晶体中的失配应变,有效地抑制其中失配位错的形成,获得高质量的外延薄膜晶体;这种纳米晶柱阵列的几何设计应满足两个基本条件：1) 晶柱的横截面尺寸应大于对应温度下的晶柱热失稳临界尺寸,以克服纳米结构的热失稳,模拟显示700K下铝的热失稳临界尺寸为19nm;2) 晶柱的高度与间距之比应大于076,以保证 关键词： 失配位错 分子动力学 纳米晶柱 铝     

六方晶格基底上薄膜生长的Monte Carlo模拟研究

利用Monte Carlo（MC）方法,模拟研究了六方晶格基底上薄膜生长的初始阶段岛的形貌和岛的尺寸与薄膜覆盖度以及入射粒子沉积速率之间的关系. 结果表明在基底温度为300K时,岛的形貌主要表现为分形生长,随着薄膜覆盖度的增加,岛的分形枝簇变大,岛的数目不断减少. 在同样的温度下,随着入射粒子沉积速率的增大,薄膜表面的形貌逐步由少数聚集型岛核分布状态向众多各自独立的离散型岛核分布状态过渡. 进一步研究得出,薄膜覆盖度和入射粒子沉积速率对粒子扩散能力的影响最终导致岛的形貌发生了改变.     

钙原子4p_(1/2,3/2)ng(J=3)自电离Rydberg光谱的研究

利用Monte Carlo(MC)方法模拟研究了薄膜生长的初始阶段岛的形貌和岛的尺寸与基底温度和入射粒子剩余能量之间的关系.模型中考虑了粒子的沉积、吸附粒子的扩散和蒸发等过程.结果表明当基底温度从200K变化到260K时,岛的形貌经历了一个从分散生长逐渐过渡到分形生长的过程,并且在较低温度(200K)下,随入射粒子剩余能量的增加,岛的形貌也经历了同样的变化过程.进一步研究证明,随着基底温度的升高或入射粒子剩余能量的增加,沉积粒子的扩散能力显著增强,从而使岛的形貌发生了改变.     

超薄膜生长的Monte Carlo模拟研究

利用Monte Carlo(MC)方法模拟研究了薄膜生长的初始阶段岛的形貌和岛的尺寸与基底温度和入射粒子剩余能量之间的关系.模型中考虑了粒子的沉积、吸附粒子的扩散和蒸发等过程.结果表明当基底温度从200K变化到260K时,岛的形貌经历了一个从分散生长逐渐过渡到分形生长的过程,并且在较低温度(200K)下,随入射粒子剩余能量的增加,岛的形貌也经历了同样的变化过程.进一步研究证明,随着基底温度的升高或入射粒子剩余能量的增加,沉积粒子的扩散能力显著增强,从而使岛的形貌发生了改变.     

超薄膜生长的Monte-Carlo研究

利用MonteCarlo(MC)模型研究了薄膜生长的初始阶段岛的形貌和岛的尺寸与基底温度之间的关系.模型中考虑了原子沉积、吸附原子扩散和蒸发等过程,与以前模型不同的是我们用Morse势计算粒子之间的相互作用,并详细考虑了临近和次临近原子的影响.结果表明,随基底温度的升高,岛的形貌经历了一个从分形生长到凝聚生长的变化过程.进一步研究表明,岛的形貌与基底的形貌之间的关系随着基底温度的升高有很大的变化,基底温度低时,岛的形状与基底形貌无关,高温时岛具有与基底形貌相似的结构.这些结果与实验结果一致.为了进一步说明 关键词：     

异质结构的应变和应力分布模型研究

基于组合杆的平衡条件，分别建立了晶格失配、热失配以及由两者共同导致的异质结构应变 和应力分布模型，并获得了异质结构的晶格失配应变、热失配应变、弯曲应变以及曲率半径 的分析解. 同时，运用所建的模型，计算了HgCdTe/CdZnTe异质结构的应变和应力分布.结果 表明：应力最大值均在界面处，而中性面仅是材料厚度和弹性参数的函数，与晶格失配、晶 格弛豫、热失配等参数无关，且该异质结构的曲率半径是衬底厚度的函数，随衬底厚度的减 小而减小，而要保证HgCdTe/CdZnTe器件在液氮温度下不发生断裂，衬底的厚度必须大于临界值. 关键词： 异质结构 应变分布模型 应力分布模型 晶格失配     

低温制备微晶硅薄膜生长机制的研究

采用热丝化学气相沉积技术制备了一系列处于不同生长阶段的薄膜样品，用原子力显微镜系 统地研究生长在单晶硅衬底和玻璃衬底上薄膜表面形貌的演化.按照分形理论分析得到：在 玻璃衬底上的硅薄膜以零扩散随机生长模式生长；而在单晶硅衬底上，薄膜早期以有限扩散 生长模式生长，当膜厚超过某一临界厚度时转变为零扩散随机生长模式.岛面密度与膜厚的 依赖关系表明，在临界厚度时硅衬底和玻璃衬底上的岛面密度均出现了极大值.Raman谱的测 量证实，玻璃衬底上薄膜临界厚度与非晶/微晶相变之间存在密切的关系.不同的衬底材料直 接影响反应 关键词： 生长机制 微晶硅薄膜 表面形貌 热丝化学气相沉积     

基底显微结构对薄膜生长影响的Monte Carlo模拟研究

利用Monte Carlo方法研究了基底显微结构对薄膜生长的影响. 对不同显微结构基底上薄膜生长的初始阶段岛的形貌和尺寸与薄膜覆盖度和入射粒子沉积速率之间的关系进行了模拟和分析. 模型中考虑了粒子沉积、吸附粒子扩散和蒸发等过程. 结果表明,基底显微结构对薄膜生长具有明显影响. 当沉积温度为300K、沉积速率为0.005ML/s（Monolayer/second,简称ML/s）、覆盖度为0.05ML时,四方基底上薄膜生长呈现凝聚生长. 随着覆盖度增加,岛的尺寸变大,岛的数目减少. 而对于六方基底,当覆盖度从0.05ML变化到0.25ML时,薄膜生长经历了一个从分散生长过渡到分形生长的过程. 无论是四方还是六方基底,随着沉积速率的增加,岛的形貌由少数聚集型岛核分布状态向众多各自独立的离散型岛核分布状态过渡.     

Au/Cu(001)异质外延岛演化的分子动力学研究

利用分子动力学弛豫方法模拟了Au/Cu(001)异质外延生长初期Au异质外延岛的形貌演化，分析了Au外延岛演化过程中的局域应力及与基体结合能随表面岛尺寸的变化. 研究结果表明：当异质外延岛小于7×7时，外延岛原子分布呈现赝Cu点阵形貌；当外延岛达到8×8后，外延岛内开始出现失配位错，失配位错数量随外延岛尺寸的增加而增加. 局域压力分析指出，外延岛上原子之间的近邻环境不同导致了所受应力的差异，而外延岛的形变则是由外延岛原子的应力分布所决定. 研究还发现，失配位错的产生导致错位原子与基体原子之间的结合强度减弱，但相对增加了非错位原子与基体原子之间的结合强度. 关键词： 异质外延 表面形貌 局域压力 分子动力学模拟     

Morphological stability analysis of the epitaxial growth of a circular island: Application to nanoscale shape control

In this paper, we present a comprehensive morphological stability analysis of a single, epitaxially growing, perturbed circular island by using a Burton-Cabrera-Frank (BCF) island dynamics model. We show that there exists a critical deposition flux for which a single mode perturbation remains unchanged. In the absence of an additional far-field mass flux, there exists a naturally stabilizing radius, so that beyond this radius, growth is always stable. Up to this radius, taking fluxes larger than the critical flux results in instability. The presence of kinetics makes sufficiently small islands grow stably, even without line tension or surface diffusion. The presence of desorption further introduces a range of parameters and island radii for which both stable and unstable shrinkage may occur. The presence of a far-field mass flux in the BCF model can eliminate the naturally stabilizing radius and unstable growth may be achieved for a wide range of island radii. We then demonstrate how these results may be exploited to control the shape of the island using the deposition flux and far-field mass flux as control parameters.     

Persistent step-flow growth of strained films on vicinal substrates

We propose a model of persistent step flow, emphasizing dominant kinetic processes and strain effects. Within this model, we construct a morphological phase diagram, delineating a regime of step flow from regimes of step bunching and island formation. In particular, we predict the existence of concurrent step bunching and island formation, a new growth mode that competes with step flow for phase space, and show that the deposition flux and temperature must be chosen within a window in order to achieve persistent step flow. The model rationalizes the diverse growth modes observed in pulsed laser deposition of SrRuO3 on SrTiO3.     

Morphologies of epitaxial islands on a lattice-misfitted substrate

Under certain growth conditions for systems with a film/substrate lattice misfit, the deposited material is known to aggregate into island-like shapes. We have obtained an analytical expression of the total free energy, which consists of strain energy, surface energy and interfacial energy of a coherent island/substrate system, and the change of equilibrium aspect ratio versus the volume of the island and the misfit of lattices in the system, which provides a broad perspective on island behaviour. These then were used to study the equilibrium shapes of the system. The results show that in order to minimize the total free energy, a coherent island will have a particular height-to-width aspect ratio, called equilibrium aspect ratio, that is a function of the island volume and misfit. The aspect ratio is increased with increasing island volume at a fixed misfit, and with increasing misfit strain between the island and substrate at a fixed island volume. Moreover, the effect of misfit dislocation on the equilibrium shape of the island is also examined. The results obtained are in good agreement with experiment of observations and thus can serve as a basis for interpreting the experiments.     

Morphological instability in InAs/GaSb superlattices due to interfacial bonds

Synchrotron x-ray diffraction is used to compare the misfit strain and composition in a self-organized nanowire array in an InAs/GaSb superlattice with InSb interfacial bonds to a planar InAs/GaSb superlattice with GaAs interfacial bonds. It is found that the morphological instability that occurs in the nanowire array results from the large misfit strain that the InSb interfacial bonds have in the nanowire array. Based on this result, we propose that tailoring the type of interfacial bonds during the epitaxial growth of III-V semiconductor films provides a novel approach for producing the technologically important morphological instability in anomalously thin layers.     

晶体相场法模拟异质外延过程中界面形态演化与晶向倾侧

采用晶体相场模型研究了异质外延过程中失配应变与应力弛豫对外延层界面形态演化的影响, 并对由衬底倾角引起的外延层晶向倾侧进行了分析.研究结果表明: 在有一定倾角的衬底晶体上进行外延生长时,若衬底和外延层之间失配度较大 (ε>0.08),外延层中弹性畸变能会以失配位错的形式释放, 最终薄膜以稳定的流动台阶形式生长且外延层的晶向倾角与衬底倾角呈近似线性关系. 而当衬底和外延层之间失配度较小(ε<0.04)不足以形成失配位错时, 外延层中弹性畸变能会以表面能的形式释放,最终使薄膜以岛状形态生长. 在高过冷度条件下,衬底倾角和失配度较大时,衬底和外延层之间会形成由大量位错规则排列而成的小角度晶界从而显著改变外延层的生长位向.     

Mesoscopic and microscopic modeling of island formation in strained film epitaxy

The instability of strained films for island formation is examined through an approach incorporating both discrete microscopic details and continuum mechanics. A linear relationship between the island wave number and misfit strain is found for large strains, while only in the small strain limit is a crossover to the continuum elasticity result obtained. A universal scaling relation accommodating all range of misfit strains is identified. Our results indicate that continuum mechanics may break down even at relatively small misfit stress due to the discrete nature of crystalline surfaces.     

Origin of apparent critical thickness for island formation in heteroepitaxy

We find that a continuum model of heteroepitaxy exhibits a sharp crossover with increasing coverage, from planar growth to island formation. The "critical thickness" at which this Stranski-Krastanov transition occurs depends sensitively on misfit strain, with a dependence strikingly similar to that seen experimentally. The initial planar growth occurs because of intermixing of deposited material with the substrate. While the transition is strictly kinetic in nature, it depends only weakly on growth rate. The role of surface segregation is also discussed.     

Influences of misfit strains on liquid phase heteroepitaxial growth

Influences of misfit strains with different signs on liquid phase heteroepitaxial growth are studied by binary phase field crystal model. It is amazing to find that double islands are formed because of lateral and vertical separation. The morphological evolution of epitaxial layer depends on signs of misfit strains. The maximum atomic layer thickness of double islands under negative misfit strain is larger than that of under positive misfit strain at the same evolutional time, and size differences between light and dark islands is much smaller under negative misfit strain than that of under positive misfit strain. In addition, concentration field and density field approximately have similar variational law along x direction under the same misfit strain but show opposite variational trend under misfit strains with different signs. Generally, free energy of epitaxial growth systems keeps similar variational trend under misfit strains with different signs.     

Competing roughening mechanisms in strained heteroepitaxy: a fast kinetic Monte Carlo study

We study the morphological evolution of strained heteroepitaxial films using kinetic Monte Carlo simulations in two dimensions. A novel Green's function approach, analogous to boundary integral methods, is used to calculate elastic energies efficiently. We observe island formation at low lattice misfit and high temperature that is consistent with the Asaro-Tiller-Grinfeld instability theory. At high misfit and low temperature, islands or pits form according to the nucleation theory of Tersoff and LeGoues.     

Shape and composition map of a prepyramid quantum dot

We present a theory for the shape, size, and nonuniform composition profile of a small prepyramid island in an alloy epitaxial film when surface diffusion is much faster than deposition and bulk diffusion. The predicted composition profile has segregation of the larger misfit component to the island peak, with segregation enhanced by misfit strain and solute strain but retarded by alloy solution thermodynamics. Vertical composition gradients through the center of the island due to this mechanism are on the order of 2%/nm for Ge(X)Si(1-X)/Si and 10-15%/nm for In(X)Ga(1-X)As/GaAs.