The emission wavelength tuning of InAs/InP quantum dots with thin GaAs, InGaAs, InP capping layers by MOCVD

InAs quantum dots (QDs) were grown on InP substrates by metalorganic chemical vapor deposition. The width and height of the dots were 50 and 5.8 nm, respectively on the average and an areal density of 3.0×10¹⁰ cm⁻² was observed by atomic force microscopy before the capping process. The influences of GaAs, In_0.53Ga_0.47As, and InP capping layers (5–10 ML thickness) on the InAs/InP QDs were studied. Insertion of a thin GaAs capping layer on the QDs led to a blue shift of up to 146 meV of the photoluminescence (PL) peak and an InGaAs capping layer on the QDs led to a red shift of 64 meV relative to the case when a conventional InP capping layer was used. We were able to tune the emission wavelength of the InAs QDs from 1.43 to 1.89 μm by using the GaAs and InGaAs capping layers. In addition, the full-width at half-maximum of the PL peak decreased from 79 to 26 meV by inserting a 7.5 ML GaAs layer. It is believed that this technique is useful in tailoring the optical properties of the InAs QDs at mid-infrared regime.     

Structural characterization of self-organized nanostructures

Self-organized nano-objects fabricated in different semiconductor systems are currently at the focus of scientific interest because of their unique electronic properties. Transmission electron microscopy and high-resolution electron microscopy have been used to study the InAs quantum dots grown by molecular-beam epitaxy (MBE) on GaAs and InP substrates. Optimal imaging conditions for visualization of quantum dots were established. Size, shape, and stability of the equilibrium island arrays were analyzed with respect to the growth conditions. Both decrease and increase of the As pressure compared to the optimal value were shown to destroy the regular arrangement of the islands. Energy benefit due to the strain relaxation in the InAs islands is likely to be the driving force for their formation. Fiz. Tverd. Tela (St. Petersburg) 40, 849–851 (May 1998) Published in English in the original Russian journal. Reproduced here with stylistic changes by the Translation Editor.     

Analysis of room temperature PL spectra of InAs/GaAs/InP and InAs/InP self-assembled QDs: A five-band study

In this paper, room temperature PL spectra of InAs self-assembled dots grown on GaAs/InP and InP substrate are presented. For analyzing different positions of the PL peaks, we examine the strain tensor in these quantum dots (QDs) using a valence force field model, and use a five-band k·p formalism to find the electronic spectra. We find that the GaAs tensile-stained layer affects the position of room temperature PL peak. The redshift of PL peak of InAs/GaAs/InP QDs compared to that of InAs/InP QDs is explained theoretically.     

Optical investigation of InAs/InP(1 0 0) quantum dots grown by gas source molecular beam epitaxy

We report on the optical characteristics of InAs quantum dots based on the InP(1 0 0) substrate grown by gas source molecular beam epitaxy without assisting any other methods. The photoluminescence was carefully investigated by adjusting the thickness of InAs layers and the growth temperature. A wide range of emitting peaks is obtained with the increase in the thickness of InAs layers. In addition, we find that the morphology and shape of quantum dots also greatly depend on InAs layers. The images of atomic force microscopy show that the quantum dots like forming into quantum dashes elongated along the [0 1 ?1] direction when the thickness of InAs layers increased. A critical thickness of formation quantum dots or quantum dash is obtained. At the same time, we observe that the growth temperature also has a great impact on the emission wavelength peaks. High qualities of InAs/InP(1 0 0) quantum dots providing their emission wavelength in 1.55 μm are obtained, and good performances of quantum dots lasers are fabricated.     

A study of photosensitive InAs/GaAs heterostructures with quantum dots grown by ion-beam deposition

The possibility of obtaining ion-beam-deposited InAs/GaAs heterostructures with quantum dots for photovoltaic converters is shown. The surface morphology of the grown heterostructures is analyzed by scanning probe microscopy. Quantum dots and InAs nanoclusters with planar dimensions from 20 to 100 nm and a height from 5 to 80 nm are detected. The average surface density of quantum-dimensional InAs objects with a size below 35 nm is 10⁵ mm⁻². In the photoluminescence spectra (T = 300 K), a peak is revealed with a maximum at the wavelength λ = 1150 nm (hν ≈ 1.1 eV), which shows that the grown heterostructures contain InAs quantum dots of various sizes.     

Controlling emission wavelength from InAs self-assembled quantum dots on InP (0 0 1) during MOCVD

We studied the growth of InAs quantum dots on InP (0 0 1) substrates in a low-pressure metalorganic chemical vapor deposition by using a so-called InP ‘double-cap’ procedure. With double-capping, a photoluminescence spectrum is modified into a series of multiple peaks, where the emission peaks arise from several quantum dot families with different heights changing in a step of integer number of an InAs monolayer. Cross-sectional transmission electron micrograph observations revealed that the shape of double-capped dots is dramatically changed into a thin plate-like shape with extremely flat upper and lower interfaces, being consistent with our interpretation of the photoluminescence spectrum. We showed that the procedure was extremely useful for controlling the emission wavelength from quantum dots in an InAs/InP (0 0 1) system.     

Carrier dynamics in strain-induced InGaAsP/InP quantum dots

Carrier dynamics of strain-induced InGaAsP/InP quantum dots (QDs) is investigated. In this structure, self-assembled InAs islands on the surface act as stressors and create a lateral confinement potential in the near surface InGaAsP/InP quantum well. Photoluminescence (PL) measurements reveal that decreasing the distance from the QD to the surface significantly diminishes the QD–PL intensity, presumably due to surface states of the InAs islands. Moreover, time-resolved measurements show a faster decay of the QD–PL with decreasing distance. To analyze the carrier dynamics, rate equation model is applied and surface state-related transitions are taken into account. The model is found to agree with measurements, and thus provides a possible explanation for the observed temporal behavior of the carriers.     

Diagnostics of height distribution of InAs/GaAs quantum dot arrays by means of carbon tetrachloride treatment in vapor phase epitaxy conditions

A technique for determination of InAs quantum dots bimodal distribution has been developed. This technique is based on vapor-chemical etching of quantum dot arrays coated with thin GaAs layers and on combined investigation of the morphology and photoluminescence spectra of etched quantum-size structures. It has been shown that, in some growth modes of quantum-size heterostructures by metal-organic vapor phase epitaxy, bimodal arrays of large and small quantum dots are formed. The surface concentration of large and small dots has been established to be about 2 × 10⁹ and 3 × 10¹⁰ cm⁻², respectively.     

InAs SELF-ASSEMBLED NANOSTRUCTURES GROWN ON InP(001)

The 6-period stacked layers of self-assembled InAs quasi-quantum wires(qQWRs) and quantum dots(QDs) embedded into InAlAs on InP(001) substrates have been prepared by solid molecular beam epitaxy. The structures are characterized by atomic force microscopy(AFM) and transmission electron microscopy(TEM). From AFM we have observed for the first time that InAs qQWRs and QDs coexist, and we explained this phenomenon from the view of the energy related to the islands. Cross-sectional TEM shows that InAs qQWRs are vertically aligned every other layer along the growth direction [001], which disagrees with conventional vertical self-alignment of InAs QDs on GaAs substrate.     

In-plane and perpendicular tunneling through InAs quantum dots

A Schottky diode with InAs dots in the intrinsic GaAs region was used to investigate perpendicular tunneling (in growth direction) through InAs quantum dots (QDs). At forward bias conditions electrons tunnel from the ohmic back contact into the metal Schottky gate. Peaks appear in the differential conductance when a QD level comes into resonance with the Fermi-level of the n-doped region. The observed tunneling features are attributed to electron transport through the s- and p-shell of the InAs islands. In our in-plane tunneling experiments the islands were embedded in the channel region of an n-doped GaAs/AlGaAs HEMT-structure. In order to study tunneling through single InAs islands, a quantum point contact was defined by lithography with an atomic force microscope and subsequent wet-chemical etching. In contrast to unpatterned devices sharp peaks appear in the I–V characteristic of our samples reflecting the transport of electrons through the p-shell of a single InAs QD.     

Anomalous temperature dependence of photoluminescence peak energy in InAs/InAlAs/InP quantum dots

We have observed an unusual temperature sensitivity of the photoluminescence (PL) peak energy for InAs quantum dots grown on InAs quantum wires (QDOWs) on InP substrate. The net temperature shift of PL wavelength of the QDOWs ranges from 0.8 to −4 Å/°C depending upon the Si doping concentration in the samples. This unusual temperature behavior can be mainly ascribed to the stress amplification in the QDOWs when the thermal strain is transferred from the surrounding InAs wires. This offers an opportunity for realizing quantum dot laser devices with a temperature insensitive lasing wavelength.     

Optical spectroscopy of single InAs/InP quantum dots around λ=1.55 μm

We discuss the preparation and spectroscopic characterisation of a single InAs/InP quantum dot suitable for long-distance quantum key distribution applications around λ=1.55 μm. The dot is prepared using a site-selective growth technique which allows a single dot to be deposited in isolation at a controlled spatial location. Micro-photoluminescence measurements as a function of exciton occupation are used to determine the electronic structure of the dot. Biexciton emission, shell filling and many-body re-normalization effects are observed for the first time in single InAs/InP quantum dots.     

Optical properties of InAs quantum dots in a Si matrix

We report on the optical properties of nanoscale InAs quantum dots in a Si matrix. At a growth temperature of 400°C, the deposition of 7 ML InAs leads to the formation of coherent islands with dimensions in the 2–4 nm range with a high sheet density. Samples with such InAs quantum dots show a luminescence band in the 1.3 μm region for temperatures up to 170 K. The PL shows a pronounced blue shift with increasing excitation density and decays with a time constant of 440 ns. The optical properties suggest an indirect type II transition for the InAs/Si quantum dots. The electronic structure of InAs/Si QDs is discussed in view of available band offset information.     

InAs QDs on InP: polarization insensitive SOA and non-radiative Auger processes

An efficient mechanical and electronic axial approximation of the strained 8 × 8 Hamiltonian is proposed for zinc-blende nanostructures with a cylindrical shape on (100) substrates. Vertically stacked InAs/InP columnar quantum dots (CQDs) for polarization insensitive semiconductor optical amplifier (SOA) in telecommunications applications are studied theoretically. Non-radiative Auger processes in InAs/InP quantum dots (QDs) are also investigated. It is shown that a multiband approach is necessary in both cases.     

不同组分InxGa1-xAs(0≤x≤0.3)覆盖层对自组织InAs量子点的影响

研究了不同In组分的In_xGa_1-xAs(0≤x≤0.3)覆盖层对自组织InAs量子点的结构及发光特性的影响.透射电子显微镜和原子力显微镜表明,InAs量子点在InGaAs做盖层时所受应力较GaAs盖层时有所减小,并且x＝0.3时,InGaAs在InAs量子点上继续成岛.随x值的增大,量子点的光荧光峰红移,但随温度的变化发光峰峰位变化不明显.理论分析表明InAs量子点所受应力及其均匀性的变化分别是导致上述现象的主要原因. 关键词： 量子点 盖层 应力 红移     

InSb quantum dots and quantum rings on InAs-rich surface

We report a study of InSb nanoobjects (quantum dots and quantum rings) grown on InAs-rich surface by liquid phase epitaxy. Characterization of the sample surface was performed using atomic force microscopy (AFM). The bimodal formation of the uncapped InSb quantum dots (QDs) was observed for the growing on a binary InAs substrate. Uniform high-density (1 × 10¹⁰ cm⁻²) quantum dots with a height of 3 nm were obtained at T = 420-430 °C, whereas low-density (5 × 10⁸ cm⁻²) big quantum dots were 9 nm in height. As a buffer layer, lattice-matched InAsSb_0.12P_0.25 solid solution was deposed on InAs substrate using metal-organic vapour phase epitaxy. Deposition from the InSb melt on the buffer layer resulted in the formation of InSb nanoobjects with density as high as 3 × 10¹⁰ cm⁻².     

Selective growth of InAs islands on patterned GaAs (100) substrate

By a combination of prepatterned substrate and self-organized growth, InAs islands are grown on the stripe-patterned GaAs (100) substrate by solid-source molecular beam epitaxy. It is found that the InAs quantum dots can be formed either on the ridge or on the sidewall of the stripes near the bottom, depending on the structure of the stripes on the patterned substrate or molecular beam epitaxy growth conditions. When a In_xGa_1−xAs strained layer is grown first before InAs deposition, almost all the InAs quantum dots are deposited at the edges of the top ridge. And when the InAs deposition amount is larger, a quasi-quantum wire structure is found. The optical properties of the InAs dots on the patterned substrate are also investigated by photoluminescence.     

Optical transitions of InAs/In0.36Ga0.64As/GaAs(311B) surface quantum dots clearly identified by the piezoreflectance technique

The bilayer InAs/In_0.36Ga_0.64As/GaAs(311B) quantum dots (QDs), including one InAs buried quantum dot (BQD) layer and the other InAs surface quantum dot (SQD) layer, have been grown by molecular beam epitaxy (MBE). The optical properties of these three samples have been studied by the piezoreflectance (PzR) spectroscopy. The PzR spectra do not exhibit only the optical transitions originated from the InAs BQDs, but the features originated from the InAs SQDs. After the InAs SQDs have been removed chemically, those optical transitions from InAs SQDs have been demonstrated clearly by investigating the PzR spectra of the residual InAs BQDs in these samples. The great redshift of these interband transitions of InAs SQDs has been well discussed. Due to the suitable InAs SQD sizes and the thickness of In_0.36Ga_0.64As layer, the interband transition of InAs SQDs has been shifted to ∼1.55 μm at 77 K.     

Quantum dots formed by activated spinodal decomposition of InGa(Al)As alloy on InAs stressors

We have studied quantum dots (QDs) fabricated by activated spinodal decomposition (ASD) of an InGa(Al)As alloy deposited on top of self-organized InAs nanoscale stressors on GaAs substrate. Such a growth sequence results in a strong red shift of the PL emission down to 1.3 μm at 300 K. This red shift is caused by the formation of In-rich areas in the vicinity of the InAs islands, which increase the effective dot size. Beyond a certain critical InAs composition or nominal thickness of the InGa(Al)As layer the PL line shifts back towards higher energies. Adding Al to the alloy increases the red shift for a given In concentration. Room temperature lasing near 1.3 μm with threshold current densities of about 85 A/cm² was achieved for lasers based on three-fold stacked ASD-formed QDs, with a maximum cw output power of 2.7 W.     

Effects of rapid thermal annealing on the energy levels of InAs/InP self-assembled quantum dots

We have studied the effects of thermal annealing on the electrical properties of InAs/InP self-assembled quantum dots (QDs) using deep level transient spectroscopy (DLTS). It was found from the DLTS measurements that the activation energy of the QD signal varied from 0.47 to 0.60 eV and the emission cross section changed from 1.01×10⁻¹⁵ to 9.63×10⁻¹⁴ cm² when the annealing temperature increased up to 700 °C. As a result of the thermal annealing process at the temperature ranging from 500 to 600 °C, the higher activation energy and the larger emission cross section of the QD related signal were observed for the annealed samples compared to those for the as-grown sample. On the basis of the capture barrier height for the QDs structure being lowered from 0.24 to 0.06 eV at the annealing temperature of 700 °C, thermal damage was considered as the reason. The appropriate annealing process can provide a clue for the engineering of the energy levels in the self-assembled QD structures.