托卡马克实验与工程——HL-2A装置上芯部弹丸加料中的电子热输运研究

从80年代中期开始，在许多聚变装置上观察到了用弹丸注入改善的等离子体能量约束。在JET和一些大型托卡马克上实现了弹丸增强约束模（PEP）。PEP模的机制也已在理论上做了分析。分析表明，有多种机制在减小反常输运中起作用，而这些机制的作用依赖于实验的条件。本文将报道在HL-2A装置上无辅助加热条件下的弹丸加料实验结果。该工作的着重点是研究在中心加料欧姆放电中的电子热输运。     

HL-2A装置欧姆击穿电源改造

HL-2A装置欧姆电源放电设计有两种方式：当装置放电正常、等离子体击穿电压较低时，按电流对称的逻辑无环流方式运行；而在装置刚开始投入运行，放电条件不好、等离子体击穿电压较高时，则采用非对称方式运行，即断开正向整流器组，充电控制欧姆击穿电源电容器组，串联反向整流器组对HL-2A装置欧姆变压器原边线圈放电。     

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第1期欧姆驱动托卡马克平衡位形的确定……………………………………………石秉仁,曲文孝,李芳著(1)线积分辐射率的有限探测器效应修正………………………………………………………………秦运文(8)HL-2A装置利用调制送气的电子热输运研究………………………………石中兵,丁玄同     

湍流雷诺协强及密度扰动对极向动量输运影响的实验研究

利用静电探针阵列对HL-2A边缘等离子体径向和极向速度进行了测量,获得了最后闭合磁面附近湍流的雷诺协强 以及 和 间相位差的剖面。实验表明,虽然 、 的幅值对雷诺协强的大小会有影响,但雷诺协强的变化趋势主要取决于二者相位差的变化;另一方面,欧姆放电以及不同电子回旋加热功率L模放电条件下的实验结果显示,密度扰动引起的粒子输运所带来的极向动量输运的贡献与雷诺协强项对极向动量输运的贡献是可比的。这表明在分析湍流引起的动量输运时必须考虑粒子输运的贡献。     

HL-2A装置等离子体电子回旋加热的理论研究

电子回旋加热是HL-2A装置主要二级加热手段之一。在通常运行条件下，HL-2A装置欧姆加热功率估计为300-450kW范围（按总环向电流300kA，环压1-1．5V估算）。而电子回旋加热的总功率已达1MW，有望增加到2MW。     

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用密度调制的方法研究了等离子体中粒子输运问题。采用了注入脉冲式补充送气和超声分子束两种不同的密度调制方法。在HL-2A装置常规欧姆放电的情况下,运用有限差分法和Nagashima矩阵技术,求解了粒子平衡方程。计算出了粒子的输运系数(对流速度v和扩散系数D)。研究了粒子输运系数与等离子体线平均密度之间的关系。实验结果表明,在欧姆放电的情况下,等离子体芯部的粒子对流速度方向始终是向内的,并且密度低时,粒子输运系数(粒子扩散系数D和对流速度v)较大;密度高时,粒子输运系数较小。     

逃逸电子和不稳定性波反常多普勒共振实验研究

利用电子回旋辐射诊断系统并结合其他相关诊断研究了HL-2A托卡马克中逃逸电子与波间的反常多普勒共振作用.结果显示:欧姆放电下提高等离子密度能抑制逃逸电子束的不稳定性,但等离子密度的再次降低导致逃逸电子又会激发不稳定性波,并耦合不稳定性波发生二次反常多普勒共振作用.利用统计方法分析了HL-2A上不同放电阶段逃逸电子反常多普勒共振阈值(ωpe/ωce)区间大致都在0.17-0.54范围内.此共振机制导致逃逸电子在速度空间被波散射,平行能量转化到垂直能量,pitch角增加,同步辐射功率增强,逃逸电子能量限制在反常多普勒效应的阈值能量附近.基于反常多普勒共振的逃逸抑制能有效减轻逃逸电子对装置第一壁的损坏.     

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利用静电探针阵列对HL-2A边缘等离子体径向和极向速度进行了测量,获得了最后闭合磁面附近湍流的雷诺协强〈(v)r(v)θ〉以及(v)r和(v)θ间相位差的剖面.实验表明,虽然(v)r、(v)θ的幅值对雷诺协强的大小会有影响,但雷诺协强的变化趋势主要取决于二者相位差的变化;另一方面,欧姆放电以及不同电子回旋加热功率L模放电条件下的实验结果显示,密度扰动引起的粒子输运所带来的极向动量输运的贡献与雷诺协强项对极向动量输运的贡献是可比的.这表明在分析湍流引起的动量输运时必须考虑粒子输运的贡献.     

HL-2A托卡马克实验进展和科学创新

中国环流器二号A(HL-2A)托卡马克是中国第一个带偏滤器的大型受控核聚变研究装置.文章综述了在HL-2A托卡马克装置上的重要实验结果.自从HL-2A装置建成以来,有以下3个重要进展:实现了等离子体偏滤器位形放电;等离子体电子温度达到5500万度;实现了具有边缘局域模的高约束(H模)放电.随着HL-2A装置辅助加热能力和先进等离子体诊断等系统的发展,该装置在聚变等离子体物理的若干领域做出了以下创新性的贡献:实验验证了对聚变等离子体输运有重要影响的带状流的三维结构;进一步发展了原创的分子束加料技术,并且成功地应用于等离子体输运研究;用低频调制的电子回旋共振加热(ECRH)对撕裂模进行了有效的抑制,并使约束得到改善;观测到高能电子激发的内部扭曲模和阿尔芬模等新的物理现象.文章还简要介绍了该装置的发展计划及近期要开展的物理实验研究内容.     

HL-2A装置上ECRH实验的初步结果和电子热输运分析

电子回旋共振加热（ECRH）是托卡马克等离子体一种最常用的辅助加热手段，也是进行等离子体电子热输运和约束性能研究的一种有效手段。本文介绍了HL-2A装置上ECRH实验的初步结果，分析了在ECRH实验期间的电子热输运特征和约束情况。     

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The multichannel bremsstrahlung measurement system on HL-2A tokamak has been using to observe the intensity of visible (535.1nm) bremsstrahlung radiation. Combined the intensity with plasma electron density and electron temperature, the effective ion charge measurements can be obtained on HL-2A tokamak. The 1×10¹⁹m⁻³ to4×10¹⁹m⁻³ experimental results show that when the plasma electron density increases from 1×10 m to 4×10 m , the effective ion charge number changes from 5 down to around 2. The bremsstrahlung radiation signal intensity is proportional to the quadratic plasma density. When the electron density is higher than 3×10¹⁹m⁻³, the multichannel bremsstrahlung measurement system can collect sufficient signal through the plasma, which enables the measurement of effective ion charge radial profile.     

HL-2A 装置中利用可见光谱段轫致辐射测量有效离子电荷数

通过测量可见光谱段的轫致辐射(λ=535.1nm)强度,结合等离子体电子密度和电子温度,HL-2A     

Spatial characteristics of nanosecond pulsed micro-discharges in atmospheric pressure He/H2O mixture by optical emission spectroscopy

Atmospheric pressure micro-discharges in helium gas with a mixture of 0.5%water vapor between two pin electrodes are generated with nanosecond overvoltage pulses.The temporal and spatial characteristics of the discharges are investigated by means of time-resolved imaging and optical emission spectroscopy with respect to the discharge morphology,gas temperature,electron density,and excited species.The evolution of micro-discharges is captured by intensified CCD camera and electrical properties.The gas temperature is diagnosed by a two-temperature fit to the ro-vibrational OH(A²Σ⁺–X^П(2),0–0)emission band and is found to remain low at 425 K during the discharge pulses.The profile of electron density performed by the Stark broadening of Ha 656.1-nm and He I 667.8-nm lines is uniform across the discharge gap at the initial of discharge and reaches as high as 10²³m^-3.The excited species of He,OH,and H show different spatio-temporal behaviors from each other by the measurement of their emission intensities,which are discussed qualitatively in regard of their plasma kinetics.     

Spectroscopic investigation of a low current arc in pure fluorine

A pure fluorine 10-A DC arc has been operated in an Al₂O₃ tube of 18 mm diameter at atmospheric pressure. This arc was used to perform radially resolved spectroscopic end-on measurements in the visible and UV-spectral regions. An excitation temperature of 7800 K on the arc axis was determined from the intensity of atomic fluorine lines, and an ion density of 1.7×10 ²¹ m^-3 was determined from the half-width of the contamination line H_β. A Boltzmann plot of the affinity continuum in the UV-spectral region yields two groups of electrons. A group of hot electrons is characterized by a temperature that agrees with the excitation temperature, and a group of cold electrons has a temperature in accordance to the gas temperature of 4000 K. The absolute intensity of the affinity continuum gives and electron density of 1.3×10²⁰ m^-3 on the arc axis, which is lower than the density of both positive and negative ions in the discharge. From the difference between the electron and gas temperature, an elastic collision cross section between the electrons and F-atoms of 2×10^-20 m² is determined     

HL-2M装置真空室预装阶段检漏试验

通过在加工现场和安装现场搭建的真空辅助系统、四极质谱计及氦检漏仪组成的检漏系统,运用残 余气体分析和氦质谱检漏方法在冷态下对 HL-2M 真空室扇形段及真空室整体进行了真空检漏试验。对漏点进行 修复后,测试了真空室的极限真空度和总漏气率等。真空室经过 72h 的抽气后,真空度达到 3.7×10⁻⁵Pa,超过了 1.0×10⁻⁴Pa 的预期预抽真空度。用静态定容法测得的真空室漏放气率为 2.3×10⁻⁷Pa⋅m³⋅s⁻¹,小于设定的真空漏率 技术指标 5×10⁻⁷Pa⋅m³⋅s⁻¹。试验结果表明 HL-2M 装置真空室满足超高真空条件,符合设计要求。     

Importance of high local cathode spot pressure on the attachment ofthermal arcs on cold cathodes

The importance of having high local cathode spot pressures for the self-sustaining operation of a thermal arc plasma on a cold cathode is theoretically investigated. Applying a cathode sheath model to a Cu cathode, it is shown that cathode spot plasma pressures ranging 7.4-9.2 atm and 34.2-50 atm for electron temperatures of ~1 eV are needed to account for current densities of 10⁹ and 10¹⁰ A·m^-2, respectively. The study of the different contributions from the ions, the emission electrons, and the back-diffusing plasma electrons to the total current and heat transfer to the cathode spot has allowed us to show the following. 1) Due to the high metallic plasma densities, a strong heating of the cathode occurs and an important surface electric field is established at the cathode surface causing strong thermo-field emission of electrons. 2) Due to the presence of a high density of ions in the cathode vicinity, an important fraction of the total current is carried by the ions and the electron emission is enhanced. 3) The total current is only slightly reduced by the presence of back-diffusing plasma electrons in the cathode sheath. For a current density j_tot=10⁹ A·m^-2 , the current to the cathode surface is mainly transported by the ions (76-91% of j_tot while for a current density j_tot = 10¹⁰ A·m^-2, the thermo-field electrons become the main current carriers (61-72% of j_tot). It is shown that the cathode spot plasma parameters are those of a high pressure metallic gas where deviations from the ideal gas law and important lowering of the ionization potentials are observed     

HL-2M 真空室保温层设计及安装

基于 HL-2M 真空室烘烤保温要求，通过有限元分析和原型件实验确定采用陶瓷纤维与纳米级微孔材 料组合作为 HL-2M 真空室保温材料。在 30℃时，保温层的导热系数小于 0.027W⋅m⁻¹·℃⁻¹；300℃时，导热系数 小于 0.038W⋅m⁻¹·℃⁻¹。在保温层厚度 25mm、热面温度 300℃且达到稳态时，冷面可控制在 85℃以下，线圈侧的 温度低于 60℃，整体热损失小于 12kW，满足 HL-2M 真空室烘烤需求。      

Pseudospark produced pulsed electron beam for material processing

An intense pulsed electron beam produced by a pseudospark discharge is used for material processing. The electron beam propagates in a self-focused manner in the background gas. Hardly 12 ns after the beginning of the discharge the fraction of space charge neutralization is about 96%. To sustain the neutralization effect high energy electrons (E <500 keV) are accelerated in radial direction at the beam head, due to strong electric field gradients. At current maximum the beam pinches due to its own magnetic field. At peak current of 400 A and charging voltage up to 16 kV power density reaches 10⁹ W/cm ² on the target surface. Some results of copper thin films are presented. Due to the high expansion velocity of 10⁴ m/s of the ablated target material a copper-matrix has been masked     

A two-component model for the electron distribution function in ahigh-current pseudospark or back-lighted thyratron

Temperature, energy, and densities of two electron distribution function components, including an isotropic bulk part and an anisotropic beam, are analyzed for a hydrogen pseudospark and/or back-lighted thyratron switch plasma with a peak electron density of 1-3×10¹⁵ cm^-3 and peak current density of ≈10⁴ A/cm². Estimates of a very small cathode-fall width during the conduction phase and high electric field strengths lead to the injection of an electron beam with energies ⩾100 eV and density of 10¹³-10¹⁴ cm^-3 into a Maxwellian bulk plasma. Collisional and radiative processes of monoenergetic beam electrons, bulk plasma electrons and ions, and atomic hydrogen are modeled by a set of rate equations, and line intensity ratios are compared with measurements. Under these high-current conditions, for an initial density n_H2=10¹⁶ cm^-3 and electron temperature of 0.8-1 eV, the estimated beam density is ≈10¹³ -10¹⁴ cm^-3. These results suggest the possibility of producing in a simple way a very high-density electron beam     

AlN插入层对AlxGa1-xN/GaN界面电子散射的影响

本文研究AlN作为Al_xGa_1-xN/GaN插入层引起的电子输运性质的变化, 考虑了Al_xGa_1-xN和AlN势垒层的自发极化、压电极化对Al_xGa_1-xN/AlN/GaN双异质结高电子迁移率晶体管(HEMT)中极化电荷面密度、二维电子气(2DEG) 浓度的影响, 分析了AlN厚度与界面粗糙度散射和合金无序散射的关系; 结果表明, 2DEG 浓度、界面粗糙度散射和合金无序散射依赖于AlN层厚度, 插入一层1–3 nm薄的AlN层, 可以明显提高电子迁移率.