Enhanced single-fundamental LP01 mode operation of 650-nm GaAs-based GaInP/AlGaInP quantum-well VCSELs

Minimal optical attenuation of plastic (polymer) optical fibres (POFs) corresponds to the 650-nm wavelength. Currently the GaInP/AlGaInP quantum-well (QW) oxide-confined (OC) vertical-cavity surface-emitting diode lasers (VCSELs) are undoubtedly the laser devices most suited to be used in 650-nm POF optical communication, for which the stable single-fundamental-mode LP₀₁ emission (SFM) is definitely the one most desired. In the present paper, the comprehensive fully self-consistent VCSEL model is used to examine mode selectivity of the above VCSELs. An increase in the VCSEL active-region diameter leads to a gradual modification of the current injection into this region and subsequent carrier radial diffusion within it before their recombination, which is followed by an essential transformation of active-region optical-gain profiles deciding upon an excitation of successive transverse modes. In standard arsenide OC VCSELs, SFM operation is usually limited to relatively small active regions. But for a room-temperature continuous-wave operation of the GaInP/AlGaInP VCSELs, the fundamental LP₀₁ mode remains surprisingly the lowest-threshold one up to relatively large active regions of 9-μm diameters. Nevertheless, in such VCSELs, thresholds of many LP modes become very similar to one another, which leads to their relatively poor mode selectivity and an unwanted multi-mode operation for higher output powers.     

Optimization of GaInNAs quantum-well vertical-cavity surface-emitting laser emitting at 2.33 μm

In the present paper, a comprehensive computer simulation is used to determine optimal structure of the InP-based GaInNAs quantum-well (QW) active region and to investigate a possibility of reaching room-temperature (RT) continuous-wave (CW) single-fundamental-mode 2.33-μm operation of vertical-cavity surface-emitting laser (VCSEL) with such an active region. From among various considered InP-based active regions, the one with the Ga_0.15In_0.85N_0.015As_0.985/Al_0.138Ga_0.332In_0.530As QW, i.e. with barriers lattice matched to InP, seems to be optimal for the 2.33-μm VCSEL performance. Its QW material is chosen for the required long-wavelength emission whereas its barrier is expected to ensure promising laser performance at room and higher temperatures. The latter is mostly connected with the QW conduction band offset equal in the above active region to as much as 413 meV, which is much larger than those of its possible lattice matched to InP competitors, e.g. 276 meV for the Ga_0.47In_0.53As barrier and 346 meV for the Ga_0.327In_0.673As_0.71P_0.29 one. Our simulation reveals that from among various considered structures, a VCSEL with a 4-μm-diameter tunnel junction and two 6-nm Ga_0.15In_0.85N_0.015As_0.985/Al_0.138Ga_0.332In_0.530As QWs exhibits the lowest calculated threshold current of 0.88 mA. Its promising RT CW performance suggests that it may represent a very interesting alternative to GaSb-based VCSELs.     

Microstructural and optical properties of strain compensated InxGa1−xAs/InyAl1−yAs multiple quantum wells

Transmission electron microscopy (TEM) and photocurrent (PC) measurements were carried out to investigate the microstructural and excitonic transitions in In_0.52Ga_0.48As/In_0.55Al_0.45As multiple quantum wells (MQWs). TEM images showed that high-quality 11-period strain-compensated In_0.52Ga_0.48As/In_0.55Al_0.45As MQWs had high-quality heterointerfaces. Based on the TEM results, a possible crystal structure for the In_0.52Ga_0.48As/In_0.55Al_0.45As MQWs is presented, and their strains are compensated. The results for the PC data at 300 K for several applied electric fields showed that several excitonic transitions shifted to longer wavelengths as the applied electric field increased. These results indicate that the strain-compensated In_0.52Ga_0.48As/In_0.55Al_0.45As MQWs hold promise for electroabsorption modulator devices.     

GaInP材料生长及其性质研究

用常压MOCVD在半绝缘GaAs衬底上生长了Ga_xIn_1-xP(x=0.476～0.52)外延层,对外延层进行了X光双晶衍射、Hall和光致发光(PL)测试.77K下电子迁移率达3300cm²/V.s(浓度为1.4×10¹⁶cm^-3).载流子浓度随生长温度升高,随Ⅴ/Ⅲ比的增大而降低,并提出P空位(V_p)是自由载流子的一个重要来源,17KPL谱中,Ga_0.5In_0.5P(Tg=650℃,Ⅴ/Ⅲ=70)的峰能为1.828eV,半峰宽为19meV.另外,在1.849eV处还有一较弱的峰,GaInP峰能和其计算的带隙最大相差113meV,这可能与GaInP中杂质或缺陷以及其中存在有序结构有关.     

Electron mobilities in isomorphic In0.53Ga0.47As quantum wells on InP substrates

The influence of the doping level, illumination, and width of isomorphic In_0.52Al_0.48As/In_0.53Ga_0.47As/In_0.52Al_0.48As quantum wells grown on InP substrates on the electron mobility is studied. The persistent photoconductivity at low temperatures is found. Band diagrams are calculated and optimal parameters are found for obtaining the maximum electron mobility. The quantum and transport electron mobilities in dimensional quantization subbands are obtained from the Shubnikov-de Haas effect. The electron mobilities are calculated in dimensional quantization subbands upon scattering by ionized impurities taking intersubband transitions into account. Scattering by ionized impurities in samples studied is shown to be dominant at low temperatures.     

双δ掺杂In0.65Ga0.35As/In0.52Al0.48As赝型高迁移率晶体管材料子带电子特性研究

研究了基于InP基的In_0.65Ga_0.35As/In_0.52Al_0.48As赝型高迁移率晶体管材料中纵向磁电阻的Shubnikov-de Haas(SdH)振荡效应和霍耳效应，通过对纵向磁电阻SdH振荡的快速傅里叶变换分析，获得了各子带电子的浓度，并因此求得了各子带能级相对于费米能级的位置.联立求解Schrdinger方程和Poisson方程，自洽计算了样品的导带形状、载流子浓度分布以及各子带能级和费米能级位置.理论计算和实验结果很好符合.实验和理论计算均表明，势垒层的掺杂电子几乎全部转移到了量子阱中，转移率在95%以上. 关键词： SdH振荡 二维电子气 FFT分析 自洽计算     

A numerical study of characteristic temperature of short-cavity 1.3-μm AlGaInAs/InP MQW lasers

Optical properties of a 1.3-μm AlGaInAs/InP strained multiple quantum-well structure with an AlInAs electron stopper layer, which is located between the active region and the p-type graded-index separate confinement heterostructure layer, are studied numerically with a LASTIP simulation program. Specifically, the effect of the electron stopper layer on the characteristic temperature and the temperature dependence of the slope efficiency are investigated. Various physical parameters at different operating temperatures are adjusted so that the threshold currents of the simulated laser structure can be matched to the experimental results of an identical laser structure fabricated by Selmic et al. The simulation results suggest that, with the use of a p-type Al_0.5In_0.5As electron stopper layer and a strain-compensated active region consisting of Al_0.175Ga_0.095In_0.73As (6 nm)/Al_0.32Ga_0.2In_0.48As (10 nm), a characteristic temperature as high as 108.7 K can be achieved for a 250-μm-long AlGaInAs/InP laser. PACS 42.55.Px; 73.21.Fg; 73.61.Ey; 78.20.Bh     

Manganese-related luminescence in GaInAs/AlInAs multiple quantum wells grown on InP by molecular beam epitaxy

Two Mn-related luminescence peaks have been observed in a series of nominally undoped Ga_0.47In_0.53As/Al_0.48In_0.52As multiple quantum wells (MQW) grown lattice-matched on InP substrates by molecular beam epitaxy. These two peaks correspond to on-center and on-edge impurity states, respectively. The origin of the Mn impurities is outdiffusion from the Fe-doped semiinsulating InP substrate into the epitaxial layer. The binding energy of Mn acceptors, determined to be 53±3 meV in bulk-like Ga_0.47In_0.53As, increases to 80±5 meV for the on-center Mn state in a 58 Å MQW. The strong well-width dependence of the binding energy is explained in terms of the unique behavior of the Mn impurity in III–V semiconductors. The Mn in Ga_0.47In_0.53As and Ga_0.47In_0.53As/Al_0.48In_0.52As MQWs behaves predominantly as a deep impurity.On leave from: A. F. Ioffe Physicotechnical Institute, Leningrad, USSR     

Transverse-mode selectivity in possible nitride vertical-cavity surface-emitting lasers

Excitation of various transverse modes in possible nitride vertical-cavity surface-emitting lasers (VCSELs) is investigated and compared using the effective frequency optical model. In the comparative analysis of laser mode selectivity, two distinctly different configurations of possible nitride VCSELs are considered: the traditional VCSEL design with both (n-side and p-side) ring contacts as well as the uniform-current-injection (UCI) VCSEL design. Our simulation reveals that, during the continuous-wave device operation at room temperature, a multi-mode operation dominated by higher-order transverse modes is typical for traditional nitride VCSEL configurations whereas a desirable single-mode (based on the fundamental LP₀₁ mode) operation turns out to be characteristic for the wide current range in UCI ones. The above different threshold device behaviours are an immediate consequence of essentially different current-spreading phenomena in both VCSEL designs, resulting in completely different not only gain profiles but also temperature distributions within the laser active regions of both VCSELs. Seemingly similar behaviour has been also reported in arsenide VCSELs but it is expected to be much more severe in the case of nitride ones as a result of much higher both electrical resistivities of p-type nitrides and their temperature derivatives of refractive indices.     

Mobility enhancement in MBE-grown InxGa1−xAs/In0.52Al0.48As modulation-doped heterostructures

Pseudomorphic In_xGa_1−xAs/In_0.52Al_0.48As modulation-doped heterostructures were grown by molecular beam epitaxy (MBE) on InP (100) substrates over a range of indium compositions fromx=0.53 to 0.75. Low temperature photoluminescence (PL) measurements show a prominent reduction in the InGaAs linewidth due to the quantum-size effect as the indium composition is increased from its lattice-matched value of 0.53. The lowest linewidth of 6.8 meV was achieved at an indium composition of 0.65, above which an increase in the linewidth was observed due to the overwhelming effects of interfacial strain. The Hall mobilities at 300 K and 77 K increase in correspondence to the PL linewidth reduction as the indium composition is increased. Although initial signs of mobility saturation can be seen at an indium composition of 0.65, the peak mobility at 77 K of 8.9×10⁴cm²V s⁻¹was achieved at an indium composition of 0.70. There is experimental evidence to indicate that the mobility enhancement at increasing indium composition is due to an effect of a reduction in the alloy scattering and in the effective mass of the carriers. It was found that the insertion of an additional In_0.53Ga_0.47As interface smoothing layer between the strained InGaAs channel and the In_0.52Al_0.48As spacer layer did not have a significant effect on the mobility enhancement in the heterostructures.     

InAs nanostructures on InP (001) substrate with the insertion of a superthin AlAs layer

An AlAs layer of two or three monolayers was inserted beneath the strained InAs layer in the fabrication of InAs nanostructure on the In_0.53Ga_0.47As and In_0.52Al_0.48As buffer layer lattice-matched to InP(001) substrate using molecular beam epitaxy. The effects of AlAs insertion on the InAs nanostructures were investigated and discussed.      

In0.53Ga0.47As/In0.52Al0.48As量子阱中的正磁电阻效应

在低温强磁场条件下,对In_0.53Ga_0.47As/In_0.52Al_0.48As量子阱中的二维电子气进行了磁输运测试.在低磁场范围内观察到正磁电阻效应,在高磁场下这一正磁电阻趋于饱和,分析表明这一现象与二维电子气中的电子占据两个子带有关.在考虑了两个子带之间的散射效应后,通过分析低磁场下的正磁电阻,得到了每个子带电子的迁移率,结果表明第二子带电子的迁移率高于第一子带电子的迁移率.进一步分析表明,这主要是由两个子带之间的 关键词： 二维电子气 正磁电阻 子带散射     

赝形InxGa1-xAs/In0.52Al0.48As异质结构中二维电子气的回旋共振光谱研究

采用回旋共振光谱方法，同时获得了具有较高电子气浓度的赝形In_0.80Ga_0.20As/In_0.53Ga_0.47As/In_0.52Al_0.48AsHEMT结构中最低两个子能带的费密面附近电子有效质量、 散射时间和迁移率.观察到该系统中能带非抛物性和波函数穿透所导致的电子回旋有效质量的显著增大效应，以及合金无序势和电离杂质散射所引起的电子散射时间和迁移率明显的子带依赖性. 关键词：     

单边掺杂InAlAs/InGaAs单量子阱中二维电子气的磁输运特性

研究了双子带占据的In_0.52Al_0.48As/In_0.53Ga_{0 .47}As单量子阱中磁电阻的Shubnikov-de Haas(SdH)振荡效应和霍耳效应，获得了不 同子带电子的浓度、迁移率、有效质量和能级位置.低磁感应强度(B＜1.5T)下由迁移率谱和 多载流子拟合相结合的方法得到的各子带电子浓度与通过SdH振荡得到的结果一致.在d ²ρ/dB²-1/B的快速傅里叶变换 关键词： InAlAs/InGaAs单量子阱 SdH振荡 二维电子气 磁致子带间散射     

Effect of GaInP intermediate barrier in 1.3 μm compressive-strained GaInAsP/GaInAsP multiple-quantum-wells laser diodes

In this article, 1.3 μm Ga_0.27In_0.63As_0.67P_0.33/Ga_0.11In_0.89As_0.24P_0.76 compressive-strain multiple-quantum-wells (CS-MQWs) with Ga_0.09In_0.91P intermediate barrier (IB) laser diodes (LDs) have been grown by low-pressure metalorganic chemical vapor deposition (LP-MOCVD). The photoluminescence (PL) measurement indicates that the CS-MQWs with 20 Å Ga_0.09In_0.91P IB have the narrowest full width at half maximum (FWHM) of 43.9 meV. The 55-μm-width metal contact and 900-μm cavity length as-cleaved broad-area LDs with the Ga_0.09In_0.91P IB have the better performance than those of LDs without Ga_0.09In_0.91P IB, including a threshold current density of 0.86 kA/cm², a differential quantum efficiency of 25.6%, an internal quantum efficiency of 50%, and an internal optical loss of 25 cm⁻¹. Finally, the GaInAsP/GaInAsP CS-MQWs with the Ga_0.09In_0.91P IB LDs were processed as 4-μm-width ridge and an as-cleaved 600-μm-cavity length. It exhibits a threshold current of 38.5 mA, a slope efficiency of 0.16 W/A, a characteristic temperature of 80.5 K, a maximum operating temperature up to 80 °C without power saturation, and a red-shift rate of 0.38 nm/°C, and a relaxation frequency response of 5.8 GHz. The 3-dB bandwidth for the LDs with GaInP IB is as high as 9 GHz without considering the damping factor and coupling loss.     

Optical and structural properties of molecular-beam epitaxially grown Ga0.47In0.53As/Al0.48In0.52As superlattices,emitting at 1.55 μm at room temperature

We have combined photoluminescence and absorption measurements with double crystal x-ray diffraction in order to study the influence of growth conditions on optical and structural properties of Ga_0.47In_0.53As/Al_0.48In_0.52As superlattices of 10.5 nm well width grown by molecular beam epitaxy on InPSn substrates. Superlattices with excellent structural properties can be grown even at low substrate temperatures of 500 °C, as indicated by narrow linewidths of the satellite peaks of the x-ray diffraction pattern of 20 to 25 s of arc (FWHM). However, elevated substrate temperatures are required to increase the intensity of the intrinsic luminescent subband transition at 77 K, to reduce the luminescence linewidth to 12 meV (FWHM), and to sharpen the absorption spectra. In addition to the absorption due to the steplike variation of the two-dimensional density of states, we observe excitonic transitions to the excitonic continuum at the subband edges.     

Dependence of the interband transitions on the in mole fraction and the applied electric field in InxGa1−xAs/In0.52Al0.48As multiple quantum wells

Transmission electron microscopy (TEM) and photocurrent (PC) measurements were carried out to investigate the microstructural properties and excitonic transitions in In_xGa_1−xAs/In_0.52Al_0.48As multiple quantum wells (MQWs) for x = 0.54, 0.57 and 0.60. TEM images showed that high-quality 11-period In_xGa_1−xAs/In_0.52Al_0.48As MQWs had high-quality heterointerfaces. The results for the PC spectra at 300 K showed that the peaks corresponding to the excitonic transitions from the ground state electronic sub-band to the ground state heavy-hole band (E₁-HH₁) and the ground state electronic sub-band to the ground state light-hole band (E₁-LH₁) became closer to each other with decreasing In mole fraction and that E₁-HH₁ and E₁-LH₁ excitonic peaks shifted to longer wavelength with increasing applied electric field. The calculated values of the E₁-HH₁ interband transition energies were in qualitative agreement with those obtained form the PC measurements with and without applied electric field. These results can be helpful in understanding potential applications of In_xGa_1−xAs/In_yAl_1−yAs MQWs dependent on In mole fraction and applied electric field in long-wavelength optoelectronic devices.     

调制掺杂的应变In0.60Ga0.40As/In0.52Al0.48As多量子阱结构的光致发光谱研究

报道了调制掺杂的应变In_0.60Ga_0.40As/In_0.52Al_0.48As多量子阱中室温光致发光光谱.观察到n=1和2电子子带到n=1重空穴子带的强发光峰.在低温下可以观察到n=1电子子带到n=1轻空穴弱发光肩胛.通过对发光强度随激发功率及温度依赖关系以及理论模型的分析研究,认为该调制掺杂量子阱中辐射复合效率降低的主要机制是应变失配位错对载流子的陷阱作用.界面上的失配位错是陷阱的主要来源.并用静态的光致发光理论模型 关键词：     

Low threshold current density, low resistance oxide-confined VCSEL fabricated by a dielectric-free approach

We present the fabrication process and experimental results of 850-nm oxide-confined vertical cavity surface emitting lasers (VCSELs) fabricated by using dielectric-free approach. The threshold current of 0.4 mA, which corresponds to the threshold current density of 0.5 kA/cm², differential resistance of 76 Ω, and maximum output power of more than 5 mW are achieved for the dielectric-free VCSEL with a square oxide aperture size of 9 μm at room temperature (RT). L–I–V characteristics of the dielectric-free VCSEL are compared with those of conventional VCSEL with the similar aperture size, which indicates the way to realize low-cost, low-power consumption VCSELs with extremely simple process. Preliminary study of the temperature-dependent L–I characteristics and modulation response of the dielectric-free VCSEL are also presented.     

Electron g-factor in a gated InAs-inserted-channel In0.53Ga0.47As/In0.52Al0.48As heterostructure

We report on electron g-factor in an InAs-inserted In_0.53Ga_0.47As/In_0.52Al_0.48As heterostructure. The gate voltage dependence of g-factor is obtained from the coincidence method. The obtained g-factor values are surprisingly smaller than the g-factor value of bulk InAs, and it is close to the bare g-factor value of In_0.53Ga_0.47As. The large change in g-factor is observed by applying the gate voltage. The obtained gate voltage dependence is not simply explained by the energy dependence of g-factor.