蓝紫光发光二极管中的低频产生-复合噪声行为研究

本文对GaN基InGaN/GaN多量子阱结构、蓝紫光发光二极管(light-emitting diode, LED)的电流噪声进行了测试,电流测试范围为0.1—180 mA.根据电流噪声的特点,结合LED中载流子之间的产生-复合机制,探讨了电流注入下LED中载流子的产生与复合机制和低频噪声产生的机理.结论表明,随着电流从0.1 mA逐渐增大到27 mA, LED中的电流噪声具有低频产生-复合(generation-recombination, g-r)噪声的特性;当电流逐渐增大到50 mA及以上时,电流噪声的行为接近1/f噪声.采用电子元器件中公认的电流噪声模型,拟合了低频电流噪声功率谱密度与频率之间的关系,结合LED中载流子的输运机理和复合机制,从理论上分析了LED在电流注入时g-r噪声幅值和转折频率的变化规律.本文的结果提供了一种检测和表征多量子阱结构蓝紫光LED在电流逐渐增大过程中发光机制转变的有效手段,为提高其发光量子效率提供理论依据.     

量子阱数量变化对双波长LED作用的研究

采用软件理论分析的方法分析了InGaN/GaN量子阱数量变化对双波长发光二极管发光光谱、内量子效率、电子空穴浓度分布、溢出电流等产生的影响.分析结果表明,量子阱数量的增加会引起载流子分配不均的现象,所以量子阱数量的增加并不能有效地提升载流子复合率、内量子效率和发光强度,还会引起开启电压升高的现象,影响能量转化效率.此外,不同发光波长的量子阱数量的增加会引起发光光谱强度的变化. 关键词： 量子阱 数量 数值模拟 双波长发光二极管     

量子阱垒层掺杂变化对双波长LED调控作用研究

采用APSYS软件研究了InGaN/GaN量子阱垒层掺杂变化对双波长 发光二极管发光光谱的调控问题. 在不同掺杂类型和浓度下对器件电子空穴浓度分布、 载流子复合速率、 能带结构、 发光光谱进行分析, 结果表明, 调节量子阱垒层n型和p型的掺杂浓度可以精确而有效地根据需要调控发光光谱, 解决发光光谱调控难的问题. 这些现象归因于掺杂的量子阱垒层对电子空穴分布的调控作用.     

金属有机化学气相沉积外延技术生长GaN基半导体发光二极管和激光二极管(Ⅱ)

如今，InGaN／GaN基量子阱发光二极管已经商业化，而且InGaN／GaN基量子阱激光二极管已实现连续波室温运转，使用寿命超过10000小时，虽然如此，但还没有完全搞清楚这些器件的发光机理．试验中通常使用连续输出He-Cd激光器（325nm）作光源，或者使用20—50mA注入电流来研究In—GaN量子阱样品或发光二极管光学性质，本文上篇研究了量子阱厚度与发光二极管发光功率的关系，lnGaN和GaN之间的晶格失配产生压电场，从而导致量子束缚斯塔克效应，而量子束缚斯塔克效应强     

InGaN/GaN多量子阱蓝光发光二极管老化过程中的光谱特性

系统地研究了小注入电流(＜4 mA)下InGaN/GaN多量子阱结构蓝光发光二极管的发光光谱特性在老化过程中的变化。对比老化前后的电致发光(EL)光谱,发现在注入电流1 mA下的峰值波长(peak wavelength)和半高宽(FWHM)随老化时间增加而减小,变化过程分两个阶段：前期(＜100 h)减小速度较快,而后逐渐变缓,呈现出与LEDs的发光光功率一致的变化规律,说明LEDs的等效极化电场在老化过程中减弱,这一变化和量子阱内缺陷的增加有明确的关系。通过电学特性测量发现同一结电压(V_j=1.8 V)下的结电容C_j和由交流小信号I—V方法计算得到的注入电流1 mA下的结电压V_j随老化时间增加而增大,明确了在同等小注入电流下量子阱内的载流子浓度随老化过程增加。分析表明在老化过程中InGaN/GaN 多量子阱结构蓝光发光二极管量子阱内的缺陷及其束缚的载流子数量增加,形成了增强的极化电场屏蔽效应,减弱的等效极化电场导致了量子阱的能带倾斜变小,带边辐射复合能量增大,能态密度增多,对应的发光过程的峰值波长变短(蓝移),半高宽变窄。     

GaN基多量子阱发光二极管的极化效应和载流子不均匀分布及其影响

制备了GaN基绿光发光二极管.利用耦合法求解了在自发极化和压电极化效应影响下的GaN/InGaN量子阱的极化电场强度.考虑载流子在量子阱间的不均匀分布，模拟计算了系统的一维薛定谔方程、稳态速率方程和泊松方程，得到了载流子在各个阱间的分布比值和辐射复合速率.同时还得到了不同电流下电致发光(EL)谱的峰值波长、谱峰半高宽及EL谱强度的变化情况.发现当测试电流由10 mA 增加到70 mA时，理论结果与实验结果能很好符合. 关键词： 极化 载流子不均匀分布 复合速率     

InGaN/GaN多量子阱蓝色发光二极管的实验与模拟分析

分别采用量子阱模型和量子点模型对蓝色InGaN/GaN多量子阱发光二极管电学和光学特性进行模拟,并和实验测量结果进行了比对,结果发现,量子点模型的引入,很好地解决了I-V和电致发光二方面的实验与理论模型间符合程度不好的问题.同时,在I-V曲线特性模拟中发现,在量子点理论模型的基础上,只有考虑到载流子的非平衡量子传输效应,才能得到和实验相接近的I-V曲线,揭示着在InGaN/GaN 多量子阱发光二极管电输运特性中,载流子的非 关键词： InGaN/GaN 发光二极管 数值模拟 量子点模型     

掺杂GaN间隔层对双波长发光二极管光谱调控作用的研究

采用软件理论分析的方法对p型及n型掺杂的GaN间隔层在InGaN/GaN多量子阱双波长发光二极管中对光谱调控作用进行模拟分析.分析结果表明,掺杂的GaN间隔层的引入,可以有效地控制各阱中的电子或空穴浓度,很好地解决了双波长发光二极管中两种阱发光强度不均的问题,并且通过控制阻挡层的厚度,可以调控两种阱中的载流子浓度,从而调控发光峰的相对强度.这些可以归因于掺杂GaN间隔层对电子或空穴的阻挡作用. 关键词： GaN 间隔层 数值模拟 双波长发光二极管     

反对称n-AlGaN层对GaN基双蓝光波长发光二极管性能的影响

采用数值分析方法对在InGaN/GaN混合多量子阱活性层和n-GaN之间引入n-AlGaN层的GaN基双蓝光波长发光二极管进行模拟分析.结果发现,与传统的具有p-AlGaN电子阻挡层的双蓝光波长发光二极管相比,这种反对称n-AlGaN层能有效改善电子和空穴在混合多量子阱活性层中的分布均匀性及减少电子溢出,实现电子空穴在各个量子阱中的平衡辐射,从而减弱了双蓝光波长发光二极管的效率衰减.此外,通过改变Al组分可以提高双蓝光波长发光二极管发射光谱的稳定性:当Al组分为0.16时,双蓝光波长发光二极管的光谱在小电流下比较稳定,而Al组分为0.12时,光谱在大电流下比较稳定.     

GaN基激光器多量子阱垒材料的研究

在(0001)蓝宝石衬底上分别用金属有机化学气相沉积技术外延生长了InGaN/GaN, InGaN/InGaN, InGaN/AlInGaN多量子阱激光器结构, 并分别制作了脊形波导GaN基激光器。同步辐射X射线衍射,电注入受激发射光谱测试及光功率-电流(L-I)测试证明,相对于GaN垒材料,InGaN垒材料,AlInGaN四元合金垒材料更能改善多量子阱的晶体质量,提高量子阱的量子效率及降低激光器阈值电流。相关的机制为：组分调节合适的四元合金垒层中Al的掺入使得量子阱势垒高度增加,阱区收集载流子的能力增强;In的掺入能更多地补偿应力,减少了由于缺陷和位错所产生的非辐射复合中心密度;In的掺入还减小了量子阱中应力引致的压电场,电子空穴波函数空间交叠得以加强,使得辐射复合增加。     

Investigation of wavelength-dependent efficiency droop in InGaN light-emitting diodes

The physical mechanisms leading to the efficiency droop of InGaN/GaN light-emitting diodes (LEDs) are theoretically investigated. We first discuss the effect of Auger recombination loss on efficiency droop by taking different Auger coefficients into account. It is found that the Auger recombination process plays a significant nonradiative part for carriers at typical LED operation currents when the Auger coefficient is on the order of 10⁻³⁰ cm⁶ s⁻¹. Furthermore, the InGaN/GaN multiple-quantum-well (MQW) LEDs with varied indium compositions in InGaN quantum wells are studied to analyze the wavelength-dependent efficiency droop. The simulation results show that the wavelength-dependent efficiency droop is caused by several different effects including non-uniform carrier distribution, electron overflow, built-in electrostatic field induced by spontaneous and piezoelectric polarization, and Auger recombination loss. These internal physical mechanisms are the critical factors resulting in the wavelength-dependent efficiency droop in InGaN/GaN MQW LEDs.     

具有三角形InGaN/GaN多量子阱的高内量子效率的蓝光LED(英文)

对InGaN量子阱LED的内量子效率进行了优化研究。分别对发光光谱、量子阱中的载流子浓度、能带分布、静电场和内量子效应进行了理论分析。对具有不同量子阱数量的InGaN/GaN LED进行了理论数值比对研究。研究结果表明,对于传统结构的LED而言,2个量子阱的结构相对于5个和7个量子阱具有更好的光学性能。同时还研究了具有三角形量子阱结构的LED,研究结果显示,三角形多量子阱结构具有较高的电致发光强度、更高的内量子效率和更好的发光效率,所有的优点都归因于较高的电子-空穴波函数重叠率和低的Stark效应所产生的较高的载流子输入效率和复合发光效率。     

Optimization towards reduction of efficiency droop in blue GaN/InGaN based light emitting diodes

Light emitting diodes (LEDs) based on GaN/InGaN material suffer from efficiency droop at high current injection levels. We propose multiple quantum well (MQW) GaN/InGaN LEDs by optimizing the barrier thickness and high–low–high indium composition to reduce the efficiency droop. The simulation results reflect a significant improvement in the efficiency droop by using barrier width of 10 nm and high–low–high indium composition in MQW LED.     

MOCVD生长InGaN/GaN MQW紫光LED

利用LP－MOCVD系统生长了InGaN/GaN MQW紫光LED外延片，双晶X射线衍射测试获得了2级卫星峰，室温光致发光谱的峰值波长为399.5nm，FWHM为15.5nm，波长均匀性良好。制成的LED管芯，正向电流20mA时，工作电压在4V以下。     

Simulation of InGaN/GaN light-emitting diodes with a non-local quantum well transport model

Blue InGaN/GaN multiple quantum well (MQW) light-emitting diodes (LEDs) are simulated by the APSYS software with a non-local quantum well transport model which is used to describe the phenomenon that carriers can fly over the quantum wells directly. The simulation results based on this model are in good agreement with the experiment and show its significant influence on the output power, carrier transport, peak wavelength and current crowding effect of the InGaN/GaN MQW LEDs, indicating that the non-local quantum well transport plays an important role in these devices.     

The effect of junction temperature on the optoelectrical properties of InGaN/GaN multiple quantum well light-emitting diodes

Thermal effects on the optoelectrical characteristics of green InGaN/GaN multiple quantum well (MQW) light-emitting diodes (LEDs) have been investigated in detail for a broad temperature range, from 30 °C to 100 °C. The current-dependent electroluminescence (EL) spectra, current–voltage (I–V) curves and luminescence intensity–current (L–I) characteristics of green InGaN/GaN MQW LEDs have been measured to characterize the thermal-related effects on the optoelectrical properties of the InGaN/GaN MQW LEDs. The experimental results show that both the forward voltages decreased with a slope of ?3.7 mV/K and the emission peak wavelength increased with a slope of +0.02 nm/K with increasing temperature, indicating a change in the contact resistance between the metal and GaN layers and the existence of a band gap shrinkage effect. The junction temperature estimated from the forward voltage and the emission peak shift varied from 25.6 to 14.5 °C and from 22.4 to 35.6 °C, respectively. At the same time, the carrier temperature decreased from 371.2 to 348.1 °C as estimated from the slope of high-energy side of the emission spectra. With increasing injection current, there was found to be a strong current-dependent blueshift of ?0.15 nm/mA in the emission peak wavelength of the EL spectra. This could be attributed to not only the stronger band-filling effect but also the enhanced quantum confinement effect that resulted from the piezoelectric polarization and spontaneous polarization in InGaN/GaN heterostructures. We also demonstrate a helpful and easy way to measure and calculate the junction temperature of InGaN/GaN MQW LEDs.     

Effect of low-energy electron irradiation on the cathodoluminescence of multiple quantum well (MQW) InGaN/GaN structures

The effect of low-energy electron-beam (e-beam) irradiation on the InGaN-related cathodoluminescence in multiple quantum well (MQW) InGaN/GaN light-emitting diode (LED) structures has been studied. It is shown that the e-beam exposure leads to an increase of emission intensity and to a formation of new blue-shifted emission bands. The changes observed were explained by the enhancement of In diffusion stimulated by excess carrier recombination.     

Enhancement of light-emission efficiency of ultraviolet InGaN/GaN multiple quantum well light emitting diode with InGaN underlying layer

Two ultraviolet InGaN/GaN light emitting diodes (LEDs) with and without InGaN underlying layer beneath the multiple quantum wells (MQWs) were grown by metal-organic vapor phase epitaxy. Based on the photoluminescence excitation measurements, it was found that the Stokes shift of the sample with a 10-nm-thick In_0.1Ga_0.9N underlying layer was about 64 meV, which was smaller than that of the reference sample without InGaN underlying layer, indicating a reduced quantum-confined Stark effect (QCSE) due to the decrease of the piezoelectric polarization field in the MQWs. In addition, by fitting the photon energy dependence of carrier lifetime values, the radiative recombination lifetime of the sample with and without InGaN underlying layer were obtained about 1.22 and 1.58 ns at 10?K, respectively. The shorter carrier lifetime also confirmed that the QCSE in the MQWs was weakened after inserting the InGaN underlying layer. In addition, although the depth of carrier localization in the sample with InGaN underlying layer became smaller, the nonradiative recombination centers (NRCs) inside it decreased, and thus suppressed the nonradiative recombination process significantly according to the electroluminescence measurement results. Compared to the reference sample, the efficiency droop behavior was delayed in the sample with InGaN underlying layer and the droop effect was also effectively alleviated. Therefore, the enhanced light-emission efficiency of ultraviolet InGaN/GaN MQW LEDs could be attributed to the decrease of QCSE and NRCs.     

具有超晶格应力调制结构的绿光InGaN/GaN多量子阱的发光特性

研究了具有InGaN/GaN超晶格(SL)插入结构的绿光InGaN/GaN多量子阱(MQW)的发光特性。结构测试表明,SL插入结构并没有引起MQW中平均In组份的增加,而是改变了In组份的分布,形成了高In组份的量子点和低In组份量子阱。其电致发光(EL)谱和光致发光(PL)谱均出现了双发光峰。我们认为这两个 峰分别来自于量子点和量子阱,且存在着载流子从阱向点转移的输运机制。最后变温PL积分强度的Arrhenius 拟合表明,SL插入结构并没有在MQW中引入新的缺陷,使其发光效率下降。     

硅衬底生长的InGaN/GaN多层量子阱中δ型硅掺杂n-GaN层对载流子复合过程的调节作用

为了解决在单晶硅衬底上生长的InGaN/GaN多层量子阱发光二极管器件发光效率显著降低的问题,使用周期性δ型Si掺杂的GaN取代Si均匀掺杂的GaN作为n型层释放多层界面间的张应力。采用稳态荧光谱及时间分辨荧光谱测量,提取并分析了使用该方案前后的多层量子阱中辐射/非辐射复合速率随温度（10~300 K）的变化规律。实验结果表明引入δ-Si掺杂的n-GaN层后,非辐射复合平均激活能由（18±3）meV升高到（38±10）meV,对应非辐射复合速率随温度升高而上升的趋势变缓,室温下非辐射复合速率下降,体系中与阱宽涨落有关的浅能级复合中心浓度减小,PL峰位由531 nm左右红移至579 nm左右,样品PL效率随温度的衰减受到抑制。使用周期性δ型Si掺杂的GaN取代Si均匀掺杂的GaN作为生长在Si衬底上的InGaN/GaN多层量子阱LED器件n型层,由于应力释放,降低了多层量子阱与n-GaN界面、InGaN/GaN界面的缺陷密度,使得器件性能得到了改善。