辉光放电发射光谱法测定硅钢薄板中微量硼元素

通过对辉光放电发射光谱参数的优化,以铁元素为内标来消除基体效应,建立了测定硅钢薄板中微量硼元素的方法.优化的实验参数为:放电电压1200V,放电电流50 mA,预溅射时间40 s,积分时间1o s.校准曲线硼元素含量范围0.0001％～0.022％,相关系数大于0.999,测量结果与认定值一致,相对标准偏差小于10％....     

A miniature planar magnetron glow discharge source for analysis of submicroliter volume aqueous samples using atomic emission spectroscopy

A miniature planar magnetron glow discharge source with a chamber volume of 60 ml has been designed and evaluated for the analysis of less than 1 μl of aqueous samples by atomic emission spectroscopy. Limits of detection for magnesium, silver, boron, europium and copper in the presence of a magnetic field are observed to be 3 to 40 times lower than for the source without a magnetic field when the measurements are made under the compromised discharge conditions for each type of source. Emission intensity in the presence of the magnetic field is found to increase as a square function of the discharge current. The improved detection limits for the magnetically enhanced glow discharge source are attributed to the increased current density of the discharge in the presence of the magnetic field which formed a plasma ring localized above the cathode surface. An RSD in the range 15–25% is observed for these measurements.     

New hardware for radio frequency powered glow discharge spectroscopies and its capabilities for analytical applications

A new radio frequency (rf) hardware is developed for glow discharge spectroscopic methods. The resulting features and its capabilities for analytical applications are discussed. The electrical equipment developed allows to work as quickly, stably, reliably and easily as known from the direct current (dc) mode. Moreover, the rf power measurement has been improved. The hardware has been developed, optimised and tested for glow discharge optical emission spectroscopy (GDOES), but nevertheless it is possible to use it for all procedures applying glow discharge sources.     

New hardware for radio frequency powered glow discharge spectroscopies and its capabilities for analytical applications

A new radio frequency (rf) hardware is developed for glow discharge spectroscopic methods. The resulting features and its capabilities for analytical applications are discussed. The electrical equipment developed allows to work as quickly, stably, reliably and easily as known from the direct current (dc) mode. Moreover, the rf power measurement has been improved. The hardware has been developed, optimised and tested for glow discharge optical emission spectroscopy (GDOES), but nevertheless it is possible to use it for all procedures applying glow discharge sources.     

Bias-current modulation technique of a radio-frequency glow discharge plasma for atomic emission analysis associated with a fast Fourier transform analyzer

A measuring method using a fast Fourier transform (FFT) analyzer is suggested to estimate the emission intensity from a radio-frequency (RF)-powered glow discharge plasma for atomic emission analysis. The FFT analyzer has an ability to disperse the components by frequency from an overall signal, and thus works as a selective detector in modulation spectroscopy. In the RF glow discharge plasma, a dc bias current can be introduced by connecting an external electric circuit with the discharge lamp, which predominantly enhances the emission intensities. Further, the bias current can be pulsated with a switching device to modulate the emission intensities, and then the modulated component was selectively detected with the FFT analyzer. This method greatly improved the data precision. The emission intensity of the Cu I 324.75-nm line in an Fe-based alloy sample containing 0.043 mass% Cu could be estimated with a relative standard deviation of 0.20%. The 3σ detection limits of Cu in Fe-based alloys could be obtained to be 2.3 × 10^− 6 mass% Cu for Cu I 324.75 nm and 6.8 × 10^− 6 mass% Cu for Cu I 327.40 nm.     

The impact of molecular emission in compositional depth profiling using Glow Discharge-Optical Emission Spectroscopy

The scope of this paper is to investigate and discuss how molecular emission can affect elemental analysis in glow discharge optical emission (GD-OES), particularly in compositional depth profiling (CDP) applications. Older work on molecular emission in glow discharges is briefly reviewed, and the nature of molecular emission spectra described. Work on the influence of hydrogen in the plasma, in particular elevated background due to a continuum spectrum, is discussed. More recent work from sputtering of polymers and other materials with a large content of light elements in a Grimm type source is reviewed, where substantial emission has been observed from several light diatomic molecules (CO, CH, OH, NH, C₂). It is discussed how the elevated backgrounds from such molecular emission can lead to significant analytical errors in the form of “false” depth profile signals of several atomic analytical lines. Results from a recent investigation of molecular emission spectra from mixed gases in a Grimm type glow discharge are presented. An important observation is that dissociation and subsequent recombination processes occur, leading to formation of molecular species not present in the original plasma gas. Experimental work on depth profiling of a polymer coating and a thin silicate film, using a spectrometer equipped with channels for molecular emission lines, is presented. The results confirm that molecular emission gives rise to apparent depth profiles of elements not present in the sample. The possibilities to make adequate corrections for such molecular emission in CDP of organic coatings and very thin films are discussed.     

Glow characterization in direct current plasma polymerization of trimethylsilane

Plasma polymerization of trimethylsilane (TMS) was carried out in a direct current (dc) glow discharge and was investigated by optical photography and plasma diagnostic techniques including optical emission spectroscopy and residual gas analysis. The nature of the glow formed in TMS discharge, which deposited plasma polymers, was significantly different from that of a simple gas such as Ar. In an Ar discharge, the dominant glow was the well known negative glow, which developed at a distinctive distance from the cathode, whereas the cathode surface remained in the dark space. In strong contrast to this situation, in TMS dc discharge the dominant or primary glow was the cathode glow, which appeared at the cathode surface. At a similar location where the Ar negative glow appeared, a very feeble glow as a secondary glow was also observed in TMS glow discharge. The deposition results and plasma diagnosis data evidently indicated that in TMS glow discharge, the cathode glow resulted from the low‐energy electron‐impact dissociation of TMS molecules that creates polymerizable species, but the negative glow was related to nonpolymerizable species such as hydrogen atoms and molecules. In this article, the cathode glow formed in glow discharges of organic compounds was designated as the dissociation glow according to its underlying plasma reactions. © 2004 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 42: 1042–1052, 2004     

Detection of negative ions in glow discharge mass spectrometry for analysis of solid specimens

A new method is presented for elemental and molecular analysis of halogen-containing samples by glow discharge time-of-flight mass spectrometry, consisting of detection of negative ions from a pulsed RF glow discharge in argon. Analyte signals are mainly extracted from the afterglow regime of the discharge, where the cross section for electron attachment increases. The formation of negative ions from sputtering of metals and metal oxides is compared with that for positive ions. It is shown that the negative ion signals of F^? and TaO₂F^? are enhanced relative to positive ion signals and can be used to study the distribution of a tantalum fluoride layer within the anodized tantala layer. Further, comparison is made with data obtained using glow-discharge optical emission spectroscopy, where elemental fluorine can only be detected using a neon plasma. The ionization mechanisms responsible for the formation of negative ions in glow discharge time-of-flight mass spectrometry are briefly discussed.     

Collisional–radiative model for the sputtered copper atoms and ions in a direct current argon glow discharge

A collisional–radiative model is developed for various levels of the sputtered copper (Cu) atoms and their ions in an argon (Ar) direct current glow discharge, used as an analytical source for optical emission spectrometry. In this application, attention is paid to the photons emitted by sputtered atoms and ions, and hence to the behavior of excited levels of these species. 8 Cu atomic and 7 Cu⁺ ionic levels are considered in the model, as well as the Cu²⁺ ions. Typical results of the model are the level populations (in two dimensions) of the various levels, and the relative contributions of the different populating and depopulating processes. This model is not only of interest for analytical glow discharge optical emission spectrometry, but also for plasma diagnostic tools and for copper–vapor lasers.     

Plasma diagnostics of an analytical Grimm-type glow discharge in argon and in neon: Langmuir probe and optical emission spectrometry measurements

Comparative investigations were performed on a Grimm-type glow discharge source by Langmuir probe measurements and by optical emission spectrometry. The Langmuir probe measurements yielded electron temperatures and number densities of electrons, whereas the optical emission spectrometry measurements resulted in data for excitation and ionization temperatures of different species. The results confirm that there is no local thermal equilibrium in the discharge plasma. The operating conditions of the glow discharge source and also the working gas and the cathode material were varied to investigate their influence on the plasma parameters. The outcome of the plasma diagnostics will be used to improve the modelling of relevant excitation and ionization processes by computer simulation. The major physical processes in the low pressure glow discharge plasma should be better understood if the analytical capability of this spectrochemical excitation and ionization source has to be further enhanced.     

Radio-frequency glow discharge ion source for high resolution mass spectrometry

A radio-frequency powered glow discharge ion source has been developed for a double-focusing mass spectrometer. The sputtering and ionization of conducting, semiconducting and insulating materials have been realized using a 13.56 MHz generator to supply the discharge operating potential. The glow discharge ion source operates stably at argon pressures of 0.1–1 hPa and radio frequency powers of 10–50 W. The influence of discharge parameters and gas inlet system on sputtering rates and ion signal intensities for semi-insulating gallium arsenide wafers has been investigated.     

Evaluation of open-air type electrolyte-as-cathode glow discharge-atomic emission spectrometry for determination of trace heavy metals in liquid samples

Electrolyte-as-cathode glow discharge-atomic emission spectrometry (ELCAD-AES) has been used for on-line determination of trace heavy metals in tap and drinking waters and fresh milk. The fundamental characteristics are: pH of electrolytes; discharge current; discharge gap shown influenced the plasma stability; and the intensity of emission lines emitted from different elements of solution. A stable discharge plasma which significantly improved the sensitivity was achieved when approximately 1.6 kV, several tens of milli-amperes current and a few millimeters discharge gap between the Pt rod anode and acidified electrolyte cathode in atmospheric air pressure were applied. Although the OH band dominates the solution spectra between wavelengths of 300 and 700 nm, nine elements including Pb and Cu have been determined from freshly collected unspiked tap and drinking waters and fresh milk. The limits of detection (LOD) of Hg, Pb, Cd, Cu, Na and K were obtained as 0.001–0.08 mg/l. The open-air ELCAD has used for the first time for Hg, Cd, Na and K detection and an improved LOD of Pb was found compared to reported values. The LOD values of Hg, Pb, Cd and Cu improved by more than one order of magnitude compared to closed-type ECLAD.     

Measurement of isotope ratios in solids by glow discharge mass spectrometry

A commercial thermion mass spectrometer has been modified for glow discharge mass spectrometry. GDMS isotope ratio measurements on osmium, uranium, and boron containing samples are compared with TIMS measurements.     

Radio frequency glow discharge source with integrated voltage and current probes used for sputtering rate and emission yield measurements at insulating samples

Radio frequency glow discharge optical emission spectroscopy (RF-GD-OES) is routinely used for the chemical analysis of solid samples. Two independent electrical signals from the discharge are required for quantification. When sputtering insulating samples, the voltage over the discharge is not directly measurable. The coupling capacity of the sample is required in order to calculate the discharge voltage. A procedure is outlined where the coupling capacity is determined using an electrical measurement without discharge. The calculated time-dependent discharge voltage and current are evaluated using a plasma equivalent circuit. An insulating sample is sputtered at constant cathode voltage and current. The emission yield for an aluminium line is comparable to that of conducting reference material.     

Precise determination of manganese in steel by dc glow discharge optical emission spectrometry associated with voltage modulation technique

A voltage modulation technique was applied for the precise and accurate determination of manganese in steels in dc glow discharge optical emission spectrometry. Emission signals from the glow discharge plasma are modulated by a cyclic variation of the discharge voltage so that only the desired signals can be detected at very low noise levels by using a lock-in amplifier. Mn determination in low-alloyed steels was performed to estimate the repeatability of the analytical result. For each measurement, the relative standard deviation (R.S.D.) of the intensities of the Mn I 403.08-nm line was ca 0.1% when a steel sample containing 0.329 mass% Mn was employed. Averaging all analytical values, which are obtained in various discharge conditions, yields statistical information on the precision and accuracy of the analytical values obtained. The relative error from the recommended value is calculated to be 0.5%. The R.S.D. over the analytical values is 1.5%, representing the overall analytical performance of this technique.     

Microsecond-pulse glow discharge atomic emission

A microsecond pulsed glow discharge was produced with high pulse magnitude and small duty cycle. Time resolved emission and absorption spectroscopy was applied to study the processes of atomization, excitation and ionization in the glow discharge. Experimental results show that, without overheating the sample, the emission peak intensity is several orders greater than that obtained in the conventional dc mode. This implies that a much more intense plasma is generated during pulsed "on" region.     

射频供能辉光放电原子发射光谱分析导体的基本特性

自行设计组装了射频供能辉光放电原子发射光谱仪器(rf-GD-AES),并对其分析导体试样的基本特性(包括光源的稳定性、电学特性和光谱特性)进行了研究。在此基础上建立了rf-GD-AES分析导电试样的方法,并用于铜合金标准样品中的A l和Mn的分析,其测定结果与标准值吻合很好,充分地显示了rf-GD-AES在固体样品直接分析中的潜力。     

Excitation of singly-ionized argon species in helium-matrix Grimm glow discharge plasmas II – Comparison between argon and neon

A considerable intensity enhancement of several Ar II lines assigned to the 3p(4)4p-3p(4)4s transition in a helium-argon Grimm glow discharge plasma has been previously reported and attributed to argon ions excited by metastable helium atoms. In this paper the behavior of Ne II lines assigned to the 2p(4)3p-2p(4)3s transition in a helium-neon plasma was investigated to obtain detailed information on the excitation of plasma gases in the helium-matrix plasmas. No Ne II lines with enhanced emission intensities have been found; on the contrary, the intensities of the doublet Ne II lines decreased in the helium-matrix plasma.     

Reduction of supported noble-metal ions using glow discharge plasma

A novel plasma reduction method has been developed to reduce supported noble-metal ions without the use of any reducing chemicals. H2PtCl6, PdCl2, AgNO3, and HAuCl4 supported on nonporous TiO2 and porous gamma-Al2O3 and HZSM-5 were reduced using an Ar glow discharge plasma. Optical absorption spectra and X-ray photoelectron spectroscopy show that the supported metal ions are completely reduced to metallic species. Transmission electron microscopy shows that the prepared metals are amorphous clusters and homogeneously distributed with nanoscale sizes. X-ray diffraction also confirms that the plasma-reduced metals exist as small crystallites or amorphous clusters. Thermal annealing of plasma-reduced samples at elevated temperature transforms the clusters into crystals with a slight increase in particle sizes, but the sizes are still smaller than those of H2-reduced metals. O2 glow discharge plasma can also reduce noble-metal ions, accompanied by production of a small amount of oxides. Plasma reduction is very promising for the preparation of metal nanoparticles and supported metal catalysts.     

辉光放电光谱法定量分析金属材料表面纳米级薄膜的研究

介绍了利用辉光放电光谱法分析金属材料表面的纳米级薄膜。通过优化辉光光源的放电参数，计算标准样品的溅射率。溅射率经校正后，建立各元素的标准工作曲线，从而形成了纳米级薄膜的定量表面分析方法。试验证明，此方法对膜厚的测定具有很好的准确度和精密度，可应用于多种金属材料表面纳米级薄膜的研究。