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辉光放电光谱法定量分析金属材料表面纳米级薄膜的研究
引用本文:何晓蕾,张毅,蓝闽波,陈英颖,邬君飞,王艳萍.辉光放电光谱法定量分析金属材料表面纳米级薄膜的研究[J].理化检验(化学分册),2006,42(9):693-698.
作者姓名:何晓蕾  张毅  蓝闽波  陈英颖  邬君飞  王艳萍
作者单位:1. 华东理工大学,分析测试中心,上海,200237
2. 宝钢研究院,上海,201900
摘    要:介绍了利用辉光放电光谱法分析金属材料表面的纳米级薄膜。通过优化辉光光源的放电参数,计算标准样品的溅射率。溅射率经校正后,建立各元素的标准工作曲线,从而形成了纳米级薄膜的定量表面分析方法。试验证明,此方法对膜厚的测定具有很好的准确度和精密度,可应用于多种金属材料表面纳米级薄膜的研究。

关 键 词:辉光放电光谱法  纳米级薄膜  表面分析
文章编号:1001-4020(2006)09-0693-05
收稿时间:2005-09-27
修稿时间:2005年9月27日

STUDY OF ANALYSIS OF NANO FILM ON METAL SURFACE BY GLOW DISCHARGE EMISSION SPECTROMETRY
HE Xiao-lei,ZHANG Yi,LAN Min-bo,CHEN Ying-ying,WU Jun-fei,WANG Yan-ping.STUDY OF ANALYSIS OF NANO FILM ON METAL SURFACE BY GLOW DISCHARGE EMISSION SPECTROMETRY[J].Physical Testing and Chemical Analysis Part B:Chemical Analgsis,2006,42(9):693-698.
Authors:HE Xiao-lei  ZHANG Yi  LAN Min-bo  CHEN Ying-ying  WU Jun-fei  WANG Yan-ping
Institution:1. Testing and Analysis Center, East China University of Science and Engineering, Shanghai 200237, China 2. Baosteel Research Institute, Shanghai 201900, China
Abstract:A method of glow discharge(GD) emission spectrometry for the analysis of nano film on metal surface was discribed in this paper.Analytical parameters of the GD source were optimized.The sputtering yield was experimentally determined for establishing corrected calibration curves.It was experimentally verified that the proposed method has good accuracy and precision in film thickness determination.The method has been applied to the analysis of nano film on the surface of several metal meterials.
Keywords:Glow discharge emission spectrometry  Nano film  Surface analysis
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