用毛细微模塑法制造无机盐及聚合物的微结构

软刻蚀;弹性印章;聚二甲基硅氧烷;用毛细微模塑法制造无机盐及聚合物的微结构     

微热模塑法制备聚苯乙烯球面微透镜阵列

用软刻蚀中的微热模塑技术制备聚苯乙烯(PS)微立方体阵列, 再利用材料在液态或熔融状态时其表面自由能会不断地减小直至最低从而达到最稳定的状态这一特性, 通过加热熔融方法成功地将PS微立方体结构变成了PS微半球体结构, 光学成像测试验证了PS微半球体阵列具有良好的光学成像功能, 可以作为微透镜阵列使用. 用微热模塑技术制备高聚物的微透镜阵列, 其过程简单, 成本低, 适用于很多材料, 所制备的微透镜阵列结构精确度高, 并因所用到的模具为弹性印章, 有望在非平面上制备微透镜阵列, 为微透镜阵列的制备提供了一种新的途径.     

ITO基底上ZnO薄膜的制备以及刻蚀图形的扫描电化学显微镜表征

在氧化铟锡(ITO)导电玻璃的衬底上,利用直接电沉积方法制备了ZnO纳米线或ZnO薄膜.然后利用存储有HCI刻蚀剂的琼脂糖微图案印章对其进行了化学刻蚀以形成不同的图形.利用扫描电子显微镜(SEM)、X射线衍射(XRD)和扫描电化学显微镜(SECM)分别对ITO衬底上的ZnO薄膜的结构、形貌和电化学性质进行表征.     

用微模塑直接在聚合物曲面上制备微图形

用聚二甲基硅氧烷制备的,表面复制有微图形的"弹性印章"直接在聚乙烯,聚丙烯,聚苯乙烯和聚甲基丙烯酸甲酯等热塑性聚合物表面上进行热微模塑,无需复杂设备并可在普通实验室条件下,复制微图形,甚至在小试管外壁的曲面上或在用毛细管形成的微突起表面上也能制备出微曲面图形.讨论了不同聚合物对生成微图形的影响,认为结晶性聚合物以及在温度变化时有较大收缩率的聚合物在微模塑中难以获得清晰图形.无定形聚合物如聚苯乙烯和聚甲基丙烯酸甲酯等能够获得清晰的微结构.     

有机硅橡胶/蒙脱土纳米复合弹性印章的制备

聚二甲基硅氧烷硅橡胶(PDMS)是用于制作软刻蚀技术[1,2]中弹性印章的最常用材料, 但使用单一的硅橡胶制作的印章存在易变形、易溶胀等缺点. 本文用有机蒙脱土(MMT)和硅橡胶进行插层纳米复合改性, 用树脂固化仪对复合体系进行固化行为分析和固化配方优化, 并对复合材料的耐溶胀性能及其弹性印章的表面形貌进行观察比较.     

软光刻技术制备液晶显示用定向层

以偶氮聚合物光致表面起伏光栅为模板,制备聚二甲基硅氧烷(PDMS)弹性印章,再以可溶性聚酰亚胺(PI)为“墨水”,在石英玻璃上压印出具有规则起伏结构的PI薄膜.由此制备的PI薄膜显示出很好的使液晶分子定向排列的效果.此方法成本低、效率高,是一种实用的液晶定向层薄膜制备方法.     

软刻蚀及其应用

软刻蚀是一类基于自组装和复制模塑等原理的非光刻微米和纳米加工方法。它为形成和制作微米、纳米图案提供了简便、有效、价廉的途径。在软刻蚀中，用一个表面带图案的弹性模板来实现图案的转移，其加工的分辨率可达30nm－100μm。软刻蚀是微接触印刷、复制模塑、转移微模塑、毛细微模塑、溶剂辅助微模塑等的总称。本文将简介软刻蚀的原理、方法以及它们在微米和纳米加工、微电子学、材料科学、光学、微电子机械系统、表面化学等方面的应用。     

改进的微乳液聚合制备的聚甲基丙烯酸甲酯的力学和光学性能研究

研究了改进的微乳液聚合方法制备的聚甲基丙烯酸甲酯(PMMA)的力学和光学性能, 并与本体聚合制备的PMMA相比较. 研究结果表明, 由改进的微乳液聚合制备的PMMA具有较高的Tg和富间规度, 在较宽的温度范围内具有较高的力学模量. 此外, 它的拉伸强度、拉伸模量及断裂伸长率均比本体聚合制备的PMMA样品高. PMMA的折光率与制备方法关系不大, 但由改进的微乳液聚合制备的PMMA样品消光系数更小, 更加透明. 这说明由改进的微乳液聚合方法制备的PMMA具有更广泛的应用前景.     

用规整膜板对砷化镓的三维微结构图形加工刻蚀

以微齿轮图形结构作为规整模板 ,用约束刻蚀剂层技术对GaAs样品表面进行了加工刻蚀 .在有捕捉剂H3AsO3存在的情况下 ,规则微齿轮图形能够很好地在样品表面复制 .刻蚀结果与没有捕捉剂存在时的刻蚀结果做了比较 .另外还测试了不同方法制得膜板的性能 ,初步探讨了电化学模板的制作工艺 .     

聚氨酯分子印章的制备和表征

“软平板印刷”微结构制备技术为微米和亚微米器件的制备提供了一条新的途径 [1] ,已被电子学家和材料学家所应用 ,近年来进入了生物学领域[2 ] .本实验室将这一方法与生物分子电子学相结合 ,提出了用于 DNA芯片在片合成的分子印章法 [3,4 ] .分子印章法的实质是接触压印与组合化学相结合的固相界面反应 .聚二甲氧基硅氧烷 ( PDMS)是一种软印刷的优良材料 [5] ,但是由于其疏水性和较差的机械性能 ,必须对其进行改性才能用来制备 DNA分子印章 [6 ] .　　聚氨酯作为一种功能材料 ,由于分子中交替的软、硬链段及其不同的热动力学性能而形成…     

Micro/nanopatterning of proteins via contact printing using high aspect ratio PMMA stamps and nanoimprint apparatus

Micro- and nanoscale protein patterns have been produced via a new contact printing method using a nanoimprint lithography apparatus. The main novelty of the technique is the use of poly(methyl methacrylate) (PMMA) instead of the commonly used poly(dimethylsiloxane) (PDMS) stamps. This avoids printing problems due to roof collapse, which limits the usable aspect ratio in microcontact printing to 10:1. The rigidity of the PMMA allows protein patterning using stamps with very high aspect ratios, up to 300 in this case. Conformal contact between the stamp and the substrate is achieved because of the homogeneous pressure applied via the nanoimprint lithography instrument, and it has allowed us to print lines of protein approximately 150 nm wide, at a 400 nm period. This technique, therefore, provides an excellent method for the direct printing of high-density sub-micrometer scale patterns, or, alternatively, micro-/nanopatterns spaced at large distances. The controlled production of these protein patterns is a key factor in biomedical applications such as cell-surface interaction experiments and tissue engineering.     

A novel process for inking the stamp with biomacromolecule solution used in reactive microcontact printing

This paper describes a novel process for inking the stamp with biomacromolecule solution used in reactive microcontact printing. The stamp was first coated with biomacromolecule solution such as bovine serum albumin (BSA) solution for 20 min, and then dried by soft nitrogen flow. After cooling the stamp below the dew point for 1 min and incubated at room temperature for 10 s, a thin layer of condensed water was formed on the stamp surface. Then, an aldehyde functionalized glass slide was pressed immediately onto the stamp for certain time, yielding the covalently patterning of the biomacromolecules on the aldehyde-containing surface. A notable feature of this process is that the biomacromolecule solution can be inked onto the stamp at a controlled state, neither too “dry” nor too “wet”. As a result, the covalently grafting reaction can occur at a comparable speed with those in solution, while avoiding the contamination caused by dispersal of excessive solvent.     

Development of a colloidal lithography method for patterning nonplanar surfaces

A colloidal lithography method has been developed for patterning nonplanar surfaces. Hexagonal noncontiguously packed (HNCP) colloidal particles 127 nm-2.7 μm in diameter were first formed at the air-water interface and then adsorbed onto a substrate coated with a layer of polymer adhesive ～17 nm thick. The adhesive layer plays the critical role of securing the order of the particles against the destructive lateral capillary force generated by a thin film of water after the initial transfer of the particles from the air-water interface. The soft lithography method is robust and very simple to carry out. It is applicable to a variety of surface curvatures and for both inorganic and organic colloidal particles.     

D4(H)/D4(V) silicone: a replica material with several advantages for nanoimprint lithography and capillary force lithography

Reported are demonstrations that D(4)(H)/D(4)(V) silicone (the product of the platinum-catalyzed hydrosilylation reaction between tetramethylcyclotetrasiloxane and tetramethyltetravinylcyclotetrasiloxane) is useful and practical as a replica material for both nanoimprint lithography (NIL) and capillary force lithography (CFL). The multiple advantageous properties of this extremely cross-linked material include UV transparency (for photo NIL and photo CFL), thermal stability (for high printing temperatures), high modulus (for high printing pressures), low surface energy (for easy demolding), and low viscosity precursors (for replicating small scale features). The replication performance of this material was tested using Blu-ray discs with sub-25 nm features and anodized aluminum foil with sub-10 nm features. Structures of ～5 nm length scale on the surface of the anodized Al were replicated using D(4)(H)/D(4)(V) silicone as a mold material for CFL with a photocurable epoxy resin and for NIL with poly(methyl methacrylate) (PMMA). Features (holes in the anodized aluminum) with aspect ratios of greater than 9 were replicated.     

Versatile multilevel soft lithography method with micrometer alignment using all-flexible rubber stamps and moiré fringe technique

Soft lithography has gathered wide interest for the fabrication of unconventional micrometer and nanometer-sized structures and devices. Nevertheless, accurate alignment is essential to achieve multilevel soft lithography. Because of the soft nature of the stamp materials, such as soft polydimethylsiloxane, they are susceptible to mechanical distortions, which lower the registration accuracy. To reduce the distortions we backed the stamp with a polymer foil and minimized the overall forces applied to the stamp. We furthermore employed an alignment method using additive type moiré fringe technique that is easy to implement and does not require extensive processing steps. The alignment results show less than 1 μm misalignment when the stamp is brought again onto a previously structured rigid template. When performing two consecutive lithography steps by transfer printing of thin gold films, we were able to obtain average registration accuracy of 1.3 μm over an area of 400 mm(2). This method is versatile and can be used for several soft lithography techniques. Better results can be obtained with smaller moiré gratings and the use of harder materials.     

Fabrication of surface-patterned ZnO thin films using sol–gel methods and nanoimprint lithography

Surface-patterned ZnO thin films were fabricated by direct imprinting on ZnO sol and subsequent annealing process. The polymer-based ZnO sols were deposited on various substrates for the nanoimprint lithography and converted to surface-patterned ZnO gel films during the thermal curing nanoimprint process. Finally, crystalline ZnO films were obtained by subsequent annealing of the patterned ZnO gel films. The optical characterization indicates that the surface patterning of ZnO thin films can lead to an enhanced transmittance. Large-scale ZnO thin films with different patterns can be fabricated by various easy-made ordered templates using this combination of sol–gel and nanoimprint lithography techniques.     

Patterning biomolecules with a water-soluble release and protection interlayer

We report on a general lithography method for high-resolution biomolecule patterning with a bilayer resist system. Biomolecules are first immobilized on the surface of a substrate and covered by a release-and-protection interlayer of water-soluble polymer. Patterns can then be obtained by lithography with a spin-coated resist layer in a conventional way and transferred onto the substrate by reactive ion etching. Afterward, the resist layer is removed by dissolution in water. To demonstrate a high-resolution patterning, soft UV nanoimprint lithography has been used to produce high-density dot arrays of poly-(L-lysine) molecules on a glass substrate. Both fluorescence images and cell proliferation behaviors on such a patterned substrate have shown evidence of improved stability of biomolecule immobilization comparing to that obtained by microcontact printing techniques.     

Patterning of sol gel thin films by capillary force assisted soft lithographic technique

Patterning of sol gel based silica and silica–titania films has been developed at room temperature by soft lithographic technique. Corresponding metal alkoxides have been utilized for the preparation of precursor sols. Elastomeric stamps of polydimethylsiloxane (PDMS) are used to emboss patterns of a master grating on the as-prepared silica and silica–titania films obtained by sol gel process. Pressure-less capillary force lithography has been used to fabricate both 1-D and 2-D ordered structures of simple stripe patterns. A modified solvent assisted lithography and micro-molding in capillaries yielded stable and high fidelity 1-D structures for silica and silica–titania films over a large area.     

Photopatternable silicon elastomers with enhanced mechanical properties for high-fidelity nanoresolution soft lithography

Soft lithography has been widely used in stamping and printing processes for microfabrication as a low cost alternative to photolithography. However, conventional poly(dimethyl)siloxane (PDMS) stamp materials have limitations, especially in the submicrometer range, due to their low physical toughness and requirements for thermocuring. A new version of functional stamp materials with adjustable physical toughness has been developed for advanced soft lithography. We thus demonstrate here its photopatternability and nanoresolution soft lithography, which have proven to be difficult using commercial stamp materials.     

Polybenzoxazine as a mold-release agent for nanoimprint lithography

One of the most important tasks remaining to be resolved in nanoimprint lithography is the elimination of the resist sticking to the mold during demolding. Previously, the main approach was to apply a thin layer of fluorinated alkyl silane mold-release agent on the surface on the mold; however, this involves complicated steps and high costs. The low surface free energy material polybenzoxazine provides an efficient mold-release agent for silicon molds that is easier to process, costs less, and has no side reactions.