(1 1 0) oriented quantum wells and modulation-doped heterostructures for cleaved edge overgrowth

The dependence of the optical quality, i.e. the line width and homogeneity of (1 1 0) oriented quantum wells on the substrate temperature, the As pressure as well as on the As species is studied by means of micro-photoluminescence. Molecular beam epitaxial growth using the As dimer leads to a photoluminescence line width as narrow as 5.5 meV for 7 nm wide quantum wells compared to a value of 8 meV for the As tetramer source. In addition to the small line widths which can be achieved using As , quantum wells grown under these conditions are also superior to those using As in terms of uniformity on a m length scale. In contrast, the peak mobility of a two-dimensional electron system located at a (1 1 0) oriented GaAs/AlGaAs heterointerface of cm V s is obtained for tetramer growth, while the use of As degrades the electron mobility to values below 500 000 cm V s.     

Anisotropy of Two-Dimensional Electron and Hole Mobilities in (0 0 1) GaAs/Al x Ga 1− x As Heterostructures Under Uniaxial Stress

Transport properties of two-dimensional electron and hole gas at (0 0 1) GaAs/Al x Ga 1 m x As heterointerface in [1 1 0] and [1 m 1 0] directions have been investigated for the first time under in plane uniaxial compression up to 5 kbar. Resistivity, Shubnikov-de Haas oscillations and Hall effect were measured and carrier densities and mobilities were determined. The in-plane uniaxial compression significantly modifies the energy spectrum of p-GaAs/Al x Ga 1 m x As that leads to strong anisotropy of hole mobility under compression. In the case of the n-type heterostructure uniaxial compression causes only change of the carrier concentration and the corresponding small change of the initial mobility anisotropy, determined by anisotropic surface roughness scattering.     

Anisotropy of Long-term Resistivity Relaxations Induced in p -(0 0 1)GaAs/Al 0.5 Ga 0.5 As by Uniaxial Stress

Anisotropy of the piezoresistance relaxations has been observed in p -(0 0 1)GaAs/Al 0.5 Ga 0.5 As heterostructures. The character of relaxation process depends on the direction of the applied uniaxial compression: after loading along [1 m 1 0] direction the specimen resistance relaxes down to the lower magnitude while after loading along [1 1 0] direction it relaxes up to the higher magnitude. Shubnikov-de Haas oscillations and Hall effect measurements indicate that variation of the carrier concentration j N in the quantum well during relaxation processes has different signs for uniaxial compression along [1 m 1 0] and [1 1 0] directions and correlates with the corresponding change of the resistance. The piezoelectric field that in GaAs can reach the magnitude E =1.152 2 10 6 V/m at uniaxial stress P =1 kbar along d 1 1 0 ¢ directions is supposed to be responsible for the metastable state after loading (unloading) and redistribution of carriers during the relaxation process.     

(Ga,Mn)As光调制反射光谱

室温下我们研究了稀磁半导体(Ga,Mn)As的光调制反射(PR)光谱,观测到来自样品的Franz-Keldysh振荡(FKO)信号。随着Mn原子浓度的增加,PR线形展宽,但是临界点E₀和E₀+Δ₀没有明显的移动。根据FKO振荡数据,计算得到样品表面电场强度随Mn原子掺杂浓度的增加而增强。测量到与Mn原子掺杂相关的杂质带,其能量位置离GaAs价带边~100 meV。根据样品的表面电场强度和表面耗尽层模型,估算样品的空穴浓度为~10¹⁷cm^-3,较低的空穴浓度可能与样品具有较低的居里温度有关,或测量的PR信号来自于样品中外延层的部分耗尽区域。     

Carrier spin polarization in ferromagnet-semiconductor (Ga,Mn)As/GaAs structures

The effect of ferromagnetic layers on the spin polarization of holes and electrons in ferromagnet-semiconductor superlattices with a fixed Mn δ-layer thickness of 0.11 nm and different GaAs interlayer thicknesses varying in the range from 2.5 to 14.4 nm and a fixed number of periods (40) is studied by means of hot-electron photoluminescence (HPL). Here, our study of the HPL demonstrates that the holes in δ-layers of (Ga,Mn)As DMS occupy predominantly the Mn acceptor impurity band. The width of the impurity band decreases with the increase of the interlayer distance. We also found that an increase in the GaAs interlayer thickness softens the magnetic properties of the ferromagnetic layers as well as reduces the carrier polarization. It is demonstrated that the hole spin polarization in the DMS layers and spin polarization of electrons in nonmagnetic GaAs are proportional to the sample magnetization.     

Light hole transport in a strained GaAs/In0.18Ga0.82As quantum well at high pressures

Abstract

Here we report what we believe to be the first observation of the pressure dependence of the light hole behavior in a modulation doped In_0.18Ga_0.82As/GaAs single strained quantum well grown by MBE. Transport measurements have been undertaken as a function of temperature (4–300K) and hydrostatic pressure (4–8kbar). Hole mobilities of ～17000 cm²/Vs have been obtained for sheet carrier densities of ～3.3×10¹¹ cm^?2. At low temperatures (<100K) persistent photogenerated holes have been observed. The hole mobility is found to decrease with increasing pressure at a rate intermediate between that typically observed for holes and electrons in bulk III-V semiconductors.     

Growth of three-dimensional quantum dot crystals on patterned GaAs (0 0 1) substrates

The growth of a three-dimensional (3D) InAs quantum dot (QD) crystal on a patterned GaAs (0 0 1) substrate is demonstrated. The morphology of QDs grown on a surface patterned with shallow holes is studied as a function of the amount of deposited InAs. We observe that the QDs form in the patterned holes close to each other forming lateral QD bimolecules for InAs coverages below the commonly observed critical thickness of 1.6 monolayers. When the coverage increases, the QD bimolecules coalesce to form larger single QDs. The QDs in the holes are then capped with a Ga(Al)As spacer. The buried QD array serves as a strain template for controlling the formation site of the QDs in the second layer. By tuning the growth conditions for the second and subsequent layers, we achieve a 3D InAs QD crystal with a high degree of perfection. A detail investigation of the growth on hole patterns with different periodicities is presented.     

(Ga,Mn)As 体系中Mn自补偿效应的第一性原理研究

基于密度泛函理论的赝势平面波方法计算了处于填隙位置磁性原子(MnI)对(Ga,Mn) As体系电子结构和磁性的影响. 计算结果表明MnI在GaAs中是施主；代替Ga位的MnGa 与MnI的自旋按反铁磁序排列；静电相互作用使MnGa，MnI倾向于形成MnGa_MnI对. MnI的存在一方面补偿了(Ga,Mn)As中的空穴，降低了空穴浓度；同时还使邻近的MnG a失活. MnI的存在对获得高居里温度的(Ga,Mn)As是极为不利的. 关键词： (Ga Mn)As 稀磁半导体 密度泛函理论     

(GaAs)n(n=1-4)原子链电子输运性质的理论计算

本文利用密度泛函理论结合非平衡格林函数的方法, 对 (GaAs)_n(n=1-4)直线原子链与Au(100)-3×3两半无限电极耦合构成Au-(GaAs)_n-Au纳米结点的电子输运性质进行了第一性原理计算. 在各结点拉伸过程中, 对其结构进行了优化, 得到各结点稳定平衡结构时Ga-As的平均键长分别为0.220, 0.224, 0.223, 0.223 nm, 平衡电导分别为2.328G₀, 1.167G₀, 0.639G₀, 1.237G₀; 通过对结点投影态密度的计算, 发现电子传输主要是通过Ga, As原子中p_x与p_y电子轨道相互作用形成的π键进行的. 在0-2 V的电压范围内, 对于(GaAs)_n(n=1-3)的原子链的电流随电压增大而增大, I-V曲线呈线性关系, 表现出类似金属导电行为; 对于(GaAs)₄原子链在0.6-0.7 V, 0.8-0.9 V的电压范围内却存在负微分电阻现象.     

Structure and photoluminescence study of type-II GaAs quantum wires and dots grown on nano-faceted (3 1 1)A surface

(3 1 1)A GaAs/AlAs corrugated superlattices (CSLs) and satellite (3 1 1)B and (1 0 0) SLs were studied using Raman spectroscopy, high-resolution transmittance electron microscopy (HRTEM) and photoluminescence (PL). The thickness of GaAs layers was varied from 1 monolayer (ML) to 10 ML, the thickness of AlAs barriers was 10 ML in (3 1 1) direction. The strongest modification of the Raman spectra is found for the case of partial (<1 nm) GaAs filling of the AlAs surface. The calculated and experimental Raman spectra demonstrated a good agreement for both complete (1 nm) and partial (<1 nm) GaAs filling of the AlAs surface. According to Raman and HRTEM data, in the case of partial filling of (3 1 1)A AlAs surface, GaAs forms quantum well wires of finite length (quantum dots). A drastic difference of PL from grown side-by-side (3 1 1)A and (3 1 1)B SLs was observed. A strong room temperature PL in the green–yellow spectral region was observed in GaAs/AlAs (3 1 1)A CSLs containing GaAs type-II quantum dots.     

GaAs/AlAs super-flat interfaces in GaAs/AlAs and GaAs/(GaAs) (AlAs) quantum wells grown on (4 1 1)A GaAs substrates by MBE

Effectively atomically flat GaAs/AlAs interfaces over a macroscopic area (“super-flat interfaces”) have been realized in GaAs/AlAs and GaAs/(GaAs) (AlAs) quantum wells (QWs) grown on (4 1 1)A GaAs substrates by molecular beam epitaxy (MBE). A single and very sharp photoluminescence (PL) peak was observed at 4.2 K from each GaAs/AlAs or GaAs/(GaAs) (AlAs) QW grown on (4 1 1)A GaAs substrate. The full-width at half-maximum (FWHM) of a PL peak for GaAs/AlAs QW with a well width ( ) of 4.2 nm was 4.7 meV and that for GaAs/(GaAs) (AlAs) QW with a smaller well width of 2.8 nm (3.9 nm) was 7.6 meV (4.6 meV), which are as narrow as that for an individual splitted peak for conventional GaAs/AlAs QWs grown on (1 0 0) GaAs substrates with growth interruption. Furthermore, only one sharp peak was observed for each GaAs/(GaAs) (AlAs) QW on the (4 1 1)A GaAs substrate over the whole area of the wafer (7 7 mm ), in contrast with two- or three-splitted peaks reported for each GaAs/AlAs QW grown on the (1 0 0) GaAs substrate with growth interruption. These results indicate that GaAs/AlAs super-flat interfaces have been realized in GaAs/AlAs and GaAs/(GaAs) (AlAs) QWs grown on the (4 1 1)A GaAs substrates.     

Zn在Ga1-xAlxAs中的扩散规律

本文论述了在720℃～750℃的温度下,Zn在Ga1-xAlxAs,GaAs中的扩散。研究了结深x1,随片子表面Al组份x值的变化规律。实验表明在同一扩散条件下,Ga1-xAlxAs与GaAs两种材料的结深xj并不相同。在此基础上获得了Al组份x=0.34的最佳扩散条件。     

InAs/GaAs单量子点中电子/空穴自旋弛豫

利用分子束外延制备了三种类型量子点样品,它们分别是:未掺杂样品、n型Si调制掺杂样品和p型Be调制掺杂样品。在5 K温度下,采用共聚焦显微镜系统,测量了单量子点的光致发光谱和时间分辨光谱, 研究了单量子点中三种类型激子(本征激子、负电荷激子和正电荷激子)的电子/空穴自旋翻转时间。它们的自旋翻转时间常数分别为: 本征激子的自旋翻转时间约16 ns, 正电荷激子中电子的自旋翻转时间约2 ns, 负电荷激子中空穴的自旋翻转时间约50 ps。     

GaAs衬底上生长的GaInP_2外延单晶薄膜的杂质污染研究

各种外延技术已被用来在ＧａＡｓ衬底上生长ＧａｘＩｎ１－ｘＰ外延单晶薄膜（ＧａＩｎＰ２／ＧａＡｓ）．很多文献认为,在ＧａＩｎＰ２／ＧａＡｓ生长过程中会被Ｃ杂质污染．我们用高灵敏的ＣＡＭＥＣＡＩＭＳ４Ｆ型二次离子质谱仪直接测量的结果表明,污染ＧａＩｎＰ２／ＧａＡｓ的微量杂质是Ｓｉ,而不是Ｃ．由ＧａＩｎＰ２／ＧａＡｓ在１．１７ｅＶ附近的光致发光峰的峰值随激发强度的变化形状表明了它应属于施主－受主对复合发光．进一步分析表明,施主为处在Ｇａ格位上的Ｓｉ杂质（ＳｉＧａ）,受主为Ｇａ空位（ＶＧａ）．     

Scanning tunneling microscopy luminescence from nanoscale surface of GaAs(1 1 0)

Scanning tunneling microscopy luminescence (STML) was induced from the nanometer scale surfaces of cleaved n-type and p-type GaAs(1 1 0) wafers by using of an ITO-coated optical fiber probe in an ultrahigh-vacuum chamber. The STML from n-type GaAs(1 1 0) surface was induced under negative sample bias when the applied bias exceeds a threshold voltage around −1.5 V. Whereas the STML from p-type GaAs(1 1 0) surface was induced under positive sample bias when the applied bias exceeds a threshold voltage around +1.5 V. The excitation energies at the threshold voltages are consistent with the band gap of GaAs (1.42 eV) at 295 K. The typical quantum efficiencies for n-type and p-type GaAs are about 3 × 10⁻⁵ and 2 × 10⁻⁴ photons/electron, respectively. The observed STML from are attributed to a radiative recombination of electron-hole pairs generated by a hole injection for n-type GaAs under negative sample bias and an electron injection for p-type GaAs under positive sample bias, respectively.     

Direct observation of tunneling emission to determine localization energies in self-organized In(Ga)As quantum dots

We report direct observation of tunneling emission of electrons and holes from In(Ga)As/GaAs QDs in time resolved capacitance spectroscopy. From the dependence of the tunneling time constant on the external electric field the important entire localization energies of electron and holes in In(Ga)As QDs are determined with high accuracy. The results yield electron and hole localization energies of and , respectively, which is in excellent agreement with 8-band k·p theory.     

Monte Carlo simulation for temperature dependence of Ga diffusion length on GaAs(0 0 1)

Diffusion length of Ga on the GaAs(0 0 1)-(2×4)β2 is investigated by a newly developed Monte Carlo-based computational method. The new computational method incorporates chemical potential of Ga in the vapor phase and Ga migration potential on the reconstructed surface obtained by ab initio calculations; therefore we can investigate the adsorption, diffusion and desorption kinetics of adsorbate atoms on the surface. The calculated results imply that Ga diffusion length before desorption decreases exponentially with temperature because Ga surface lifetime decreases exponentially. Furthermore, Ga diffusion length L along and [1 1 0] on the GaAs(0 0 1)-(2×4)β2 are estimated to be and L_[110]200 nm, respectively, at the incorporation–desorption transition temperature (T860 K).     

Morphological anisotropy during migration enhanced epitaxy of GaAs(0 0 1)

The GaAs(0 0 1) surface morphology and structure during growth by migration enhanced epitaxy (MEE) has been studied by reflection high energy electron diffraction and scanning tunneling microscopy. Changes induced by varying the incident As/Ga flux ratio, growth temperature and the total amount of material deposited in each cycle have been studied and the results compared with GaAs(0 0 1) growth by conventional molecular beam epitaxy (MBE). Comparison of the surface morphology at the end of the Ga and As cycles indicates no clear evidence for any enhancement in the Ga adatom diffusion length during the Ga cycle. However, the morphological anisotropy of the growth front does change significantly and it is proposed that this changing anisotropy during MEE enables Ga adatom diffusion along both azimuths. The surface anisotropy during MEE growth is found to increase with the Ga/As ratio. Although there is a clear correlation between composition and morphology, we have also found that highly ordered and flat surfaces are not necessarily an indication of stoichiometric material. We also attempt to clarify a recent controversy on the structure of the c(4 × 4) reconstruction by studying the surface structure at the end of the As cycle as a function of the As/Ga ratio.     

Spacer layer thickness fluctuation scattering in a modulation-doped Al_xGa_1-xAs/GaAs/Al_xGa_1-xAs quantum well

We theoretically study the influence of spacer layer thickness fluctuation(SLTF) on the mobility of a twodimensional electron gas(2DEG) in the modulation-doped Al x Ga 1 x As/GaAs/Al x Ga 1 x As quantum well.The dependence of the mobility limited by SLTF scattering on spacer layer thickness and donor density are obtained.The results show that SLTF scattering is an important scattering mechanism for the quantum well structure with a thick well layer.     

Oxide-apertured VCSEL with short period superlattice

Novel distributed Bragg reflectors (DBRs) with 4.5 pairs of GaAs/AlAs short period superlattice (SPS)used in oxide-apertured vertical-cavity surface-emitting lasers (VCSELs) were designed. The structure of a 22-period Al0.9Ga0.1As (69.5 nm)/4.5-pair [GaAs (10 nm)-AlAs (1.9 nm)] DBR was grown on an n+ GaAs substrate (100) 2° off toward (111)A by molecular beam epitaxy. The emitting wavelength was 850 nm with low threshold current of about 2 mA, corresponding to the threshold current density of 2 kA/cm2. The maximum output power was more than 1 mW. The VCSEL device temperature was increased by heating ambient temperature from 20 to 100 ℃ and the threshold current increased slowly with the increase of temperature.