|
|||||
|
|
Mesoporous Silica Sputter‐Coated onto ITO: Electrochemical Processes,Ion Permeability,and Gold Deposition Through NanoPores |
|
| Authors: | Anne Vuorema Mika Sillanpää Karen J Edler Robben Jaber Sara E C Dale Simon Bending Yunfeng Gu Kamran Yunus Adrian C Fisher Frank Marken |
| Institution: | 1. Department of Chemistry, University of Bath, Claverton Down, Bath BA2?7AY, UK;2. Laboratory of Green Chemistry, Faculty of Technology, Lappeenranta University of Technology, Patteristonkatu 1, FI‐50100 Mikkeli, Finland;3. Department of Physics, University of Bath, Claverton Down, Bath BA2?7AY, UK;4. Department of Chemical Engineering, University of Cambridge, New Museums Site, Pembroke Street, Cambridge, CB2?3RA, UK |
| Abstract: | “Simple” silica films of 50 nm and 100 nm thickness are sputter‐coated onto ITO substrates and shown to be structured with in‐planed features of ca. 15 nm and pores <5 nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)64? in aqueous KNO3 strongly depends on the electrolyte concentration. Poly‐cationic poly(diallyl‐dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of “discs”. Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements. |
| Keywords: | Tin‐doped indium oxide Silica Sputter‐coating Membrane Voltammetry Gold Electrodeposition Poly‐electrolyte Membrane sensor |