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Effect of nanostructured AlN coatings on the oxidation-resistant properties of optical diamond films
Authors:H Zhang  JM Liu
Institution:a Physics Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
b School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China
Abstract:Diamond film is an ultra-durable optical material with high thermal conductivity and good transmission in near-infrared and far-IR (8-14 μm) wavebands. CVD diamond is subjected to oxidation at temperature higher than 780 °C bared in air for 3 min, while it can be protected from oxidation for extended exposure in air at temperature up to 900 °C by a coating of aluminum nitride. Highly oriented AlN coatings were prepared for infrared windows on diamond films by reactive sputtering method and the average surface roughness (Ra) of the coatings was about 10 nm. The deposited films were characterized by X-ray diffraction (XRD) and atom force microscope (AFM). XRD confirmed the preferential orientation nature and AFM showed nanostructures. Optical properties of diamond films coated AlN thin film was investigated using infrared spectrum (IR) compared with that for as-grown diamond films.
Keywords:81  05  Uw  77  84  Bw  91  65  Mq  78  20  &minus  e
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