GaInP/GaAs/Ge三结太阳电池不同能量质子辐照损伤模拟

以GaInP/GaAs/Ge三结太阳电池为研究对象,开展了能量为0.7, 1, 3, 5, 10 MeV的质子辐照损伤模拟研究,建立了三结太阳电池结构模型和不同能量质子辐照模型,获得了不同质子辐照条件下的I-V曲线,光谱响应曲线,结合已有实验结果验证了本文模拟结果,分析了三结太阳电池短路电流、开路电压、最大功率、光谱响应随质子能量的变化规律,利用不同辐照条件下三结太阳电池最大输出功率退化结果,拟合得到了三结太阳电池最大输出功率随位移损伤剂量的退化曲线.研究结果表明,质子辐照会在三结太阳电池中引入位移损伤缺陷,使得少数载流子扩散长度退化幅度随质子能量的减小而增大,从而导致三结太阳电池相关电学参数的退化随质子能量的减小而增大.相同辐照条件下,中电池光谱响应退化幅度远大于顶电池光谱响应退化幅度,中电池抗辐照性能较差,同时中电池长波范围内光谱响应的退化幅度比短波范围更大,表明中电池相关电学参数的退化主要来源于基区损伤.     

Growth of high-crystallinity uniform GaAs nanowire arrays by molecular beam epitaxy

The self-catalyzed growth of Ga As nanowires(NWs) on silicon(Si) is an effective way to achieve integration between group III–V elements and Si. High-crystallinity uniform Ga As NW arrays were grown by solid-source molecular beam epitaxy(MBE). In this paper, we describe systematic experiments which indicate that the substrate treatment is crucial to the highly crystalline and uniform growth of one-dimensional nanomaterials. The influence of natural oxidation time on the crystallinity and uniformity of Ga As NW arrays was investigated and is discussed in detail. The Ga As NW crystallinity and uniformity are maximized after 20 days of natural oxidation time. This work provides a new solution for producing high-crystallinity uniform III–V nanowire arrays on wafer-scale Si substrates. The highly crystalline uniform NW arrays are expected to be useful for NW-based optical interconnects and Si platform optoelectronic devices.     

GaAs基980 nm高功率半导体激光器的研究进展

GaAs基980 nm半导体激光器在材料加工、通信和医疗等领域有着重要应用。应变量子阱结构的出现提高了GaAs基半导体激光器的转换效率、输出功率和可靠性。本文综述了高功率GaAs基量子阱激光器历史发展,介绍了高功率半导体激光器的外延结构、芯片结构和封装结构设计,重点阐述了影响高功率GaAs基量子阱激光器光电性能、散热和实际应用的问题。针对以上问题讨论了相应解决方案及研究成果,并指出了各个方案的不足之处和改进方向。最后,总结了高功率半导体激光器的发展现状,对高功率半导体激光器发展方向进行了展望。     

GaAs pyramidal quantum dot coupled to wetting layer in an AlGaAs matrix: A strain-free system

In this contribution, the electronic and linear and nonlinear optical properties of pyramid-shaped GaAs quantum dots (QDs) coupled to wetting layer (WL) in an Al_0.3Ga_0.7As matrix have been investigated. This nanostructure is relaxed from strain effects due to very small lattice-mismatching. Three transitions of P-to-S, WL-to-P, and WL-to-S were considered and the corresponding transition dipole moments, oscillator strengths, and linear and nonlinear optical properties regarding to these transitions were investigated as a function of the QD height. The results showed that for P-to-S transition, which is a purely in-plane-polarized transition, the dependence of electronic and optical properties on the size is moderate and can be neglected. But for WL-to-P and WL-to-S transitions, which are in-plane- and z-polarized transitions, respectively, the electronic as well as optical properties are strongly size-dependent. Furthermore, a competition between WL-to-S and WL-to-P transitions was observed when the QD size changed.     

Free standing modulation doped core–shell GaAs/AlGaAs hetero‐nanowires

Modulation doped AlGaAs/GaAs core–shell nanowire structures were grown by molecular beam epitaxy. A Si delta‐doping was introduced in the AlGaAs shell around the {110} facets of the GaAs core. The wires are typically highly resistive at low temperatures. However, they show a pronounced persistent photoconductivity effect indicating activation of free carriers from the delta‐doped shell to the GaAs core. The n‐type character of the channel is demonstrated by applying a back‐gate voltage. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Theoretical and experimental study of laser induced damage on GaAs by nanosecond pulsed irradiation

The surface damage experiments of gallium arsenide (GaAs) single crystal irradiated by 1.06 and 0.53 μm nanosecond irradiations are carried out with fundamental and frequency-doubled Nd:YAG laser, respectively. The surface damage thresholds for both wavelengths are experimentally determined and the damaged morphologies and elementary component are analyzed with electron probe microanalyzer (EPM). It is found that the components of Ga and As almost keep constant in our experiments when the irradiated fluence is just around the surface damage threshold and no oxygen is found at all. The theoretical calculations on temperature rise for both wavelengths are carried out using the purely thermal model. It is shown that for irradiation with photon energy above the corresponding band gap the theoretical calculation is in good agreement with the experimental results; however, for that with photon energy just below the band gap, the experimental results cannot be effectively explained by the purely thermal heating mechanism. Combining with the experiment of multi-shot damage from references we finally conclude that the damage by laser irradiation with photon energy below the band gap should be explained by the micro-defect accumulation and consequently enhanced absorption heating mechanism.     

长寿命吸收过程对超快动力学过程测量的影响

使用飞秒时间分辨抽运-探测透射光谱技术,实验研究了GaAs体材料中光激发载流子的超快弛豫动力学的波长依赖.在相同的光激发载流子浓度和抽运/探测比时,发现760 nm和780 nm两中心波长处的瞬态透射变化延迟扫描信号出现负的和振荡的信号.与模拟计算结果对比,判定该实验瞬态信号是错误的.分析探测器输出波形,发现是由于反相波形导致的,而引起反相波形的原因在于样品中存在长寿命的吸收过程.指出通过提高探测器上的抽运/探测比能够矫正反相波形,从而获得正确的瞬态透射变化动力学.提高探测器上的抽运/探测比与目前的应尽量减小抽运光对探测器的散射贡献的观点是对立的.文章的研究结果对应用抽运-探测时间分辨光谱技术正确地测量超快瞬态动力学过程具有重要的参考价值. 关键词： 时间分辨抽运-探测透射光谱 饱和吸收 吸收增强 GaAs体材料     

GaAs光电阴极激活时Cs的吸附效率研究

从NEA GaAs光电阴极的激活光电流曲线发现,当系统真空度不很高时,在首次Cs激活阶段,表面掺杂浓度较低的阴极材料,其光电流产生需要的时间也较长.同时,随着系统真空度的提高,这种时间上的差异又变得不再明显.该现象表明,Cs原子在阴极表面的吸附效率同表面层掺杂浓度以及系统真空度之间有直接的联系.为定量分析这种关系,本文根据实验数据建立了Cs在阴极表面吸附效率的数学模型,利用该模型仿真的结果同实验现象非常符合.该研究对进一步开展变掺杂阴极结构设计和制备工艺研究具有重要的价值和意义. 关键词： GaAs光电阴极 吸附效率 真空度 表面掺杂浓度     

体结构GaAs光导开关实验研究

 为解决光导开关耐受场强的提高问题,研制了2种体结构光导开关,并进行了实验研究。两种开关均由半绝缘GaAs材料制成,一种尺寸为10.0 mm×10.0 mm×0.6 mm,电极位于10.0 mm×10.0 mm面上相对位置,电极直径6 mm;另一种尺寸为15.0 mm×15.0 mm×3.0 mm,8 mm直径电极位于15.0 mm×15.0 mm面上相对位置。测试了第1种开关在不同半高宽脉冲加载电压下的击穿电压,结果表明其最大耐受电压达7.6 kV,击穿电场127 kV/cm。对第2种结构测试了开关在直流加载条件下的暗态伏安特性并进行了触发实验,结果表明在15 kV工作电压下,其放电最大电流超过3.5 kA。     

Electrical characterization of deep levels in n-type GaAs after hydrogen plasma treatment

Deep level transient spectroscopy (DLTS) and Laplace-DLTS (L-DLTS) have been used to investigate defects in an n-type GaAs before and after exposure to a dc hydrogen plasma (hydrogenation). DLTS revealed the presence of three prominent electron traps in the material in the temperature range 20-300 K. However, L-DLTS with its higher resolution enabled the splitting of two narrowly spaced emission rates. Consequently four electron traps at, E_C—0.33 eV, E_C—0.36 eV, E_C—0.38 eV and E_C—0.56 eV were observed in the control sample. Following hydrogenation, all these traps were passivated with a new complex (presumably the M3), emerging at E_C—0.58 eV. Isochronal annealing of the passivated material between 50 and 300 °C, revealed the emergence of a secondary defect, not previously observed, at E_C—0.37 eV. Finally, the effect of hydrogen passivation is completely reversed upon annealing at 300 °C, as all the defects originally observed in the reference sample were recovered.