GaAs光电阴极激活时Cs的吸附效率研究

从NEA GaAs光电阴极的激活光电流曲线发现,当系统真空度不很高时,在首次Cs激活阶段,表面掺杂浓度较低的阴极材料,其光电流产生需要的时间也较长.同时,随着系统真空度的提高,这种时间上的差异又变得不再明显.该现象表明,Cs原子在阴极表面的吸附效率同表面层掺杂浓度以及系统真空度之间有直接的联系.为定量分析这种关系,本文根据实验数据建立了Cs在阴极表面吸附效率的数学模型,利用该模型仿真的结果同实验现象非常符合.该研究对进一步开展变掺杂阴极结构设计和制备工艺研究具有重要的价值和意义. 关键词： GaAs光电阴极 吸附效率 真空度 表面掺杂浓度     

Influence of varied doping structure on photoemissive property of photocathode

The built-in electric fields within a varied doping GaAs photocathode may promote the transport of electrons from the bulk to the surface,thus the quantum efficiency of the cathode can be enhanced remarkably. But this enhancement,which might be due to the increase in either the number or the energy of electrons reaching the surface,is not clear at present. In this paper,the energy distributions of electrons in a varied doping photocathode and uniform doping photocathode before and after escaping from the cathode surface are analysed,and the number of electrons escaping from the surface in different cases is calculated for the two kinds of photocathodes. The results indicate that the varied doping structure can not only increase the number of electrons reaching the surface but also cause an offset of the electron energy distribution to high energy. That is the root reason for the enhancement of the quantum efficiency of a varied doping GaAs photocathode.     

Spectral transmittance and module structure fitting for transmission-mode GaAs photocathodes

A transmission-mode GaAs photocathode includes four layers of glass,Si 3 N 4 ,Ga 1x Al x As and GaAs. A gradient-doping photocathode sample was obtained by molecular beam epitaxy and its transmittance was measured by spec-trophotometer from 600 nm to 1100 nm. The theoretical transmittance is derived and simulated based on the matrix formula for thin film optics. The simulation results indicate the influence of the transition layers and the three thin-film layers except glass on the transmittance spectra. In addition,a fitting coefficient needed for error modification enters into the fitted formula. The fitting results show that the relative error in the full spectrum reduces from 19.51% to 4.35% after the formula is modified. The coefficient and the thicknesses are gained corresponding to the minimum relative error,meanwhile each layer and total thin-film thickness deviation in the module can be controlled within 7%. The presence of glass layer roughness,layer interface effects and surface oxides is interpreted on the modification.     

Improvement of photoemission performance of a gradient-doping transmission-mode GaAs photocathode

Two types of transmission-mode GaAs photocathodes grown by molecular beam epitaxy are compared in terms of activation process and spectral response, one has a gradient-doping structure and the other has a uniform-doping structure. The experimental results show that the gradient-doping photocathode can obtain a higher photoemission capability than the uniform-doping one. As a result of the downward graded band-bending structure, the cathode performance parameters, such as the electron average diffusion length and the surface electron escape probability obtained by fitting quantum yield curves, are greater for the gradient-doping photocathode. The electron diffusion length is within a range of from 2.0 to 5.4 μm for doping concentration varying from 10¹⁹ to 10¹⁸ cm^-3 and the electron average diffusion length of the gradient-doping photocathode achieves 3.2 μm.     

GaAs光电阴极激活后的表面势垒评估研究

根据阴极制备过程中单独Cs激活和Cs-O交替激活两个阶段产生的光电流的峰值比,结合对电子穿过表面单势垒和双势垒后能量分布的理论曲线,提出了一种评估NEA GaAs光阴极表面势垒参数的新方法.利用该方法研究的结果完全符合双偶极层模型理论,并且和对实测阴极电子能量分布曲线拟合的结果非常一致.该方法简单、有效,在不增加测试手段的前提下,丰富了对NEA GaAs光电阴极激活效果及表面特征评价的方法和途径. 关键词： GaAs 光电阴极 表面势垒 能量分布     

高性能透射式GaAs光电阴极量子效率拟合与结构研究

为了探索高性能透射式GaAs光电阴极的特征结构,对光电阴极量子效率公式进行了光谱反射率与短波截止限的修正,并利用修正后的公式对ITT透射式GaAs光电阴极量子效率(≈43%)曲线进行了拟合,得到拟合相对误差小于5%时的结构参数为:窗口层Ga_1-xAl_xAs的厚度介于0.3-0.5 μm,Al组分x值为0.7,发射层GaAs的厚度介于1.1-1.4 μm.另外,根据拟合结果讨论了均匀掺杂透射式GaAs光电阴极的优化结构参数,如果光电阴极具有0.4 μm厚的Ga_1-xAl_xAs(x=0.7)窗口层和1.1-1.5 μm厚的GaAs发射层,则积分灵敏度可以达到2350 μA/lm以上. 关键词： 透射式GaAs光电阴极 量子效率 积分灵敏度 光学性能