用湿法刻蚀技术制作衍射光学元件

研究了氢氟酸(HF)湿法刻蚀石英玻璃的化学机理，探索了针对衍射光学元件制作的刻蚀工艺，得到相关实验规律和工艺参数。最后对实验误差进行定量分析，得到湿法刻蚀的可控精度。     

石墨烯玻璃透明薄膜加热特性

Graphene has become a research focus in recent years owing to its excellent characteristics, and glass is a commonly used material with high transparency and low cost. Graphene glass combines the excellent properties of both graphene and glass; graphene glass has not only high thermal conductivity, high electrical conductivity, and good surface hydrophobicity but also exhibits superior electrothermal conversion and wide-spectrum high-light-transmittance characteristics. Therefore, the study of graphene glass films is of theoretical value and practical significance. In this study, a high-purity glass-based (JGS1 quartz glass) multilayer graphene film was developed based on an atmospheric-pressure chemical vapor deposition (APCVD) method, and its electrical characteristics, light transmittance, and electrical heating characteristics were experimentally investigated in detail. The results show that graphene glass with different surface resistance values obtained through direct growth on a high-purity quartz glass substrate using the APCVD method, not only has excellent uniformity and quality, but also has considerably flat and high transmittance across the entire visible light region and exhibits excellent heating performance and fast response time. For graphene glass with a surface resistance of 1500 Ω·sq^-1, the light transmittance can reach 74%, and the saturation temperature can rise to 185 ℃ by applying a bias voltage of 40 V. In addition, when the resistance value of the graphene glass is 420 Ω·sq^-1, the graphene glass reaches a high saturation temperature of 325 ℃ in 40 s, and the corresponding heating rate can exceed 18 ℃·s^-1, achieving a significantly higher heating rate than other heating films at the same voltage. Compared with the polyethylene-terephthalate- (PET-) based and silicon-based graphene films obtained by the transfer, graphene glass has a higher saturation temperature, shorter thermal response time, and faster heating rate. Furthermore, graphene glass exhibits better heating cycle stability and longer-term heating stability at a constant voltage. In addition, an experiment using the graphene glass to thermally tune the wavelength of a vertical-cavity surface-emitting laser was conducted and gave good results. The position of the laser peak controlled by the graphene glass was red-shifted by 1.78 nm by applying a voltage of 20 V, and the wavelength tuning efficiency reached 0.059 nm·℃^-1. Compared with PET-based and silicon-based graphene films, the actual electrical heating capacity of graphene glass increased by 195%. These experimental findings demonstrate that graphene glass transparent films with excellent electric heating characteristics can be used in various transparent electric heating fields and have relatively wide application prospects.     

动态加载过程中石英玻璃诱导水的快速结晶相变

在气炮加载试验中利用弹载光源原位测试技术,观测了夹于石英玻璃之间的水在动态压缩过程中的透光特性. 通过其光透射特性研究了水的冲击相变. 实验结果发现液态水在动态冲击压缩过程中, 其压力低于2 GPa 就出现透明性变差的现象,而且水的透明性下降与石英玻璃的存在有关,是一种石英诱导水的结晶相变现象.     

熔石英相位共轭镜无损工作状态分析

基于非线性光学耦合波方程组建立了聚焦泵浦条件下熔石英玻璃材料中SBS过程的物理模型并编制了相应的数值求解程序,研究了SBS介质内激光场的时空发展特征,从而试图揭示SBS介质的内在破坏机制并寻求相应的加固措施.通过数值模拟程序研究了焦点处激光功率密度以及SBS反射率与激光能量的依赖关系,发现SBS对介质内的激光场具有"限幅"作用,即在注入能量大幅度提升的情况下,内部的激光场强度只有较小的增加,这种机制使大能量的固体介质PCM成为可能.分析激光脉宽以及耦合透镜焦距等参数对SBS过程的影响发现,精细选择系统参数,在熔石英玻璃材料中有可能无损伤地实现高效的SBS过程.     

K9和石英玻璃基片上Au膜真空紫外反射特性研究

采用离子束溅射法,分别在经过不同前期清洗方法处理过的K9及石英玻璃光学基片上,选择不同的镀膜参量,镀制了多种厚度的Au膜。对镀制的Au膜在真空紫外波段较宽波长范围内的反射率进行了连续测量。测试结果表明:辅助离子源的使用方式、Au膜厚度对反射镜的反射率有重大影响。基片材料、镀前基片表面清洗工艺等对反射率也有一定影响。采用镀前离子轰击,可显著提高Au膜反射率及膜与基底的粘合力;获得最高反射率时的最佳膜厚与基片材料、镀膜工艺密切相关。对经过离子清洗的石英基片,膜厚在30 nm左右反射率最高;比较而言,石英基片可获得更高的反射率;辅助离子源的使用还显著影响获得最高反射率时对应的最佳膜厚值,且对K9基片的影响更显著。     

石英玻璃的非线性极化及其光学测量

本文报道了石英玻璃的非线性极化及其光学测量的全过程。研究了外电场对极化样品二阶大线性的影响。并用铁电极化模型作了一些理论分析。     

飞秒激光烧蚀石英玻璃的实验与理论研究

实验研究了800nm飞秒激光作用下石英玻璃的破坏机理和烧蚀规律，给出了破坏阈值与脉冲宽度的关系.发展了雪崩击穿模型，计算了材料的烧蚀阈值与脉冲宽度的依赖关系，烧蚀深度、烧蚀体积与脉冲能量的依赖关系，研究了导带电子的扩散对材料中激光能量的沉积、分布，以及材料的破坏阈值和烧蚀规律的影响. 关键词： 飞秒激光脉冲 破坏机理 石英玻璃 电子扩散     

石英玻璃片的化学抛光工艺研究

石英玻璃是紫外光刻、激光核技术等精密光学系统的关键光学元件.石英玻璃在加工过程中易出现表面及亚表面损伤和蚀坑等缺陷问题,化学抛光能有效消除石英玻璃的亚表面损伤.介绍了石英玻璃片的化学抛光工艺原理和过程,利用正交实验法优化了石英玻璃化学抛光工艺参数,分析了化学抛光过程中抛光液成分、抛光液温度和抛光时间对石英玻璃片表面粗糙...