原子束计算全息片的设计与制作研究

在分析原子束计算全息片特点的基础上,提出采用罗曼Ⅲ型傅里叶变换计算全息图设计原子束计算全息片,给出设计步骤,然后提出采用电子束光刻编码矩孔图形,ICP各向异性刻蚀SiN薄膜的全息片制作方案,对全息片的制作工艺流程详细予以介绍,最后给出制作完成的SiN薄膜计算全息片.     

自组装制备二氧化铪图案化薄膜

采用短波紫外光(UV)在十八烷基三氯硅烷(OTS)自组装单分子层刻蚀不同的微型图案,利用液相自组装技术在OTS模板表面沉积HfO₂图案化薄膜。通过XRD、AFM、SEM、EDS等测试手段对OTS膜和HfO₂薄膜进行表征,结果表明：以OTS为模板利用液相自组装技术成功制备出边缘轮廓清晰、粗糙度较小、条纹宽度为10μm的立方晶型的HfO₂图案化薄膜。     

Selective gold nano-patterning on flexible polymer substrate via concurrent nanoimprinting and nanotransfer printing

We report a simple technique of selective gold nano-patterning on non-planar polycarbonate substrate by combining nanoimprinting and gold nanotransfer printing techniques in a single concurrent nano-patterning process: thermal nanoimprinting directly patterns a MPTMS (3-mercaptopropyl trimethoxysilane)-coated polycarbonate sheet to form the non-planar nanostructures using a gold-film deposited mold. Simultaneously, the gold-film from the mold is selectively transfer-printed either onto the protrusion or the base of the imprinted non-planar structures. This high nano-patterning selectivity is achieved due to a combined effect of a thiol-terminated MPTMS-gold surface chemistry, more importantly, aided by a surface area dependent differential work of adhesion. We show the high delineation of the patterned gold on the non-planar polycarbonate substrate of various geometries such as pillars, dimples, and gratings, down to nano-scale resolution (130 nm) as well as over micro-scale resolution (10 μm), thus demonstrating that this can be a generic metal patterning technique. Using this technique, we fabricate a metal nanowire grid polarizer to demonstrate a potential device application. The main advantage of this technique lies in its inherent self-aligned process that simplifies selective Au nano-patterning on non-planar polymer surfaces, which is otherwise difficult to be obtained using conventional patterning techniques.     

Formation of Au nano-patterns on various substrates using simplified nano-transfer printing method

For future device applications, fabrication of the metal nano-patterns on various substrates, such as Si wafer, non-planar glass lens and flexible plastic films become important. Among various nano-patterning technologies, nano-transfer print method is one of the simplest techniques to fabricate metal nano-patterns. In nano-transfer printing process, thin Au layer is deposited on flexible PDMS mold, containing surface protrusion patterns, and the Au layer is transferred from PDMS mold to various substrates due to the difference of bonding strength of Au layer to PDMS mold and to the substrate. For effective transfer of Au layer, self-assembled monolayer, which has strong bonding to Au, is deposited on the substrate as a glue layer.In this study, complicated SAM layer coating process was replaced to simple UV/ozone treatment, which can activates the surface and form the -OH radicals. Using simple UV/ozone treatments on both Au and substrate, Au nano-pattern can be successfully transferred to as large as 6 in. diameter Si wafer, without SAM coating process. High fidelity transfer of Au nano-patterns to non-planar glass lens and flexible PET film was also demonstrated.