自组装制备二氧化铪图案化薄膜

采用短波紫外光(UV)在十八烷基三氯硅烷(OTS)自组装单分子层刻蚀不同的微型图案，利用液相自组装技术在OTS模板表面沉积HfO₂图案化薄膜。通过XRD、AFM、SEM、EDS等测试手段对OTS膜和HfO₂薄膜进行表征，结果表明：以OTS为模板利用液相自组装技术成功制备出边缘轮廓清晰、粗糙度较小、条纹宽度为10μm的立方晶型的HfO₂图案化薄膜。

Self-assembled Monolayers Preparation of Patterned HfO2 Thin Film

Different kinds of micro-patterns were created within octadecyltrichlorosilane (OTS) self-assembled monolayers utilizing UV lithography. The HfO_2 pattern films have been formed on silanol SAMs by the liquid-phase deposition (LPD) method. The crystal phase composition, microstructure and topography oi the as-prepared films were characterized by various techniques, including X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and energy disperse spectroscopy (EDS). The results indicate that the HfO_2 pattern films were successfully prepared by the self-assembled monolayers, and the thin films had cubic pattern microstructure of HfO_2, 10 μm deposited lines width and small line edge roughness.