Microstructure of nickel nanoparticles embedded in carbon films: case study on annealing effect by micromorphology analysis

The presented study is aimed at analyzing the surface texture of amorphous hydrogenated carbon layers containing nickel nanoparticles (Ni‐NPs@a‐C:H) within their structure, which were deposited by Radio Frequency (RF) sputtering and RF‐Plasma Enhanced Chemical Vapor Deposition (RF‐PECVD) methods on glass substrates. Prepared films were then used as research material following their annealing at two different temperatures of 250 °C and 350 °C in an inert argon atmosphere. Series of height samples were taken with the help of atomic force microscopy (AFM) operating in a non‐contact mode and examined in order to determine their fractal characteristics. Raw AFM data were first plane‐fitted to remove the surface bow exhibiting the so‐called residual surface, and then numerically processed to calculate the Areal Autocorrelation Function (AACF), which was later used to compute the Structure Function (SF). The log–log plots of the latter served for calculation of fractal properties of surfaces under investigation, including fractal dimension D, and pseudo‐topothesy K. The analysis of 3‐D surface texture helps to understand their essential characteristics and their implications as well as graphical models and their implementation in computer simulation. Copyright © 2016 John Wiley & Sons, Ltd.     

用等离子体增强化学气相沉积技术制备类金刚石碳薄膜的摩擦磨损性能研究

利用射频-直流等离子体增强化学气相沉积技术在单晶硅衬底上沉积类金刚石碳薄膜,采用激光拉曼光谱仪和原子力显微镜对薄膜的结构和表面形貌进行表征,采用纳米压痕仪测定薄膜的硬度,并用UMT型微摩擦磨损试验机考察了薄膜在不同试验条件下的摩擦磨损性能.结果表明:所制备的类金刚石碳薄膜表面光滑致密且硬度较高;在干摩擦条件下与GCr15钢球或Al2O3球配副时显示出良好的减摩抗磨性能,摩擦系数较低,耐磨寿命较长,而在水润滑条件下同Al2O3球配副时发生灾难性磨损.     

Relatively low temperature synthesis of graphene by radio frequency plasma enhanced chemical vapor deposition

We present a simple, low-cost and high-effective method for synthesizing high-quality, large-area graphene using radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) on SiO₂/Si substrate covered with Ni thin film at relatively low temperatures (650 °C). During deposition, the trace amount of carbon (CH₄ gas flow rate of 2 sccm) is introduced into PECVD chamber and the deposition time is only 30 s, in which the carbon atoms diffuse into the Ni film and then segregate on its surface, forming single-layer or few-layer graphene. After deposition, Ni is removed by wet etching, and the obtained single continuous graphene film can easily be transferred to other substrates. This investigation provides a large-area, low temperature and low-cost synthesis method for graphene as a practical electronic material.     

Synthesis and Characterization of New Alumina and Titania-Containing Hybrid Network Ceramer Materials from Sol-Gel Processing

Transparent hybrid materials have been prepared by incorporating either an alumina or titania alkoxide sol with triethoxysilane end-capped polytetramethylene oxide (PTMO) oligomer. In order to avoid undesirable precipitation after the addition of water, a β-dicarbonyl ligand, ethyl acetoacetate, was used. Triethoxysilane endcapped polytetramethylene oxide with a molecular weight of 2000 (g/mol) was chosen to react with either the alumina or titania sol to demonstrate the features of the reaction scheme. The extent of reaction leading to network formation has been qualitatively followed by infrared spectroscopy. A series of solid films were prepared by varying the molar ratio of either aluminum tri(sec-butoxide) or titanium tetraisopropoxide to ethyl acetoacetate, and the weight fraction of alumina or titania to that of PTMO. The refractive index as well as the general structure-property behavior of these hybrid materials were studied.     

垂直直立石墨烯纳米墙的制备及光热感应

基于等离子体增强化学气相沉积(PECVD)技术,通过调节实验参数,在绝缘衬底玻璃上成功制备出了三维垂直直立的石墨烯纳米墙(GNWs)材料.生长过程中发现石墨烯的质量和尺寸大小与相应的生长时间有关,利用拉曼(Raman)光谱、扫描电子显微镜(SEM)、原子力显微镜(AFM)等仪器对石墨烯纳米墙作了表征.并且,利用石墨烯纳米墙超高的比表面积和优异的散热特性,发现垂直直立的石墨烯纳米片-玻璃杂化混合材料在光热感应上有着良好的响应,将有望促进垂直直立石墨烯纳米片-玻璃杂化的混合材料在透明的太阳热装置和绿色保暖建筑材料上的应用.     

Photoluminescence characterization of silicon nanostructures embedded in silicon oxide

This paper describes a simple method to analyze the photoluminescent characteristics of materials based on embedded light-emitting nanoclusters. Photoluminescence spectra of deposited silicon sub-oxide layers with the same composition and different thicknesses have been obtained. A saturation of the total luminescence intensity is observed with increase in thickness. By analyzing the photoluminescence spectra several optical and structural parameters can be evaluated. We thus propose a model in which the absorption of light from a nanostructure layer implies the possibility of subsequent luminescence and affects the underlying layers as well. By fitting the data to the developed model, two fundamental parameters are extracted: nanostructures absorption probability, which is independent of the emission energy and the spectra of emission probability of an excited nanostructure which fits a Gaussian shape.     

常规退火与光退火固相晶化的对比

为研究传统炉子退火与光退火固相晶化的不同特点,用石英玻璃作衬底,在室温、350℃和450℃下用PECVD法直接沉积非晶硅(a-Si:H)薄膜,把沉积的样品分别在850℃下用传统炉子退火3h、用光快速热处理(RTP)5min,然后用Raman、XRD和SEM分析对比,发现传统炉子退火后的晶粒分布不均匀,光退火后的晶粒分布均匀.XRD分析发现两种方法晶粒尺寸均为30nm左右.     

PECVD低温制备微晶硅薄膜的研究

实验采用等离子体增强化学气相沉积(PECVD)法在玻璃衬底上制备了微晶硅薄膜.研究了氢稀释比、衬底温度、射频功率等因素对薄膜晶化的影响,得出在一定范围内随着衬底温度的升高、射频功率和氢稀释比的增大,薄膜的晶化率得到提高;但进一步提高沉积温度、射频功率反而会使薄膜晶化效果变差,并对晶化硅薄膜低温生长的机理进行了初步的探讨.     

不同工艺参数及喷淋板结构下PECVD热流场分析

建立了PECVD腔室的连续流体和传热模型,通过仿真实验来分析工艺参数和喷淋板结构对PECVD腔室热流场的影响.在典型工艺的基础上,根据单变量原则设计不同的仿真实验来研究工艺参数对晶圆片上方流速、压力及温度分布的影响,结果显示在不同的工艺参数下,流速分布都能够保持线性分布;温度分布波动很小,表现良好的稳定性;压力随径向近似抛物线分布,中心压力高边缘压力低.另外本文设计了两组仿真实验,研究喷淋板不同的流阻分布对热流场的影响,结果显示喷淋板流阻的分布对流速分布有明显的影响,在不同的流阻分布下,加热盘边缘处的流速保持不变,但是流速分布存在一个拐点,拐点前和拐点后流速都近似于直线分布;结果说明能够通过改变喷淋板流阻的分布来调控晶圆上方流速的分布从而获得更高的薄膜工艺均匀性.