刻线镍膜上沉积的碳纳米管场发射特性

利用微波等离子体化学气相沉积(MWPCVD)方法,在刻线的镍膜上沉积碳纳米管膜。通过SEM和拉曼光谱表征,讨论了催化剂厚度、制备温度、反应时间以及甲烷浓度对碳纳米管场发射的影响。结果表明：不同条件下制备的碳纳米管的场发射性能有很大差异,保持氢气的流量(100sccm)不变,当甲烷流量为5sccm、生长时间为5min、催化剂膜厚为150nm、温度为700～800℃时,场发射性能最好,开启场强为1．3V／um,最大发射电流达到6．8mA／cm^3。     

MWPCVD低温合成纳米碳管的生长机理

The synthesis of carbon nanotubes (CNTs) at low temperature has received a great deal of attention and be-comes a challenging issue. But few model which accounts for the growth of CNTs is suited for the synthesis of CNTs by microwave plasma chemical vapor deposition (MWPCVD) at low temperature because most researchers conclude that the growth mechanism is determined by the catalyst-supporter interaction while ignored the diffusion of carbon in the catalyst. In this paper, under the catalytic effect of cobalt supported by SiO₂ and Al₂O₃, CNTs are synthe-sized by MWPCVD at about 500℃, and tip-growth, the model which accounts for the catalytic growth of CNTs is outlined. It is the temperature difference between the upper and bottom of the catalytic particle that results in the diffusion of carbon atoms from upper to the bottom, and precipitation of saturated carbon on the bottom surface to form CNTs.