激光限制结晶技术制备nc-Si/SiO2多层膜

在等离子体增强化学气相淀积系统中，采用aSi:H层淀积和原位等离子体氧化相结合的逐层生长技术制备了aSi:H/SiO_2多层膜.在激光诱导限制结晶原理基础上，使用KrF准分子脉冲激光为辐照源，对aSi:H/SiO_2多层膜进行辐照，使纳米级厚度的aSi:H子层晶化.Raman散射谱和电子衍射谱的结果表明，经过激光辐照后纳米Si颗粒在原始的aSi:H子层内形成，晶粒尺寸可以根据aSi:H层的厚度精确控制.还研究了样品的光致发光（PL）特性以及激光辐照能量密度对PL性质的影响. 关键词： 脉冲激光 多层膜 限制结晶     

Graphene/Mo_2C heterostructure directly grown by chemical vapor deposition

Graphene-based heterostructure is one of the most attractive topics in physics and material sciences due to its intriguing properties and applications. We report the one-step fabrication of a novel graphene/Mo_2C heterostructure by using chemical vapor deposition(CVD). The composition and structure of the heterostructure are characterized through energydispersive spectrometer, transmission electron microscope, and Raman spectrum. The growth rule analysis of the results shows the flow rate of methane is a main factor in preparing the graphene/Mo_2C heterostructure. A schematic diagram of the growth process is also established. Transport measurements are performed to study the superconductivity of the heterostructure which has potential applications in superconducting devices.     

Structural evolution of a-Si:H/SiO2 multilayers upon step by step thermal annealing

a-Si:H/SiO_2 multilayers were prepared by alternatively changing plasma enhanced chemical vapour deposition of a-Si:H layers and in situ plasma oxidation process. Subsequently, as-grown samples were annealed at temperatures from 350℃ to 1100℃ in N_2 ambient with an increment of 100℃. The evolution of bonding configurations and structures with annealing treatments was systematically investigated by Fourier-transform infrared spectroscopy. The peak position of Si－O stretching vibration of SiO_2 layers shift to 1087cm^{-1} after annealing at 1100℃, which demonstrates that the SiO_2 films fabricated by plasma oxidation after high temperature annealing can have similar properties to the thermal grown ones. A Si－O vibration from interfacial SiO_x was identified: the value x was found to increase as increasing the annealing temperature, which is ascribed to the cooperation of hydrogen effusion and reordering of the oxygen bond in SiO_x networks. The H-related bonds were observed in the form of H－Si－O_3 and H－Si－Si_{3-n}O_n (n=1－2) configurations, which are supposed to be present in SiO_2 and interfacial SiO_x layers, respectively. The H atoms bonded in different bonding configurations effuse at different temperatures due to their different desorption energies.     

衬底温度对共蒸发制备GaSb多晶薄膜性质的影响

采用共蒸发的方法在玻璃衬底上制备出GaSb多晶薄膜材料.研究了薄膜生长速率与衬底温度、Ga源温度和Sb源温度的关系.通过XRD、UV-Vis、Hall效应和AFM等测试方法,研究了衬底温度对于GaSb薄膜的结构特性、光电性质以及表面形貌的影响.GaSb多晶薄膜具有(111)择优取向,薄膜的吸收系数达到105 cm-1,晶粒尺寸随衬底温度升高逐渐增大;衬底温度为540℃时,薄膜的迁移率达到127 cm2/V·s,空穴浓度为3×1017 cm-3.GaSb薄膜的表面粗糙度随温度增加而增加.     

柔性衬底非晶硅薄膜太阳电池界面处理的研究

通过实验和模拟计算对比分析了i/p界面过渡层对太阳电池性能的影响．结合具体实验工艺参数,模拟计算了不同带隙和缺陷态密度的过渡层对太阳电池的影响,同时结合实验情况重现了宽带隙高缺陷态密度过渡层对太阳电池的损伤,为实验结果提供了理论依据．通过优化调整i/p界面过渡层的制备方法得到了转换效率为7.09%的聚酰亚胺衬底非晶硅薄膜太阳电池． 关键词： 柔性衬底 太阳电池 AMPS 模拟计算     

射频等离子体辅助MBE生长GaN及Mg掺杂的光致发光

采用射频等离子体辅助分子束外延(RF plasma-assisted MBE)系统生长非故意掺杂GaN和p型GaN,并且通过室温和低温光致发光(PL)谱测试研究了材料的发光特性及与杂质态的关系,对于GaN外延层出现的黄带发光进行分析。结果表明,富Ga条件下生长的GaN材料特性要优于富N生长的材料;非故意掺杂的富Ga样品中出现的黄带发光(YL)与GaN中生成能最低的氮空位(V_N)缺陷有关;不同的Mg掺杂浓度对样品的PL特性有较大的影响;结合Hall效应测量结果,认为在Mg重掺杂的样品中出现的黄带发光,与GaN的自补偿效应以及重掺杂导致的晶体质量下降有关。     

nc-Si/SiO2多层膜的制备及蓝光发射

在等离子体增强化学气相淀积(PECVD)系统中，采用a-Si∶H层淀积与原位等离子体氧化相结合的逐层生长的方法成功制备出a-Si∶H/SiO2多层膜 (ML)；利用限制性结晶原理通过两步退火处理使a-Si∶H层晶化获得尺寸可控的nc-Si/SiO2 ML，并观察到室温下的蓝光发射；结合Raman散射和剖面透射电子显微镜技术分析了nc-Si/SiO2 ML的结构特性；通过对晶化样品光致发光谱和紫外-可见光吸收谱的研究，探讨了蓝光发射的起源. 关键词： 纳米硅多层膜 等离子体氧化 蓝光发射 热退火     

柔性衬底非晶硅薄膜太阳电池量子效率的研究

量子效率是太阳电池对光的吸收能力的评定标准之一.本文通过对柔性衬底倒结构n-I-p非晶硅薄膜太阳电池量子效率的测量,同时结合本征材料吸收特性,讨论了衬底温度和反应压强对太阳电池量子效率的影响.结果表明:本征非晶硅薄膜的吸收特性是影响太阳电池量子效率的主要因素,同时光生载流子在本征层和界面处的复合也会对太阳电池的量子效率有所影响.经过反应条件优化得到了转换效率为5.67;的聚酰亚胺衬底太阳电池.