Thermal stability and data retention of resistive random access memory with HfO_x/ZnO double layers

As an industry accepted storage scheme, hafnium oxide(HfO_x) based resistive random access memory(RRAM)should further improve its thermal stability and data retention for practical applications. We therefore fabricated RRAMs with HfO_x/ZnO double-layer as the storage medium to study their thermal stability as well as data retention. The HfO_x/ZnO double-layer is capable of reversible bipolar switching under ultralow switching current( 3 μA) with a Schottky emission dominant conduction for the high resistance state and a Poole–Frenkel emission governed conduction for the low resistance state. Compared with a drastically increased switching current at 120℃ for the single HfO_x layer RRAM, the HfO_x/ZnO double-layer exhibits excellent thermal stability and maintains neglectful fluctuations in switching current at high temperatures(up to 180℃), which might be attributed to the increased Schottky barrier height to suppress current at high temperatures. Additionally, the HfO_x/ZnO double-layer exhibits 10-year data retention @85℃ that is helpful for the practical applications in RRAMs.     

Spin–orbit coupling effects on the in-plane optical anisotropy of semiconductor quantum wells

We theoretically study the influence of the spin–orbit coupling(SOC) on the in-plane optical anisotropy(IPOA) induced by in-plane uniaxial strain and interface asymmetry in(001) GaAs/AlGaAs quantum wells(QWs) with different well width. It is found that the SOC has more significant impact on the IPOA for the transition of the first valence subband of heavy hole to the first conduction band(1H1E) than that of 1L1E. The reason has been discussed. The IPOA of(001) InGaAs/InP QWs has been measured by reflectance difference spectroscopy, whose amplitude is about one order larger than that of GaAs/AlGaAs QWs. The anisotropic interface potential parameters of InGaAs/InP QWs are also determined. The influence of the SOC effect on the IPOA of InGaAs/InP QWs when the QWs are under tensile, compressive or zero biaxial strain are also investigated in theory. Our results demonstrate that the SOC has significant effect on the IPOA especially for semiconductor QWs with small well width, and therefore cannot be ignored.     

Multiple-State Storage Capability of Stacked Chalcogenide Films （Si16Sb33Te51/Si4Sb45Te51/Si11Sb39Te50） for Phase Change Memory

The multiple-state storage capability of phase change memory （PCM） is confirmed by using stacked chalcogenide films as the storage medium. The current-voltage characteristics and the resistance-current characteristics of the PCM clearly indicate that four states can be stored in this stacked film structure. Qualitative analysis indicates that the multiple-state storage capability of this stacked film structure is due to successive crystallizations in different Si-Sb-Te layers triggered by different amplitude currents.     

氮掺杂Ge2Sb2Te5相变存储器的多态存储功能

通过反应溅射的方法，制备了N掺杂的Ge₂Sb₂Te₅(N-GST)薄膜，用作相变存储器的存储介质.研究表明，掺杂的N以GeN的形式存在，不仅束缚了Ge₂Sb₂Te₅ (GST)晶粒的长大也提高了GST的晶化温度和相变温度.利用N-GST薄膜的非晶态、晶态面心立方相和晶态六方相的电阻率差异，能够在同一存储单元中存储三个状态，实现相变存储器的多态存储功能. 关键词： 相变存储器 多态存储 N掺杂 2Sb₂Te₅')" href="#">Ge₂Sb₂Te₅     

Na+掺杂KLaF4∶Er3+/yb3+纳米晶上转换发光性能的研究

采用水热法,以乙二胺为络合剂合成了Na+离子掺杂的六方相KLaF4∶Er3+/yb3纳米晶.利用X射线衍射谱(XRD)、透射电子显微镜(TEM)、红外光谱(FT-IR)对样品的晶体结构、形貌和表面吸附进行了表征;测量了不同含量Na+掺杂样品在980 nm近红外光激发下的上转换发射光谱和4R/2能级的荧光寿命.结果表明:随着Na+掺杂浓度的增加,KLaF4∶Er3+/yb3+纳米晶上转换红绿光的发光强度均呈现出先增大后减小的趋势,红绿光发射最强强度分别为未掺Na+样品的7.3倍和5.2倍.Na+掺杂使Er3+离子周围晶场的不对称性降低和纳米晶表面吸附基团的减少是发光增强的主要原因.针对Na+掺杂样品的荧光寿命低于未掺样品的原因作了简要讨论.     

Investigation of the mode splitting induced by electro-optic birefringence in a vertical-cavity surface-emitting laser by polarized electroluminescence

The mode splitting induced by electro-optic birefringence in a P-I-N InGaAs/GaAs/A1GaAs vertical-cavity surface- emitting laser （VCSEL） has been studied by polarized electroluminescence （EL） at room temperature. The polarized EL spectra with E｜｜[110] and E ｜｜ [150] directions, are extracted for different injected currents. The mode splitting of the two orthogonal polarized modes for a VCSEL device is determined, and its value increases linearly with the increasing injected current due to electro-optic birefringence; This article demonstrates that the polarized EL is a powerful tool to study the mode splitting and polarization anisotropy of a VCSEL device.     

Er3+/Yb3+共掺KLaF4纳米晶的制备和上转换发光

用水热法成功制备了Er3+/Yb3+共掺不同浓度比的KLaF4纳米晶,并在300℃氩气气氛下退火。利用X射线衍射谱(XRD)、透射电子显微镜(TEM)对样品的晶体结构和形貌进行了表征。测量了样品漫反射谱、980 nm激发下的上转换发射光谱和2H11/2能级的荧光寿命。研究结果表明:制备得到的样品为六方相的纳米棒,退火后纳米棒平均直径为28 nm,长为130 nm;在Er3+浓度一定的情况下,提高Yb3+掺杂量有利于增强973 nm附近光的吸收;980 nm的近红外光可上转换为较强的绿光和红光,且红绿光强度和2H11/2能级的平均荧光寿命均会随着Yb3+掺杂浓度的增加而下降。     

合成参数对气-液-固法低温生长MgO纳米线的影响

将Mg(C11H19O2)2(即双(2,2,6,6,-四甲基-3,5-庚二酮酸)镁)作为反应前驱体,用脉冲液滴注入式金属有机物化学气相沉积法,在较低温度(T=600℃)下合成MgO纳米线.纳米线沿着[001]方向生长且Au催化剂位于纳米线顶端,这表明纳米线是由气-液-固机制诱导生长的.通过改变前驱体注入的脉冲周期或周期注入剂量能够控制纳米线的生长模式,使之垂直或平行于样品表面生长.     

氮掺杂Ge2Sb2Te5相变存储器的多态存储功能

通过反应溅射的方法,制备了N掺杂的Ge2Sb2Te5(N-GST)薄膜,用作相变存储器的存储介质.研究表明,掺杂的N以GeN的形式存在,不仅束缚了Ge2Sb2Te5 (GST)晶粒的长大也提高了GST的晶化温度和相变温度.利用N-GST薄膜的非晶态、晶态面心立方相和晶态六方相的电阻率差异,能够在同一存储单元中存储三个状态,实现相变存储器的多态存储功能.     

Effect of deposited temperatures of the buffer layer on the band offset of CZTS/In_2S_3 heterostructure and its solar cell performance

The effect of the deposition temperature of the buffer layer In_2S_3 on the band alignment of CZTS/In_2S_3 heterostructures and the solar cell performance have been investigated.The In_2S_3 films are prepared by thermal evaporation method at temperatures of 30,100,150,and 200 ℃,respectively.By using x-ray photoelectron spectroscopy(XPS),the valence band offsets(VBO) are determined to be-0.28 ±0.1,-0.28 ±0.1,-0.34 ±0.1,and-0.42 ±0.1 eV for the CZTS/In_2S_3heterostructures deposited at 30,100,150,and 200 ℃,respectively,and the corresponding conduction band offsets(CBO)are found to be 0.3 ±0.1,0.41 ±0.1,0.22±0.1,and 0.01 ±0.1 eV,respectively.The XPS study also reveals that interdiffusion of In and Cu occurs at the interface of the heterostructures,which is especially serious at 200 ℃ leading to large amount of interface defects or the formation of CuInS_2 phase at the interface.The CZTS solar cell with the buffer layer In_2S_3 deposited at 150 ℃ shows the best performance due to the proper CBO value at the heterostructure interface and the improved crystal quality of In_2S_3 film induced by the appropriate deposition temperature.The device prepared at 100 ℃presents the poorest performance owing to too high a value of CBO.It is demonstrated that the deposition temperature is a crucial parameter to control the quality of the solar cells.