A New Method of Measuring Electron Emission Induced by Low Energy Ions from Solids

A new mathematical method of measuring electron emission induced by low energy ions from solids is described and used to calculate secondary electron emission according to the recorded pulse-height spectra of ions and ultraviolet （UV） photons. Using the UV single secondary electron spectra, we predict the shape of many secondary electron distributions under consideration of detection efficiency of MCP detector. These calculated distributions allow us to characterize the secondary electrons yield, and to give a secondary electron distribution for measured data. It seems rather feasible to determine secondary electron yield emitted by low energy ions at very low ion uxes.     

Dielectric Characterization of Free—Standing Diamond Films

The dielectric properties of free-standing diamond films grown by the dc arc-jet plasma method are measured by an impedance analyser in the temperature range of 298-573K and at frequencies between 1000Hz and 1MHz.In the temperature and frequency ranges,the loss tangent can be expressed as a function of temperature and frequency.The loss tangent increases slightly with increasing temperature and frequency,The dielectric properties of the diamond films decrease with the increasing deposited temperature.The structure and quality of diamond films have been analysed by scanning electron microscopy,x-ray diffraction and raman spectroscopy.     

CVD金刚石膜断裂性能测试装置的研究

文章介绍弛一种利用恒载荷速率加载测试金刚石膜断裂性能的试验方法,并建立了国内第一台金刚石膜断裂性能测试的专用装置,该装置利用弹性压头代替传统的刚性压头,可以成功地解决断裂试验的缓慢加载问题,试验装置的最大载荷为500N,可以在5－500N之间获得准确的载荷,误差不大于1％,最小加载速率为0．5N/s,最大加载速率为25N／s,该装置采用计算机控制,可以直接输出试验结果,该装置采用恒载荷速率（0．5N／s 至2N/s)的加载方式测得的断裂性能比用恒位移速率（0．5mm/min和0．05mm/min)加载方式测得的断裂性能更低,适合高脆性,小尺寸金刚石膜试样断裂性能的测试。     

加氮对直流电弧等离子体喷射金刚石膜生长、形貌和质量的影响

利用直流等离子体喷射化学气相沉积法制备掺氮的金刚石厚膜.本文研究了在甲烷/氩气/氢气中加入氮气对金刚石膜生长、形貌和质量的影响.反应气体的比例由质量流量计控制,在固定氢气(5000sccm)、氩气(3000sccm)、甲烷(100sccm)流量的情况下改变氮气的流量,即反应气体中氮原子和碳原子的变化比例(N/ C比)范围是从0.06到0.68.同时金刚石膜在固定的腔体压力(4kPa)和衬底温度(800℃)下生长.金刚石膜用扫描电镜(SEM)、拉曼谱和X射线衍射表征.结果表明,氮气在反应气体中的大量加入对直流等离子体喷射制备金刚石膜的形貌、生长速率、晶体取向、成核密度等有非常显著的影响.     

直流等离子体法中脱膜开裂的金刚石膜组织结构分析

为了解决用直流等离子体喷射法制备金刚石膜在脱膜过程中膜体开裂的问题,本文对3组脱膜开裂的金刚石膜组织结构进行了分析,发现由热应力作用产生的裂纹形貌随沉积温度的不同而呈现网状、河流状和环状,裂纹尖端的膜体具有最小的Raman 谱峰半高宽值.在所研究的温度范围内,膜体断口都是穿晶断裂和沿晶断裂的混合断口,而且断口面中的占优晶面都是{111}晶面.X射线和Raman谱结果还表明沉积温度愈高,膜体中的残余应力愈大.