高反射率p-GaN欧姆接触电极

根据光学薄膜原理计算了GaN/Ti/Ag、GaN/Al和GaN/Ni/Au/Ti/Ag、GaN/Ni/Au/Al多层电极结构的反射率,得出Ag基和Al基反射电极均能在全角范围内提供较高的反射率。实验测量结果表明,反射率能高于80%的Ag基反射电极,具有低欧姆接触的电学特性。并将GaN/Ni/Au/Ti/Ag多层反射电极应用在上下电极结构的GaN基LED中。实验上采用两步合金法获得了低接触电阻、高反射率的电极结构,并引入Ni/Au覆盖层克服了Ag高温时的团聚和氧化现象。解决了Ag电极的稳定性问题,显著地提高了LED的出光效率,成功制备了具有上下电极结构的GaN基LED管芯。     

极小孔半导体激光器近场区光场分布研究

利用时域有限差分法(FDTD)计算和分析了极小孔半导体激光器输出光端面附近的光场分布,指出小孔激光器近场区域光场分布的特点,讨论了小孔大小和金属厚度对光场分布和光源分辨率的影响,得到设计和制备极小孔半导体激光器的优化方法.     

Surface Light Extraction Mapping from Photonic Quasicrystal on Current Two-Dimensional Array of 12-Fold Injected GaN-Based LEDs

A two-dimensional array of dodecagonal photonic quasicrystal （12PQC） is fabricated on the surface of current injected GaN-based LEDs to out-couple guided modes. The spatially-resolved surface light extraction mapping of 12PQC is observed and compared with that of triangular lattice photonic crystal （3PC） by microscopic electrical luminescence and scanning near-field microscopy. The higher enhancement factor of 12PQC is obtained to be larger than that of 3PC. It is shown that 12PQC is more favourable and efficient for light extraction of guided lights.     

Shock-Assisted Superficial Hexagonal-to-Cubic Phase Transition in GaN/Sapphire Interface Induced by Using Ultra-violet Laser Lift-Off Techniques

Ultra-violet （KrF excimer laser,λ =248 nm） laser lift-off （LLO） techniques have been operated to the GaN/sapphire structure to separate GaN from the sapphire substrate. Hexagonal to cubic phase transformation induced by the ultra-violet laser lift-off （UV-LLO） has been characterized by micro-Raman spectroscopy, miero-photoluminescence, along with high-resolution transmission electron microscopy （HRTEM）. HRTEM indicates that UV-LLO induced phase transition takes place above the LLO interface, without phase transition under the LLO interface. The formed cubic GaN often exists as nanocrystal grains attaching on the bulk hexagona/GaN. The half-loop-clusterlike UV-LLO interface indicates that the LLO-indueed shock waves has generated and played an assistant role in the decomposition of the hexagonal GaN and in the formation of cubic GaN grains at the LLO surface.     

微小孔径激光器的研制与近场测试

介绍了一种用于高密度近场存储领域的新型微小孔径激光器(VSAL)。为了解决由腔面金属膜造成的激光器PN结短路的问题,在激光器中引入了窗口隔离区,不仅降低了器件制备的难度,而且也提高了器件的性能和成品率。采用聚焦离子束刻蚀技术成功地制备了输出功率为0 3mW的激光器,利用矩阵方法通过远场测量值估算了激光器的近场分布。     

X射线光电发射材料

分析Ｘ射线光电效应的特点,讨论俄歇电子和二次发射电子的产生机理。从“自由原子”模型出发,在理论上探讨Ｘ射线光电发射的原理,建立Ｘ射线光电发射的初步理论模型,讨论影响Ｘ躬一光电发射量子产额的几个特性参数,并对两上国际上常用的绝缘材料进行了计算,在此基础上提出了具有较高量子产额的全新硬Ｘ射线光电阴极模型。     

GaN-Based Thin Film Vertical Structure Light Emitting Diodes Fabricated by a Modified Laser Lift-off Process and Transferred to Cu

GaN-based thin film vertical structure light-emitting diodes （VS-LEDs） were fabricated by a modified YAG laser lift-off （LLO） process and transferred to Cu substrates. With a comparison of the electrical and optical properties of conventional LEDs on sapphire substrates and of lateral structure thin film LEDs by a KrF LLO process, the vertical structure of LLO LEDs shows obvious superiority. LLO VSLEDs made by modified YAG LLO process show less increase of leakage current than the devices made by conventional/（rE LLO process. Furthermore, owing to the well current spreading and less current path, the ideality factors and series resistance of vertical structure LEDs reduce greatly and the efficiency increases more obviously than the lateral structure LEDs, which is dso reflected on the relative L - I curves. The output power of vertical structure LEDs is over 3 times greater than that of the lateral structure LLO LEDs within 300mA.     

微机电光开关

对微机械光开关的特点和应用作了简要的论述 ,并对近年国外几种典型微机械光开关的结构、原理和研制方法作了简要的介绍和评述。这类新型的开关器件的主要优点是串话小 ,插入损耗小 ,消光比高 ,对波长和偏振不敏感 ,且体积小 ,造价低等 ,在光纤通信和光纤测试系统中具有广阔的应用前景     

条形半导体激光器光束质量因子M2的理论计算

通过一个二维半矢量模型求得纯折射率导引脊形波导和掩埋波导这两种常见平面条形半导体激光器波导结构的模式光场分布，现通过描述光束传播的非傍轴矢量二阶矩，通过平面波谱的方法获得激光器出射光束在横向和侧向上的束腰、远场发散角和M^2因子。讨论了波导结构参量变化对M^2因子的影响，并对两种波导结构光束的性质与波导参量的关系进行了比较。     

微小孔径激光器的工艺及器件功率和寿命特性分析

在650nm波长半导体激光器的基础上制造出了高输出功率的微小孔径激光器.驱动电流为25mA时， 输出功率达到0.4mW，最大功率可达１mW以上.叙述了微小孔径激光器的特殊的制造工艺，并分析了器件可能的失效机理. 关键词： 近场光学 微小孔径激光器 半导体激光器 失效分析