单晶硅晶格间距的测量技术进展及应用

单晶硅晶格间距是许多重要物理常数测量的基础。本文介绍了硅晶格间距测量技术的发展历程,包括X射线干涉仪直接测量和晶格比较仪间接测量两种方法,以及影响测量结果不确定度的关键因素。得益于晶格间距测量的进展,在纳米尺度,硅晶格间距被国际计量局(BIPM)批准成为新的米定义复现形式。最后介绍了硅晶格在计量学中的应用,以及基于硅晶格实现纳米几何量测量的溯源体系的研究趋势。     

基于迁移学习的原子力显微镜成像恢复方法

受限于探针针尖结构尺寸,用原子力显微镜进行微纳测量时会产生图像边缘失真.提出了一种基于迁移学习的原子力显微镜成像恢复方法,通过迁移学习训练源模型和靶模型实现一维栅格成像恢复.该方法采用数学形态法中的腐蚀算法生成栅格点云数据,通过U-Net网络源模型从点云中提取针尖卷积效应的特征向量,将权重参数迁移至U-Net网络靶模型,靶模型在自适应正则化方法下进行监督学习.实验结果表明,该方法能有效恢复一维栅格的原子力显微镜测量图像,提高横向分辨力,可用于纳米栅格的线宽检测上.     

纳米级稠化剂颗粒沉积膜在乏脂润滑中的作用机制研究

利用双光束干涉法对点接触区乏脂润滑成膜特性规律以及接触区附近润滑剂的微观迁移特性进行了观测.在试验条件下,接触区会经历充分润滑—乏脂—沉积膜润滑—分离油润滑等润滑状态.借助原子力显微镜,探测到沉积膜是润滑脂的稠化剂被碾压破碎而沉积在滚压轨道表面的一层纳米级颗粒薄膜;而分离油是在剪切过程中润滑脂内逐渐释放基础油.试验初始,接触区周围的润滑脂池因乏脂而迅速消失,但分离油会逐渐形成"第二相油池"以实现回流补给.沉积膜增大了基础油在滚动轨道表面的接触角,阻碍回流补给,但其会随运动逐渐磨损,此后分离油将进入接触区补充润滑膜.初步发现,当分离油不充足时,沉积膜有利于保护润滑轨道.     

Characterization of a nano line width reference material based on metrological scanning electron microscope

The line width (often synonymously used for critical dimension, CD) is a crucial parameter in integrated circuits. To accurately control CD values in manufacturing, a reasonable CD reference material is required to calibrate the corresponding instruments. We develop a new reference material with nominal CDs of 160 nm, 80 nm, and 40 nm. The line features are investigated based on the metrological scanning electron microscope which is developed by the National Institute of Metrology (NIM) in China. Also, we propose a new characterization method for the precise measurement of CD values. After filtering and leveling the intensity profiles, the line features are characterized by the combination model of the Gaussian and Lorentz functions. The left and right edges of CD are automatically extracted with the profile decomposition and k-means algorithm. Then the width of the two edges at the half intensity position is regarded as the standard CD value. Finally, the measurement results are evaluated in terms of the sample, instrument, algorithm, and repeatability. The experiments indicate efficiency of the proposed method which can be easily applied in practice to accurately characterize CDs.