双金属在掺硼金刚石表面电化学共沉积-共溶出模型

采用微分脉冲阳极溶出伏安法, 研究了Ag+、Cu2+、Pb2+、Sn2+、Cd2+等多种共存金属离子在掺硼金刚石(BDD)表面双金属共沉积-共溶出电化学行为. 结果表明, 双金属在掺硼金刚石膜表面的共沉积-共溶出模型是由金属本身的析出电位, 金属之间的相互作用, 金属离子和溶液间的相互作用等多种因素决定的. 微分阳极溶出法的研究结果表明, 双金属在掺硼金刚石电极上的共沉积-共溶出过程表现出金属1溶出-金属2溶出、金属1溶出-析氢-金属2溶出、金属1溶出-金属合金溶出-金属2溶出、金属1溶出-析氢-金属2络合物形成-金属2溶出等四种模型.     

Direct and Simultaneous Determination of Phenol, Hydroquinone and Nitrophenol at Boron-Doped Diamond Film Electrode

The electrochemical characteristics of multi-component phenolic pollutants, such as phenol （Ph）, hydroquinone （HQ） and 4-nitrophenol （4-NP）, were investigated on boron-doped diamond （BDD） film electrode by differential pulse voltammetry （DPV） technique. A simple and feasible platform was accordingly established for the direct and simultaneous determination of these three phenolic pollutants. Results showed that, Ph, HQ and 4-NP gave obvious oxidation peaks on BDD electrode at the potential of 1.24, 0.76 and 1.52 V, respectively. Each of them displayed good linear relationship between their oxidation peak currents and their corresponding concentrations in a rather wide range coexisting with one or two of the other phenolic pollutants. The detection limits of Ph, HQ and 4-NP were estimated to be as low as 1.82×10^-6, 1.67×10^-6 and 1.44×10^-6 mol·L^-1, respectively. Therefore, a promising direct and simultaneous electrochemical determination method of multi-component phenolic pollutants in wastewater samples was constructed successfully on BDD electrode with advantages being rapid, simple, convenient, sensitive, in situ and inexpensive.