Evolution of native point defects in ZnO bulk probed bypositron annihilation spectroscopy

This paper studies the evolution of native point defects with temperature in ZnO single crystals by positron lifetime and coincidence Doppler broadening (CDB) spectroscopy, combined with the calculated results of positron lifetime and electron momentum distribution. The calculated and experimental results of the positron lifetime in ZnO bulk ensure the presence of zinc monovacancy, and zinc monovacancy concentration begins to decrease above 600℃ annealing treatment. CDB is an effective method to distinguish the elemental species, here we combine this technique with calculated electron momentum distribution to determine the oxygen vacancies, which do not trap positrons due to their positive charge. The CDB spectra show that oxygen vacancies do not appear until 600℃ annealing treatment, and increase with the increase of annealing temperature. This study supports the idea that green luminescence has a close relation with oxygen vacancies.     

利用霍尔效应研究热退火对黑硅材料电学性质的影响

利用霍尔效应测量了不同温度热退火后的黑硅的霍尔系数、载流子浓度、载流子迁移率和电导率.随着热退火温度的升高,黑硅内载流子的浓度缓慢下降,载流子迁移率却同步增加,这说明黑硅内载流子散射的主要形式是电离杂质散射.     

Si(001)表面分子束外延生长的小尺寸Ge量子点

通过调节生长参数, 在Si(001)衬底表面利用分子束外延(MBE)方法生长得到尺寸小于10 nm的高密度Ge量子点. 扩展的X射线吸收精细结构(EXAFS)的研究结果表明, 在500 ℃和550 ℃制备的小尺寸量子点内, GeSi合金的含量分别为75%和80%. 经热力学分析, 在量子点生长完成后的退火过程中, 可能存在Si原子从衬底表面向量子点表面扩散, 并和Ge原子通过表面偏析发生混合的过程. 另一方面, 小尺寸量子点较高的高宽比, 也会导致形成较高含量的GeSi合金.     

δ掺杂Si对InAs/GaAs量子点太阳电池的影响

在InAs/GaAs量子点的自组装生长阶段,采用δ掺杂技术对量子点进行不同浓度的Si掺杂,可以使得量子点的室温光致发光峰强度大幅提高,其原因是掺杂的Si原子释放电子钝化了周围的非辐射复合中心.这种掺杂也应用到了量子点太阳电池中,结果表明电池开路电压从0.72 V提高到了0.86 V,填充因子从60.4;提高到73.2;,短路电流从26.9 mA/cm2增加到27.4 mA/cm2.优化的Si掺杂可将量子点太阳的电池效率从11.7;提升到17.26;.