基于临界电子密度的多载波微放电全局阈值分析

多载波微放电即发生在宽带、大功率真空无源微波部件中的二次电子倍增放电现象, 是影响空间和加速器应用中无源微波部件长期可靠性的主要隐患. 多载波微放电全局阈值功率的预测对于工作在真空环境中的微波部件至关重要, 但迄今尚无有效方法进行上述阈值的准确分析. 本文将微放电发生过程中二次电子分布区域等效为等离子体, 通过在理论上建立微波部件的电磁特性和电子密度间的对应关系, 提出了一种基于测试系统可检测水平的多载波微放电全局阈值功率分析方法. 为了能够通过蒙特卡罗优化方法得到全局阈值, 进一步基于电子加速的类半正弦等效, 提出了微放电演化过程中电子数涨落的快速计算方法. 基于以上两种方法得到的针对实际微波部件的全局阈值分析结果与实验结果相符合. 不同于传统基于多载波信号功率分析的经验方法, 本文基于临界电子密度判断依据和电子数涨落快速计算, 为多载波微放电全局阈值的准确预测提供了一种高效的分析方法.     

Three-dimensional simulation method of multipactor in microwave components for high-power space application

Based on the particle-in-cell technology and the secondary electron emission theory, a three-dimensional simulation method for multipactor is presented in this paper. By combining the finite difference time domain method and the panicle tracing method, such an algorithm is self-consistent and accurate since the interaction between electromagnetic fields and particles is properly modeled. In the time domain aspect, the generation of multipactor can be easily visualized, which makes it possible to gain a deeper insight into the physical mechanism of this effect. In addition to the classic secondary electron emission model, the measured practical secondary electron yield is used, which increases the accuracy of the algorithm. In order to validate the method, the impedance transformer and ridge waveguide filter are studied. By analyzing the evolution of the secondaries obtained by our method, multipactor thresholds of these components are estimated, which show good agreement with the experimental results. Furthermore, the most sensitive positions where multipactor occurs are determined from the phase focusing phenomenon, which is very meaningful for multipactor analysis and design.     

金属规则表面形貌影响二次电子产额的解析模型

表面形貌是影响二次电子发射特性的重要因素, 但目前仍缺乏刻画这一影响规律的解析模型. 本文通过分析发现表面结构的遮挡作用是影响二次电子发射特性的主要因素. 基于二次电子以余弦角分布出射的规律, 提出了建立表面形貌参数与二次电子产额之间定量关系的方法, 并以矩形槽和三角槽为例, 建立了电子正入射和斜入射时的一代二次电子产额的解析模型. 将推导的解析模型与Monte Carlo模拟结果和实验结果进行了比较, 结果表明本文建立的模型能够正确反映规则表面形貌的二次电子产额. 本文的模型对于反映常用规则结构影响二次电子出射的规律以及指导通过表面结构调控二次电子发射特性都具有参考价值.     

An efficient multipaction suppression method in microwave components for space application

Multipaction,caused by the secondary electron emission phenomenon,has been a challenge in space applications due to the resulting degradation of system performance as well as the reduction in the service life of high power components.In this paper we report a novel approach to realize an effective increase in the multipaction threshold by employing micro-porous surfaces.Two micro-porous structures,i.e.,a regular micro-porous array fabricated by photolithography pattern processing and an irregular micro-porous array fabricated by a direct chemical etching technique,are proposed for suppressing the secondary electron yield(SEY) and multipaction in components,and the benefits are validated both theoretically and experimentally.These surface processing technologies are compatible with the metal plating process,and offer substantial flexibility and accuracy in topology design.The suppression effect is quantified for the first time through the proper fitting of the surface morphology and the corresponding secondary emission properties.Insertion losses when using these structures decrease dramatically compared with regular millimeter-scale structures on high power dielectric windows.SEY tests on samples show that the maximum yield of Ag-plated samples is reduced from 2.17 to 1.58 for directly chemical etched samples.Multipaction testing of actual C-band impedance transformers shows that the discharge thresholds of the processed components increase from 2100 W to 5500 W for photolithography pattern processing and 7200 W for direct chemical etching,respectively.Insertion losses increase from 0.13 d B to only 0.15 d B for both surface treatments in the transmission band.The experimental results agree well with the simulation results,which offers great potential in the quantitative anti-multipaction design of high power microwave components for space applications.     

Characteristics of secondary electron emission from few layer graphene on silicon (111) surface

As a typical two-dimensional (2D) coating material, graphene has been utilized to effectively reduce secondary electron emission from the surface. Nevertheless, the microscopic mechanism and the dominant factor of secondary electron emission suppression remain controversial. Since traditional models rely on the data of experimental bulk properties which are scarcely appropriate to the 2D coating situation, this paper presents the first-principles-based numerical calculations of the electron interaction and emission process for monolayer and multilayer graphene on silicon (111) substrate. By using the anisotropic energy loss for the coating graphene, the electron transport process can be described more realistically. The real physical electron interactions, including the elastic scattering of electron—nucleus, inelastic scattering of the electron—extranuclear electron, and electron—phonon effect, are considered and calculated by using the Monte Carlo method. The energy level transition theory-based first-principles method and the full Penn algorithm are used to calculate the energy loss function during the inelastic scattering. Variations of the energy loss function and interface electron density differences for 1 to 4 layer graphene coating GoSi are calculated, and their inner electron distributions and secondary electron emissions are analyzed. Simulation results demonstrate that the dominant factor of the inhibiting of secondary electron yield (SEY) of GoSi is to induce the deeper electrons in the internal scattering process. In contrast, a low surface potential barrier due to the positive deviation of electron density difference at monolayer GoSi interface in turn weakens the suppression of secondary electron emission of the graphene layer. Only when the graphene layer number is 3, does the contribution of surface work function to the secondary electron emission suppression appear to be slightly positive.     

Vaughan二次电子发射模型的深入研究与拓展

当前国际上基于Vaughan二次电子模型的材料数据库十分丰富,且其数据均经过大量实验验证,具有很高的实验精度和可信度。为了将这些数据库融入到自主开发的电磁粒子联合模拟平台,完善和提高电磁粒子混合算法的计算精度,在对经典Vaughan模型做了深入研究的基础上,成功地推导出产生二次电子数目的计算方法。此外,为了使经典Vaughan二次电子发射理论更便捷和完整地应用到实际工程应用当中,还对二次电子出射能量以及二次电子出射角度的计算等实际问题做了进一步的拓展性研究。数值计算结果验证了拓展后Vaughan模型算法的准确性和鲁棒性。     

多载波微放电阈值的粒子模拟及分析

多载波微放电阈值的准确分析对于空间大功率微波系统的长期可靠性至关重要.近年来,一种源于多载波包络周期间少量剩余电子累积的"长周期"微放电机制引发广泛关注.国内外研究者普遍认为,相对源于单个周期内电子累积的"周期内"微放电,"长周期"微放电应该被优先激发、具有更低的阈值.但依据长周期微放电判据分析所得的阈值显著高于实验结果.针对这一问题,本文采用与实验系统可比拟的微放电判据,在相同多载波信号激励、相同微波部件条件下,对微放电的演化过程进行了粒子模拟,分析了多载波微放电、特别是周期内微放电的行为特性和发生条件,有效地解释了实验结果.本文的粒子模拟结果表明,给定微波部件被优先激发的多载波微放电类型取决于载波频率的配置,长周期微放电并非一定被优先激发,这是导致基于长周期微放电判据分析所得阈值显著高于实验结果这一问题的原因所在.以上结论对于空间大功率微波部件的多载波微放电全局阈值评估和抑制设计具有指导意义.     

大功率铁磁性微波部件微放电演变机理与抑制

铁氧体环行器是承载航天器微波系统大功率的关键器件,其大功率微放电效应是影响航天器在轨安全、可靠运行的瓶颈问题。从影响微放电效应的关键因素——二次电子发射特性出发,提出铁磁性微波部件微放电效应物理演变模型,揭示了铁磁性微波部件内部初始自由电子与二次电子运动的空间规律;通过改变铁磁性微波部件表面二次电子发射特性,揭示了铁磁性微波部件抗微放电优化设计的物理原理。在S频段铁氧体环行器中验证了基于表面二次电子发射特性的微放电效应抑制,将器件的微放电阈值从380 W提高至3400 W以上,提升效率大于900%。