Formation and local electronic structure of Ge clusters on Si（111）-7×7 surfaces

We report the formation and local electronic structure of Ge clusters on the Si(111)-7$\times $7 surface studied by using variable temperature scanning tunnelling microscopy (VT-STM) and low-temperature scanning tunnelling spectroscopy (STS). Atom-resolved STM images reveal that the Ge atoms are prone to forming clusters with 1.0~nm in diameter for coverage up to 0.12~ML. Such Ge clusters preferentially nucleate at the centre of the faulted-half unit cells, leading to the `dark sites' of Si centre adatoms from the surrounding three unfaulted-half unit cells in filled-state images. Bias-dependent STM images show the charge transfer from the neighbouring Si adatoms to Ge clusters. Low-temperature STS of the Ge clusters reveals that there is a band gap on the Ge cluster and the large voltage threshold is about 0.9~V.     

Co-Zr/Pd多层膜的磁性与结构

Co-Zr/Pd多层膜由高频溅射方法制得．磁性合金Co-Zr层厚度固定为1.8nm，改变Pd层厚度0.5—6nm．由振动样品磁强计测量，发现随Pd层厚度增加，磁化强度发生周期性振荡变化，周期约为1nm，这是由Pd层的极化振荡引起的．经X射线衍射测得Pd层厚度超过1.3nm时，磁性合金Co-Zr层发生晶化，而厚的Co-Zr单层膜是非晶结构．X射线大角衍射图中的超晶格峰表明，在Co-Zr层和Pd层之间存在相关生长．而且还发现，随Pd层厚度增加，样品在垂直膜面方向的晶粒尺寸及fcc（111）面的面间距发生周期性 关键词：