Li+,Bi3+掺杂对Lu2O3∶Ho3+,Yb3+粉体发光性质的影响

采用高温固相法制备了Li+、Bi3掺杂Lu2O3∶Ho3,Yb3粉体.用X射线衍射仪分析了合成粉体的微结构,用场发射扫描电子显微镜观测了样品的形貌及尺寸,用紫外可见近红外荧光光谱仪分析了合成粉体的上转换发射光谱以及能级寿命.结果 表明:Li+、Bi3掺杂的Lu2O3∶Ho3,Yb3粉体,仍然保持Lu2O3立方相结构.Li+或Bi3掺杂后,合成粉体的分散性更好,颗粒更均匀,且更加接近球形,LI+掺杂后粉体颗粒尺寸明显增加.用980 nm激发,4;Li+或1.5; Bi3+掺杂后,合成粉体中Ho3的绿光光强分别提高了约3.9倍、2.8倍.随着Li+浓度的增加,合成粉体中Ho3的5S2能级寿命先增加后减小;随着Bi3浓度的增加,合成粉体中Ho3的5S2能级寿命逐渐减小.     

Spin Polarization Properties of Na Doped Meridianal Tris（8-Hydroxyquinoline） Aluminum Studied by First Principles Calculations

We theoretically investigate the electronic structure and spin polarization properties of Na-doped meridianal tris（S-hydroxyquinoline） aluminum （Alq3） by first principles calculations. It is found that the spin density is distributed mainly in the Alq3 part in the Alq3：Na complex. Electron charge transfer takes place from the Na atom to the Alq3 molecule, which induces asymmetric changing of the molecule bond lengths, thus the spin density distribution becomes asymmetric. Spin polarization of the complex originates from the preferable filling of the spin-split nitrogen and carbon p-orbitals because of the different bond length changes of the Aiq3 molecule upon Na doping.     

Fabrication of large-scale ripples on fluorine-doped tin oxide films by femtosecond laser irradiation

The large-scale uniform self-organized ripples are fabricated on fluorine-doped tin oxide （FTO） coated glass by femtosecond laser. They can be smoothly linked in a horizontal line with the moving of XYZ stage by setting its velocity and the repetition rate of the laser. The ripple-to-ripple linking can also be realized through line-by-line scanning on a vertical level. The mechanism analysis shows that the seeding effect plays a key role in the linking of ripples.     

Frequency and voltage-dependent electrical and dielectric properties of Al/Co-doped PVA/p-Si structures at room temperature

In order to investigate of cobalt-doped interracial polyvinyl alcohol （PVA） layer and interface trap （Dit） effects, A1/p- Si Schottky barrier diodes （SBDs） are fabricated, and their electrical and dielectric properties are investigated at room temperature. The forward and reverse admittance measurements are carded out in the frequency and voltage ranges of 30 kHz-300 kHz and -5 V-6 V, respectively. C-V or er-V plots exhibit two distinct peaks corresponding to inversion and accumulation regions. The first peak is attributed to the existence of Dit, the other to the series resistance （Rs）, and interfacial layer. Both the real and imaginary parts of dielectric constant （er and err） and electric modulus （Mr and Mrr）, loss tangent （tan~）, and AC electrical conductivity （aac） are investigated, each as a function of frequency and applied bias voltage. Each of the M~ versus V and Mrr versus V plots shows a peak and the magnitude of peak increases with the increasing of frequency. Especially due to the Dit and interfacial PVA layer, both capacitance （C） and conductance （G/w） values are strongly affected, which consequently contributes to deviation from both the electrical and dielectric properties of A1/Co-doped PVA/p-Si （MPS） type SBD. In addition, the voltage-dependent profile of Dit is obtained from the low-high frequency capacitance （CLF-CHF） method.     

第一性原理计算N掺杂对InNbO4电子结构的影响

宽带隙（3.83 eV）半导体光催化材料InNbO4在紫外光作用下具有分解水和降解有机物的性能。最近实验发现了N掺杂InNbO4具有可见光下分解水制氢的活性。为了从理论上解释这一实验现象，本文采用基于密度泛函理论的第一性原理计算了N掺杂对InNbO4的能带结构、态密度和光学性质的影响。分析能带结构可得，N掺杂后在InNbO4的价带（O 2p）上方形成N 2p局域能级，导致电子跃迁所需的能量减小。吸收光谱表明，N掺杂后InNbO4的光吸收边出现了红移，实现了可见光吸收。     

Synthesis and Characterization of Titanium-doped Ordered Mesoporous Alumina

Titanium-doped ordered mesoporous alumina with specific structural properties has been prepared by the evaporation induced self-assembly sol-gel method. The results show that the doped titanium helps to stabilize the ordered mesoporous alumina material without influencing the ordered mesoporosity. The textural properties of the obtained sample are related to the amount of doped titanium. When the molar ratio of aluminum to titanium(n(Al)/n(Ti)) is controlled as 10.2, the titanium-doped ordered mesoporous alumina exhibits high surface area(up to 218 m2 g-1), large pore volume(0.42 cm3 g-1) and narrow pore diameter(6.1 nm) after treating at 900 ℃, showing high thermal stability. Moreover, the obtained sample calcined at 900 ℃ still maintains ordered mesoporous structure and exhibits high thermal stability.     

Cu∶CdS纳米晶的绿色合成、结构及光谱性质研究

本文利用一种绿色合成工艺,采用巯基乙酸作为配体,在水溶液中成功合成了水溶性的Cu∶CdS纳米晶。利用X射线衍射分析(XRD)、傅里叶变换红外光谱(FT-IR)、场发射扫描电镜显微分析(FE-SEM)、能量色散X射线谱(EDX)、紫外可见(UV-Vis)吸收光谱对样品的晶体学性质、结构、形貌、成分、吸收光谱性质进行了系统的研究。着重研究了掺杂浓度对Cu∶CdS纳米晶的晶体学性质及吸收光谱的影响。结果表明:合成的Cu∶CdS纳米晶为立方相,通过谢乐公式估算的平均晶粒尺寸约为2 nm;随着掺杂浓度的增加,产物的晶胞参数也逐渐增大,表明Cu离子已经掺入到CdS纳米晶中,该发现与EDX结果相吻合。FT-IR红外光谱发现,配体巯基乙酸成功包覆在纳米晶的表面。UV-vis吸收谱表明,掺杂后的Cu∶CdS纳米晶的吸收峰向长波长方向移动。这种红移主要是Cu离子在CdS纳米晶中的掺杂而形成电子能级跃迁所致。     

An optical study of the D-D neutron irradiation-induced defects in Co-and Cu-doped ZnO wafers

Room-temperature photoluminescence and optical transmittance spectroscopy of Co-doped(1×1014,5×1016,and 1×1017cm-2) and Cu-doped(5×1016cm-2) ZnO wafers irradiated by D-D neutrons(fluence of 2.9×1010 cm-2) have been investigated.After irradiation,the Co or Cu metal and oxide clusters in doped ZnO wafers are dissolved,and the wu¨rtzite structure of ZnO substrate for each sample remains unchanged and keeps in high c-axis preferential orientation.The degree of irradiation-induced crystal disorder reflected from the absorption band tail parameter(E0) is far greater for doped ZnO than the undoped one.Under the same doping concentration,the Cu-doped ZnO wafer has much higher irradiation-induced disorder than the Co-doped one.Photoluminescence measurements indicate that the introduction rate of both the zinc vacancy and the zinc interstitial is much higher for the doped ZnO wafer with a high doping level than the undoped one.In addition,both crystal lattice distortion and defect complexes are suggested to be formed in doped ZnO wafers.Consequently,the Co-or Cu-doped ZnO wafer(especially with a high doping level) exhibits very low radiation hardness compared with the undoped one,and the Cu-doped ZnO wafer is much less radiation-hard than the Co-doped one.