CdTe纳米晶及层状纳米晶薄膜的生长及其光荧光性质

用湿化学法在水溶液中合成了单分散的、大小尺寸可控的、巯基包裹的胶体CdTe纳米晶体,并利用CdTe纳米晶体和双功能分子poly（diallyldimethylammonium chloride）（PDDA）在Si衬底表面自组织生长了有序的层状纳米晶薄膜,荧光光谱研究了层状纳米晶体之间的共振能量迁移过程.结果表明：层状自组织生长的样品中纳米晶粒的间隔几乎一样,表明它们是有序排列的;而用直接干燥形成的样品中,小尺寸和大尺寸的纳米晶体之间间隔较短,发生荧光共振能量迁移,较小尺寸的纳米晶粒荧光峰（即波长较短处的晶 关键词： CdTe纳米晶体 量子限制效应 共振能量迁移     

Si／SiNx超晶格材料的非线性光学特性

采用射频磁控反应溅射技术与热退火处理制备了Si/SiNx超晶格材料。利用吸收光谱和X射线衍射对材料进行表征。通过皮秒脉冲激光单光束Z-扫描技术研究了该材料在非共振吸收区的三阶非线性光学特性,实验结果表明,样品的非线性折射率为负值,非线性吸收属于双光子吸收。由实验数据得到材料的三阶非线性极化率实部和虚部分别为1.27×10-7,1.51×10-8esu,该值比体硅材料的三阶非线性极化率值大5个数量级。对材料光学非线性产生的机理进行了探讨,认为材料的非线性极化率的增加来源于材料量子限制效应的增强。     

Eigenmode Splitting in all Hydrogenated Amorphous Silicon Nitride Coupled Microcavity

Hydrogenated amorphous silicon nitride based coupled optical microcavity is investigated theoretically and ex- perimentally. The theoretical calculation of the transmittance spectra of optical microcavity with one cavity and coupled microcavity with two-cavity is performed. The optical eigenmode splitting for coupled microcavity is found due to the interaction between the neighbouring localized cavities. Experimentally, the coupled cavity samples are prepared by plasma enhanced chemical vapour deposition and characterized by photoluminescence measurements. It is found that the photoluminescence peak wavelength agrees well with the cavity mode in the calculated transmittance spectra. This eigenmode splitting is analogous to the electron state energy splitting in diatom molecules.     

Photoluminescence of amorphous carbon films fabricated by layer—by—layer hydrogen plasma chemical annealing method

A method in which nanometre-thick film deposition was alternated with hydrogen plasma annealing (layer-by-layer method) was applied to fabricate hydrogenated amorphous carbon films in a conventional plasma-enhanced chemical vapour deposition system.It was found that the hydrogen plasma treatment could decrease the hydrogen concentration in the films and change the sp^2/sp^3 ratio to some extent by chemical etching.Blue photoluminescence was observed at room temperature,as a result of the reduction of sp^2 clusters in the films.     

NANO-CRYSTALLINE SILICON FILMS PRODUCED BY LAYER-BY-LAYER DEPOSITION TECHNIQUE AND THEIR NOVEL PROPERTIES

We have applied the layer-by-layer deposition technique to the growth of nano-crystalline silicon films by varying the hydrogen plasma exposure time. The tailoring effect of hydrogen plasma has been studied, The novel optical and electronic proper-ties of these films have also been reported.