NANO-CRYSTALLINE SILICON FILMS PRODUCED BY LAYER-BY-LAYER DEPOSITION TECHNIQUE AND THEIR NOVEL PROPERTIES

We have applied the layer-by-layer deposition technique to the growth of nano-crystalline silicon films by varying the hydrogen plasma exposure time. The tailoring effect of hydrogen plasma has been studied, The novel optical and electronic proper-ties of these films have also been reported.     

NMR STUDIES OF HYDROGEN MICROSTURUCTURES IN HYDROGENATED AMORPHOUS SILICON FILMS

Four kinds of a-Si: H films deposited in the PECVD system with different T_s are studied by ¹H NMR technique. Direct evidence is given to confirm hydrogen atoms in the diluted and clustered phases. The local bonding configurations for hydrogen and the density of dangling bonds are analyzed by ESR and infrared absorption spectroscopy. The behaviour of hydrogen in a-Si; H films is discussed.     

NANO-CRYSTALLINE SILICON FILMS PRODUCED BY LAYER-BY-LAYER DEPOSITION TECHNIQUE AND THEIR NOVEL PROPERTIES

We have applied the layer-by-layer deposition technique to the growth of nano-crystalline silicon films by varying the hydrogen plasma exposure time. The tailoring effect of hydrogen plasma has been studied, The novel optical and electronic proper-ties of these films have also been reported.