走近电离辐射

 提起辐射,人们很自然地联想到手机、电脑的电磁辐射,对电离辐射则比较陌生。其实,这种电磁辐射就是电离辐射的一种。电离辐射还包括电子、质子、中子及较重粒子的粒子源,微波辐射,光辐射,同步辐射等。我们的生活环境中存在着天然电离辐射和人工电离辐射,可以说,电离辐射就在我们身边。电离辐射可以造福于人类,它在工业、医学、农业上有着广泛的应用;电离辐射也可以给人类带来巨大的灾难,特别是核武器和辐射事故的发生。因此,我们对待电离辐射这把双刃剑时,既要充分利用它来造福人类,又要严防它的危害。     

蓝光相变光盘的多层膜结构设计

为了使光盘获得优良的记录／读出性能并能够长期稳定地使用，必须优化设计相变光盘的多层膜结构。采用自行设计的模拟分析相变光盘读出过程设计软件，从光学角度出发模拟计算了蓝光(405nm)相变光盘的膜层结构，研究了多层膜系的反射率和反射率对比度等光学参量与各层膜厚度和槽深的关系。研究得出的最佳多层膜结构为：下介电层／记录层／上介电层／反射层的厚度对于台记录为100nm／10nm／25nm，／60nm，而对于槽记录则为140nm／15nm／30nm，／60nm，槽深为50nm。模拟计算结果对于将来高密度蓝光相变光盘的制备具有一定的指导意义。     

Emittance Measurements for Beams Extracted from LECR3 Ion Source

High quality ion beams are required by IMP cyclotron and atomic physics research, so it is important to research and measure beam emitt ance of ECR ion source. Intense beams extracted from ECR ion source usually have low energy, so it is suitable to use Electric-Sweep Scanner to measure the emittance. This kind of measurement is popularly used at ECR ion source, and it has some prominent merits such as high accuracy, very short time of data processing and easy expressing of the emittance pattern. So we designed and built this emittance scanner to measure emittance of the ion beams produced by LECR3 ion source. The structure of the ESS is shown in Fig.l, and the photo of the ESS is shown in Fig.2.     

Deposition of Diamond-Like carbon Films by High-Intensity Pulsed Ion Beam Ablation at Various Substrate Temperatures

Diamond-like carbon (DLC) films have been deposited on to Si substrates at substrate temperatures from 255℃ to 400O℃ by a high-intensity pulsed-ion-beam (HIPIB) ablation deposition technique. The formation of DLC is confirmed by Raman spectroscopy. According to an x-ray photoelectron spectroscopy analysis, the concentration of sp^3 carbon in the films is about 40% when the substrate temperature is below 300℃ C. With increasing substratetemperature from 25℃ to 400℃, the concentration of sp^3 carbon decreases from 43% to 8%. In other words,sp3 carbon is graphitized into sp^2 carbon when the substrate temperature is above 300℃. The results of xray diffraction and atomic force microscopy show that, with increasing the substrate temperature, the surface roughness and the friction coefficient increase, and the microhardness and the residual stress of the films decrease.     

磁逆多光子非线性Compton散射的谱功率

相对论电子在强磁场中的磁逆Compton散射是一种重要的γ射线辐射机制。虽然对该问题的研究已有二十多年的历史，但对磁逆多光子非线性Compton散射谱功率的研究尚未见报道。本文采用电子与光子非弹性碰撞模型，首次给出了磁逆多光子非线性Compton散射的谱功率。     

BEPCⅡ束流相关本底的蒙特卡罗模拟研究(Ⅱ)—束流-气体相互作用

介绍了用蒙特卡罗方法研究正常对撞模式下束流本底中的束流-气体相互作用的原理与效果.使用通用的模拟工具,研究了BEPCⅡ的束流-气体本底对设计中的BESⅢ的影响.结果显示,在储存环上设置挡板后,探测器的本底在允许的范围之内.模拟结果对BEPCⅡ-BESⅢ的设计建造具有指导意义.     

对激光等离子体中X射线的产生与辐射加热研究

利用一维辐射流体力学程序MULTI数值模拟研究了功率为1014Wcm2、脉冲宽度为300ps、波长为0.44μm的强激光辐照平面Au靶时产生X射线的过程,给出了X射线转换效率和能谱分布.通过将靶物质划分为对所产生的X射线光学薄的转化区和光学厚的再发射区,得到了作为黑体辐射热源的最佳靶厚度,并给出了辐射加热靶所产生的等离子体的密度和温度的空间分布. 关键词： 辐射流体力学 激光等离子体 X射线转换 辐射热波     

类型γ射线能谱指纹的识别机理

放射源的辐射指纹能起到标识和鉴别放射性物体的作用.在涉及核弹头不可逆销毁过程的深度核裁军核查中,核弹头的辐射指纹对标识和鉴别裁减下来的核弹头将起到关键作用.预先研究辐射指纹的有关技术,如识别机理的研究,将有助于深度核裁军的核弹头核查技术发展.以实验室放射源为研究对象,探索了类型γ射线能谱指纹的同一性识别机理.类型γ射线指纹识别机理的研究,就是要找出一种合适的方法,以较高的置信度,描述两个正在进行比较的γ射线指纹是否为同一放射源的指纹.采用了谱形比较法,并用谱相似度概念来描述两个指纹的相似程度.在谱形比较思想的指导下,编制了放射源类型指纹识别软件,并通过放射源同一性的识别实验验证了软件的有效性,同时研究了谱相似度随统计涨落和测量条件,如时间、源强和本底等因素的变化情况.研究结果表明:1)用相似度概念来描述两个指纹的相似程度,回答两个待比较的γ射线能谱是否代表同一类型放射源,是切实可行的;2)该识别机理只具备识别放射源类型的能力,而对同一类型、差异甚微的放射源个体还不能识别 关键词： γ射线能谱指纹 辐射指纹 识别机理 核查技术     

Fifth—Order Harmonic Generation using a Coherent Controlled Two—Pulsed Optical Field

We have experimentally studied the characteristics of fifth-order harmonic radiation produced by two coherent femtosecond laser pulses with a changeable relative phase.The intensities of harmonic generation are found to increase with the coherent degree.In one optical Period,the temporal variation of harmonics exhibits an asymmetric characteristic,which is interpreted in terms of ionization theory and the deformation of the wave packets of fundamental field contribution to harmonic generation.