Spin Squeezed States and Entangled States

The time evolution of spontaneous decay of a two-level atom in one dimension photonic crystals is investigated with three different methods ： （ 1 ） using the Markovian approximation, （2） using the constant approximation, and （3） without using any of the two approximations. The second and third methods are Non-Markovian, which yield similar results. The second method gives us a clear physical picture of the effect of the reflected field. The Non- Markovian processes due to the reflected field have great influence on the atomic decay mainly within one tenth of an optical cycle, and reach steady state influence fter one optical cycle. The result of Markovian approximation gives almost the same result of the other two methods after one optical cycle, but misses the details within the one optical cycle.     

快速康复外科在肝癌肝切除术中的应用及对细胞免疫功能的影响

目的探讨快速康复外科（FTS）在肝癌肝切除患者围术期的临床应用效果及对细胞免疫功能的影响。方法选取择期行肝癌肝切除术患者48例,按随机数字表法分为FTS组与常规组,各24例,比较两组患者术后肝功能、细胞免疫功能及临床疗效指标。结果两组患者临床基线资料比较差异均无统计学意义（均P＞0.05）。术后第３天,FTS组TBil为（113.96±61.39）μmol/L,ALT为（146.17±72.51）U/L,AST为（155.04±54.04）U/L;常规组TBil为（165.25±64.38）μmol/L,ALT为（213.46±107.48）U/L,AST为（225.92±81.51）U/L,两组比较差异均有统计学意义（均P＜0.05）;FTS组CD3+、CD4+、CD4+/CD8+指标均明显优于常规组（均P＜0.05）。FTS组患者术后首次肛门排气时间、首次进半流质时间、首次排便时间均较常规组提前（均P＜0.05）,术后住院时间亦缩短（P＜0.05）。结论FTS理念用于肝癌肝切除术患者围术期处理可降低患者术后应激反应、提高术后细胞免疫功能,改善患者术后肝功能恢复效果、缩短术后肛门排气时间和住院时间,安全性好,加快患者康复,值得临床应用。     

超几何光场态与二能级原子相互作用中原子反转的演化及光场的反聚束 …

研究作为二项式态单参数推广超几何态与二能级原子的强度耦合相互作用。讨论了原子反转的动力学演化以及光场的反聚束效应。     

MULTIPHOTON INTERACTION OF A TWO-LEVEL ATOM WITH A LARGE PERIOD QUANTIZED STANDING WAVE FIELD BEYOND THE RAMAN-NATH REGIME

A model that describes the multiphoton interaction of a two-level atom with a large period quantized standing wave field beyond the Raman-Nath regime is solved exactly by the Wei-Norman's operator factorization method, and the momentum distribution of the atom is discussed. We also investigate the dynamics of the atomic population inversion and field second-order correlation function. They exhibit very remarkable behavior due to the inclusion of atomic translational motion.     

XAFS研究Ni-P和Ni-Ce-P超细非晶合金的退火晶化

采用原子配位分布函数为Gaussian函数Ｐ_G和指数函数P_E直积的非 对称模型进行拟合计算,XAFS定量地研究化学还原法制备的Ni-P和Ni-Ce-P超细非晶合金大 无序度体系中Ni原子的局域环境结构随退火温度升高而产生的变化.结果表明Ni-P和Ni-Ce-P 原样的Ni-Ni配位的平均键长Ｒ_j、配位数N、热无序度σ_T、结构无 序度σ_S分别为0271nm,100,00060nm,0028n 关键词： XAFS Ni-P Ni-Ce-P 超细非晶合金 局域结构     

过渡元素Dawson结构的钨钒磷四元杂多配合物的合成与表征

制备了两个系列１２种尚未见文献报道的过渡金属Ｄａｗｓｏｎ结构的钨钒磷四元杂多配合物。经元素分析和热重分析确定配合物通式为Ｋ９，１０［Ｐ２Ｍ（Ｈ２Ｏ）Ｗ１５Ｖ２Ｏ６１］．ｘＨ２Ｏ和Ｋ１０，，１１［Ｐ２Ｍ（Ｈ２Ｏ）Ｗ１４Ｖ３Ｏ６１］．ｘＨ２Ｏ）（Ｍ＝Ｆｅ＾３＾＋，Ｃｏ＾３＾＋，Ｎｉ＾２＾＋，Ｍｎ＾２＾＋，Ｃｕ＾２＾＋，Ｚｎ＾２＾＋＿），采用ＩＲ，ＵＶ，ＮＭＲ，ＥＳＲ和ＸＲＤ等方法进行了结构表征。     

N-甲氧基-N-[2-(1,6-2H-1-取代-6-羰基-哒嗪-3-氧甲基)苯基]氨基甲酸甲酯的合成及生物活性研究

为了寻找高效、低毒的农药, 设计合成了一系列新的N-甲氧基-N-[2-(1,6-2H-1-取代-6-羰基-哒嗪-3-氧甲基)苯基]氨基甲酸甲酯化合物3a～3k, 其结构经IR, ¹H NMR, LC/MS和元素分析确认. 生物活性测定表明, 部分化合物在50 mg/L下对小麦赤霉病菌(Gibberella zeae)、稻瘟病菌(Pyricularia oryzae)和黄瓜灰霉病菌(Botrytis cinerea)有较好的抑菌活性.     

三元合金Ga0.52In0.48P的喇曼散射谱

采用室温下微区Raman散射方法,观测到了GaInP2的LO双模行为和禁戒的TO模,由于晶格有序导致晶体对称性从Td降低为C3v,从而使禁戒的TO模变为Raman活性。在所有的样品中都观测到了由晶格无序激活的DALA模。在有序样品中,除观测到二级Raman散射峰LO1＋LO2以外,还观测到了由超晶格效应所导致的FLA折叠模和LO模的分裂。对LO模峰谷b/a的分析表明,随着晶格有序度的增加,b/a值减小。这是因为：一方面主要是由于禁戒的TO模变为Raman活性所引起的,另一方面,还可能有LO1模和LO2模分裂的贡献。在实验上,可以用b/a值或FLA的强度来表示样品的有序度。     

Derivation of quantum Chernoff metric with perturbation expansion method

We investigate a measure of distinguishability defined by the quantum Chernoff bound, which naturally induces the quantum Chernoff metric over a manifold of quantum states. Based on a quantum statistical model, we alternatively derive this metric by means of perturbation expansion. Moreover, we show that the quantum Chernoff metric coincides with the infinitesimal form of the quantum Hellinger distance, and reduces to the variant version of the quantum Fisher information for the single-parameter case. We also give the exact form of the quantum Chernoff metric for a qubit system containing a single parameter.     

中心波长为13．9nm的正入射Mo／Si多层膜

用由铜靶激光等离子体光源等组成的反射率计对自行设计的周期厚度为7.14nm的120层Mo/Si多层膜进行极紫外(EUV)波段反射率测量。由于多层膜层数增加所引起的吸收、膜层界面之间的扩散以及镀膜过程中的膜厚控制误差或表面被氧化(污染)等原因,正入射Mo/Si多层膜在13.9nm处的反射率低于理论计算值73.2%,最后用原子力显微镜(AFM)测量其表面粗糙度为σ=0.401nm。