氧气流量对MPCVD制备微/纳米双层金刚石膜的影响

应用微波等离子体化学气相沉积(MPCVD)技术,以CH4/H2/Ar为主要气源,成功制备出了微/纳米双层金刚石膜.同时,在纳米膜层生长过程中,通过添加O2辅助气体,研究了不同O2流量对微/纳米金刚石膜生长的影响.结果表明,当O2流量在0 ～ 0.8 sccm范围时,所获得的金刚石膜仍为微/纳米两层膜结构;当氧气流量增加到1.2 sccm时,金刚石膜只有一层微米膜结构;而O2流量在0～ 1.2 sccm范围时,纳米层晶粒尺寸及品质与氧气流量成正比例关系.表明适量引入O2可以促进纳米层晶粒长大和提高膜品质.另外,当O2流量为0.8 sccm,所制备的微/纳米金刚石膜不仅品质好,而且生长率也较高.     

W过渡层结合界面对金刚石薄膜在WC-6%Co上的附着力的影响

 在微波等离子体化学气相沉积装置中,采用负偏压形核等方法,研究两种不同的W过渡层/基体结合界面对金刚石薄膜与WC-6%Co附着力的影响。采用氢等离子体脱碳、磁控溅射镀W、高偏压碳化等方法,在YG6衬底表面形成化学反应型界面,W膜在碳化时和基体WC连为一体,极大地增加了W膜与基体的附着力,明显优于直接镀钨、碳化形成的物理吸附界面。在高负偏压下碳化,能提高表面粗糙度,增加膜与基体机械钳合,而负偏压形核增加核密度,从而增加膜与基体的接触面积,结果极大地提高了金刚石薄膜的附着力。     

微波等离子化学气相沉积金刚石膜涂层氮化硅刀具

金刚石的成核和生长影响金刚石膜的质量.本文用自制的一种新型的不锈钢谐振腔型微波等离子CVD设备,等离子直径为76mm,均匀的温度分布使得金刚石膜均匀生长,在不同工艺条件下研究Si3N4陶瓷刀具上金刚石涂层的成核质量,用SEM,Raman检测和分析研究了在Si3N4刀具上高速高质量生长金刚石膜涂层的制备工艺,并检测了涂层刀具的切削性能,切削试验表明,在切削18wt;Si-Al合金时,金刚石涂层刀具比未涂层刀具的使用寿命增多10倍以上.     

微波等离子体化学气相沉积法低温合成纳米碳管

纳米碳管的低温合成是纳米碳管合成的一个重要研究方向。在众多的合成方法 中,化学气相沉积法,特别是等离子体化学气相沉积法在纳米碳管的低温合成方面 意义重大。本研究利用溶胶-凝胶法结合等离子体还原,获得了负载在SiO_2上的纳 米金属钻颗粒。以甲烷为碳源、氢气为载气,在纳米金属钴颗粒的催化作用下,利 用微波等离子体化学气相沉积法在低于500 ℃ 的温度条件下合成了纯度较高的纳 米碳管。     

镍基板上低温合成定向纳米碳管

纳米碳管具有非常优异的场发射效应 ,亮度高、均匀且稳定的纳米碳管场效应发射器 ,例如平板显示器、阴极射线管以及信号灯等有着非常广阔的应用前景 [1] .由于纳米碳管的场发射效应与纳米碳管的方向性有关[2 ] ,因此定向纳米碳管的制备及其场发射性能研究是当前的一个研究热点     

硬质合金基体上钛过渡层碳化条件对金刚石薄膜附着力的影响

以WC-6;Co为基体,采用磁控溅射法,在酸蚀后进行氢等离子体脱碳试样上制备Ti过渡层,然后碳化过渡层为TiC.在电子辅助热丝化学气相沉积装置中制备金刚石薄膜.研究碳化条件对金刚石薄膜与基体附着力的影响.结果表明,在700℃左右的低温碳化,TiC结构致密,而在850℃左右的高温碳化,TiC呈疏松的多孔组织,在CH4-Ar等离子体中碳化则850℃左右仍能获得致密的TiC层.在致密的过渡层上沉积的金刚石薄膜具有更高的附着力.     

The effect of initial discharge conditions on the properties of microcrystalline silicon thin films and solar cells

This paper studies the effects of silane back diffusion in the initial plasma ignition stage on the properties of microcrystalline silicon ($\mu $c-Si:H) films by Raman spectroscopy and spectroscopic ellipsometry, through delaying the injection of SiH7280N, 7830G, 8115Hhttp://cpb.iphy.ac.cn/CN/10.1088/1674-1056/19/5/057205https://cpb.iphy.ac.cn/CN/article/downloadArticleFile.do?attachType=PDF&id=111771back diffusion, microcrystalline silicon, thin film, Raman crystallinityProject supported by the State Key Development Program for Basic Research of China (Grant No.~2006CB202601).This paper studies the effects of silane back diffusion in the initial plasma ignition stage on the properties of microcrystalline silicon ($\mu $c-Si:H) films by Raman spectroscopy and spectroscopic ellipsometry, through delaying the injection of SiH$_{4}$ gas to the reactor before plasma ignition. By comparing with standard discharge condition, delayed SiH$_{4}$ gas condition could prevent the back diffusion of SiH$_{4}$ from the reactor to the deposition region effectively, which induced the formation of a thick amorphous incubation layer in the interface between bulk film and glass substrate. Applying this method, it obtains the improvement of spectral response in the middle and long wavelength region by combining this method with solar cell fabrication. Finally, results are explained by modifying zero-order analytical model, and a good agreement is found between model and experiments concerning the optimum delayed injection time.back;diffusion;microcrystalline;silicon;thin;film;Raman;crystallinityThis paper studies the effects of silane back diffusion in the initial plasma ignition stage on the properties of microcrystalline silicon(μc-Si:H) films by Raman spectroscopy and spectroscopic ellipsometry,through delaying the injection of SiH4 gas to the reactor before plasma ignition.Compared with standard discharge condition,delayed SiH4 gas condition could prevent the back diffusion of SiH4 from the reactor to the deposition region effectively,which induced the formation of a thick amorphous incubation layer in the interface between bulk film and glass substrate.Applying this method,it obtains the improvement of spectral response in the middle and long wavelength region by combining this method with solar cell fabrication.Finally,results are explained by modifying zero-order analytical model,and a good agreement is found between the model and experiments concerning the optimum delayed injection time.     

常压微波等离子体炬的模拟及硫化氢处理

对常压微波等离子体炬装置及H2S废气的处理进行了研究。介绍了一种具有特殊喷嘴结构的微波等离子体炬装置,模拟了不同喷嘴结构下谐振腔中微波电场的强度及分布,在此基础上,进行了H2S废气处理的实验研究。结果表明:采用新型喷嘴结构在喷嘴尖端产生的电场强度和分布更利于等离子体炬的激发,微波功率为500 W时,喷嘴尖端处的电场强度在1.5×106 V/m以上,远大于氩气的击穿电场强度,能有效地激发等离子体炬;当H2S气体与Ar气体流量比为10∶90,总流量为1000mL/min,微波功率为1000 W时,H2S的转化率最大达91.32%;大气微波等离子体炬能有效地处理H2S废气。实验结果证明了模拟结果的正确性和装置的有效性。     

自偏压作用下纳米碳管的定向生长

以玻璃为基板材料, 在550 ℃的低温条件下利用微波等离子体化学气相沉积法合成了定向纳米碳管.结果表明, 在利用微波等离子体化学气相沉积法合成纳米碳管时, 因等离子体作用存在于基板表面的自偏压对纳米碳管的定向生长起着非常重要的作用.自偏压的作用总是使纳米碳管的生长垂直于基板表面.     

Effects of deposition pressure and plasma power on the growth and properties of boron-doped microcrystalline silicon films

Using diborane as doping gas, p-doped μc-Si：H layers are deposited by using the plasma enhanced chemical vapour deposition （PECVD） technology. The effects of deposition pressure and plasma power on the growth and the properties of μc-Si：H layers are investigated. The results show that the deposition rate, the electrical and the structural properties are all strongly dependent on deposition pressure and plasma power. Boron-doped μc-Si：H films with a dark conductivity as high as 1.42 Ω^-1·cm^-1 and a crystallinity of above 50% are obtained. With this p-layer, μc-Si：H solar cells are fabricated. In addition, the mechanism for the effects of deposition pressure and plasma power on the growth and the properties of boron-doped μc-Si：H layers is discussed.