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101.
用密度泛函理论方法对半导体二元微团簇GaxPy和GaxPy−(x+y=8)的几何结构、电子态、能量等进行了计算, 在B3LYP/6-311+G(2df)水平下完成结构优化和频率分析. 讨论了电荷诱导结构发生变化情况, 与中性团簇相比, 在阴离子团簇中, Ga—P键较P—P键有利于形成. 预测了未知Ga1P7−、Ga2P6−、Ga3P5−、Ga6P2−和Ga7P1−化合物的最稳定结构存在的可能性, 得出在GaxPy和GaxPy−(x+y=8)中, Ga4P4和Ga4P4−比较稳定. 给出了两种能差即绝热电子亲合势(ΔEAEA)和垂直电离能(ΔEVDE), 并与相关文献作比较. Ga4P4和Ga5P3的绝热电子亲合势与实验值相当吻合. 布居分析表明, 磷化镓团簇的成键属于混合键型. 相似文献
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103.
A recent experimental determination[1] of the dissociation energies (D0) for H2N-H, H2N+-H and H2N-H+, the ionization energies for NH3 and NH2 resulted in large deviations when compared with those of the earlier values and the QCISD(T)/6-311+G(3df,2p) ab initio calculations. We have performed some higher level ab initio calculations on these data by utilizing the Gaussian 92/DFT and Gaussian 94 pakages of programs and have assessed the available experimental values. Our calculations were carried out at the QCISD (TQ)/aug-cc-pVDZ, G2(QCI), QCISD(T)/6-311 ++G(3df,3pd) and QCISD(T)/aug-cc-pVTZ levels of theory. Geometries were optimized at both of the MP2(full)/6-31G(d) and the MP2(full)/6-31(d,p) levels, and were compared with those of the experiments if available. The MP2(full)/6-31G(d,p) tight-optimized geometries for the neutrals are closer to those of the experiments than those of the MP2 (full)/6-31G(d), and are in excellent agreement with the experimental results as shown in Table 1. In this case, we assumed that the optimized geometries for the cations would be better if p polarization functions are added to the hydrogen atoms. We firstly noted that the symmetry of the NH3+ cation was D3h, other than Cs. as reported in ref.[1]. All of the zero-point energies and the final geometries are calculated at the MP2(full)/6-31G(d,p) level of theory. We have also repeated the QCISD(T )/6-311 + G(3df,2p) calculations of ref. [1], because we could not identify their level of goemetry optimization. It is found that the total energy, -55.244 19 Hartrees, for NH2+(1A1 ) in ref.[1] might be in error. Our result is -55.336 29 Hartrees at the same level of theory. At our highest level [QCISD(T)/aug-cc-pVTZ] of calculations as shown in Table 3, the D0 (temperature at zero Kelvin) values of H2N-H, H2N+-H(3B1for NH2+ ) and H2N- H+ are 4.51, 5.49 and 8.00 eV, respectively. These data reported in re f.[1] were 4.97, 5.59 and 8.41 eV, respectively. Our result on D0(H2N-H) supports the work of ref.[2,3,5,6]. The ionization energies (IE) for NH3 and NH2 (3B1 for NH2+) at our highest level are 10.11 and 11.09 eV while in ref.[1] were 10.16 and 10.78 eV, respectively. For the latter, our result supports the experiment of ref.[3]. Our predicted D0 for HN2+-H and IE for NH2 (1A1 for each NH2+) are 6.80 and 12.39 eV, respectively. These values differ greatly from the predicted values (9.29 and 14.88 eV) of ref.[1] where the total energy of NH2+(1A1) might be in error. The D0 value for HN-H has not been found in ref.[1]. Our result supports the work of ref.[3]. We have also derived all of these values at the temperature of 298K and under the pressure of 101kPa at several levels of thoery as shown in Table 3. On examining the experiment of ref.[1] in detail, it is easy to find that all of the larger deviations might be from a too high value of the appearance potential of proton AP(H+). Indeed, ref.[1] has mentioned that the determintion of AP(H+), due to kinetic shift, would lead to a hihger value for the dissociation energy as has been pointed out by Berkowitz and Ruscic. In this work, we concluded that, besides some mistakes in the theoretical calculations of ref.[1], the dissociation energies for H2N-H and H2N-H+,the IE for NH2 (3B1 for NH2+) might also be unreliable and need to be re-examined.
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104.
由X-射线光电子谱测定的原子内层电子的电离能(也称结合能)能反映分子内部不同区域的原子特性,常用于估计分子内不同部位的化学活性、分子中的电子结构变化以及取代基效应[1]。还用于研究价电子性质[2-4]和化合物的气相酸碱性[5]。目前,对原子内层电子电离能的研究有实验测定和 相似文献
105.
106.
107.
电离度与类H离子电离能关系的研究 总被引:1,自引:0,他引:1
张国营 《原子与分子物理学报》1999,(1)
研究了类H离子电离能与电离度ΔZ(离子电荷数)之间的关系,给出了类H离子各电离态电离能的计算公式,并对所有类H离子的电离能进行了计算。与实验结果或相对论多组态DiracFock方法的结果比较,得到了较满意的结果。 相似文献
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109.
针对空间质子诱发CCD性能退化问题,开展了CCD质子辐照效应的三维蒙特卡罗模拟研究。采用三维蒙特卡罗软件Geant4模拟计算了不同能量质子在Si和SiO2中的射程及Bragg峰,分析了不同能量质子在材料中能量沉积的过程,并将模拟结果与相关数据进行对比,模拟误差在5%以内。根据质子与材料相互作用的物理过程,选取了合适的Lindhard分离函数,添加合适的物理过程,模拟计算了不同能量质子在SiO2中的电离能量损失和Si中的非电离能量损失,并将结果与国外相关数据进行对比。根据CCD的生产工艺参数,建立了单个像元的三维模拟模型,确定了质子辐照损伤的灵敏体积,模拟计算了不同能量质子在像元灵敏体积内的电离能量沉积与非电离能量沉积,分析了CCD不同能量质子的辐照损伤差异产生的机理。结合粒子输运计算结果与CCD质子辐照实验结果,分析了质子辐照诱发CCD辐射敏感参数退化的物理机制。 相似文献
110.