基于等效层法分析对称性倍频分束镜的半波孔

半波孔问题严重影响了倍频分束镜在高功率激光系统中的应用。为研究半波孔的产生机理,分别模拟了由高、低折射率膜层厚度失配和膜料色散失配引起的1/4波长对称规整膜系的半波孔。基于等效层理论,在Matlab平台上计算膜系的等效折射率E,绘出其对应的反射率极值包络曲线。通过研究对称膜系的等效折射率、反射率光谱和反射率包络之间的关系,从原理上分析了半波孔的大小、位置和变化趋势等特点。结果表明,膜层的厚度失配使对称膜系的等效折射率在光谱半波处产生截止带。膜层数越多,膜层厚度和膜料色散的失配越严重,则倍频分束镜的半波孔越深。     

亚波长光栅偏振片的纳秒脉冲激光损伤特性

偏振片在诸多光学系统中有着重要的应用。亚波长介质光栅可用作正入射偏振片，在高能激光系统中有着广泛的应用前景。为了探究波长为1 064 nm的纳秒脉冲激光对于亚波长全介质光栅的诱导损伤特性，使用了粒子群优化算法结合严格耦合波分析设计了光栅的几何参数，计算表明亚波长光栅偏振片在入射光波长1 064 nm附近带宽0.5 nm内，平均消光比为1 500。使用了紫外曝光配合离子束刻蚀的工艺制备了HfO₂光栅，并对其纳秒脉冲激光损伤阈值进行了测试。测试结果表明S光损伤阈值约为P光损伤阈值的5倍，且都大于5 J/cm2。结果表明亚波长全介质光栅偏振片可广泛用于正入射激光系统中。     

50~110 nm波段高反射率多层膜的设计与制备

阐述了50~110 nm强吸收波段亚四分之一波长多层膜的设计方法.这种膜系是由强吸收材料叠加而成，每层膜光学厚度小于四分之一个波长.与常规周期多层膜相比，这种膜系更适用于提高强吸收波段的反射率.利用该方法设计了50 nm处高反射多层膜，并以此为初始条件通过Levenberg-Marquart优化方法完成了50~110 nm强吸收波段宽带高反射率Si/W/Co多层膜的设计，其平均反射率达到45%.采用直流磁控溅射方法制备了Si/W/Co多层膜,用X射线衍射仪(XRD)对膜层结构进行了测试，测试结果表明制作出的多层膜结构与设计结构基本相符.     

节瘤缺陷平坦化提高高反射膜的激光损伤阈值

探究了节瘤缺陷平坦化技术中平坦化层(刻蚀层)厚度和种子源尺寸之间的刻蚀规律,同时解释了平坦化技术提高节瘤缺陷的损伤阈值的机制。在双离子束溅射系统中,使用SiO₂微球模拟真实的种子源置于基板上,镀制1064 nm HfO₂/SiO₂高反膜,制备人工节瘤缺陷。对类似于实际种子源的SiO₂微球一系列不同刻蚀程度的实验得出了节瘤缺陷平坦化技术的刻蚀规律:只要平坦化层(刻蚀层)的厚度稍大于节瘤缺陷的种子源粒径,就可以将种子源完全平坦化。使用时域有限差分法(FDTD)模拟不同平坦化程度的节瘤缺陷内电场增强的结果与节瘤缺陷的损伤形貌进行对比实验,将损伤形貌和损伤阈值与电场强度分布之间建立联系,表明平坦化技术可以改变节瘤缺陷原有的几何结构,有效抑制节瘤缺陷的电场增强效应。最后,通过对未经平坦化和经过平坦化处理后的节瘤缺陷进行损伤阈值测试,对比结果直接验证了节瘤缺陷平坦化技术可以实现对节瘤缺陷的调控,大幅度提高了节瘤缺陷的损伤阈值。     

清洗对偏振分光膜损伤阈值的影响

采用微分干涉显微镜、扫描电镜和聚焦离子束观察了偏振分光膜损伤的形貌,从损伤机理出发,研究了清洗对偏振分光膜损伤阈值的影响。结果表明:清洗能有效去除表面杂质,清洗质量越好,基板上的杂质尺寸越小,杂质密度也越小,相应的偏振分光膜S光的损伤阈值越高;清洗能有效去除基板表面的纳米吸收中心,吸收性杂质分布密度越小,吸收峰越低,P光的损伤阈值越高。     

Characterization of a nano line width reference material based on metrological scanning electron microscope

The line width (often synonymously used for critical dimension, CD) is a crucial parameter in integrated circuits. To accurately control CD values in manufacturing, a reasonable CD reference material is required to calibrate the corresponding instruments. We develop a new reference material with nominal CDs of 160 nm, 80 nm, and 40 nm. The line features are investigated based on the metrological scanning electron microscope which is developed by the National Institute of Metrology (NIM) in China. Also, we propose a new characterization method for the precise measurement of CD values. After filtering and leveling the intensity profiles, the line features are characterized by the combination model of the Gaussian and Lorentz functions. The left and right edges of CD are automatically extracted with the profile decomposition and k-means algorithm. Then the width of the two edges at the half intensity position is regarded as the standard CD value. Finally, the measurement results are evaluated in terms of the sample, instrument, algorithm, and repeatability. The experiments indicate efficiency of the proposed method which can be easily applied in practice to accurately characterize CDs.     

SiO2/HfO2高反射膜的研制

主要讨论了电子束蒸发SiO2/HfO2薄膜的面形控制和损伤性能。研究了电子束蒸发工艺参数对薄膜应力以及面形的影响;分析了制备工艺对薄膜吸收、节瘤缺陷密度的影响,测量了制备薄膜的损伤阈值。研究结果表明:调整SiO2蒸发时的氧分压可以有效地将薄膜的应力控制在-250~-50 MPa。同时采用金属Hf蒸发可以显著地将节瘤缺陷密度从12.6 mm-2降低至2.7 mm-2,同时将损伤阈值从30 J/cm2提高至55 J/cm2。     

Dispersive mirrors designed with mixed metal multilayer dielectric stacks

A different approach to construct dispersive mirrors (DMs) for ultrafast applications is proposed based on the high reflectivity and constant phase property of a novel metal in ultrawide spectral band. A 200- nm bandwidth DM, a high dispersive DM, and a complementary DM are designed with mixed metal multilayer dielectric stacks. The results show that the mixed-metal multilayer dielectric DMs (MMDMs) have much less layers and total thickness compared with an all-dielectric DM under the case of comparable performance. Such an approach will save manufacturing time and remarkably improve the stress of the DM.     

基于模拟退火算法的宽角度X射线超反射镜设计研究

应用于硬X射线波段的宽带多层膜光学元件———宽角度X射线超反射镜的设计可以归结为一个连续变量的多维多极值的全局优化问题。缺少一种有效的全局优化方法是阻碍解决这一难题的一个关键。模拟退火算法是一种简单而且通用的全局优化算法。结合光学多层膜的设计原理提出了利用模拟退火算法来进行宽角度X射线超反射镜设计的新方法。结合已有的方法选择了W和C作为膜层的膜对材料,设计出Cu的Kα线处角度范围0.9°~1.1°反射率达到20%的宽角度X射线超反射镜。并在此基础上采用改进的自适应模拟退火算法实现了Cu的Kα线处宽角度X射线超反射镜的理想设计结果。设计结果表明了模拟退火算法在多层膜最优化设计领域的正确性和有效性。     

High Spectral Resolution Mo/Si Multilayers Working at High Order Reflection

The high reflectance orders are used to improve the spectral resolution of Mo/Si multilayers. The multilayers for the first-, second- and third-order reflectance are designed and optimized, respectively. These multilayers are fabricated by using a directed current magnetron sputtering system, and the reflectivity is measured in an extreme ultraviolet range by synchrotron radiation. The experimental results show that the spectral resolution λ/Δλ（λ= 14 nm） increases from 24.6 for the first order to 66.6 for the third order.