COMPLETE EXTREMAL SURFACES OF MIXED TYPE IN 3-DIMENSIONAL MINKOWSKI SPACE

ＣＯＭＰＬＥＴＥＥＸＴＲＥＭＡＬＳＵＲＦＡＣＥＳＯＦＭＩＸＥＤＴＹＰＥＩＮ３－ＤＩＭＥＮＳＩＯＮＡＬＭＩＮＫＯＷＳＫＩＳＰＡＣＥ￥ＧＵＣＨＡＯＨＡＯ（ＩｎｓｔｉｔｕｔｅｏｆＭａｔｈｅｍａｔｉｃｓ，ＦｕｄａｎＵｎｉｖｅｒｓｉｔｙ，Ｓｈａｎｇｈａｉ２００...     

双电荷交换反应与双重子共振态

提出了核双电荷交换反应的双重子共振态的反应机制,成功地解释了长期以来一直困惑着人们的共振区反应的角分布的实验结果.说明了共振区核双电荷交换反应是寻找双重子共振态的一个可能的途径.     

大电流稳定发射铁电阴极的模拟与实验研究

讨论了铁电阴极的发射机理, 借助MAFIA对不同电极结构的铁电阴极表面电场分布进行了模拟计算. 计算中发现, 发射面电极结构对铁电阴极表面三界点处的场增强效应影响很大,特别是具有孤岛电极结构的铁电阴极具有更大的三界点场强,从而获得更大和更稳定的发射电流. 通过对电极结构及其工艺的改进,使用PLZT铁电阴极在实验中得到了大于100A的电流.     

Nuclear Effects in Structure Functions xFa（x, Q^2） from Charge Current Neutrino Deep Inelastic Scattering

By taking advantage of the model-independent nuclear parton distributions, the structure functions xF3（x, Q^2） are calculated, in comparison with the experimental data from CCFR neutrino-nuclei charge current deep inelastic scattering. It is shown that shadowing and anti-shadowing effects occur in valence quark distributions for small and medium x regions, respectively. It is suggested that the neutrino experimental data should be employed in the future for pinning down the nuclear patton distributions.     

金属上化学吸附的族模型量子化学研究

簇模型方法是研究化学吸附的最重要的量子化学方法之一。本文对＇簇－－表面类比法＇的物理内涵、研究现状、以及发展趋势作了简要的评述。     

锂离子电池负极碳材料的表面改性与修饰：Ⅲ,人工施加的固体电解质膜…

研究了人工施加的无机固体电解质体膜对锂碳负极电池性能的影响作用，结果表明碳电极的容量及首次充放电效率相对于未改性电极都得到了一定程度的提高。显示了以这层外界人工施加的晶体膜替代的电极体系本身所形成的钝化膜之有效性，扫描电子显微镜的研究直观地显示了这层人工施加膜的均匀，致密性质。     

分析型反射电子显微镜和表面科学：实验技术和发展

本文综述了反射电子显微术(REM)和反射电子能量损失谱(REELS)在表面科学中的应用。较详细地给出了用这些方法研究表面原子结构、化学成份和电子态的基本实验和理论,指出了发展这一学科对表面研究的重要性。     

Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7nm, the densities of Ni films are around 97% and the deposition rate is 0.26nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.