激光等离子体探针及应用研究

本文介绍用阴影、纹影相干涉方法确定等离子体折射系数变化的原理。分析了等离子体中的非线性效应和对光探测系统的基本要求。并简要叙述了实验上采用的后向喇曼探测束,给出了等离子体干涉、纹影和阴影的测量结果。     

党和国家领导人珍爱珠算

我们党和国家领导人历来重视珠算的作用。1972年周恩来总理与李政道博士谈话中指出：“要告诉下面．不要把算盘丢掉、猴子吃桃子最危险”。1979年薄一波同志为《珠算》杂志创刊号题词时也指出：“算盘是我国的传统计算工具。一千多年以来在金融贸易和人民生活等方面起了重要作用。用算与与用电子计算札并不矛盾。现在还应充分发挥算盘的功能．为我国经济建没事业服务。”《珠算》杂志1980年第一期刊登了“陈云同志在杭州打算盘”的照片。     

电子束流品质对自由电子激光小信号增益影响的计算

对电子束有一定初始能量分散或角度分散时的自由电子激光小信号增益用较简便的方法进行了分析计算,并给出了一个渐近公式,结果与用计算机模拟解自由电子激光微分方程组得到的结果一致。     

Structural and Electrical Characteristics of Pb（Zr0.53,Ti0.47）O3 Thin Films Deposited on Si （100） Substrates

Pb(Zr0.53, Ti0.47)O3 (PZT) films were directly deposited on Si substrates without a buffer layer by pulsed laser deposition. Only(110)-oriented PZT peaks (other than Si substrate peaks) were observed from the XRD data. The electrical properties of the PZT/Si capacitor were characterized in terms of both the capacitance versus voltage (C-V) and current versus voltage (I-V) measurements. The clockwise trace of the C-V curve shows ferroelectric polarization switching, as is expected. From the I-V curves, the Schottky emission and spacecharge-limited-current behaviour are found to be the mainly leakage current mechanism in a certain electric field range in the negative and positive bias, respectively.     

光学材料微缺陷引起的损伤机理及后处理

采用时域有限差分方法（FDTD）进行元件表面微结构电磁场分布的数值模拟；同时实验分析了化学湿法刻蚀对光学元件表面面形及粗糙度、激光损伤阈值等的影响。     

用脉冲激光同轴全息技术测量微射流

强冲击载荷下自由表面的粒子喷射现象还没有被清楚认识，很难从理论上给以准确的计算模型，因而从实验测定材料在冲击载荷下自由面面喷射物质的分布和粒子尺寸大小就显得非常重要。测量微粒场的脉冲激光同轴全息技术，具有在纳秒或更在短时间内“固化”运动微粒场、测量精度高、景深长、光路简单和获得的信息量大等优点。这些优势使得脉冲激光同轴全息技术成为研究微喷射场的重要测试手段之一。     

Lifetime Measurements for Electric-Dipole △n=0 Transitions in the Beryllium-Like Sulfur

We have measured lifetimes of △n=0 allowed transitions in beryllium-like sulfur using beam foil spectroscopic techniques. The measured values, derived from analysis of arbitrarily normalized decay curves, are presented and compared with theoretical calculations and previous measurements. Accurate probabilities have been determined by the well-known relationship.     

Von Neumann Entropy of an Electron in One-Dimensional Determined Potentials

By using the measure of von Neumann entropy, we numerically investigate quantum entanglement of an electron moving in the one-dimensional Harper model and in the one-dimensional slowly varying potential model. The delocalized and localized eigenstates can be distinguished by von Neumann entropy of the individual eigenstates.There are drastic decreases in von Neumann entropy of the individual eigenstates at mobility edges. In the curve of the spectrum averaged von Neumann entropy as a function of potential parameter λ, a sharp transition exists at the metal-insulator transition point λc = 2. It is found that the von Neumann entropy is a good quantity to reflect localization and metal-insulator transition.     

Deposition of Hydrogen-Free Silicon Nitride Thin Films by Microwave ECR plasma Enhanced Magnetron Sputtering at Room Temperature

Hydrogen-free silicon nitride （SiNx） films were deposited at room temperature by microwave electron cyclotron resonance （MW-ECR） plasma enhanced unbalance magnetron sputtering system. Both Fourier-transform infrared spectroscopy and x-ray photoelectron spectroscopy are used to study the bonding type and the change of bonding structures of the silicon nitride films. The results indicate that the chemical structure and composition of SiNx films deposited by this technique depend strongly on the N2 flow rates, the stoichiometric SiNx film, which has the highest hardness of 22.9 GPa, could be obtained at lower N2 flow rate of 4 sccm.