In this paper, the fabrication and investigation of flexible impedance and capacitive tensile load sensors based on carbon nanotube(CNT) composite are reported. On thin rubber substrates, CNTs are deposited from suspension in water and pressed at elevated temperature. It is found that the fabricated load cells are highly sensitive to the applied mechanical force with good repeatability. The increase in impedance of the cells is observed to be 2.0 times while the decrease in the capacitance is found to be 2.1 times as applied force increases up to 0.3 N. The average impedance and capacitive sensitivity of the cell are equal to 3.4 N~(-1) and 1.8 N~(-1), respectively. Experimental results are compared with the simulated values,and they show that they are in reasonable agreement with each other. 相似文献
Based on Hamilton's principle,a new kind of fully coupled nonlinear dynamic model for a rotating rigid-flexible smart structure with a tip mass is proposed.The geometrically nonlinear effects of the axial,transverse displacement and rotation angle are considered by means of the first-order approximation coupling(FOAC)model theory, in which large deformations and the centrifugal stiffening effects are considered.Three kinds of systems are established respectively,which are a structure without piezoelectric layer,with piezoelectric layer in open circuit and closed circuit.Several simulations based on simplified models are presented to show the differences in characteristics between structures with and without the tip mass,between smart beams in closed and open circuit, and between the centrifugal effects in high speed rotating state or not.The last simulation calculates the dynamic response of the structure subjected to external electrical loading. 相似文献
This work reports a facile method to fabricate multi‐tiered polymer nanopatterns on SU‐8 by the combination of imprint‐ and photo‐lithography. First, SU‐8 is imprint patterned using a polymeric flexible mold with an anti‐adhesion coating that is deposited on a transparent and flexible substrate, at room temperature under low pressure. Next, the resulting SU‐8 nanopatterns are exposed to UV light through a chromium mask by a photolithographic process. Removal of the unexposed SU‐8 leaves behind multi‐tiered structures. The use of a hemispherical poly(dimethylsiloxane) pad facilitates the evacuation of trapped air during the imprinting process. Line/space patterns of 500 nm with the smallest line width of 200 nm were homogeneously imprint‐patterned on SU‐8 on a large flexible substrate, and three‐tiered structures, ranging in thickness from 300 nm to 2 µm, were successfully formed.
