ICP-AES测定彩涂前处理表面调整转化层中Ti、Ni含量及钝化膜中Cr含量

采用电感耦合等离子体-原子发射光谱法同时测定彩涂前处理表面调整转化层中Ti、Ni含量及钝化膜中Cr含量.以表征表面调整转化层厚度及钝化膜厚度,采用本方法准确度高、快速简便,经试验结果令人满意.     

掺Eu3+硅基材料的发光性质

通过溶胶－凝胶技术制备了掺Eu^3 的硅基材料并测试了其三维荧光光谱、激光谱和发射光谱，结果显示，最佳激发波波长为350nm,最强荧光波长为620nm；在350nm光激发下的发射光谱显示Eu^3 的特征发射光谱，产生4条谱带，分别是577nm(^5D0-^7F0)，588nm(^5D0-^7F1),596nm(^5D0-^7F1)和610nm(^5D0-^7F2)。     

掺钛蓝宝石脉冲可调谐激光器在实验室中的应用

介绍了掺钛蓝宝石可调谐激光器在实验室中的应用.自行设计了波长690~900 nm之间连续可调谐激光,单脉冲能量为5 mJ,重复频率为20 Hz,激励采用波长532 nm、能量35 mJ的倍频YAG激光器,经过调谐滤波器,输出连续可调谐激光.     

Compact Single-Stage Femtosecond Multipass Ti：Sapphire Amplifier at 1 kHz with High Beam Quality

A compact femtosecond Ti：sapphire amplifier system is reported using single-stage multipass configuration with high beam quality. A high dispersion glass stretcher and a pair of double prisms for compression are introduced based on broadband femtosecond seed pulses. The non-grating-based pulse stretcher and compressor are advantageous to increase high beam quality and to reduce the high-order dispersion. A Gaussian filter is used to reduce the gain narrowing effect in amplification. The compact femtosecond Ti：sapphire nine-pass amplifier delivers pulses with a duration of 26 fs and an energy of 800μJ at 7mJ pumping pulses energy at I kHz. The 1-kHz femtosecond amplifier with high beam quality and high stability is very suitable for ultrafast physics research applications, such as attosecond science, ultra-precision micromachining, and THz wave generation.     

模式识别预报双阳离子共交换Cu,Me-ZSM-5分子筛对NO分解的催化活性

本文采用模式识别方法,分析了用于NO分解反应的分子筛催化剂Cu,Me-ZSM-5中的第二种交换阳离子Me对其活性的影响.根据模式识别二维分类图,很好地预报了不同活性的催化剂.并初步讨论了引入共交换金属离子导致催化剂活性变化的原因.     

Experimental Study of Capillary Effect in Porous Silicon Using Micro-Raman Spectroscopy and X-Ray Diffraction

We investigate the capillary effect and the residual stress evolution in the wetting, drying and rewetting stages of porous silicon using x-ray diffraction and micro-Raman spectroscopy. A reversible capillary effect and an irreversible oxidation effect are the driving forces for the residual stress evolution. The lattice expansion of the porous-silicon layer is observed to decrease slightly by x-ray diffraction and the tensile residual stress increases rapidly by micro-Raman spectroscopy, with the change of about 82 MPa for the oxidation effect and the change of 2.78 GPa (enough for cracking) for the capillary effect. Therefore, the capillary effect plays a major role in the residual stress evolution in the stages. A simple microscopic liquid-bridge model is introduced to explain the capillary effect and its reversibility. The capillary emergence has a close relation with a great deal of the micro-pore structure of porous silicon.