Surface passivation in n-type silicon and its application in silicon drift detector

Based on the surface passivation of n-type silicon in a silicon drift detector(SDD), we propose a new passivation structure of SiO2/Al2O3/SiO2 passivation stacks. Since the SiO2 formed by the nitric-acid-oxidation-of-silicon(NAOS)method has good compactness and simple process, the first layer film is formed by the NAOS method. The Al2O3 film is also introduced into the passivation stacks owing to exceptional advantages such as good interface characteristic and simple process. In addition, for requirements of thickness and deposition temperature, the third layer of the SiO2 film is deposited by plasma enhanced chemical vapor deposition(PECVD). The deposition of the SiO2 film by PECVD is a low-temperature process and has a high deposition rate, which causes little damage to the device and makes the SiO2 film very suitable for serving as the third passivation layer. The passivation approach of stacks can saturate dangling bonds at the interface between stacks and the silicon substrate, and provide positive charge to optimize the field passivation of the n-type substrate.The passivation method ultimately achieves a good combination of chemical and field passivations. Experimental results show that with the passivation structure of SiO2/Al2O3/SiO2, the final minority carrier lifetime reaches 5223 μs at injection of 5×10¹⁵ cm^-3. When it is applied to the passivation of SDD, the leakage current is reduced to the order of nA.     

超导离子源铌三锡六极线圈镜像磁场约束结构的优化设计

中国科学院近代物理研究所正在进行国际首台45 GHz全铌三锡超导离子源FECR(Fourth Electron Cyclotron Resonance)磁体的研制，该离子源磁体线圈由六个铌三锡超导六极线圈和四个铌三锡超导螺线管线圈组成。由于单根超导线绕制异形六极线圈(非标准鞍型)技术难度大，且铌三锡超导性能对应力敏感，为了测试单个铌三锡六极线圈性能能否达到设计指标，基于铝合金壳层结构和Bladder-Key精确预紧技术，设计了镜像磁场约束结构。本工作主要阐述了运用ANSYS参数化设计编程对镜像磁场结构进行优化设计的过程和优化后的镜像磁场结构，确定了室温预应力大小，并给出了线圈经过室温预紧、冷却降温和加电励磁后的最大等效应力。进一步结合实际六极线圈制作公差(±0.1 mm)，分析和评估了公差对镜像磁场结构中六极线圈预应力施加的影响。     

^13C的一个可能的类晕的中子1p态

假设^13C是单粒子的2p态的结构，用Glauber多重散射理论研究了入射能量为1GeV的质子在^13C上的弹性散射，得到了与实验符合得很好的理论结果。这说明^13C可能存在着一个类晕的中子皮。     

记忆效应之管见

记忆效应之管见王怀亮山西师大化学系０４１００４临汾一、前言记忆效应［１］（ｍｅｍｏｒｙｅｆｆｅｃｔ）是Ｊ．Ａ．Ｂｅｒｓｏｎ在１９６８年提出的，其含义是在一多步的碳正离子重排反应中，用构型上不相同的反应原料，经过首次异裂产生在结构上相同的碳正离子中间体...     

Eu(DBM)_3TPPO的晶体结构和荧光光谱

C_(63)H_(51)O_7PEu,三斜晶系,空间群,a=12.336(3),b=18.729(5),c=11.502(3),α=95.86(2),β=103.14(2),γ=87.89(2)°,Z=2,D_x=1.39gcm~(-3)。用6989个I>3σ(I)的可观察衍射数据对72个非氢原子的原子坐标和各向异性温度因子进行全矩阵最小二乘精修,最终的偏离因子R=0.055。中心离子Eu(Ⅲ)由七个氧原子配位,配位多面体为畸变的单帽三棱柱体,帽位由TPPO的氧原子占据,Eu—O原子间距在2.305(4)—2.367(4)之间。77K下测定了配合物的高分辨激光激发和发射光谱,结果表明配合物中Eu(Ⅲ)离子有两种格位,一具C_(2v)点对称性,另一具C_s点对称性。具有较低对称性C_s的物种在配合物中占绝对优势。77K下还记录了掺1％铕的配合物Gd(DBM)_3TPPO的发射光谱,结果表明Gd(Ⅲ)离子具有与标题化合物中Eu(Ⅲ)离子相同的格位。     

HIRFL–CSR加速器中束流与真空中剩余气体的碰撞损失

研究了重离子加速器中束流与真空中剩余气体的碰撞损失过程和碰撞截面,在依据大量实验数据的基础上,提出了一组计算离子一原子的电荷交换截面的经验公式.以兰州重离子加速器HDRFL及冷却储存环CSR为例,给出了依据碰撞截面的公式计算束流在加速器真空中的传输效率的方法,并计算了在不同真空度下HIRFL的ECR源轴向注入束运线、注入器SFC、前束运线、主加速器SSC和后束运线等不同加速阶段及CSR的传输效率,并提出合理的真空度要求.HIRFL的真空分布测量和束流的损失测量证明了该计算方法的可靠性.